{"id":"https://openalex.org/W4385210340","doi":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185379","title":"Contact Cavity Shaping and Selective SiGe:B Low-Temperature Epitaxy Process Solution for sub 10<sup>-9</sup> \u03a9.cm<sup>2</sup> Contact Resistivity in Nonplanar FETs","display_name":"Contact Cavity Shaping and Selective SiGe:B Low-Temperature Epitaxy Process Solution for sub 10<sup>-9</sup> \u03a9.cm<sup>2</sup> Contact Resistivity in Nonplanar FETs","publication_year":2023,"publication_date":"2023-06-11","ids":{"openalex":"https://openalex.org/W4385210340","doi":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185379"},"language":"en","primary_location":{"id":"doi:10.23919/vlsitechnologyandcir57934.2023.10185379","is_oa":false,"landing_page_url":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185379","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5028306051","display_name":"N. Breil","orcid":"https://orcid.org/0000-0002-3664-5113"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"N. Breil","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108474122","display_name":"BC Lee","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"B-C. Lee","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5076705758","display_name":"J. Avila Avendano","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. Avila Avendano","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5037450921","display_name":"J. L. Jewell","orcid":"https://orcid.org/0000-0001-8991-2599"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. Jewell","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5037605991","display_name":"M. Vellaikal","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. Vellaikal","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5078599870","display_name":"E.H. Newman","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"E. Newman","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046732300","display_name":"El Mehdi Bazizi","orcid":"https://orcid.org/0000-0002-2053-6270"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"E. M. Bazizi","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102010262","display_name":"Ashish Pal","orcid":"https://orcid.org/0000-0002-7753-2051"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. Pal","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100349601","display_name":"Lei Liu","orcid":"https://orcid.org/0000-0002-9714-2130"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"L. Liu","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113785955","display_name":"Oleg Gluschenkov","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"O. Gluschenkov","raw_affiliation_strings":["IBM Semiconductor Technology Research, 257 Fuller Road,Albany,NY","IBM Semiconductor Technology Research, 257 Fuller Road, Albany, NY"],"affiliations":[{"raw_affiliation_string":"IBM Semiconductor Technology Research, 257 Fuller Road,Albany,NY","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"IBM Semiconductor Technology Research, 257 Fuller Road, Albany, NY","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019704296","display_name":"Andrew Greene","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. Greene","raw_affiliation_strings":["IBM Semiconductor Technology Research, 257 Fuller Road,Albany,NY","IBM Semiconductor Technology Research, 257 Fuller Road, Albany, NY"],"affiliations":[{"raw_affiliation_string":"IBM Semiconductor Technology Research, 257 Fuller Road,Albany,NY","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"IBM Semiconductor Technology Research, 257 Fuller Road, Albany, NY","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004143066","display_name":"Shinichi Mochizuki","orcid":"https://orcid.org/0000-0001-9832-5070"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Mochizuki","raw_affiliation_strings":["IBM Semiconductor Technology Research, 257 Fuller Road,Albany,NY","IBM Semiconductor Technology Research, 257 Fuller Road, Albany, NY"],"affiliations":[{"raw_affiliation_string":"IBM Semiconductor Technology Research, 257 Fuller Road,Albany,NY","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"IBM Semiconductor Technology Research, 257 Fuller Road, Albany, NY","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112754550","display_name":"N. Loubet","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"N. Loubet","raw_affiliation_strings":["IBM Semiconductor Technology Research, 257 Fuller Road,Albany,NY","IBM Semiconductor Technology Research, 257 Fuller Road, Albany, NY"],"affiliations":[{"raw_affiliation_string":"IBM Semiconductor Technology Research, 257 Fuller Road,Albany,NY","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"IBM Semiconductor Technology Research, 257 Fuller Road, Albany, NY","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089883415","display_name":"B. Colombeau","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"B. Colombeau","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110987984","display_name":"Bala Haran","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"B. Haran","raw_affiliation_strings":["Applied Materials,Sunnyvale,CA,USA,94041"],"affiliations":[{"raw_affiliation_string":"Applied Materials,Sunnyvale,CA,USA,94041","institution_ids":["https://openalex.org/I193427800"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":15,"corresponding_author_ids":["https://openalex.org/A5028306051"],"corresponding_institution_ids":["https://openalex.org/I193427800"],"apc_list":null,"apc_paid":null,"fwci":0.6694,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.68414583,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":98},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"2"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/contact-resistance","display_name":"Contact