{"id":"https://openalex.org/W2943898044","doi":"https://doi.org/10.3390/s19092182","title":"Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography","display_name":"Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography","publication_year":2019,"publication_date":"2019-05-11","ids":{"openalex":"https://openalex.org/W2943898044","doi":"https://doi.org/10.3390/s19092182","mag":"2943898044","pmid":"https://pubmed.ncbi.nlm.nih.gov/31083502"},"language":"en","primary_location":{"id":"doi:10.3390/s19092182","is_oa":true,"landing_page_url":"https://doi.org/10.3390/s19092182","pdf_url":"https://www.mdpi.com/1424-8220/19/9/2182/pdf?version=1557550348","source":{"id":"https://openalex.org/S101949793","display_name":"Sensors","issn_l":"1424-8220","issn":["1424-8220"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Sensors","raw_type":"journal-article"},"type":"article","indexed_in":["crossref","doaj","pubmed"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://www.mdpi.com/1424-8220/19/9/2182/pdf?version=1557550348","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5059213574","display_name":"Chiara Valsecchi","orcid":"https://orcid.org/0000-0002-0456-5776"},"institutions":[{"id":"https://openalex.org/I72872986","display_name":"Universidade Federal do Pampa","ror":"https://ror.org/003qt4p19","country_code":"BR","type":"education","lineage":["https://openalex.org/I72872986"]}],"countries":["BR"],"is_corresponding":true,"raw_author_name":"Chiara Valsecchi","raw_affiliation_strings":["Engineering Department, Universidade Federal do Pampa, Alegrete 97546-550, RS, Brazil"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Department, Universidade Federal do Pampa, Alegrete 97546-550, RS, Brazil","institution_ids":["https://openalex.org/I72872986"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028459489","display_name":"Luis E. G. Armas","orcid":"https://orcid.org/0000-0003-4910-2406"},"institutions":[{"id":"https://openalex.org/I72872986","display_name":"Universidade Federal do Pampa","ror":"https://ror.org/003qt4p19","country_code":"BR","type":"education","lineage":["https://openalex.org/I72872986"]}],"countries":["BR"],"is_corresponding":false,"raw_author_name":"Luis Enrique Gomez Armas","raw_affiliation_strings":["Engineering Department, Universidade Federal do Pampa, Alegrete 97546-550, RS, Brazil"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Department, Universidade Federal do Pampa, Alegrete 97546-550, RS, Brazil","institution_ids":["https://openalex.org/I72872986"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5022418586","display_name":"J. W. Menezes","orcid":"https://orcid.org/0000-0002-3062-7125"},"institutions":[{"id":"https://openalex.org/I72872986","display_name":"Universidade Federal do Pampa","ror":"https://ror.org/003qt4p19","country_code":"BR","type":"education","lineage":["https://openalex.org/I72872986"]}],"countries":["BR"],"is_corresponding":true,"raw_author_name":"Jacson Weber de Menezes","raw_affiliation_strings":["Engineering Department, Universidade Federal do Pampa, Alegrete 97546-550, RS, Brazil"],"raw_orcid":"https://orcid.org/0000-0002-3062-7125","affiliations":[{"raw_affiliation_string":"Engineering Department, Universidade Federal do Pampa, Alegrete 97546-550, RS, Brazil","institution_ids":["https://openalex.org/I72872986"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5022418586","https://openalex.org/A5059213574"],"corresponding_institution_ids":["https://openalex.org/I72872986"],"apc_list":{"value":2400,"currency":"CHF","value_usd":2598},"apc_paid":{"value":2400,"currency":"CHF","value_usd":2598},"fwci":1.8931,"has_fulltext":true,"cited_by_count":30,"citation_normalized_percentile":{"value":0.84707855,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":98},"biblio":{"volume":"19","issue":"9","first_page":"2182","last_page":"2182"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10295","display_name":"Plasmonic and Surface Plasmon Research","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10295","display_name":"Plasmonic and Surface Plasmon Research","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/nanolithography","display_name":"Nanolithography","score":0.8360259532928467},{"id":"https://openalex.org/keywords/interference-lithography","display_name":"Interference lithography","score":0.7983503341674805},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.7859543561935425},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7604377269744873},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.6987184882164001},{"id":"https://openalex.org/keywords/nanosphere-lithography","display_name":"Nanosphere lithography","score":0.566899836063385},{"id":"https://openalex.org/keywords/photolithography","display_name":"Photolithography","score":0.5507439970970154},{"id":"https://openalex.org/keywords/x-ray-lithography","display_name":"X-ray lithography","score":0.544605553150177},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.5416342616081238},{"id":"https://openalex.org/keywords/next-generation-lithography","display_name":"Next-generation lithography","score":0.5346663594245911},{"id":"https://openalex.org/keywords/substrate","display_name":"Substrate (aquarium)","score":0.4939449429512024},{"id":"https://openalex.org/keywords/interference","display_name":"Interference (communication)","score":0.46586373448371887},{"id":"https://openalex.org/keywords/maskless-lithography","display_name":"Maskless lithography","score":0.45430004596710205},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.43856093287467957},{"id":"https://openalex.org/keywords/focused-ion-beam","display_name":"Focused ion beam","score":0.42947494983673096},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.41297513246536255},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"Electron-beam lithography","score":0.35972124338150024},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.08202177286148071},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.06251323223114014},{"id":"https://openalex.org/keywords/telecommunications","display_name":"Telecommunications","score":0.05619579553604126}],"concepts":[{"id":"https://openalex.org/C162117346","wikidata":"https://www.wikidata.org/wiki/Q1106386","display_name":"Nanolithography","level":4,"score":0.8360259532928467},{"id":"https://openalex.org/C159395582","wikidata":"https://www.wikidata.org/wiki/Q6046394","display_name":"Interference lithography","level":4,"score":0.7983503341674805},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7859543561935425},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7604377269744873},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6987184882164001},{"id":"https://openalex.org/C43766710","wikidata":"https://www.wikidata.org/wiki/Q17043033","display_name":"Nanosphere lithography","level":4,"score":0.566899836063385},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5507439970970154},{"id":"https://openalex.org/C41794268","wikidata":"https://www.wikidata.org/wiki/Q1408939","display_name":"X-ray lithography","level":4,"score":0.544605553150177},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.5416342616081238},{"id":"https://openalex.org/C163581340","wikidata":"https://www.wikidata.org/wiki/Q1983848","display_name":"Next-generation lithography","level":5,"score":0.5346663594245911},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.4939449429512024},{"id":"https://openalex.org/C32022120","wikidata":"https://www.wikidata.org/wiki/Q797225","display_name":"Interference (communication)","level":3,"score":0.46586373448371887},{"id":"https://openalex.org/C137905882","wikidata":"https://www.wikidata.org/wiki/Q6783445","display_name":"Maskless lithography","level":5,"score":0.45430004596710205},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.43856093287467957},{"id":"https://openalex.org/C161866238","wikidata":"https://www.wikidata.org/wiki/Q258563","display_name":"Focused ion beam","level":3,"score":0.42947494983673096},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.41297513246536255},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.35972124338150024},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.08202177286148071},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.06251323223114014},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.05619579553604126},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C127162648","wikidata":"https://www.wikidata.org/wiki/Q16858953","display_name":"Channel (broadcasting)","level":2,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.0}],"mesh":[],"locations_count":5,"locations":[{"id":"doi:10.3390/s19092182","is_oa":true,"landing_page_url":"https://doi.org/10.3390/s19092182","pdf_url":"https://www.mdpi.com/1424-8220/19/9/2182/pdf?version=1557550348","source":{"id":"https://openalex.org/S101949793","display_name":"Sensors","issn_l":"1424-8220","issn":["1424-8220"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Sensors","raw_type":"journal-article"},{"id":"pmid:31083502","is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/31083502","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Sensors (Basel, Switzerland)","raw_type":null},{"id":"pmh:oai:doaj.org/article:b4e736867e5b41d28ec2cc82412c702c","is_oa":true,"landing_page_url":"https://doaj.org/article/b4e736867e5b41d28ec2cc82412c702c","pdf_url":null,"source":{"id":"https://openalex.org/S4306401280","display_name":"DOAJ (DOAJ: Directory of Open Access Journals)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-sa","license_id":"https://openalex.org/licenses/cc-by-sa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Sensors, Vol 19, Iss 9, p 2182 (2019)","raw_type":"article"},{"id":"pmh:oai:mdpi.com:/1424-8220/19/9/2182/","is_oa":true,"landing_page_url":"http://dx.doi.org/10.3390/s19092182","pdf_url":null,"source":{"id":"https://openalex.org/S4306400947","display_name":"MDPI (MDPI AG)","issn_l":null,"issn":null,"is_oa":true,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I4210097602","host_organization_name":"Multidisciplinary Digital Publishing Institute (Switzerland)","host_organization_lineage":["https://openalex.org/I4210097602"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Sensors","raw_type":"Text"},{"id":"pmh:oai:pubmedcentral.nih.gov:6539013","is_oa":true,"landing_page_url":"https://www.ncbi.nlm.nih.gov/pmc/articles/6539013","pdf_url":null,"source":{"id":"https://openalex.org/S2764455111","display_name":"PubMed