{"id":"https://openalex.org/W1979238691","doi":"https://doi.org/10.1147/rd.242.0195","title":"Fabrication Process for Josephson Integrated Circuits","display_name":"Fabrication Process for Josephson Integrated Circuits","publication_year":1980,"publication_date":"1980-03-01","ids":{"openalex":"https://openalex.org/W1979238691","doi":"https://doi.org/10.1147/rd.242.0195","mag":"1979238691"},"language":"en","primary_location":{"id":"doi:10.1147/rd.242.0195","is_oa":false,"landing_page_url":"https://doi.org/10.1147/rd.242.0195","pdf_url":null,"source":{"id":"https://openalex.org/S4210219925","display_name":"IBM Journal of Research and Development","issn_l":"0018-8646","issn":["0018-8646","2151-8556"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320652","host_organization_name":"IBM","host_organization_lineage":["https://openalex.org/P4310320652"],"host_organization_lineage_names":["IBM"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IBM Journal of Research and Development","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5067766966","display_name":"J. H. Greiner","orcid":null},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"J. H. Greiner","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079159747","display_name":"C. J. Kircher","orcid":null},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"C. J. Kircher","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054992830","display_name":"S. P. Klepner","orcid":null},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. P. Klepner","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102777392","display_name":"S. K. Lahiri","orcid":"https://orcid.org/0009-0004-1930-8977"},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. K. Lahiri","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070293380","display_name":"Alexander Warnecke","orcid":"https://orcid.org/0009-0006-3617-3968"},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. J. Warnecke","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044313379","display_name":"S. Basavaiah","orcid":null},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Basavaiah","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073460268","display_name":"E. T. Yen","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"E. T. Yen","raw_affiliation_strings":["IBM General Products Division, laboratory, San Jose, California 95150, USA","IBM General Products Division laboratory, San Jose, California#TAB#"],"affiliations":[{"raw_affiliation_string":"IBM General Products Division, laboratory, San Jose, California 95150, USA","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"IBM General Products Division laboratory, San Jose, California#TAB#","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048330648","display_name":"John M. Baker","orcid":null},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"John M. Baker","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5077170883","display_name":"P. R. Brosious","orcid":null},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"P. R. Brosious","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102012682","display_name":"Hao Huang","orcid":"https://orcid.org/0000-0003-3045-329X"},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"H.-C. W. Huang","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089273020","display_name":"Masanori Murakami","orcid":"https://orcid.org/0000-0002-5541-3502"},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. Murakami","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5052288616","display_name":"I. Ames","orcid":"https://orcid.org/0000-0002-7662-4309"},"institutions":[{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"I. Ames","raw_affiliation_strings":["IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","IBM Thomas J. Watson Research Center, Yorktown Heights, New York"],"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA","institution_ids":["https://openalex.org/I4210114115"]},{"raw_affiliation_string":"IBM Thomas J. Watson Research Center, Yorktown Heights, New York","institution_ids":["https://openalex.org/I4210114115"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":12,"corresponding_author_ids":["https://openalex.org/A5067766966"],"corresponding_institution_ids":["https://openalex.org/I4210114115"],"apc_list":null,"apc_paid":null,"fwci":23.016,"has_fulltext":false,"cited_by_count":202,"citation_normalized_percentile":{"value":0.99924314,"is_in_top_1_percent":true,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":97},"biblio":{"volume":"24","issue":"2","first_page":"195","last_page":"205"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":0.9940000176429749,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":0.9940000176429749,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12300","display_name":"Advanced Electrical Measurement Techniques","score":0.9937000274658203,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12588","display_name":"Electronic and Structural Properties of Oxides","score":0.9891999959945679,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photoresist","display_name":"Photoresist","score":0.7637070417404175},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6847490072250366},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.5109659433364868},{"id":"https://openalex.org/keywords/electrode","display_name":"Electrode","score":0.49475330114364624},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.4876900911331177},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.47980502247810364},{"id":"https://openalex.org/keywords/josephson-effect","display_name":"Josephson