{"id":"https://openalex.org/W2908899888","doi":"https://doi.org/10.1145/3287624.3288738","title":"Integrated flow for reverse engineering of nanoscale technologies","display_name":"Integrated flow for reverse engineering of nanoscale technologies","publication_year":2019,"publication_date":"2019-01-18","ids":{"openalex":"https://openalex.org/W2908899888","doi":"https://doi.org/10.1145/3287624.3288738","mag":"2908899888"},"language":"en","primary_location":{"id":"doi:10.1145/3287624.3288738","is_oa":false,"landing_page_url":"https://doi.org/10.1145/3287624.3288738","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 24th Asia and South Pacific Design Automation Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5070384565","display_name":"Bernhard Lippmann","orcid":null},"institutions":[{"id":"https://openalex.org/I137594350","display_name":"Infineon Technologies (Germany)","ror":"https://ror.org/005kw6t15","country_code":"DE","type":"company","lineage":["https://openalex.org/I137594350"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"Bernhard Lippmann","raw_affiliation_strings":["Infineon Technolgies, Neubiberg, Germany"],"affiliations":[{"raw_affiliation_string":"Infineon Technolgies, Neubiberg, Germany","institution_ids":["https://openalex.org/I137594350"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101577720","display_name":"Michael Werner","orcid":"https://orcid.org/0000-0001-7447-3511"},"institutions":[{"id":"https://openalex.org/I137594350","display_name":"Infineon Technologies (Germany)","ror":"https://ror.org/005kw6t15","country_code":"DE","type":"company","lineage":["https://openalex.org/I137594350"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Michael Werner","raw_affiliation_strings":["Infineon Technolgies, Neubiberg, Germany"],"affiliations":[{"raw_affiliation_string":"Infineon Technolgies, Neubiberg, Germany","institution_ids":["https://openalex.org/I137594350"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5013619372","display_name":"Niklas Unverricht","orcid":null},"institutions":[{"id":"https://openalex.org/I137594350","display_name":"Infineon Technologies (Germany)","ror":"https://ror.org/005kw6t15","country_code":"DE","type":"company","lineage":["https://openalex.org/I137594350"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Niklas Unverricht","raw_affiliation_strings":["Infineon Technolgies, Neubiberg, Germany"],"affiliations":[{"raw_affiliation_string":"Infineon Technolgies, Neubiberg, Germany","institution_ids":["https://openalex.org/I137594350"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110592314","display_name":"Aayush Singla","orcid":null},"institutions":[{"id":"https://openalex.org/I137594350","display_name":"Infineon Technologies (Germany)","ror":"https://ror.org/005kw6t15","country_code":"DE","type":"company","lineage":["https://openalex.org/I137594350"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Aayush Singla","raw_affiliation_strings":["Infineon Technolgies, Neubiberg, Germany"],"affiliations":[{"raw_affiliation_string":"Infineon Technolgies, Neubiberg, Germany","institution_ids":["https://openalex.org/I137594350"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5013214327","display_name":"P. Egger","orcid":"https://orcid.org/0000-0002-8819-6700"},"institutions":[{"id":"https://openalex.org/I137594350","display_name":"Infineon Technologies (Germany)","ror":"https://ror.org/005kw6t15","country_code":"DE","type":"company","lineage":["https://openalex.org/I137594350"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Peter Egger","raw_affiliation_strings":["Infineon Technolgies, Neubiberg, Germany"],"affiliations":[{"raw_affiliation_string":"Infineon Technolgies, Neubiberg, Germany","institution_ids":["https://openalex.org/I137594350"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010233865","display_name":"Anja D\u00fcbotzky","orcid":null},"institutions":[{"id":"https://openalex.org/I137594350","display_name":"Infineon Technologies (Germany)","ror":"https://ror.org/005kw6t15","country_code":"DE","type":"company","lineage":["https://openalex.org/I137594350"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Anja D\u00fcbotzky","raw_affiliation_strings":["Infineon Technolgies, Neubiberg, Germany"],"affiliations":[{"raw_affiliation_string":"Infineon Technolgies, Neubiberg, Germany","institution_ids":["https://openalex.org/I137594350"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5022061507","display_name":"Horst Gieser","orcid":"https://orcid.org/0000-0003-0838-024X"},"institutions":[{"id":"https://openalex.org/I4210128143","display_name":"Fraunhofer Research Institution for Microsystems and Solid State Technologies","ror":"https://ror.org/02hm5m482","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210128143","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Horst Gieser","raw_affiliation_strings":["Fraunhofer EMFT, M\u00fcnchen, Germany"],"affiliations":[{"raw_affiliation_string":"Fraunhofer EMFT, M\u00fcnchen, Germany","institution_ids":["https://openalex.org/I4210128143"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5012468684","display_name":"Martin