{"id":"https://openalex.org/W4385192572","doi":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185324","title":"Novel Bridge Transmission Line Method for Thin-Film Semiconductors: Modelling, Simulation Verification, and Experimental Demonstration","display_name":"Novel Bridge Transmission Line Method for Thin-Film Semiconductors: Modelling, Simulation Verification, and Experimental Demonstration","publication_year":2023,"publication_date":"2023-06-11","ids":{"openalex":"https://openalex.org/W4385192572","doi":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185324"},"language":"en","primary_location":{"id":"doi:10.23919/vlsitechnologyandcir57934.2023.10185324","is_oa":false,"landing_page_url":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185324","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5025729156","display_name":"Kaizhen Han","orcid":"https://orcid.org/0000-0002-2376-0921"},"institutions":[{"id":"https://openalex.org/I165932596","display_name":"National University of Singapore","ror":"https://ror.org/01tgyzw49","country_code":"SG","type":"education","lineage":["https://openalex.org/I165932596"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Kaizhen Han","raw_affiliation_strings":["National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576","institution_ids":["https://openalex.org/I165932596"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5063188500","display_name":"Yuye Kang","orcid":"https://orcid.org/0000-0002-9242-565X"},"institutions":[{"id":"https://openalex.org/I165932596","display_name":"National University of Singapore","ror":"https://ror.org/01tgyzw49","country_code":"SG","type":"education","lineage":["https://openalex.org/I165932596"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Yuye Kang","raw_affiliation_strings":["National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576","institution_ids":["https://openalex.org/I165932596"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100454809","display_name":"Yue Chen","orcid":"https://orcid.org/0000-0002-0463-4209"},"institutions":[{"id":"https://openalex.org/I165932596","display_name":"National University of Singapore","ror":"https://ror.org/01tgyzw49","country_code":"SG","type":"education","lineage":["https://openalex.org/I165932596"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Yue Chen","raw_affiliation_strings":["National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576","institution_ids":["https://openalex.org/I165932596"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5014399843","display_name":"Xiao Gong","orcid":"https://orcid.org/0000-0002-9243-1937"},"institutions":[{"id":"https://openalex.org/I165932596","display_name":"National University of Singapore","ror":"https://ror.org/01tgyzw49","country_code":"SG","type":"education","lineage":["https://openalex.org/I165932596"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Xiao Gong","raw_affiliation_strings":["National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576","institution_ids":["https://openalex.org/I165932596"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I165932596"],"apc_list":null,"apc_paid":null,"fwci":3.2452,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.92705139,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":90,"max":97},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"2"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9991999864578247,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/semiconductor","display_name":"Semiconductor","score":0.607515811920166},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5816753506660461},{"id":"https://openalex.org/keywords/indium-tin-oxide","display_name":"Indium tin oxide","score":0.5755645036697388},{"id":"https://openalex.org/keywords/contact-resistance","display_name":"Contact resistance","score":0.5558609366416931},{"id":"https://openalex.org/keywords/transmission-line","display_name":"Transmission line","score":0.527661919593811},{"id":"https://openalex.org/keywords/indium","display_name":"Indium","score":0.4818659722805023},{"id":"https://openalex.org/keywords/extraction","display_name":"Extraction (chemistry)","score":0.47602206468582153},{"id":"https://openalex.org/keywords/omega","display_name":"Omega","score":0.45270320773124695},{"id":"https://openalex.org/keywords/electrical-resistivity-and-conductivity","display_name":"Electrical resistivity and conductivity","score":0.4392772614955902},{"id":"https://openalex.org/keywords/line","display_name":"Line (geometry)","score":0.4381425380706787},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.4313376247882843},{"id":"https://openalex.org/keywords/bridge","display_name":"Bridge (graph theory)","score":0.43126580119132996},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.41052180528640747},{"id":"https://openalex.org/keywords/thin-film","display_name":"Thin