resistance","score":0.670609712600708},{"id":"https://openalex.org/keywords/epitaxy","display_name":"Epitaxy","score":0.5946462154388428},{"id":"https://openalex.org/keywords/doping","display_name":"Doping","score":0.5377040505409241},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.4941456615924835},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.4765906035900116},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.44613224267959595},{"id":"https://openalex.org/keywords/omega","display_name":"Omega","score":0.43773218989372253},{"id":"https://openalex.org/keywords/pmos-logic","display_name":"PMOS logic","score":0.42575377225875854},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.420486181974411},{"id":"https://openalex.org/keywords/contact-process","display_name":"Contact process (mathematics)","score":0.41684046387672424},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.41601794958114624},{"id":"https://openalex.org/keywords/analytical-chemistry","display_name":"Analytical Chemistry (journal)","score":0.36516550183296204},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.3434707820415497},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3214421272277832},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.30441272258758545},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.17613691091537476},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.08839735388755798}],"concepts":[{"id":"https://openalex.org/C123671423","wikidata":"https://www.wikidata.org/wiki/Q332329","display_name":"Contact resistance","level":3,"score":0.670609712600708},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.5946462154388428},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.5377040505409241},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.4941456615924835},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4765906035900116},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.44613224267959595},{"id":"https://openalex.org/C2779557605","wikidata":"https://www.wikidata.org/wiki/Q9890","display_name":"Omega","level":2,"score":0.43773218989372253},{"id":"https://openalex.org/C27050352","wikidata":"https://www.wikidata.org/wiki/Q173605","display_name":"PMOS logic","level":4,"score":0.42575377225875854},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.420486181974411},{"id":"https://openalex.org/C134247516","wikidata":"https://www.wikidata.org/wiki/Q5164846","display_name":"Contact process (mathematics)","level":2,"score":0.41684046387672424},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.41601794958114624},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.36516550183296204},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.3434707820415497},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3214421272277832},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.30441272258758545},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.17613691091537476},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.08839735388755798},{"id":"https://openalex.org/C121864883","wikidata":"https://www.wikidata.org/wiki/Q677916","display_name":"Statistical physics","level":1,"score":0.0},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.23919/vlsitechnologyandcir57934.2023.10185379","is_oa":false,"landing_page_url":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185379","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":2,"referenced_works":["https://openalex.org/W2529644784","https://openalex.org/W2949595525"],"related_works":["https://openalex.org/W2095795001","https://openalex.org/W1920840823","https://openalex.org/W2044884047","https://openalex.org/W2538286039","https://openalex.org/W2040570931","https://openalex.org/W1508850821","https://openalex.org/W2140269070","https://openalex.org/W2240148330","https://openalex.org/W2082260328","https://openalex.org/W2046269172"],"abstract_inverted_index":{"In":[0],"order":[1],"to":[2],"tackle":[3],"the":[4,46],"CMOS":[5],"contact":[6,12,47,58],"resistance":[7,59],"bottleneck,":[8],"we":[9,52],"developed":[10],"a":[11,18,25,54,82],"cavity":[13],"shaping":[14],"process":[15,31],"that":[16],"leverages":[17],"Reactive":[19],"Ion":[20],"Etching":[21],"(RIE)":[22],"technology,":[23],"and":[24],"selective":[26],"highly":[27],"doped":[28],"SiGe:B":[29],"epitaxial":[30],"allowing":[32],"an":[33],"active":[34],"boron":[35],"doping":[36],"level":[37],"of":[38,60,63,72,90],"2E21":[39],"at.cm-3.":[40],"By":[41],"co-optimizing":[42],"these":[43],"processes":[44],"in":[45],"module":[48],"on":[49],"300mm":[50],"wafers,":[51],"demonstrate":[53],"record":[55],"low":[56],"transistor":[57],"11":[61],"$\\Omega.\\mu$m":[62],"W":[64],"<inf":[65,85],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[66,76,86],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">eff</inf>":[67,87],"with":[68],"corresponding":[69],"effective":[70],"$\\rho_{\\mathrm{c}}$":[71],"5.2$\\times":[73],"10^{-10}\\Omega$.cm":[74],"<sup":[75],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">2</sup>":[77],",":[78],"which":[79],"translates":[80],"into":[81],"device":[83],"I":[84],"performance":[88],"gain":[89],"44/19%":[91],"(median/leading":[92],"edge).":[93]},"counts_by_year":[{"year":2025,"cited_by_count":4},{"year":2024,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}