{"id":"https://openalex.org/W2612414884","doi":"https://doi.org/10.23919/date.2017.7927227","title":"On refining standard cell placement for self-aligned double patterning","display_name":"On refining standard cell placement for self-aligned double patterning","publication_year":2017,"publication_date":"2017-03-01","ids":{"openalex":"https://openalex.org/W2612414884","doi":"https://doi.org/10.23919/date.2017.7927227","mag":"2612414884"},"language":"en","primary_location":{"id":"doi:10.23919/date.2017.7927227","is_oa":false,"landing_page_url":"https://doi.org/10.23919/date.2017.7927227","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Design, Automation & Test in Europe Conference & Exhibition (DATE), 2017","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5047609237","display_name":"Ye\u2010Hong Chen","orcid":"https://orcid.org/0000-0002-7308-2823"},"institutions":[{"id":"https://openalex.org/I25846049","display_name":"National Tsing Hua University","ror":"https://ror.org/00zdnkx70","country_code":"TW","type":"education","lineage":["https://openalex.org/I25846049"]}],"countries":["TW"],"is_corresponding":true,"raw_author_name":"Ye-Hong Chen","raw_affiliation_strings":["Department of Computer Science, National Tsing Hua University, Hsinchu City, Taiwan"],"affiliations":[{"raw_affiliation_string":"Department of Computer Science, National Tsing Hua University, Hsinchu City, Taiwan","institution_ids":["https://openalex.org/I25846049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5068121697","display_name":"Sheng-He Wang","orcid":"https://orcid.org/0000-0002-9307-6607"},"institutions":[{"id":"https://openalex.org/I25846049","display_name":"National Tsing Hua University","ror":"https://ror.org/00zdnkx70","country_code":"TW","type":"education","lineage":["https://openalex.org/I25846049"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Sheng-He Wang","raw_affiliation_strings":["Department of Computer Science, National Tsing Hua University, Hsinchu City, Taiwan"],"affiliations":[{"raw_affiliation_string":"Department of Computer Science, National Tsing Hua University, Hsinchu City, Taiwan","institution_ids":["https://openalex.org/I25846049"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5073705099","display_name":"Ting-Chi Wang","orcid":"https://orcid.org/0000-0002-3435-0418"},"institutions":[{"id":"https://openalex.org/I25846049","display_name":"National Tsing Hua University","ror":"https://ror.org/00zdnkx70","country_code":"TW","type":"education","lineage":["https://openalex.org/I25846049"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Ting-Chi Wang","raw_affiliation_strings":["Department of Computer Science, National Tsing Hua University, Hsinchu City, Taiwan"],"affiliations":[{"raw_affiliation_string":"Department of Computer Science, National Tsing Hua University, Hsinchu City, Taiwan","institution_ids":["https://openalex.org/I25846049"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5047609237"],"corresponding_institution_ids":["https://openalex.org/I25846049"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.04041647,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1492","last_page":"1497"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9973000288009644,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9973000288009644,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","score":0.9943000078201294,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9922999739646912,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/overlay","display_name":"Overlay","score":0.8302692770957947},{"id":"https://openalex.org/keywords/multiple-patterning","display_name":"Multiple patterning","score":0.7513837218284607},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6933711767196655},{"id":"https://openalex.org/keywords/placement","display_name":"Placement","score":0.6119894981384277},{"id":"https://openalex.org/keywords/refining","display_name":"Refining (metallurgy)","score":0.5786397457122803},{"id":"https://openalex.org/keywords/decomposition","display_name":"Decomposition","score":0.5212022066116333},{"id":"https://openalex.org/keywords/standard-cell","display_name":"Standard cell","score":0.4941263496875763},{"id":"https://openalex.org/keywords/parallel-computing","display_name":"Parallel computing","score":0.4799768924713135},{"id":"https://openalex.org/keywords/space","display_name":"Space (punctuation)","score":0.4561036229133606},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.41266584396362305},{"id":"https://openalex.org/keywords/mathematical-optimization","display_name":"Mathematical optimization","score":0.34066063165664673},{"id":"https://openalex.org/keywords/physical-design","display_name":"Physical design","score":0.22664687037467957},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.15739291906356812},{"id":"https://openalex.org/keywords/embedded-system","display_name":"Embedded system","score":0.15364930033683777},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.11770260334014893},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.09459766745567322},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.09249812364578247},{"id":"https://openalex.org/keywords/circuit-design","display_name":"Circuit