{"id":"https://openalex.org/W2570930710","doi":"https://doi.org/10.1587/elex.14.20160901","title":"Enhanced 3 \u00d7 VDD-tolerant ESD clamp circuit with stacked configuration","display_name":"Enhanced 3 \u00d7 VDD-tolerant ESD clamp circuit with stacked configuration","publication_year":2017,"publication_date":"2017-01-01","ids":{"openalex":"https://openalex.org/W2570930710","doi":"https://doi.org/10.1587/elex.14.20160901","mag":"2570930710"},"language":"en","primary_location":{"id":"doi:10.1587/elex.14.20160901","is_oa":true,"landing_page_url":"https://doi.org/10.1587/elex.14.20160901","pdf_url":"https://www.jstage.jst.go.jp/article/elex/14/2/14_14.20160901/_pdf","source":{"id":"https://openalex.org/S207433681","display_name":"IEICE Electronics Express","issn_l":"1349-2543","issn":["1349-2543","1349-9467"],"is_oa":true,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4320800604","host_organization_name":"Institute of Electronics, Information and Communication Engineers","host_organization_lineage":["https://openalex.org/P4320800604"],"host_organization_lineage_names":["Institute of Electronics, Information and Communication Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEICE Electronics Express","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://www.jstage.jst.go.jp/article/elex/14/2/14_14.20160901/_pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100781903","display_name":"Xiaoyun Li","orcid":"https://orcid.org/0000-0003-1976-6180"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xiaoyun Li","raw_affiliation_strings":["State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048847435","display_name":"Houpeng Chen","orcid":"https://orcid.org/0000-0002-5766-5746"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Houpeng Chen","raw_affiliation_strings":["State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100422786","display_name":"Qian Wang","orcid":"https://orcid.org/0000-0002-2149-384X"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Qian Wang","raw_affiliation_strings":["State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101494435","display_name":"Xi Li","orcid":"https://orcid.org/0000-0003-0147-1368"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xi Li","raw_affiliation_strings":["State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100774255","display_name":"Yu Lei","orcid":"https://orcid.org/0000-0003-4321-0385"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yu Lei","raw_affiliation_strings":["State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100360250","display_name":"Qi Zhang","orcid":"https://orcid.org/0000-0002-0312-7045"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Qi Zhang","raw_affiliation_strings":["State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5084447592","display_name":"Xi Fan","orcid":"https://orcid.org/0000-0002-3202-1047"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xi Fan","raw_affiliation_strings":["State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5058846208","display_name":"Jiajun Hu","orcid":"https://orcid.org/0000-0002-3642-947X"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jiajun Hu","raw_affiliation_strings":["State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017894990","display_name":"Zhen Tian","orcid":"https://orcid.org/0000-0001-9044-637X"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Zhen Tian","raw_affiliation_strings":["State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100366515","display_name":"Zhitang Song","orcid":"https://orcid.org/0000-0001-7859-9429"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Zhitang Song","raw_affiliation_strings":["State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.2241,"has_fulltext":true,"cited_by_count":3,"citation_normalized_percentile":{"value":0.54344166,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"14","issue":"2","first_page":"20160901","last_page":"20160901"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11444","display_name":"Electromagnetic Compatibility and Noise Suppression","score":0.9950000047683716,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9901999831199646,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/electrostatic-discharge","display_name":"Electrostatic discharge","score":0.8675613403320312},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.7075610160827637},{"id":"https://openalex.org/keywords/silicon-on-insulator","display_name":"Silicon on insulator","score":0.7041597366333008},{"id":"https://openalex.org/keywords/clamp","display_name":"Clamp","score":0.6521767377853394},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6301209926605225},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.601494312286377},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.5605120062828064},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.5603821277618408},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.5217512845993042},{"id":"https://openalex.org/keywords/clamper","display_name":"Clamper","score":0.4591490626335144},{"id":"https://openalex.org/keywords/threshold-voltage","display_name":"Threshold voltage","score":0.4350894093513489},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.3284297287464142},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.32082295417785645},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.27160587906837463},{"id":"https://openalex.org/keywords/mechanical-engineering","display_name":"Mechanical engineering","score":0.06306126713752747}],"concepts":[{"id":"https://openalex.org/C205483674","wikidata":"https://www.wikidata.org/wiki/Q3574961","display_name":"Electrostatic