{"id":"https://openalex.org/W1578525731","doi":"https://doi.org/10.1155/2001/62583","title":"Program, Erase and Retention Timesof Thin\u2010oxide Flash\u2010EEPROMs","display_name":"Program, Erase and Retention Timesof Thin\u2010oxide Flash\u2010EEPROMs","publication_year":2001,"publication_date":"2001-01-01","ids":{"openalex":"https://openalex.org/W1578525731","doi":"https://doi.org/10.1155/2001/62583","mag":"1578525731"},"language":"en","primary_location":{"id":"doi:10.1155/2001/62583","is_oa":true,"landing_page_url":"https://doi.org/10.1155/2001/62583","pdf_url":"https://downloads.hindawi.com/archive/2001/062583.pdf","source":{"id":"https://openalex.org/S81291924","display_name":"VLSI design","issn_l":"1026-7123","issn":["1026-7123","1065-514X","1563-5171"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319869","host_organization_name":"Hindawi Publishing Corporation","host_organization_lineage":["https://openalex.org/P4310319869"],"host_organization_lineage_names":["Hindawi Publishing Corporation"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"VLSI Design","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"hybrid","oa_url":"https://downloads.hindawi.com/archive/2001/062583.pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5076267890","display_name":"Giuseppe Iannaccone","orcid":"https://orcid.org/0000-0003-3375-1647"},"institutions":[{"id":"https://openalex.org/I108290504","display_name":"University of Pisa","ror":"https://ror.org/03ad39j10","country_code":"IT","type":"education","lineage":["https://openalex.org/I108290504"]}],"countries":["IT"],"is_corresponding":true,"raw_author_name":"G. Iannaccone","raw_affiliation_strings":["Dipartimento di Ingegneria dell'Informazione, Universita degli studi di Pisa, Via Diotisalvi 2"],"affiliations":[{"raw_affiliation_string":"Dipartimento di Ingegneria dell'Informazione, Universita degli studi di Pisa, Via Diotisalvi 2","institution_ids":["https://openalex.org/I108290504"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5106469301","display_name":"S. Gennai","orcid":"https://orcid.org/0000-0001-5269-8517"},"institutions":[{"id":"https://openalex.org/I108290504","display_name":"University of Pisa","ror":"https://ror.org/03ad39j10","country_code":"IT","type":"education","lineage":["https://openalex.org/I108290504"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"S. Gennai","raw_affiliation_strings":["Dipartimento di Ingegneria dell'Informazione, Universita degli studi di Pisa, Via Diotisalvi 2"],"affiliations":[{"raw_affiliation_string":"Dipartimento di Ingegneria dell'Informazione, Universita degli studi di Pisa, Via Diotisalvi 2","institution_ids":["https://openalex.org/I108290504"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5076267890"],"corresponding_institution_ids":["https://openalex.org/I108290504"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":true,"cited_by_count":4,"citation_normalized_percentile":{"value":0.05851093,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":94},"biblio":{"volume":"13","issue":"1-4","first_page":"431","last_page":"434"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12588","display_name":"Electronic and Structural Properties of Oxides","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/stack","display_name":"Stack (abstract data type)","score":0.6925861239433289},{"id":"https://openalex.org/keywords/flash","display_name":"Flash (photography)","score":0.5981022119522095},{"id":"https://openalex.org/keywords/oxide","display_name":"Oxide","score":0.5839042067527771},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.5297015309333801},{"id":"https://openalex.org/keywords/flash-memory","display_name":"Flash memory","score":0.5225319862365723},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5155829787254333},{"id":"https://openalex.org/keywords/data-retention","display_name":"Data retention","score":0.49843454360961914},{"id":"https://openalex.org/keywords/non-volatile-memory","display_name":"Non-volatile memory","score":0.4711643159389496},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.4571509063243866},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.43348023295402527},{"id":"https://openalex.org/keywords/retention-time","display_name":"Retention time","score":0.4158981740474701},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.41270536184310913},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.40793007612228394},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.3722943663597107},{"id":"https://openalex.org/keywords/embedded-system","display_name":"Embedded system","score":0.29196643829345703},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.24053657054901123},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.18460536003112793},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.15851369500160217},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.14897939562797546},{"id":"https://openalex.org/keywords/metallurgy","display_name":"Metallurgy","score":0.085970938205719},{"id":"https://openalex.org/keywords/operating-system","display_name":"Operating system","score":0.0858975350856781}],"concepts":[{"id":"https://openalex.org/C9395851","wikidata":"https://www.wikidata.org/wiki/Q177929","display_name":"Stack (abstract data