{"id":"https://openalex.org/W4405938464","doi":"https://doi.org/10.3390/sym17010046","title":"Research on Si/SiO2 Interfaces Characteristics Under Service Conditions","display_name":"Research on Si/SiO2 Interfaces Characteristics Under Service Conditions","publication_year":2024,"publication_date":"2024-12-30","ids":{"openalex":"https://openalex.org/W4405938464","doi":"https://doi.org/10.3390/sym17010046"},"language":"en","primary_location":{"id":"doi:10.3390/sym17010046","is_oa":true,"landing_page_url":"https://doi.org/10.3390/sym17010046","pdf_url":"https://www.mdpi.com/2073-8994/17/1/46/pdf?version=1735552608","source":{"id":"https://openalex.org/S190787756","display_name":"Symmetry","issn_l":"2073-8994","issn":["2073-8994"],"is_oa":true,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Symmetry","raw_type":"journal-article"},"type":"article","indexed_in":["crossref","doaj"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://www.mdpi.com/2073-8994/17/1/46/pdf?version=1735552608","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5019654808","display_name":"W. Zhang","orcid":null},"institutions":[{"id":"https://openalex.org/I149594827","display_name":"Xidian University","ror":"https://ror.org/05s92vm98","country_code":"CN","type":"education","lineage":["https://openalex.org/I149594827"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Weida Zhang","raw_affiliation_strings":["School of Microelectronics, Xidian University, Xi\u2019an 710071, China","School of Microelectronics, Xidian University, Xi'an 710071, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi\u2019an 710071, China","institution_ids":["https://openalex.org/I149594827"]},{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi'an 710071, China","institution_ids":["https://openalex.org/I149594827"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071269261","display_name":"Yunqi Yang","orcid":"https://orcid.org/0000-0002-6668-2628"},"institutions":[{"id":"https://openalex.org/I149594827","display_name":"Xidian University","ror":"https://ror.org/05s92vm98","country_code":"CN","type":"education","lineage":["https://openalex.org/I149594827"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yunqi Yang","raw_affiliation_strings":["School of Microelectronics, Xidian University, Xi\u2019an 710071, China","School of Microelectronics, Xidian University, Xi'an 710071, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi\u2019an 710071, China","institution_ids":["https://openalex.org/I149594827"]},{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi'an 710071, China","institution_ids":["https://openalex.org/I149594827"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100364589","display_name":"Dongdong Chen","orcid":"https://orcid.org/0000-0002-5065-4374"},"institutions":[{"id":"https://openalex.org/I149594827","display_name":"Xidian University","ror":"https://ror.org/05s92vm98","country_code":"CN","type":"education","lineage":["https://openalex.org/I149594827"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Dongdong Chen","raw_affiliation_strings":["School of Microelectronics, Xidian University, Xi\u2019an 710071, China","School of Microelectronics, Xidian University, Xi'an 710071, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi\u2019an 710071, China","institution_ids":["https://openalex.org/I149594827"]},{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi'an 710071, China","institution_ids":["https://openalex.org/I149594827"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070395523","display_name":"Tianlong Zhao","orcid":"https://orcid.org/0000-0002-9598-2734"},"institutions":[{"id":"https://openalex.org/I149594827","display_name":"Xidian University","ror":"https://ror.org/05s92vm98","country_code":"CN","type":"education","lineage":["https://openalex.org/I149594827"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Tianlong Zhao","raw_affiliation_strings":["School of Microelectronics, Xidian University, Xi\u2019an 710071, China","School of Microelectronics, Xidian University, Xi'an 