{"id":"https://openalex.org/W1990995275","doi":"https://doi.org/10.1587/elex.12.20150297","title":"Structure optimization for timing in nano scale FinFET","display_name":"Structure optimization for timing in nano scale FinFET","publication_year":2015,"publication_date":"2015-01-01","ids":{"openalex":"https://openalex.org/W1990995275","doi":"https://doi.org/10.1587/elex.12.20150297","mag":"1990995275"},"language":"en","primary_location":{"id":"doi:10.1587/elex.12.20150297","is_oa":true,"landing_page_url":"https://doi.org/10.1587/elex.12.20150297","pdf_url":"https://www.jstage.jst.go.jp/article/elex/12/9/12_12.20150297/_pdf","source":{"id":"https://openalex.org/S207433681","display_name":"IEICE Electronics Express","issn_l":"1349-2543","issn":["1349-2543","1349-9467"],"is_oa":true,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4320800604","host_organization_name":"Institute of Electronics, Information and Communication Engineers","host_organization_lineage":["https://openalex.org/P4320800604"],"host_organization_lineage_names":["Institute of Electronics, Information and Communication Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEICE Electronics Express","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://www.jstage.jst.go.jp/article/elex/12/9/12_12.20150297/_pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5067005883","display_name":"Toshiki Kanamoto","orcid":"https://orcid.org/0000-0002-6326-6960"},"institutions":[{"id":"https://openalex.org/I75636454","display_name":"Renesas Electronics (United States)","ror":"https://ror.org/014775w70","country_code":"US","type":"company","lineage":["https://openalex.org/I4210153176","https://openalex.org/I75636454"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Toshiki Kanamoto","raw_affiliation_strings":["JEITA EDA Technical Committee","Renesas System Design"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JEITA EDA Technical Committee","institution_ids":[]},{"raw_affiliation_string":"Renesas System Design","institution_ids":["https://openalex.org/I75636454"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5023112920","display_name":"Takeichiro Akamine","orcid":null},"institutions":[{"id":"https://openalex.org/I2800638042","display_name":"Socionext (Japan)","ror":"https://ror.org/04ma89d43","country_code":"JP","type":"company","lineage":["https://openalex.org/I2800638042"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takeichiro Akamine","raw_affiliation_strings":["JEITA EDA Technical Committee","Socionext"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JEITA EDA Technical Committee","institution_ids":[]},{"raw_affiliation_string":"Socionext","institution_ids":["https://openalex.org/I2800638042"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010256340","display_name":"H. Ammo","orcid":null},"institutions":[{"id":"https://openalex.org/I2800278093","display_name":"Sony Corporation (United States)","ror":"https://ror.org/05k91zb11","country_code":"US","type":"company","lineage":["https://openalex.org/I2800278093"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Hiroaki Ammo","raw_affiliation_strings":["JEITA EDA Technical Committee","Sony"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JEITA EDA Technical Committee","institution_ids":[]},{"raw_affiliation_string":"Sony","institution_ids":["https://openalex.org/I2800278093"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090477551","display_name":"Takashi Hasegawa","orcid":"https://orcid.org/0000-0003-0147-506X"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Takashi Hasegawa","raw_affiliation_strings":["JEITA EDA Technical Committee","Sony LSI Design"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JEITA EDA Technical Committee","institution_ids":[]},{"raw_affiliation_string":"Sony LSI Design","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051298264","display_name":"Kouhei Shimizu","orcid":"https://orcid.org/0000-0001-9523-4296"},"institutions":[{"id":"https://openalex.org/I1283155146","display_name":"Panasonic (Japan)","ror":"https://ror.org/011tm7n37","country_code":"JP","type":"company","lineage":["https://openalex.org/I1283155146"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kouhei Shimizu","raw_affiliation_strings":["JEITA EDA Technical Committee","Panasonic Industrial Devices Systems and Technology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JEITA EDA Technical Committee","institution_ids":[]},{"raw_affiliation_string":"Panasonic Industrial Devices Systems and Technology","institution_ids":["https://openalex.org/I1283155146"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5068044167","display_name":"Yoshinori Kumano","orcid":null},"institutions":[{"id":"https://openalex.org/I24193003","display_name":"Ricoh (Japan)","ror":"https://ror.org/02h4myp42","country_code":"JP","type":"company","lineage":["https://openalex.org/I24193003"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshinori Kumano","raw_affiliation_strings":["JEITA EDA Technical Committee","RICOH"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JEITA EDA Technical Committee","institution_ids":[]},{"raw_affiliation_string":"RICOH","institution_ids":["https://openalex.org/I24193003"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5066056999","display_name":"Masaharu Kawano","orcid":null},"institutions":[{"id":"https://openalex.org/I24193003","display_name":"Ricoh (Japan)","ror":"https://ror.org/02h4myp42","country_code":"JP","type":"company","lineage":["https://openalex.org/I24193003"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masaharu Kawano","raw_affiliation_strings":["JEITA EDA Technical Committee","RICOH"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JEITA EDA Technical Committee","institution_ids":[]},{"raw_affiliation_string":"RICOH","institution_ids":["https://openalex.org/I24193003"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5108528404","display_name":"Atsushi Kurokawa","orcid":null},"institutions":[{"id":"https://openalex.org/I146516829","display_name":"Hirosaki University","ror":"https://ror.org/02syg0q74","country_code":"JP","type":"education","lineage":["https://openalex.org/I146516829"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Atsushi Kurokawa","raw_affiliation_strings":["Hirosaki University","JEITA EDA Technical Committee"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hirosaki University","institution_ids":["https://openalex.org/I146516829"]},{"raw_affiliation_string":"JEITA EDA Technical Committee","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":8,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.4017,"has_fulltext":true,"cited_by_count":2,"citation_normalized_percentile":{"value":0.66982794,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":94},"biblio":{"volume":"12","issue":"9","first_page":"20150297","last_page":"20150297"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/capacitance","display_name":"Capacitance","score":0.7366228699684143},{"id":"https://openalex.org/keywords/signal","display_name":"SIGNAL (programming language)","score":0.6975201964378357},{"id":"https://openalex.org/keywords/propagation-delay","display_name":"Propagation delay","score":0.6880636811256409},{"id":"https://openalex.org/keywords/parasitic-capacitance","display_name":"Parasitic capacitance","score":0.681401789188385},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.560938835144043},{"id":"https://openalex.org/keywords/delay-calculation","display_name":"Delay calculation","score":0.530432939529419},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.49584683775901794},{"id":"https://openalex.org/keywords/nano","display_name":"Nano-","score":0.47853216528892517},{"id":"https://openalex.org/keywords/scale","display_name":"Scale (ratio)","score":0.4693988859653473},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.4213799834251404},{"id":"https://openalex.org/keywords/nanoscopic-scale","display_name":"Nanoscopic scale","score":0.41976314783096313},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.41471782326698303},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.33821436762809753},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.22310352325439453},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.22208893299102783},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.20351174473762512},{"id":"https://openalex.org/keywords/electrode","display_name":"Electrode","score":0.072622150182724},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.061653703451156616}],"concepts":[{"id":"https://openalex.org/C30066665","wikidata":"https://www.wikidata.org/wiki/Q164399","display_name":"Capacitance","level":3,"score":0.7366228699684143},{"id":"https://openalex.org/C2779843651","wikidata":"https://www.wikidata.org/wiki/Q7390335","display_name":"SIGNAL (programming language)","level":2,"score":0.6975201964378357},{"id":"https://openalex.org/C90806461","wikidata":"https://www.wikidata.org/wiki/Q1144416","display_name":"Propagation delay","level":2,"score":0.6880636811256409},{"id":"https://openalex.org/C154318817","wikidata":"https://www.wikidata.org/wiki/Q2157249","display_name":"Parasitic capacitance","level":4,"score":0.681401789188385},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.560938835144043},{"id":"https://openalex.org/C174086752","wikidata":"https://www.wikidata.org/wiki/Q5253471","display_name":"Delay