{"id":"https://openalex.org/W4385192550","doi":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185341","title":"16-layer 3D Vertical RRAM with Low Read Latency (18ns), High Nonlinearity (&gt;5000) and Ultra-low Leakage Current (~pA) Self-Selective Cells","display_name":"16-layer 3D Vertical RRAM with Low Read Latency (18ns), High Nonlinearity (&gt;5000) and Ultra-low Leakage Current (~pA) Self-Selective Cells","publication_year":2023,"publication_date":"2023-06-11","ids":{"openalex":"https://openalex.org/W4385192550","doi":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185341"},"language":"en","primary_location":{"id":"doi:10.23919/vlsitechnologyandcir57934.2023.10185341","is_oa":false,"landing_page_url":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185341","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5034856831","display_name":"Yaxin Ding","orcid":"https://orcid.org/0000-0002-2790-7302"},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210165038","display_name":"University of Chinese Academy of Sciences","ror":"https://ror.org/05qbk4x57","country_code":"CN","type":"education","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210165038"]}],"countries":["CN","SG"],"is_corresponding":true,"raw_author_name":"Yaxin Ding","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","University of the Chinese Academy of Sciences, Beijing, China","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"University of the Chinese Academy of Sciences, Beijing, China","institution_ids":["https://openalex.org/I4210165038"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5045358041","display_name":"Jianguo Yang","orcid":"https://orcid.org/0000-0002-3387-1238"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Jianguo Yang","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100774253","display_name":"Yu Liu","orcid":"https://orcid.org/0000-0002-6302-2405"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Yu Liu","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018459086","display_name":"Jianfeng Gao","orcid":"https://orcid.org/0000-0002-0553-025X"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Jianfeng Gao","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002438548","display_name":"Yuan Wang","orcid":"https://orcid.org/0000-0002-4951-4286"},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Yuan Wang","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5031793360","display_name":"Pengfei Jiang","orcid":"https://orcid.org/0000-0002-7543-8651"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Pengfei Jiang","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5107919387","display_name":"Shuxian Lv","orcid":null},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Shuxian Lv","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100436566","display_name":"Yuting Chen","orcid":"https://orcid.org/0000-0003-3852-8532"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Yuting Chen","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026031185","display_name":"Boping Wang","orcid":"https://orcid.org/0000-0003-1300-6842"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Boping Wang","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5032076594","display_name":"Wei Wei","orcid":"https://orcid.org/0009-0002-9368-3463"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Wei Wei","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008012491","display_name":"Tiancheng Gong","orcid":"https://orcid.org/0000-0001-7259-3237"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Tiancheng Gong","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5057429129","display_name":"Kan\u2010Hao Xue","orcid":"https://orcid.org/0000-0002-2894-7912"},"institutions":[{"id":"https://openalex.org/I47720641","display_name":"Huazhong University of Science and Technology","ror":"https://ror.org/00p991c53","country_code":"CN","type":"education","lineage":["https://openalex.org/I47720641"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Kan-Hao Xue","raw_affiliation_strings":["Huazhong University of Science and Technology,School of Integrated Circuits,Wuhan,China,430074"],"affiliations":[{"raw_affiliation_string":"Huazhong University of Science and Technology,School of Integrated Circuits,Wuhan,China,430074","institution_ids":["https://openalex.org/I47720641"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100347778","display_name":"Qing Luo","orcid":"https://orcid.org/0000-0002-3419-4400"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Qing Luo","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100607861","display_name":"Xiangshui Miao","orcid":"https://orcid.org/0000-0002-5621-5495"},"institutions":[{"id":"https://openalex.org/I47720641","display_name":"Huazhong University of Science and Technology","ror":"https://ror.org/00p991c53","country_code":"CN","type":"education","lineage":["https://openalex.org/I47720641"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xiangshui Miao","raw_affiliation_strings":["Huazhong University of Science and Technology,School of Integrated Circuits,Wuhan,China,430074"],"affiliations":[{"raw_affiliation_string":"Huazhong University of Science and Technology,School of Integrated Circuits,Wuhan,China,430074","institution_ids":["https://openalex.org/I47720641"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110532530","display_name":"Ming Liu","orcid":null},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Ming Liu","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences,State Key Lab of Fabrication Technologies for Integrated