710071, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi\u2019an 710071, China","institution_ids":["https://openalex.org/I149594827"]},{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi'an 710071, China","institution_ids":["https://openalex.org/I149594827"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100446349","display_name":"Di Li","orcid":"https://orcid.org/0000-0001-6118-7401"},"institutions":[{"id":"https://openalex.org/I149594827","display_name":"Xidian University","ror":"https://ror.org/05s92vm98","country_code":"CN","type":"education","lineage":["https://openalex.org/I149594827"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Di Li","raw_affiliation_strings":["School of Microelectronics, Xidian University, Xi\u2019an 710071, China","School of Microelectronics, Xidian University, Xi'an 710071, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi\u2019an 710071, China","institution_ids":["https://openalex.org/I149594827"]},{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi'an 710071, China","institution_ids":["https://openalex.org/I149594827"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100402361","display_name":"Yintang Yang","orcid":"https://orcid.org/0000-0001-9745-5404"},"institutions":[{"id":"https://openalex.org/I149594827","display_name":"Xidian University","ror":"https://ror.org/05s92vm98","country_code":"CN","type":"education","lineage":["https://openalex.org/I149594827"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yintang Yang","raw_affiliation_strings":["School of Microelectronics, Xidian University, Xi\u2019an 710071, China","School of Microelectronics, Xidian University, Xi'an 710071, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi\u2019an 710071, China","institution_ids":["https://openalex.org/I149594827"]},{"raw_affiliation_string":"School of Microelectronics, Xidian University, Xi'an 710071, China","institution_ids":["https://openalex.org/I149594827"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":["https://openalex.org/A5100364589"],"corresponding_institution_ids":["https://openalex.org/I149594827"],"apc_list":{"value":2000,"currency":"CHF","value_usd":2165},"apc_paid":{"value":2000,"currency":"CHF","value_usd":2165},"fwci":1.025,"has_fulltext":true,"cited_by_count":5,"citation_normalized_percentile":{"value":0.77659456,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":96,"max":98},"biblio":{"volume":"17","issue":"1","first_page":"46","last_page":"46"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7522013783454895},{"id":"https://openalex.org/keywords/reliability","display_name":"Reliability (semiconductor)","score":0.5687669515609741},{"id":"https://openalex.org/keywords/stress","display_name":"Stress (linguistics)","score":0.566909909248352},{"id":"https://openalex.org/keywords/degradation","display_name":"Degradation (telecommunications)","score":0.5075055956840515},{"id":"https://openalex.org/keywords/interface","display_name":"Interface (matter)","score":0.49986791610717773},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.48503559827804565},{"id":"https://openalex.org/keywords/microstructure","display_name":"Microstructure","score":0.48234885931015015},{"id":"https://openalex.org/keywords/silicon-carbide","display_name":"Silicon carbide","score":0.4590510427951813},{"id":"https://openalex.org/keywords/stress-field","display_name":"Stress field","score":0.42829620838165283},{"id":"https://openalex.org/keywords/characterization","display_name":"Characterization (materials science)","score":0.42673543095588684},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.3721100687980652},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.30346083641052246},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.2680969834327698},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.23528560996055603},{"id":"https://openalex.org/keywords/structural-engineering","display_name":"Structural engineering","score":0.16120314598083496},{"id":"https://openalex.org/keywords/finite-element-method","display_name":"Finite element