Rasche","orcid":null},"institutions":[{"id":"https://openalex.org/I4210143647","display_name":"Raith (Germany)","ror":"https://ror.org/03yag1532","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210143647"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Martin Rasche","raw_affiliation_strings":["Raith GmbH, Dortmund, Germany"],"affiliations":[{"raw_affiliation_string":"Raith GmbH, Dortmund, Germany","institution_ids":["https://openalex.org/I4210143647"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5037854846","display_name":"Oliver Kellermann","orcid":null},"institutions":[{"id":"https://openalex.org/I4210143647","display_name":"Raith (Germany)","ror":"https://ror.org/03yag1532","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210143647"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Oliver Kellermann","raw_affiliation_strings":["Raith GmbH, Dortmund, Germany"],"affiliations":[{"raw_affiliation_string":"Raith GmbH, Dortmund, Germany","institution_ids":["https://openalex.org/I4210143647"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5033163680","display_name":"Helmut Graeb","orcid":"https://orcid.org/0000-0002-7626-1958"},"institutions":[{"id":"https://openalex.org/I62916508","display_name":"Technical University of Munich","ror":"https://ror.org/02kkvpp62","country_code":"DE","type":"education","lineage":["https://openalex.org/I62916508"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Helmut Graeb","raw_affiliation_strings":["Technische Universit\u00e4t M\u00fcnchen, M\u00fcnchen, Germany"],"affiliations":[{"raw_affiliation_string":"Technische Universit\u00e4t M\u00fcnchen, M\u00fcnchen, Germany","institution_ids":["https://openalex.org/I62916508"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":10,"corresponding_author_ids":["https://openalex.org/A5070384565"],"corresponding_institution_ids":["https://openalex.org/I137594350"],"apc_list":null,"apc_paid":null,"fwci":5.5377,"has_fulltext":false,"cited_by_count":33,"citation_normalized_percentile":{"value":0.96530133,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":94,"max":99},"biblio":{"volume":null,"issue":null,"first_page":"82","last_page":"89"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12122","display_name":"Physical Unclonable Functions (PUFs) and Hardware Security","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12122","display_name":"Physical Unclonable Functions (PUFs) and Hardware Security","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9975000023841858,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.988099992275238,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/reverse-engineering","display_name":"Reverse engineering","score":0.7670313119888306},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.692973792552948},{"id":"https://openalex.org/keywords/integrated-circuit-layout","display_name":"Integrated circuit layout","score":0.6196508407592773},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.600560188293457},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5799859762191772},{"id":"https://openalex.org/keywords/encryption","display_name":"Encryption","score":0.5076605081558228},{"id":"https://openalex.org/keywords/ic-layout-editor","display_name":"IC layout editor","score":0.5048073530197144},{"id":"https://openalex.org/keywords/design-flow","display_name":"Design flow","score":0.5033861994743347},{"id":"https://openalex.org/keywords/figure-of-merit","display_name":"Figure of merit","score":0.4752114713191986},{"id":"https://openalex.org/keywords/electronic-circuit","display_name":"Electronic circuit","score":0.4569573402404785},{"id":"https://openalex.org/keywords/computer-engineering","display_name":"Computer engineering","score":0.39547955989837646},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.33773529529571533},{"id":"https://openalex.org/keywords/circuit-extraction","display_name":"Circuit extraction","score":0.3365209698677063},{"id":"https://openalex.org/keywords/embedded-system","display_name":"Embedded system","score":0.23394230008125305},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.2252621352672577},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.1798444390296936},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.11005640029907227},{"id":"https://openalex.org/keywords/equivalent-circuit","display_name":"Equivalent circuit","score":0.08993223309516907}],"concepts":[{"id":"https://openalex.org/C207850805","wikidata":"https://www.wikidata.org/wiki/Q269608","display_name":"Reverse engineering","level":2,"score":0.7670313119888306},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.692973792552948},{"id":"https://openalex.org/C2765594","wikidata":"https://www.wikidata.org/wiki/Q2624187","display_name":"Integrated circuit layout","level":3,"score":0.6196508407592773},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.600560188293457},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5799859762191772},{"id":"https://openalex.org/C148730421","wikidata":"https://www.wikidata.org/wiki/Q141090","display_name":"Encryption","level":2,"score":0.5076605081558228},{"id":"https://openalex.org/C5546195","wikidata":"https://www.wikidata.org/wiki/Q5969842","display_name":"IC