design","score":0.0796065628528595},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.07352098822593689}],"concepts":[{"id":"https://openalex.org/C136085584","wikidata":"https://www.wikidata.org/wiki/Q910289","display_name":"Overlay","level":2,"score":0.8302692770957947},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.7513837218284607},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6933711767196655},{"id":"https://openalex.org/C117690923","wikidata":"https://www.wikidata.org/wiki/Q1484784","display_name":"Placement","level":4,"score":0.6119894981384277},{"id":"https://openalex.org/C60044698","wikidata":"https://www.wikidata.org/wiki/Q1283324","display_name":"Refining (metallurgy)","level":2,"score":0.5786397457122803},{"id":"https://openalex.org/C124681953","wikidata":"https://www.wikidata.org/wiki/Q339062","display_name":"Decomposition","level":2,"score":0.5212022066116333},{"id":"https://openalex.org/C78401558","wikidata":"https://www.wikidata.org/wiki/Q464496","display_name":"Standard cell","level":3,"score":0.4941263496875763},{"id":"https://openalex.org/C173608175","wikidata":"https://www.wikidata.org/wiki/Q232661","display_name":"Parallel computing","level":1,"score":0.4799768924713135},{"id":"https://openalex.org/C2778572836","wikidata":"https://www.wikidata.org/wiki/Q380933","display_name":"Space (punctuation)","level":2,"score":0.4561036229133606},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.41266584396362305},{"id":"https://openalex.org/C126255220","wikidata":"https://www.wikidata.org/wiki/Q141495","display_name":"Mathematical optimization","level":1,"score":0.34066063165664673},{"id":"https://openalex.org/C188817802","wikidata":"https://www.wikidata.org/wiki/Q13426855","display_name":"Physical design","level":3,"score":0.22664687037467957},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.15739291906356812},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.15364930033683777},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.11770260334014893},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.09459766745567322},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.09249812364578247},{"id":"https://openalex.org/C190560348","wikidata":"https://www.wikidata.org/wiki/Q3245116","display_name":"Circuit design","level":2,"score":0.0796065628528595},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.07352098822593689},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.23919/date.2017.7927227","is_oa":false,"landing_page_url":"https://doi.org/10.23919/date.2017.7927227","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Design, Automation & Test in Europe Conference & Exhibition (DATE), 2017","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.5199999809265137,"display_name":"Peace, Justice and strong institutions","id":"https://metadata.un.org/sdg/16"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":25,"referenced_works":["https://openalex.org/W1547227531","https://openalex.org/W1990184359","https://openalex.org/W2003803236","https://openalex.org/W2021819509","https://openalex.org/W2031660054","https://openalex.org/W2032684956","https://openalex.org/W2033404897","https://openalex.org/W2054549114","https://openalex.org/W2066274800","https://openalex.org/W2070822532","https://openalex.org/W2083350702","https://openalex.org/W2090109439","https://openalex.org/W2107458461","https://openalex.org/W2122848041","https://openalex.org/W2126301723","https://openalex.org/W2152190733","https://openalex.org/W2169862988","https://openalex.org/W2485905123","https://openalex.org/W2486040343","https://openalex.org/W3100108623","https://openalex.org/W3149318025","https://openalex.org/W4252809058","https://openalex.org/W4254569978","https://openalex.org/W6667305510","https://openalex.org/W6786047862"],"related_works":["https://openalex.org/W1595862343","https://openalex.org/W2098330390","https://openalex.org/W2094793671","https://openalex.org/W1980872675","https://openalex.org/W2036839078","https://openalex.org/W2047305564","https://openalex.org/W2102664849","https://openalex.org/W3115337098","https://openalex.org/W2334021962","https://openalex.org/W2368328740"],"abstract_inverted_index":{"In":[0],"this":[1],"paper,":[2],"we":[3,70,82],"study":[4],"the":[5,52,67,76,89],"problem":[6],"of":[7,54,91],"refining":[8],"a":[9,23,28],"standard":[10],"cell":[11,62],"placement":[12,25,63,78],"for":[13,58],"self-aligned":[14],"double":[15],"patterning":[16],"(SADP),":[17],"which":[18],"asks":[19],"to":[20,75,87],"simultaneously":[21],"refine":[22],"detailed":[24],"and":[26,38],"find":[27],"valid":[29],"SADP":[30],"layout":[31],"decomposition":[32],"such":[33],"that":[34,50],"both":[35],"overlay":[36],"violation":[37],"wirelength":[39],"are":[40],"as":[41,43],"small":[42],"possible.":[44],"We":[45],"first":[46],"present":[47],"an":[48,59,73],"algorithm":[49],"adopts":[51],"technique":[53],"white":[55],"space":[56],"insertion":[57],"SADP-aware":[60],"single-row":[61,68],"problem.":[64,80],"Based":[65],"on":[66],"algorithm,":[69],"then":[71],"describe":[72],"approach":[74],"addressed":[77],"refinement":[79],"Finally,":[81],"report":[83],"encouraging":[84],"experimental":[85],"results":[86],"support":[88],"efficacy":[90],"our":[92],"approach.":[93]},"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}