method","score":0.11275032162666321},{"id":"https://openalex.org/keywords/power","display_name":"Power (physics)","score":0.09219598770141602}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7522013783454895},{"id":"https://openalex.org/C43214815","wikidata":"https://www.wikidata.org/wiki/Q7310987","display_name":"Reliability (semiconductor)","level":3,"score":0.5687669515609741},{"id":"https://openalex.org/C21036866","wikidata":"https://www.wikidata.org/wiki/Q181767","display_name":"Stress (linguistics)","level":2,"score":0.566909909248352},{"id":"https://openalex.org/C2779679103","wikidata":"https://www.wikidata.org/wiki/Q5251805","display_name":"Degradation (telecommunications)","level":2,"score":0.5075055956840515},{"id":"https://openalex.org/C113843644","wikidata":"https://www.wikidata.org/wiki/Q901882","display_name":"Interface (matter)","level":4,"score":0.49986791610717773},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.48503559827804565},{"id":"https://openalex.org/C87976508","wikidata":"https://www.wikidata.org/wiki/Q1498213","display_name":"Microstructure","level":2,"score":0.48234885931015015},{"id":"https://openalex.org/C2780722187","wikidata":"https://www.wikidata.org/wiki/Q412356","display_name":"Silicon carbide","level":2,"score":0.4590510427951813},{"id":"https://openalex.org/C2778414698","wikidata":"https://www.wikidata.org/wiki/Q7623438","display_name":"Stress field","level":3,"score":0.42829620838165283},{"id":"https://openalex.org/C2780841128","wikidata":"https://www.wikidata.org/wiki/Q5073781","display_name":"Characterization (materials science)","level":2,"score":0.42673543095588684},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3721100687980652},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.30346083641052246},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2680969834327698},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.23528560996055603},{"id":"https://openalex.org/C66938386","wikidata":"https://www.wikidata.org/wiki/Q633538","display_name":"Structural engineering","level":1,"score":0.16120314598083496},{"id":"https://openalex.org/C135628077","wikidata":"https://www.wikidata.org/wiki/Q220184","display_name":"Finite element method","level":2,"score":0.11275032162666321},{"id":"https://openalex.org/C163258240","wikidata":"https://www.wikidata.org/wiki/Q25342","display_name":"Power (physics)","level":2,"score":0.09219598770141602},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C28413391","wikidata":"https://www.wikidata.org/wiki/Q785542","display_name":"Capillary number","level":3,"score":0.0},{"id":"https://openalex.org/C196806460","wikidata":"https://www.wikidata.org/wiki/Q188603","display_name":"Capillary action","level":2,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.3390/sym17010046","is_oa":true,"landing_page_url":"https://doi.org/10.3390/sym17010046","pdf_url":"https://www.mdpi.com/2073-8994/17/1/46/pdf?version=1735552608","source":{"id":"https://openalex.org/S190787756","display_name":"Symmetry","issn_l":"2073-8994","issn":["2073-8994"],"is_oa":true,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Symmetry","raw_type":"journal-article"},{"id":"pmh:oai:doaj.org/article:0cc4b52deb204313a5bd4d4fb86f2fac","is_oa":true,"landing_page_url":"https://doaj.org/article/0cc4b52deb204313a5bd4d4fb86f2fac","pdf_url":null,"source":{"id":"https://openalex.org/S112646816","display_name":"SHILAP Revista de lepidopterolog\u00eda","issn_l":"0300-5267","issn":["0300-5267","2340-4078"],"is_oa":true,"is_in_doaj":true,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Symmetry, Vol 17, Iss 1, p 46 (2024)","raw_type":"article"}],"best_oa_location":{"id":"doi:10.3390/sym17010046","is_oa":true,"landing_page_url":"https://doi.org/10.3390/sym17010046","pdf_url":"https://www.mdpi.com/2073-8994/17/1/46/pdf?version=1735552608","source":{"id":"https://openalex.org/S190787756","display_name":"Symmetry","issn_l":"2073-8994","issn":["2073-8994"],"is_oa":true,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Symmetry","raw_type":"journal-article"},"sustainable_development_goals":[],"awards":[{"id":"https://openalex.org/G1296667907","display_name":null,"funder_award_id":"62090043","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G426303449","display_name":null,"funder_award_id":"62104177","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G5384908754","display_name":null,"funder_award_id":"TZJH2024049","funder_id":"https://openalex.org/F4320323230","funder_display_name":"Xidian