calculation","level":3,"score":0.530432939529419},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.49584683775901794},{"id":"https://openalex.org/C2780357685","wikidata":"https://www.wikidata.org/wiki/Q154357","display_name":"Nano-","level":2,"score":0.47853216528892517},{"id":"https://openalex.org/C2778755073","wikidata":"https://www.wikidata.org/wiki/Q10858537","display_name":"Scale (ratio)","level":2,"score":0.4693988859653473},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.4213799834251404},{"id":"https://openalex.org/C45206210","wikidata":"https://www.wikidata.org/wiki/Q2415817","display_name":"Nanoscopic scale","level":2,"score":0.41976314783096313},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.41471782326698303},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.33821436762809753},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.22310352325439453},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.22208893299102783},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.20351174473762512},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.072622150182724},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.061653703451156616},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1587/elex.12.20150297","is_oa":true,"landing_page_url":"https://doi.org/10.1587/elex.12.20150297","pdf_url":"https://www.jstage.jst.go.jp/article/elex/12/9/12_12.20150297/_pdf","source":{"id":"https://openalex.org/S207433681","display_name":"IEICE Electronics Express","issn_l":"1349-2543","issn":["1349-2543","1349-9467"],"is_oa":true,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4320800604","host_organization_name":"Institute of Electronics, Information and Communication Engineers","host_organization_lineage":["https://openalex.org/P4320800604"],"host_organization_lineage_names":["Institute of Electronics, Information and Communication Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEICE Electronics Express","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.1587/elex.12.20150297","is_oa":true,"landing_page_url":"https://doi.org/10.1587/elex.12.20150297","pdf_url":"https://www.jstage.jst.go.jp/article/elex/12/9/12_12.20150297/_pdf","source":{"id":"https://openalex.org/S207433681","display_name":"IEICE Electronics Express","issn_l":"1349-2543","issn":["1349-2543","1349-9467"],"is_oa":true,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4320800604","host_organization_name":"Institute of Electronics, Information and Communication Engineers","host_organization_lineage":["https://openalex.org/P4320800604"],"host_organization_lineage_names":["Institute of Electronics, Information and Communication Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEICE Electronics Express","raw_type":"journal-article"},"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W1990995275.pdf","grobid_xml":"https://content.openalex.org/works/W1990995275.grobid-xml"},"referenced_works_count":4,"referenced_works":["https://openalex.org/W1965242084","https://openalex.org/W2014482143","https://openalex.org/W2033700531","https://openalex.org/W2135818056"],"related_works":["https://openalex.org/W3015599398","https://openalex.org/W2188730438","https://openalex.org/W2157230896","https://openalex.org/W2792778858","https://openalex.org/W2034656493","https://openalex.org/W2362904186","https://openalex.org/W2114232017","https://openalex.org/W1997308464","https://openalex.org/W2040679505","https://openalex.org/W1927636319"],"abstract_inverted_index":{"This":[0],"paper":[1],"suggests":[2],"a":[3,81],"methodology":[4],"to":[5,23,29,35,61,102],"model":[6],"and":[7,11,46],"optimize":[8,24],"parasitic":[9,43,59],"capacitance":[10,47],"resistance":[12,44],"on":[13,57],"nano-scale":[14],"FinFET":[15,40,108],"devices":[16],"in":[17,80,84,104],"terms":[18],"of":[19,75],"timing.":[20],"We":[21,68],"suggest":[22],"the":[25,52,58,62,71,76,85,94,112],"gate":[26],"spacer":[27,72,113],"thickness":[28,73],"minimize":[30],"signal":[31,54,86,95],"propagation":[32,87,96],"delay.":[33,88],"Due":[34],"its":[36],"own":[37],"3D":[38],"construction,":[39],"accompanies":[41],"large":[42],"(R)":[45],"(C)":[48],"elements.":[49],"It":[50],"brings":[51],"larger":[53],"delay":[55,97],"impact":[56],"compared":[60],"conventional":[63],"planer":[64],"MOS":[65],"FET":[66],"devices.":[67],"reveal":[69],"that":[70,93],"dependence":[74],"RC":[77],"elements":[78],"results":[79,91],"minimal":[82],"value":[83],"The":[89],"experimental":[90],"show":[92],"can":[98],"be":[99],"improved":[100],"up":[101],"10%":[103],"16":[105],"nm":[106],"era":[107],"circuits":[109],"with":[110],"controlling":[111],"thickness.":[114]},"counts_by_year":[{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":1}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}