layout editor","level":5,"score":0.5048073530197144},{"id":"https://openalex.org/C37135326","wikidata":"https://www.wikidata.org/wiki/Q931942","display_name":"Design flow","level":2,"score":0.5033861994743347},{"id":"https://openalex.org/C130277099","wikidata":"https://www.wikidata.org/wiki/Q3676605","display_name":"Figure of merit","level":2,"score":0.4752114713191986},{"id":"https://openalex.org/C134146338","wikidata":"https://www.wikidata.org/wiki/Q1815901","display_name":"Electronic circuit","level":2,"score":0.4569573402404785},{"id":"https://openalex.org/C113775141","wikidata":"https://www.wikidata.org/wiki/Q428691","display_name":"Computer engineering","level":1,"score":0.39547955989837646},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.33773529529571533},{"id":"https://openalex.org/C26490066","wikidata":"https://www.wikidata.org/wiki/Q17006835","display_name":"Circuit extraction","level":4,"score":0.3365209698677063},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.23394230008125305},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2252621352672577},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.1798444390296936},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.11005640029907227},{"id":"https://openalex.org/C23572009","wikidata":"https://www.wikidata.org/wiki/Q964981","display_name":"Equivalent circuit","level":3,"score":0.08993223309516907},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1145/3287624.3288738","is_oa":false,"landing_page_url":"https://doi.org/10.1145/3287624.3288738","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 24th Asia and South Pacific Design Automation Conference","raw_type":"proceedings-article"},{"id":"pmh:oai:fraunhofer.de:N-531365","is_oa":false,"landing_page_url":"http://publica.fraunhofer.de/documents/N-531365.html","pdf_url":null,"source":{"id":"https://openalex.org/S4306400801","display_name":"Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Fraunhofer EMFT","raw_type":"conferenceObject"},{"id":"pmh:oai:publica.fraunhofer.de:publica/403351","is_oa":false,"landing_page_url":"https://publica.fraunhofer.de/handle/publica/403351","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"conference paper"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320330618","display_name":"Infineon Technologies","ror":"https://ror.org/005kw6t15"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":20,"referenced_works":["https://openalex.org/W1579357673","https://openalex.org/W1647166007","https://openalex.org/W2045818632","https://openalex.org/W2052790103","https://openalex.org/W2093081283","https://openalex.org/W2123594341","https://openalex.org/W2135335754","https://openalex.org/W2140904634","https://openalex.org/W2156413024","https://openalex.org/W2170195508","https://openalex.org/W2171447090","https://openalex.org/W2509189695","https://openalex.org/W2754667819","https://openalex.org/W2754972489","https://openalex.org/W2896697511","https://openalex.org/W2899303745","https://openalex.org/W4229643584","https://openalex.org/W4232950561","https://openalex.org/W4240941609","https://openalex.org/W4255004738"],"related_works":["https://openalex.org/W1873584906","https://openalex.org/W2091329789","https://openalex.org/W2595178692","https://openalex.org/W1605062719","https://openalex.org/W1565715208","https://openalex.org/W2376028644","https://openalex.org/W2044122268","https://openalex.org/W2583707817","https://openalex.org/W2048044560","https://openalex.org/W2102933388"],"abstract_inverted_index":{"In":[0],"view":[1],"of":[2,5,10,17,33,41,56,63,88,97],"potential":[3],"risks":[4],"piracy":[6],"and":[7,20,30,45,54,60,76,101],"malicious":[8],"manipulation":[9],"complex":[11],"integrated":[12],"circuits":[13],"built":[14],"in":[15,104],"technologies":[16],"45":[18],"nm":[19],"less,":[21],"there":[22],"is":[23],"an":[24,28,39,98],"increasing":[25],"need":[26],"for":[27,51],"effective":[29],"efficient":[31],"process":[32,44],"reverse":[34],"engineering.":[35],"This":[36],"paper":[37],"provides":[38],"overview":[40],"the":[42,52,61,67,70,73,77,102],"current":[43],"details":[46],"on":[47],"a":[48,64,86,94],"new":[49],"tool":[50],"acquisition":[53],"synthesis":[55],"large":[57],"area":[58],"images":[59],"extraction":[62],"layout.":[65],"For":[66],"first":[68],"time":[69],"error":[71],"between":[72],"generated":[74],"layout":[75,93],"known":[78],"drawn":[79],"GDS":[80],"will":[81,107],"be":[82,108],"compared":[83],"quantitatively":[84],"as":[85],"figure":[87],"merit":[89],"(FOM).":[90],"From":[91],"this":[92],"circuit":[95,105],"graph":[96],"ECC":[99],"encryption":[100],"partitioning":[103],"blocks":[106],"extracted.":[109]},"counts_by_year":[{"year":2025,"cited_by_count":4},{"year":2024,"cited_by_count":4},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":6},{"year":2021,"cited_by_count":9},{"year":2020,"cited_by_count":5},{"year":2019,"cited_by_count":3}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2019-01-25T00:00:00"}