University"},{"id":"https://openalex.org/G7889665364","display_name":null,"funder_award_id":"61934006","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G8100522184","display_name":null,"funder_award_id":"2022YFB4401300","funder_id":"https://openalex.org/F4320335777","funder_display_name":"National Key Research and Development Program of China"}],"funders":[{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"},{"id":"https://openalex.org/F4320323230","display_name":"Xidian University","ror":"https://ror.org/05s92vm98"},{"id":"https://openalex.org/F4320335777","display_name":"National Key Research and Development Program of China","ror":null}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W4405938464.pdf","grobid_xml":"https://content.openalex.org/works/W4405938464.grobid-xml"},"referenced_works_count":128,"referenced_works":["https://openalex.org/W1577063847","https://openalex.org/W1663844007","https://openalex.org/W1963634383","https://openalex.org/W1965639897","https://openalex.org/W1966816955","https://openalex.org/W1968121424","https://openalex.org/W1970576618","https://openalex.org/W1973417063","https://openalex.org/W1975379361","https://openalex.org/W1985391258","https://openalex.org/W1987079042","https://openalex.org/W1989502599","https://openalex.org/W1994987075","https://openalex.org/W1995777198","https://openalex.org/W1999334136","https://openalex.org/W2003645630","https://openalex.org/W2004235605","https://openalex.org/W2011703730","https://openalex.org/W2027032468","https://openalex.org/W2028099026","https://openalex.org/W2028795043","https://openalex.org/W2040474434","https://openalex.org/W2044245436","https://openalex.org/W2048967994","https://openalex.org/W2052231590","https://openalex.org/W2053674573","https://openalex.org/W2065252388","https://openalex.org/W2068426513","https://openalex.org/W2071991571","https://openalex.org/W2078057169","https://openalex.org/W2078391451","https://openalex.org/W2078494223","https://openalex.org/W2081893118","https://openalex.org/W2082358577","https://openalex.org/W2082614717","https://openalex.org/W2083277059","https://openalex.org/W2083552812","https://openalex.org/W2086497708","https://openalex.org/W2090587624","https://openalex.org/W2090648052","https://openalex.org/W2110727350","https://openalex.org/W2125280325","https://openalex.org/W2141372746","https://openalex.org/W2148571009","https://openalex.org/W2159496500","https://openalex.org/W2159642586","https://openalex.org/W2166102669","https://openalex.org/W2167637317","https://openalex.org/W2171853149","https://openalex.org/W2216662081","https://openalex.org/W2239897753","https://openalex.org/W2273886880","https://openalex.org/W2284692170","https://openalex.org/W2314898559","https://openalex.org/W2323076660","https://openalex.org/W2325296945","https://openalex.org/W2328643474","https://openalex.org/W2509670230","https://openalex.org/W2532673205","https://openalex.org/W2564423994","https://openalex.org/W2589675983","https://openalex.org/W2594882804","https://openalex.org/W2611553196","https://openalex.org/W2613804911","https://openalex.org/W2616343348","https://openalex.org/W2751298941","https://openalex.org/W2768178199","https://openalex.org/W2804433504","https://openalex.org/W2807186507","https://openalex.org/W2808427618","https://openalex.org/W2892555293","https://openalex.org/W2912694924","https://openalex.org/W2945190240","https://openalex.org/W2951961650","https://openalex.org/W2991609650","https://openalex.org/W2995107932","https://openalex.org/W3003619193","https://openalex.org/W3005458200","https://openalex.org/W3007656716","https://openalex.org/W3010481829","https://openalex.org