film","score":0.34223616123199463},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.32987770438194275},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.32092252373695374},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.25335824489593506},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.16760218143463135},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.15036320686340332},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.1332128942012787},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.0830467939376831},{"id":"https://openalex.org/keywords/chromatography","display_name":"Chromatography","score":0.06631296873092651}],"concepts":[{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.607515811920166},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5816753506660461},{"id":"https://openalex.org/C32737372","wikidata":"https://www.wikidata.org/wiki/Q417718","display_name":"Indium tin oxide","level":3,"score":0.5755645036697388},{"id":"https://openalex.org/C123671423","wikidata":"https://www.wikidata.org/wiki/Q332329","display_name":"Contact resistance","level":3,"score":0.5558609366416931},{"id":"https://openalex.org/C33441834","wikidata":"https://www.wikidata.org/wiki/Q693004","display_name":"Transmission line","level":2,"score":0.527661919593811},{"id":"https://openalex.org/C543292547","wikidata":"https://www.wikidata.org/wiki/Q1094","display_name":"Indium","level":2,"score":0.4818659722805023},{"id":"https://openalex.org/C4725764","wikidata":"https://www.wikidata.org/wiki/Q844704","display_name":"Extraction (chemistry)","level":2,"score":0.47602206468582153},{"id":"https://openalex.org/C2779557605","wikidata":"https://www.wikidata.org/wiki/Q9890","display_name":"Omega","level":2,"score":0.45270320773124695},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.4392772614955902},{"id":"https://openalex.org/C198352243","wikidata":"https://www.wikidata.org/wiki/Q37105","display_name":"Line (geometry)","level":2,"score":0.4381425380706787},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4313376247882843},{"id":"https://openalex.org/C100776233","wikidata":"https://www.wikidata.org/wiki/Q2532492","display_name":"Bridge (graph theory)","level":2,"score":0.43126580119132996},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.41052180528640747},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.34223616123199463},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.32987770438194275},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.32092252373695374},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.25335824489593506},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.16760218143463135},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.15036320686340332},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1332128942012787},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0830467939376831},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.06631296873092651},{"id":"https://openalex.org/C126322002","wikidata":"https://www.wikidata.org/wiki/Q11180","display_name":"Internal medicine","level":1,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.23919/vlsitechnologyandcir57934.2023.10185324","is_oa":false,"landing_page_url":"https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185324","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320311649","display_name":"Ministry of Education","ror":"https://ror.org/036nq5137"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":2,"referenced_works":["https://openalex.org/W4232869865","https://openalex.org/W4252026737"],"related_works":["https://openalex.org/W3094277601","https://openalex.org/W2004394190","https://openalex.org/W2914061517","https://openalex.org/W2019520454","https://openalex.org/W2030087524","https://openalex.org/W2925026664","https://openalex.org/W4230084025","https://openalex.org/W1976476545","https://openalex.org/W2797020525","https://openalex.org/W3172648902"],"abstract_inverted_index":{"A":[0],"novel":[1],"bridge":[2],"transmission":[3],"line":[4],"method":[5],"(BTLM)":[6],"for":[7],"thin-film":[8],"semiconductors":[9,86],"is":[10],"proposed":[11,65],"with":[12],"validation":[13],"from":[14],"experiment.":[15],"Our":[16],"BLTM":[17],"enjoys":[18],"the":[19,52],"advantages":[20],"of":[21,55,74],"parasitic":[22],"resistance":[23],"elimination,":[24],"simple":[25],"fabrication,":[26],"highly":[27],"accurate":[28],"specific":[29],"contact":[30],"resistivity":[31],"$\\rho_{C}$)":[32],"extraction,":[33],"and":[34,51],"most":[35],"importantly,":[36],"strong":[37],"variation":[38,53],"immunity,":[39],"which":[40],"has":[41],"rarely":[42],"been":[43],"considered":[44],"in":[45],"previous":[46],"TLMs.":[47],"The":[48],"extraction":[49],"accuracy":[50],"immunity":[54],"BTLM":[56,66],"were":[57],"carefully":[58],"verified":[59],"by":[60],"simulations.":[61],"By":[62],"applying":[63],"our":[64],"to":[67],"nickel/indium-tin-oxide":[68],"(Ni/TT)":[69],"contact,":[70],"a":[71],"record-low":[72],"$\\rho_{C}$":[73],"$4.4":[75],"\\times":[76],"10^{-8}":[77],"\\Omega":[78],"\\cdot":[79],"\\mathrm{cm}^{2}$":[80],"was":[81],"obtained":[82],"among":[83],"all":[84],"oxide":[85],"(OSs)":[87],"without":[88],"gate":[89],"bias.":[90]},"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":1}],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}