{"id":"https://openalex.org/W2604371324","doi":"https://doi.org/10.1145/3036669.3036673","title":"Bilinear Lithography Hotspot Detection","display_name":"Bilinear Lithography Hotspot Detection","publication_year":2017,"publication_date":"2017-03-15","ids":{"openalex":"https://openalex.org/W2604371324","doi":"https://doi.org/10.1145/3036669.3036673","mag":"2604371324"},"language":"en","primary_location":{"id":"doi:10.1145/3036669.3036673","is_oa":false,"landing_page_url":"https://doi.org/10.1145/3036669.3036673","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 2017 ACM on International Symposium on Physical Design","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100438471","display_name":"Hang Zhang","orcid":"https://orcid.org/0000-0003-0115-387X"},"institutions":[{"id":"https://openalex.org/I177725633","display_name":"Chinese University of Hong Kong","ror":"https://ror.org/00t33hh48","country_code":"CN","type":"education","lineage":["https://openalex.org/I177725633"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Hang Zhang","raw_affiliation_strings":["The Chinese University of Hong Kong, Hong Kong, Hong Kong"],"affiliations":[{"raw_affiliation_string":"The Chinese University of Hong Kong, Hong Kong, Hong Kong","institution_ids":["https://openalex.org/I177725633"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101843538","display_name":"Fengyuan Zhu","orcid":"https://orcid.org/0000-0003-4507-0689"},"institutions":[{"id":"https://openalex.org/I177725633","display_name":"Chinese University of Hong Kong","ror":"https://ror.org/00t33hh48","country_code":"CN","type":"education","lineage":["https://openalex.org/I177725633"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Fengyuan Zhu","raw_affiliation_strings":["The Chinese University of Hong Kong, Hong Kong, Hong Kong"],"affiliations":[{"raw_affiliation_string":"The Chinese University of Hong Kong, Hong Kong, Hong Kong","institution_ids":["https://openalex.org/I177725633"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101715115","display_name":"Haocheng Li","orcid":"https://orcid.org/0000-0002-3254-3259"},"institutions":[{"id":"https://openalex.org/I177725633","display_name":"Chinese University of Hong Kong","ror":"https://ror.org/00t33hh48","country_code":"CN","type":"education","lineage":["https://openalex.org/I177725633"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Haocheng Li","raw_affiliation_strings":["The Chinese University of Hong Kong, Hong Kong, Hong Kong"],"affiliations":[{"raw_affiliation_string":"The Chinese University of Hong Kong, Hong Kong, Hong Kong","institution_ids":["https://openalex.org/I177725633"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070795253","display_name":"Evangeline F. Y. Young","orcid":"https://orcid.org/0000-0003-0623-1590"},"institutions":[{"id":"https://openalex.org/I177725633","display_name":"Chinese University of Hong Kong","ror":"https://ror.org/00t33hh48","country_code":"CN","type":"education","lineage":["https://openalex.org/I177725633"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Evangeline F.Y. Young","raw_affiliation_strings":["The Chinese University of Hong Kong, Hong Kong, Hong Kong"],"affiliations":[{"raw_affiliation_string":"The Chinese University of Hong Kong, Hong Kong, Hong Kong","institution_ids":["https://openalex.org/I177725633"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5051340429","display_name":"Bei Yu","orcid":"https://orcid.org/0000-0001-6406-4810"},"institutions":[{"id":"https://openalex.org/I177725633","display_name":"Chinese University of Hong Kong","ror":"https://ror.org/00t33hh48","country_code":"CN","type":"education","lineage":["https://openalex.org/I177725633"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Bei Yu","raw_affiliation_strings":["The Chinese University of Hong Kong, Hong Kong, Hong Kong"],"affiliations":[{"raw_affiliation_string":"The Chinese University of Hong Kong, Hong Kong, Hong Kong","institution_ids":["https://openalex.org/I177725633"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":5,"corresponding_author_ids":["https://openalex.org/A5100438471"],"corresponding_institution_ids":["https://openalex.org/I177725633"],"apc_list":null,"apc_paid":null,"fwci":4.6388,"has_fulltext":false,"cited_by_count":22,"citation_normalized_percentile":{"value":0.94752962,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":99},"biblio":{"volume":null,"issue":null,"first_page":"7","last_page":"14"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9987000226974487,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9987000226974487,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9975000023841858,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12357","display_name":"Digital Media Forensic Detection","score":0.9962999820709229,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.7704082727432251},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6560927629470825},{"id":"https://openalex.org/keywords/bilinear-interpolation","display_name":"Bilinear interpolation","score":0.6087796688079834},{"id":"https://openalex.org/keywords/feature-extraction","display_name":"Feature extraction","score":0.5734297633171082},{"id":"https://openalex.org/keywords/hotspot","display_name":"Hotspot (geology)","score":0.5681020617485046},{"id":"https://openalex.org/keywords/pattern-recognition","display_name":"Pattern recognition (psychology)","score":0.4853190779685974},{"id":"https://openalex.org/keywords/interference-lithography","display_name":"Interference lithography","score":0.4375308156013489},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"Optical proximity correction","score":0.42165881395339966},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.4175335466861725},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.3657922148704529},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.21484938263893127},{"id":"https://openalex.org/keywords/computer-vision","display_name":"Computer