{"id":"https://openalex.org/W2626813990","doi":"https://doi.org/10.1145/3061639.3062252","title":"Fogging Effect Aware Placement in Electron Beam Lithography","display_name":"Fogging Effect Aware Placement in Electron Beam Lithography","publication_year":2017,"publication_date":"2017-06-13","ids":{"openalex":"https://openalex.org/W2626813990","doi":"https://doi.org/10.1145/3061639.3062252","mag":"2626813990"},"language":"en","primary_location":{"id":"doi:10.1145/3061639.3062252","is_oa":false,"landing_page_url":"https://doi.org/10.1145/3061639.3062252","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 54th Annual Design Automation Conference 2017","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101530381","display_name":"Yu-Chen Huang","orcid":"https://orcid.org/0000-0003-2042-8760"},"institutions":[{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]}],"countries":["TW"],"is_corresponding":true,"raw_author_name":"Yu-Chen Huang","raw_affiliation_strings":["Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan"],"affiliations":[{"raw_affiliation_string":"Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan","institution_ids":["https://openalex.org/I16733864"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5018371636","display_name":"Yao\u2010Wen Chang","orcid":"https://orcid.org/0000-0002-0564-5719"},"institutions":[{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Yao-Wen Chang","raw_affiliation_strings":["Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan and Department of Electrical Engineering, National Taiwan University, Taipei, Taiwan"],"affiliations":[{"raw_affiliation_string":"Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan and Department of Electrical Engineering, National Taiwan University, Taipei, Taiwan","institution_ids":["https://openalex.org/I16733864"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5101530381"],"corresponding_institution_ids":["https://openalex.org/I16733864"],"apc_list":null,"apc_paid":null,"fwci":0.8601,"has_fulltext":false,"cited_by_count":10,"citation_normalized_percentile":{"value":0.75384332,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":98},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"6"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","score":0.9980999827384949,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/fogging","display_name":"Fogging","score":0.7800260782241821},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"Electron-beam lithography","score":0.7531905174255371},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6756042838096619},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.5588252544403076},{"id":"https://openalex.org/keywords/electron","display_name":"Electron","score":0.5117268562316895},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5071408748626709},{"id":"https://openalex.org/keywords/cathode-ray","display_name":"Cathode ray","score":0.48765575885772705},{"id":"https://openalex.org/keywords/x-ray-lithography","display_name":"X-ray lithography","score":0.4562966823577881},{"id":"https://openalex.org/keywords/next-generation-lithography","display_name":"Next-generation lithography","score":0.4458332359790802},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.4395711421966553},{"id":"https://openalex.org/keywords/stencil-lithography","display_name":"Stencil lithography","score":0.41350167989730835},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.38577932119369507},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.36108046770095825},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.24845030903816223},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.2424824833869934},{"id":"https://openalex.org/keywords/nuclear-physics","display_name":"Nuclear physics","score":0.0576777458190918}],"concepts":[{"id":"https://openalex.org/C2781290227","wikidata":"https://www.wikidata.org/wiki/Q4128218","display_name":"Fogging","level":2,"score":0.7800260782241821},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.7531905174255371},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6756042838096619},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.5588252544403076},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.5117268562316895},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5071408748626709},{"id":"https://openalex.org/C95312477","wikidata":"https://www.wikidata.org/wiki/Q207340","display_name":"Cathode ray","level":3,"score":0.48765575885772705},{"id":"https://openalex.org/C41794268","wikidata":"https://www.wikidata.org/wiki/Q1408939","display_name":"X-ray