discharge","level":3,"score":0.8675613403320312},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.7075610160827637},{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.7041597366333008},{"id":"https://openalex.org/C2776161997","wikidata":"https://www.wikidata.org/wiki/Q846600","display_name":"Clamp","level":3,"score":0.6521767377853394},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6301209926605225},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.601494312286377},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.5605120062828064},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.5603821277618408},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5217512845993042},{"id":"https://openalex.org/C64881904","wikidata":"https://www.wikidata.org/wiki/Q825778","display_name":"Clamper","level":3,"score":0.4591490626335144},{"id":"https://openalex.org/C195370968","wikidata":"https://www.wikidata.org/wiki/Q1754002","display_name":"Threshold voltage","level":4,"score":0.4350894093513489},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3284297287464142},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.32082295417785645},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.27160587906837463},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.06306126713752747},{"id":"https://openalex.org/C84111939","wikidata":"https://www.wikidata.org/wiki/Q5125465","display_name":"Clamping","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1587/elex.14.20160901","is_oa":true,"landing_page_url":"https://doi.org/10.1587/elex.14.20160901","pdf_url":"https://www.jstage.jst.go.jp/article/elex/14/2/14_14.20160901/_pdf","source":{"id":"https://openalex.org/S207433681","display_name":"IEICE Electronics Express","issn_l":"1349-2543","issn":["1349-2543","1349-9467"],"is_oa":true,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4320800604","host_organization_name":"Institute of Electronics, Information and Communication Engineers","host_organization_lineage":["https://openalex.org/P4320800604"],"host_organization_lineage_names":["Institute of Electronics, Information and Communication Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEICE Electronics Express","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.1587/elex.14.20160901","is_oa":true,"landing_page_url":"https://doi.org/10.1587/elex.14.20160901","pdf_url":"https://www.jstage.jst.go.jp/article/elex/14/2/14_14.20160901/_pdf","source":{"id":"https://openalex.org/S207433681","display_name":"IEICE Electronics Express","issn_l":"1349-2543","issn":["1349-2543","1349-9467"],"is_oa":true,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4320800604","host_organization_name":"Institute of Electronics, Information and Communication Engineers","host_organization_lineage":["https://openalex.org/P4320800604"],"host_organization_lineage_names":["Institute of Electronics, Information and Communication Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEICE Electronics Express","raw_type":"journal-article"},"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy","score":0.7699999809265137}],"awards":[{"id":"https://openalex.org/G1292405369","display_name":null,"funder_award_id":"XDA09020402","funder_id":"https://openalex.org/F4320321133","funder_display_name":"Chinese Academy of Sciences"},{"id":"https://openalex.org/G2085162751","display_name":null,"funder_award_id":"61261160500","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G3219903371","display_name":null,"funder_award_id":"61376006","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G3967216521","display_name":null,"funder_award_id":"61176122, 61106001, 61261160500, 61376006","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G4166559171","display_name":null,"funder_award_id":"61176122","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G472187076","display_name":null,"funder_award_id":"61106001","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G6764850312","display_name":null,"funder_award_id":"2011CBA00607","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"}],"funders":[{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"},{"id":"https://openalex.org/F4320321133","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35"}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2570930710.pdf","grobid_xml":"https://content.openalex.org/works/W2570930710.grobid-xml"},"referenced_works_count":11,"referenced_works":["https://openalex.org/W1994628176","https://openalex.org/W1995621265","https://openalex.org/W2031622310","https://openalex.org/W2061642543","https://openalex.org/W2116641647","https://openalex.org/W2117493644","https://openalex.org/W2141598127","https://openalex.org/W2143536486","https://openalex.org/W2164902374","https://openalex.org/W2167393507","https://openalex.org/W2256755313"],"related_works":["https://openalex.org/W3181132583","https://openalex.org/W2107487035","https://openalex.org/W2046430182","https://openalex.org/W2169305461","https://openalex.org/W1571396369","https://openalex.org/W2154271946","https://openalex.org/W1985232861","https://openalex.org/W2148235476","https://openalex.org/W2563543428","https://openalex.org/W2763943869"],"abstract_inverted_index":{"An":[0],"enhanced":[1],"3":[2],"\u00d7":[3],"VDD-tolerant":[4],"ESD":[5,25,49],"clamp":[6],"circuit":[7,28],"with":[8],"stacked":[9],"configuration":[10],"was":[11,29],"presented.":[12],"Four":[13],"transistors":[14],"were":[15],"added":[16],"in":[17,31],"this":[18],"design":[19],"to":[20,63,67],"transfer":[21],"bias":[22],"voltages":[23],"or":[24],"voltages.":[26],"This":[27],"simulated":[30],"0.18":[32],"\u00b5m":[33],"silicon-on-insulator":[34],"(SOI)":[35],"CMOS":[36,42],"process":[37],"and":[38,57],"28":[39],"nm":[40],"HKMG":[41],"technology.":[43],"Spectre-simulation":[44],"results":[45],"showed":[46],"that":[47],"the":[48,58,68],"discharge":[50,59],"current":[51,60],"is":[52,61],"increased":[53],"by":[54],"2":[55],"times":[56],"decreased":[62],"nA":[64],"magnitudes":[65],"compared":[66],"conventional":[69],"circuit.":[70]},"counts_by_year":[{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1}],"updated_date":"2026-07-22T07:51:19.307946","created_date":"2025-10-10T00:00:00"}