effect","score":0.478074312210083},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.46139785647392273},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.3055831789970398},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.10846233367919922},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.08201766014099121}],"concepts":[{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.7637070417404175},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6847490072250366},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.5109659433364868},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.49475330114364624},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.4876900911331177},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.47980502247810364},{"id":"https://openalex.org/C12038964","wikidata":"https://www.wikidata.org/wiki/Q764228","display_name":"Josephson effect","level":3,"score":0.478074312210083},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.46139785647392273},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3055831789970398},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.10846233367919922},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.08201766014099121},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C54101563","wikidata":"https://www.wikidata.org/wiki/Q124131","display_name":"Superconductivity","level":2,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1147/rd.242.0195","is_oa":false,"landing_page_url":"https://doi.org/10.1147/rd.242.0195","pdf_url":null,"source":{"id":"https://openalex.org/S4210219925","display_name":"IBM Journal of Research and Development","issn_l":"0018-8646","issn":["0018-8646","2151-8556"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320652","host_organization_name":"IBM","host_organization_lineage":["https://openalex.org/P4310320652"],"host_organization_lineage_names":["IBM"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IBM Journal of Research and Development","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","score":0.4300000071525574,"display_name":"Affordable and clean energy"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1982670279","https://openalex.org/W2071556835","https://openalex.org/W2535465976","https://openalex.org/W1981279773","https://openalex.org/W2014317570","https://openalex.org/W1529090358","https://openalex.org/W2079353242","https://openalex.org/W2088156048","https://openalex.org/W2169790204","https://openalex.org/W2349208316"],"abstract_inverted_index":{"A":[0],"process":[1,29],"for":[2,64,149,161,164],"fabricating":[3],"experimental":[4,189],"Josephson":[5],"integrated":[6],"circuits":[7,193],"is":[8,11,176],"described":[9],"that":[10],"based":[12],"primarily":[13],"on":[14,78],"the":[15,79,137],"use":[16],"of":[17,54,136,181],"vacuum-deposited":[18],"Pb-alloy":[19],"and":[20,50,71,86,116,153,170,191],"SiO":[21,157],"films":[22,82,111,158],"patterned":[23,112],"by":[24,83,113,120,132,179],"photoresist":[25,182],"stencil":[26],"lift-off.":[27],"The":[28,156],"has":[30],"evolved":[31],"from":[32,98,108],"one":[33],"previously":[34],"reported,":[35],"with":[36,197],"changes":[37],"having":[38],"occurred":[39],"in":[40,89,118,168,204],"junction":[41,66,166],"electrodes,":[42,68],"tunnel":[43],"barrier":[44],"formation,":[45],"layer":[46,130],"patterning,":[47],"device":[48],"geometry,":[49],"minimum":[51],"linewidths.":[52],"Films":[53,135],"Pb-In(12":[55],"wt%)-Au(4":[56],"wt%)":[57,101],"alloy":[58,102],"(200\u2013800":[59],"nm":[60,145],"thick)":[61,146],"are":[62,76,96,106,147,159],"used":[63,148,160],"forming":[65,150],"base":[67,80],"interferometer":[69],"controls,":[70],"interconnection":[72],"lines.":[73],"Tunnel":[74],"barriers":[75],"formed":[77,97,107,131],"electrode":[81],"thermal":[84],"oxidation":[85],"subsequent":[87],"sputter-etching":[88],"an":[90],"rf-oxygen":[91],"plasma.":[92],"Junction":[93],"counter":[94],"electrodes":[95],"400-nm-thick":[99],"Pb-Bi(29":[100],"films.":[103],"Ground":[104],"planes":[105],"300-nm-thick":[109],"Nb":[110,122],"subtractive":[114],"etching":[115],"insulated":[117],"part":[119],"a":[121],"<inf":[123,127,141],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[124,128,142],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">2</inf>":[125,143],"O":[126],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">5</inf>":[129],"liquid":[133],"anodization.":[134],"intermetallic":[138],"compound":[139],"AuIn":[140],"(30\u201343":[144],"terminating,":[151],"load,":[152],"damping":[154],"resistors.":[155],"interlayer":[162],"insulation,":[163],"defining":[165],"areas":[167],"interferometers,":[169],"as":[171,199,201],"protective":[172],"coatings.":[173],"Layer":[174],"patterning":[175],"achieved":[177],"mainly":[178],"means":[180],"lift-off":[183],"stencils.":[184],"By":[185],"utilizing":[186],"this":[187],"process,":[188],"logic":[190],"memory":[192],"containing":[194],"\u2248100":[195],"interferometers":[196],"lines":[198],"small":[200],"2.5":[202],"\u00b5m":[203],"width":[205],"have":[206],"been":[207],"successfully":[208],"fabricated.":[209]},"counts_by_year":[{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":3},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}