lithography","level":4,"score":0.4562966823577881},{"id":"https://openalex.org/C163581340","wikidata":"https://www.wikidata.org/wiki/Q1983848","display_name":"Next-generation lithography","level":5,"score":0.4458332359790802},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4395711421966553},{"id":"https://openalex.org/C70520399","wikidata":"https://www.wikidata.org/wiki/Q7607503","display_name":"Stencil lithography","level":5,"score":0.41350167989730835},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.38577932119369507},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.36108046770095825},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.24845030903816223},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2424824833869934},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0576777458190918},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1145/3061639.3062252","is_oa":false,"landing_page_url":"https://doi.org/10.1145/3061639.3062252","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 54th Annual Design Automation Conference 2017","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Peace, Justice and strong institutions","score":0.75,"id":"https://metadata.un.org/sdg/16"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":21,"referenced_works":["https://openalex.org/W1875476014","https://openalex.org/W1967661769","https://openalex.org/W1974270634","https://openalex.org/W2004122330","https://openalex.org/W2013950544","https://openalex.org/W2020461489","https://openalex.org/W2028632259","https://openalex.org/W2029768678","https://openalex.org/W2036843270","https://openalex.org/W2038381909","https://openalex.org/W2041941568","https://openalex.org/W2063642376","https://openalex.org/W2065707669","https://openalex.org/W2067383773","https://openalex.org/W2084236713","https://openalex.org/W2114871550","https://openalex.org/W2129216969","https://openalex.org/W2142729647","https://openalex.org/W2160431995","https://openalex.org/W2161629461","https://openalex.org/W3016692616"],"related_works":["https://openalex.org/W806091262","https://openalex.org/W2516408400","https://openalex.org/W2135099569","https://openalex.org/W4390650236","https://openalex.org/W1974232383","https://openalex.org/W2068910694","https://openalex.org/W2050029673","https://openalex.org/W2248828965","https://openalex.org/W2011415744","https://openalex.org/W1755784680"],"abstract_inverted_index":{"Modern":[0],"electron":[1],"beam":[2],"lithography":[3],"(EBL)":[4],"suffers":[5],"from":[6],"the":[7,26,32,55,62,72,87,122,148,155,172,188],"long-range":[8],"fogging":[9,33,50,56,109,123,177,189],"effect":[10,51,63,124,156],"which":[11,146],"incurs":[12],"undesired":[13],"excessive":[14],"exposure":[15],"and":[16,60,112,151,166],"thus":[17,61],"layout":[18],"pattern":[19],"distortions.":[20],"In":[21],"this":[22],"paper,":[23],"we":[24],"propose":[25],"first":[27],"placement":[28,168,173],"algorithm":[29,184],"to":[30,39,53,85,120,169],"tackle":[31],"effect.":[34,88],"The":[35,129],"underlying":[36],"idea":[37],"is":[38],"place":[40],"standard":[41],"cells,":[42],"guided":[43],"by":[44,67,125,191],"our":[45,183],"efficient,":[46,116],"yet":[47],"reasonably":[48],"accurate":[49,117],"model":[52,111],"minimize":[54],"variation":[57,152,190],"during":[58,157],"placement,":[59],"can":[64,185],"be":[65],"corrected":[66],"reducing":[68],"dosage":[69],"uniformly":[70],"over":[71,95,135],"chip.":[73],"We":[74,106,161],"use":[75],"fast":[76,126],"Gauss":[77,127],"transform":[78],"with":[79,99,139],"Hermite":[80],"expansion":[81],"for":[82],"convolution":[83,97,137],"approximation":[84,90],"estimate":[86,121],"This":[89],"achieves":[91,131],"a":[92,108,132],"26.5X":[93],"speedup":[94,134],"traditional":[96,136],"computation,":[98,138],"only":[100,140],"about":[101,141],"0.33%":[102],"absolute":[103,143],"average":[104,144],"errors.":[105],"derive":[107],"source":[110],"further":[113,170],"develop":[114,163],"an":[115],"evaluation":[118,150],"scheme":[119,130],"transform.":[128],"30.2X":[133],"2.35%":[142],"errors,":[145],"enables":[147],"iterative":[149],"minimization":[153],"of":[154],"analytical":[158],"global":[159],"placement.":[160],"also":[162],"fogging-aware":[164],"legalization":[165],"detailed":[167],"optimize":[171],"quality,":[174,197],"while":[175,193],"maintaining":[176,194],"variation.":[178],"Experimental":[179],"results":[180],"show":[181],"that":[182],"effectively":[186],"reduce":[187],"15.5%,":[192],"high":[195],"wirelength":[196],"at":[198],"reasonable":[199],"runtime.":[200]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2018,"cited_by_count":5}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}