Circuits","institution_ids":["https://openalex.org/I4210090209","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":15,"corresponding_author_ids":["https://openalex.org/A5034856831"],"corresponding_institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210090209","https://openalex.org/I4210119392","https://openalex.org/I4210165038"],"apc_list":null,"apc_paid":null,"fwci":1.865,"has_fulltext":false,"cited_by_count":14,"citation_normalized_percentile":{"value":0.85692018,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":94,"max":100},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"2"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10338","display_name":"Advanced Sensor and Energy Harvesting Materials","score":0.9986000061035156,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/leakage","display_name":"Leakage (economics)","score":0.5538679957389832},{"id":"https://openalex.org/keywords/nonlinear-system","display_name":"Nonlinear system","score":0.5281733870506287},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.46658164262771606},{"id":"https://openalex.org/keywords/resistive-random-access-memory","display_name":"Resistive random-access memory","score":0.44597768783569336},{"id":"https://openalex.org/keywords/oxide","display_name":"Oxide","score":0.4396841526031494},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.42107123136520386},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.39088109135627747},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3636826276779175},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.331805944442749},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.2528795897960663},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.15285399556159973}],"concepts":[{"id":"https://openalex.org/C2777042071","wikidata":"https://www.wikidata.org/wiki/Q6509304","display_name":"Leakage (economics)","level":2,"score":0.5538679957389832},{"id":"https://openalex.org/C158622935","wikidata":"https://www.wikidata.org/wiki/Q660848","display_name":"Nonlinear system","level":2,"score":0.5281733870506287},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.46658164262771606},{"id":"https://openalex.org/C182019814","wikidata":"https://www.wikidata.org/wiki/Q1143830","display_name":"Resistive random-access memory","level":3,"score":0.44597768783569336},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.4396841526031494},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.42107123136520386},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.39088109135627747},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3636826276779175},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.331805944442749},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2528795897960663},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.15285399556159973},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.0},{"id":"https://openalex.org/C139719470","wikidata":"https://www.wikidata.org/wiki/Q39680","display_name":"Macroeconomics","level":1,"score":0.0},{"id":"https://openalex.org/C162324750","wikidata":"https://www.wikidata.org/wiki/Q8134","display_name":"Economics","level":0,"score":0.0},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.23919/vlsitechnologyandcir57934.2023.10185341","is_oa":false,"landing_page_url":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185341","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":1,"referenced_works":["https://openalex.org/W4252026737"],"related_works":["https://openalex.org/W2054635671","https://openalex.org/W2545245183","https://openalex.org/W2017425642","https://openalex.org/W2350916061","https://openalex.org/W2952918855","https://openalex.org/W1970117475","https://openalex.org/W4396815615","https://openalex.org/W3161624601","https://openalex.org/W2078381924","https://openalex.org/W3088198719"],"abstract_inverted_index":{"On-current":[0],"and":[1,13,100],"nonlinearity":[2,58,63],"of":[3,59,64],"selector-less":[4],"RRAM":[5],"are":[6,109],"essential":[7],"for":[8,79],"improving":[9],"the":[10,46,80],"sensing":[11],"speed":[12],"suppressing":[14],"sneak":[15],"path":[16],"leakage":[17],"respectively":[18],"in":[19,31],"3D":[20,87],"vertical":[21,88],"crossbar":[22],"structure.":[23],"In":[24],"this":[25,65],"work,":[26],"by":[27],"using":[28],"an":[29],"oxide":[30],"which":[32],"oxygen":[33],"vacancies":[34],"do":[35],"not":[36],"readily":[37],"accumulate":[38],"(NbO":[39],"<inf":[40],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[41,106],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">x</inf>":[42],")":[43,108],"to":[44],"prepare":[45],"memory":[47],"layer,":[48],"50x":[49],"on-state":[50],"current":[51],"density":[52],"improvement":[53],"is":[54,67],"achieved":[55],"with":[56],"high":[57,101],"5000.":[60],"The":[61],"maximum":[62],"device":[66],"even":[68],"higher":[69],"$(8":[70],"\\times":[71],"10":[72,104],"^{4}$":[73],"read":[74],"@":[75],"1.04":[76],"V).":[77],"Furthermore,":[78],"first":[81],"time,":[82],"we":[83],"present":[84],"a":[85],"16-layer":[86],"RRAM.":[89],"Other":[90],"outstanding":[91],"performances":[92],"such":[93],"as":[94],"low":[95],"off-current":[96],"(~":[97],"pA),":[98],"self-compliance":[99],"endurance":[102],"(>":[103],"<sup":[105],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">8</sup>":[107],"also":[110],"demonstrated.":[111]},"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2025,"cited_by_count":5},{"year":2024,"cited_by_count":5},{"year":2023,"cited_by_count":2}],"updated_date":"2026-03-09T08:58:05.943551","created_date":"2025-10-10T00:00:00"}