type)","level":2,"score":0.6925861239433289},{"id":"https://openalex.org/C2777526259","wikidata":"https://www.wikidata.org/wiki/Q221836","display_name":"Flash (photography)","level":2,"score":0.5981022119522095},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5839042067527771},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5297015309333801},{"id":"https://openalex.org/C2776531357","wikidata":"https://www.wikidata.org/wiki/Q174077","display_name":"Flash memory","level":2,"score":0.5225319862365723},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5155829787254333},{"id":"https://openalex.org/C2780866740","wikidata":"https://www.wikidata.org/wiki/Q5227345","display_name":"Data retention","level":2,"score":0.49843454360961914},{"id":"https://openalex.org/C177950962","wikidata":"https://www.wikidata.org/wiki/Q10997658","display_name":"Non-volatile memory","level":2,"score":0.4711643159389496},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.4571509063243866},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.43348023295402527},{"id":"https://openalex.org/C3020018676","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Retention time","level":2,"score":0.4158981740474701},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.41270536184310913},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.40793007612228394},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3722943663597107},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.29196643829345703},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.24053657054901123},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.18460536003112793},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.15851369500160217},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.14897939562797546},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.085970938205719},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0858975350856781},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1155/2001/62583","is_oa":true,"landing_page_url":"https://doi.org/10.1155/2001/62583","pdf_url":"https://downloads.hindawi.com/archive/2001/062583.pdf","source":{"id":"https://openalex.org/S81291924","display_name":"VLSI design","issn_l":"1026-7123","issn":["1026-7123","1065-514X","1563-5171"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319869","host_organization_name":"Hindawi Publishing Corporation","host_organization_lineage":["https://openalex.org/P4310319869"],"host_organization_lineage_names":["Hindawi Publishing Corporation"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"VLSI Design","raw_type":"journal-article"},{"id":"pmh:oai:arpi.unipi.it:11568/177557","is_oa":false,"landing_page_url":"http://hdl.handle.net/11568/177557","pdf_url":null,"source":{"id":"https://openalex.org/S4377196265","display_name":"CINECA IRIS Institutial research information system (University of Pisa)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I108290504","host_organization_name":"University of Pisa","host_organization_lineage":["https://openalex.org/I108290504"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"info:eu-repo/semantics/article"}],"best_oa_location":{"id":"doi:10.1155/2001/62583","is_oa":true,"landing_page_url":"https://doi.org/10.1155/2001/62583","pdf_url":"https://downloads.hindawi.com/archive/2001/062583.pdf","source":{"id":"https://openalex.org/S81291924","display_name":"VLSI design","issn_l":"1026-7123","issn":["1026-7123","1065-514X","1563-5171"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319869","host_organization_name":"Hindawi Publishing Corporation","host_organization_lineage":["https://openalex.org/P4310319869"],"host_organization_lineage_names":["Hindawi Publishing Corporation"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"VLSI Design","raw_type":"journal-article"},"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W1578525731.pdf","grobid_xml":"https://content.openalex.org/works/W1578525731.grobid-xml"},"referenced_works_count":4,"referenced_works":["https://openalex.org/W2039200442","https://openalex.org/W2111865441","https://openalex.org/W3197160344","https://openalex.org/W6676661322"],"related_works":["https://openalex.org/W2110321764","https://openalex.org/W2116397085","https://openalex.org/W2143400404","https://openalex.org/W3040260745","https://openalex.org/W2801267388","https://openalex.org/W2109360204","https://openalex.org/W2036350002","https://openalex.org/W2104937488","https://openalex.org/W2613072279","https://openalex.org/W2102924097"],"abstract_inverted_index":{"We":[0],"present":[1],"an":[2],"investigation":[3],"of":[4,7,11,15,47],"the":[5,12,30,48],"process":[6],"charging":[8],"and":[9,41,52],"discharging":[10],"floating":[13],"gate":[14,49],"thin":[16],"oxide":[17],"Flash":[18],"EEPROMs":[19],"based":[20],"on":[21],"a":[22,45],"fully":[23],"quantum":[24],"mechanical":[25],"approach":[26,34],"to":[27,37],"transport":[28],"in":[29],"vertical":[31],"direction.":[32],"Our":[33],"allows":[35],"us":[36],"compute":[38],"program,":[39],"erase,":[40],"retention":[42],"times":[43],"as":[44],"function":[46],"stack":[50],"structure,":[51],"applied":[53],"voltages.":[54]},"counts_by_year":[{"year":2019,"cited_by_count":1}],"updated_date":"2026-04-04T16:13:02.066488","created_date":"2025-10-10T00:00:00"}