vision","score":0.20380562543869019},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.1542453169822693},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.15307876467704773}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7704082727432251},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6560927629470825},{"id":"https://openalex.org/C205203396","wikidata":"https://www.wikidata.org/wiki/Q612143","display_name":"Bilinear interpolation","level":2,"score":0.6087796688079834},{"id":"https://openalex.org/C52622490","wikidata":"https://www.wikidata.org/wiki/Q1026626","display_name":"Feature extraction","level":2,"score":0.5734297633171082},{"id":"https://openalex.org/C146481406","wikidata":"https://www.wikidata.org/wiki/Q105131","display_name":"Hotspot (geology)","level":2,"score":0.5681020617485046},{"id":"https://openalex.org/C153180895","wikidata":"https://www.wikidata.org/wiki/Q7148389","display_name":"Pattern recognition (psychology)","level":2,"score":0.4853190779685974},{"id":"https://openalex.org/C159395582","wikidata":"https://www.wikidata.org/wiki/Q6046394","display_name":"Interference lithography","level":4,"score":0.4375308156013489},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.42165881395339966},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.4175335466861725},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.3657922148704529},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.21484938263893127},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.20380562543869019},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.1542453169822693},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.15307876467704773},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C8058405","wikidata":"https://www.wikidata.org/wiki/Q46255","display_name":"Geophysics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1145/3036669.3036673","is_oa":false,"landing_page_url":"https://doi.org/10.1145/3036669.3036673","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 2017 ACM on International Symposium on Physical Design","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":41,"referenced_works":["https://openalex.org/W398859631","https://openalex.org/W1549656520","https://openalex.org/W1560724230","https://openalex.org/W1565096114","https://openalex.org/W1964357740","https://openalex.org/W1981627777","https://openalex.org/W1999879018","https://openalex.org/W2008176598","https://openalex.org/W2024046085","https://openalex.org/W2037552354","https://openalex.org/W2055299283","https://openalex.org/W2057596653","https://openalex.org/W2068961782","https://openalex.org/W2075880753","https://openalex.org/W2076261573","https://openalex.org/W2089689336","https://openalex.org/W2092970276","https://openalex.org/W2100495367","https://openalex.org/W2102773410","https://openalex.org/W2105880865","https://openalex.org/W2117532720","https://openalex.org/W2131676429","https://openalex.org/W2132380474","https://openalex.org/W2140586694","https://openalex.org/W2146918190","https://openalex.org/W2150382423","https://openalex.org/W2163198669","https://openalex.org/W2164278908","https://openalex.org/W2164641162","https://openalex.org/W2302532728","https://openalex.org/W2505029951","https://openalex.org/W2538780316","https://openalex.org/W2597289420","https://openalex.org/W2963917643","https://openalex.org/W4236601256","https://openalex.org/W4240153047","https://openalex.org/W4292363360","https://openalex.org/W6607311024","https://openalex.org/W6675992320","https://openalex.org/W6679490728","https://openalex.org/W7058071925"],"related_works":["https://openalex.org/W2134420999","https://openalex.org/W2802459864","https://openalex.org/W4306406015","https://openalex.org/W2125031708","https://openalex.org/W2058948105","https://openalex.org/W2088068989","https://openalex.org/W1976544989","https://openalex.org/W3143665566","https://openalex.org/W1987855151","https://openalex.org/W2138070010"],"abstract_inverted_index":{"Advanced":[0],"semiconductor":[1],"process":[2],"technologies":[3],"are":[4,21,27],"producing":[5],"various":[6,45],"circuit":[7],"layout":[8],"patterns,":[9],"and":[10,16,33,146],"it":[11],"is":[12],"essential":[13],"to":[14,30,99,118],"detect":[15],"eliminate":[17],"problematic":[18],"ones,":[19],"which":[20,35,110],"called":[22],"lithography":[23,107,126],"hotspots.":[24],"These":[25],"hotspots":[26],"formed":[28],"due":[29],"light":[31],"diffraction":[32],"interference,":[34],"induces":[36],"complex":[37],"intrinsic":[38,62,93],"structures":[39],"within":[40],"the":[41,61,92,120,125,132],"formation":[42],"process.":[43,127],"Though":[44],"machine":[46],"learning":[47],"based":[48],"methods":[49],"have":[50],"been":[51],"proposed":[52,133],"for":[53],"this":[54,68,87],"problem,":[55],"most":[56],"of":[57,64,95],"them":[58],"cannot":[59],"capture":[60],"structure":[63],"each":[65,78,96],"data.":[66],"In":[67],"paper,":[69],"we":[70],"propose":[71,104],"a":[72,105],"novel":[73],"feature":[74,94],"extraction":[75],"by":[76],"representing":[77],"data":[79,113],"sample":[80],"in":[81,114,124,142],"matrix":[82,115],"form.":[83],"We":[84],"argue":[85],"that":[86,131],"method":[88,134],"can":[89,111],"well":[90],"preserve":[91,119],"sample,":[97],"leading":[98],"better":[100],"performance.We":[101],"then":[102],"further":[103],"bilinear":[106],"hotspot":[108],"detector,":[109],"tackle":[112],"form":[116],"directly":[117],"hidden":[121],"structural":[122],"correlations":[123],"Experimental":[128],"results":[129],"show":[130],"outperforms":[135],"state-of-the-art":[136],"ones":[137],"with":[138,148],"remarkably":[139],"large":[140],"margin":[141],"both":[143],"false":[144],"alarms":[145],"runtime,":[147],"98.16%":[149],"detection":[150],"accuracy.":[151]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":3},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":3},{"year":2019,"cited_by_count":8},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":2}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}