Central","issn_l":null,"issn":null,"is_oa":true,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Sensors (Basel)","raw_type":"Text"}],"best_oa_location":{"id":"doi:10.3390/s19092182","is_oa":true,"landing_page_url":"https://doi.org/10.3390/s19092182","pdf_url":"https://www.mdpi.com/1424-8220/19/9/2182/pdf?version=1557550348","source":{"id":"https://openalex.org/S101949793","display_name":"Sensors","issn_l":"1424-8220","issn":["1424-8220"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Sensors","raw_type":"journal-article"},"sustainable_development_goals":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320322025","display_name":"Conselho Nacional de Desenvolvimento Cient\u00edfico e Tecnol\u00f3gico","ror":"https://ror.org/03swz6y49"}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2943898044.pdf","grobid_xml":"https://content.openalex.org/works/W2943898044.grobid-xml"},"referenced_works_count":50,"referenced_works":["https://openalex.org/W1649808901","https://openalex.org/W1965119177","https://openalex.org/W1966156486","https://openalex.org/W1966966354","https://openalex.org/W1975987963","https://openalex.org/W1982651894","https://openalex.org/W1992474821","https://openalex.org/W1994253222","https://openalex.org/W2007434516","https://openalex.org/W2010598840","https://openalex.org/W2015481019","https://openalex.org/W2018833191","https://openalex.org/W2023539124","https://openalex.org/W2024520881","https://openalex.org/W2028330487","https://openalex.org/W2029171051","https://openalex.org/W2037224508","https://openalex.org/W2041231996","https://openalex.org/W2046865211","https://openalex.org/W2051156144","https://openalex.org/W2057982942","https://openalex.org/W2061158555","https://openalex.org/W2067946592","https://openalex.org/W2077234380","https://openalex.org/W2082933740","https://openalex.org/W2083926174","https://openalex.org/W2084906185","https://openalex.org/W2090172026","https://openalex.org/W2097525808","https://openalex.org/W2105343351","https://openalex.org/W2122352983","https://openalex.org/W2128207454","https://openalex.org/W2130960310","https://openalex.org/W2134677016","https://openalex.org/W2141734849","https://openalex.org/W2143287675","https://openalex.org/W2150352540","https://openalex.org/W2153862927","https://openalex.org/W2157641299","https://openalex.org/W2167352113","https://openalex.org/W2297983798","https://openalex.org/W2315380340","https://openalex.org/W2552526939","https://openalex.org/W2601376110","https://openalex.org/W2741229303","https://openalex.org/W2769754743","https://openalex.org/W3098355304","https://openalex.org/W4247419735","https://openalex.org/W4297747973","https://openalex.org/W6679059744"],"related_works":["https://openalex.org/W2503993276","https://openalex.org/W2007880660","https://openalex.org/W2058948105","https://openalex.org/W2908256007","https://openalex.org/W2136659490","https://openalex.org/W1980945182","https://openalex.org/W2092471058","https://openalex.org/W2113684589","https://openalex.org/W4238142582","https://openalex.org/W2953836775"],"abstract_inverted_index":{"Several":[0],"fabrication":[1,32],"techniques":[2],"are":[3,72],"recently":[4],"used":[5],"to":[6,61,76,139],"produce":[7],"a":[8],"nanopattern":[9],"for":[10,30,81,95],"sensing,":[11],"as":[12,41],"focused":[13],"ion":[14],"beam":[15],"milling":[16],"(FIB),":[17],"e-beam":[18],"lithography":[19,27,132],"(EBL),":[20],"nanoimprinting,":[21],"and":[22,45,69,98,128,142],"soft":[23],"lithography.":[24],"Here,":[25],"interference":[26,131],"is":[28,133],"explored":[29],"the":[31,55,63,78,82,90,105,118,136],"of":[33,54,89,109,135],"large":[34],"area":[35],"nanohole":[36,91],"arrays":[37],"in":[38,52,74,104,117],"metal":[39],"films":[40],"an":[42,114],"efficient,":[43],"flexible,":[44],"scalable":[46],"production":[47],"method.":[48],"The":[49,87,107],"transmission":[50],"spectra":[51],"air":[53],"1":[56],"cm2":[57],"substrate":[58,64],"were":[59],"evaluated":[60],"study":[62],"behavior":[65],"when":[66],"hole-size,":[67],"periodicity,":[68],"film":[70],"thickness":[71],"varied,":[73],"order":[75],"elucidate":[77],"best":[79,137],"sample":[80],"most":[83],"effective":[84],"sensing":[85,97],"performance.":[86],"efficiency":[88],"array":[92,115],"was":[93],"tested":[94],"bulk":[96],"compared":[99],"with":[100,113],"other":[101,140],"platforms":[102],"found":[103],"literature.":[106],"sensitivity":[108],"~1000":[110],"nm/RIU,":[111],"achieved":[112],"periodicity":[116],"visible":[119],"range,":[120],"exceeds":[121],"near":[122],"infrared":[123],"(NIR)":[124],"performances":[125],"previously":[126],"reported,":[127],"demonstrates":[129],"that":[130],"one":[134],"alternative":[138],"expensive":[141],"time-consuming":[143],"nanofabrication":[144],"methods.":[145]},"counts_by_year":[{"year":2025,"cited_by_count":3},{"year":2024,"cited_by_count":4},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":5},{"year":2021,"cited_by_count":7},{"year":2020,"cited_by_count":4},{"year":2019,"cited_by_count":3},{"year":2018,"cited_by_count":1}],"updated_date":"2026-05-21T06:26:12.895304","created_date":"2025-10-10T00:00:00"}