/W3011069786","https://openalex.org/W3019794803","https://openalex.org/W3037152455","https://openalex.org/W3045097373","https://openalex.org/W3046515913","https://openalex.org/W3088032529","https://openalex.org/W3101659329","https://openalex.org/W3104088391","https://openalex.org/W3104922746","https://openalex.org/W3133643930","https://openalex.org/W3157131883","https://openalex.org/W3185265298","https://openalex.org/W3193705215","https://openalex.org/W3195174793","https://openalex.org/W3201021524","https://openalex.org/W3205347589","https://openalex.org/W3205979944","https://openalex.org/W4206741144","https://openalex.org/W4210537253","https://openalex.org/W4210848345","https://openalex.org/W4211091940","https://openalex.org/W4211174321","https://openalex.org/W4223909407","https://openalex.org/W4249935578","https://openalex.org/W4293003106","https://openalex.org/W4298011152","https://openalex.org/W4381684758","https://openalex.org/W4382601010","https://openalex.org/W4383908673","https://openalex.org/W4385454916","https://openalex.org/W4386913001","https://openalex.org/W4388233190","https://openalex.org/W4388696465","https://openalex.org/W4392781895","https://openalex.org/W4394623038","https://openalex.org/W4394685818","https://openalex.org/W4394865771","https://openalex.org/W4396666684","https://openalex.org/W4396949290","https://openalex.org/W4403745758","https://openalex.org/W4404721121","https://openalex.org/W6647044375","https://openalex.org/W6663640905","https://openalex.org/W6682441551","https://openalex.org/W6684479035","https://openalex.org/W6684557761","https://openalex.org/W6700909888","https://openalex.org/W6862530117"],"related_works":["https://openalex.org/W3107994849","https://openalex.org/W4247143848","https://openalex.org/W2009883749","https://openalex.org/W2735573198","https://openalex.org/W29442446","https://openalex.org/W330727063","https://openalex.org/W2896904446","https://openalex.org/W1483407203","https://openalex.org/W4206825956","https://openalex.org/W651098627"],"abstract_inverted_index":{"Si/SiO2":[0,24,50,78,160],"interfaces,":[1],"an":[2,36,41],"important":[3],"functional":[4],"part":[5],"of":[6,55,67,121,126,151,156],"silicon-based":[7],"devices,":[8,152],"are":[9,61,80,131],"the":[10,21,49,52,65,119,128,134,149,157],"structures":[11],"most":[12],"likely":[13],"to":[14,40,110,118],"cause":[15],"failure.":[16],"Under":[17,123],"external":[18],"load":[19],"in":[20,28],"service":[22],"state,":[23],"interfaces":[25,79,135,161],"can":[26,33,90,116],"degrade":[27],"different":[29],"forms,":[30],"and":[31,59,74,87,96,104,112,133],"they":[32],"change":[34],"from":[35],"ideal":[37],"symmetrical":[38],"structure":[39,43],"asymmetric":[42],"with":[44],"defects.":[45],"To":[46],"systematically":[47],"analyze":[48],"interface,":[51],"research":[53],"methods":[54],"microstructure,":[56],"including":[57],"characterization":[58],"modeling,":[60],"first":[62],"introduced.":[63],"Then,":[64],"effects":[66],"irradiation,":[68],"high":[69,75,94],"field":[70,95],"stress,":[71,73],"mechanical":[72,97],"temperature":[76,113],"on":[77,159],"studied.":[81],"Chemical":[82],"bonds,":[83],"conductive":[84],"band":[85],"structure,":[86],"interface":[88,143],"roughness":[89],"be":[91],"changed":[92],"under":[93,162],"stress":[98],"loads.":[99],"In":[100],"addition,":[101],"defect":[102],"initiation":[103],"impurity":[105],"migration":[106],"may":[107],"occur":[108],"due":[109],"irradiation":[111],"loads,":[114,127],"which":[115,139],"lead":[117],"failure":[120],"devices.":[122],"multiple":[124],"types":[125],"degradation":[129,144],"mechanisms":[130],"complex,":[132],"become":[136],"more":[137],"sensitive,":[138],"makes":[140],"investigations":[141],"into":[142],"laws":[145],"difficult.":[146],"For":[147],"improving":[148],"reliability":[150],"a":[153],"systematic":[154],"analysis":[155],"influence":[158],"complex":[163],"loads":[164],"is":[165],"summarized.":[166]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":4}],"updated_date":"2026-04-10T15:06:20.359241","created_date":"2025-10-10T00:00:00"}
