{"id":"https://openalex.org/W2327754145","doi":"https://doi.org/10.1145/2872334.2872352","title":"Concurrent Guiding Template Assignment and Redundant via Insertion for DSA-MP Hybrid Lithography","display_name":"Concurrent Guiding Template Assignment and Redundant via Insertion for DSA-MP Hybrid Lithography","publication_year":2016,"publication_date":"2016-04-01","ids":{"openalex":"https://openalex.org/W2327754145","doi":"https://doi.org/10.1145/2872334.2872352","mag":"2327754145"},"language":"en","primary_location":{"id":"doi:10.1145/2872334.2872352","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2872334.2872352","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 2016 on International Symposium on Physical Design","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5063642243","display_name":"Jiaojiao Ou","orcid":null},"institutions":[{"id":"https://openalex.org/I86519309","display_name":"The University of Texas at Austin","ror":"https://ror.org/00hj54h04","country_code":"US","type":"education","lineage":["https://openalex.org/I86519309"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Jiaojiao Ou","raw_affiliation_strings":["ECE Department, Univ. of Texas at Austin, Austin, TX, USA"],"affiliations":[{"raw_affiliation_string":"ECE Department, Univ. of Texas at Austin, Austin, TX, USA","institution_ids":["https://openalex.org/I86519309"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051340429","display_name":"Bei Yu","orcid":"https://orcid.org/0000-0001-6406-4810"},"institutions":[{"id":"https://openalex.org/I177725633","display_name":"Chinese University of Hong Kong","ror":"https://ror.org/00t33hh48","country_code":"CN","type":"education","lineage":["https://openalex.org/I177725633"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Bei Yu","raw_affiliation_strings":["CSE Department Chinese Univ. of Hong Kong, Hong Kong, China"],"affiliations":[{"raw_affiliation_string":"CSE Department Chinese Univ. of Hong Kong, Hong Kong, China","institution_ids":["https://openalex.org/I177725633"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5011883763","display_name":"David Z. Pan","orcid":"https://orcid.org/0000-0002-5705-2501"},"institutions":[{"id":"https://openalex.org/I86519309","display_name":"The University of Texas at Austin","ror":"https://ror.org/00hj54h04","country_code":"US","type":"education","lineage":["https://openalex.org/I86519309"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"David Z. Pan","raw_affiliation_strings":["ECE Department, Univ. of Texas at Austin, Austin, TX, USA"],"affiliations":[{"raw_affiliation_string":"ECE Department, Univ. of Texas at Austin, Austin, TX, USA","institution_ids":["https://openalex.org/I86519309"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5063642243"],"corresponding_institution_ids":["https://openalex.org/I86519309"],"apc_list":null,"apc_paid":null,"fwci":3.859,"has_fulltext":false,"cited_by_count":21,"citation_normalized_percentile":{"value":0.9370391,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":90,"max":100},"biblio":{"volume":"8323","issue":null,"first_page":"39","last_page":"46"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9983000159263611,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9944000244140625,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.7448008060455322},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6863248348236084},{"id":"https://openalex.org/keywords/integer-programming","display_name":"Integer programming","score":0.5717990398406982},{"id":"https://openalex.org/keywords/insertion-loss","display_name":"Insertion loss","score":0.566210150718689},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.4691143333911896},{"id":"https://openalex.org/keywords/reliability","display_name":"Reliability (semiconductor)","score":0.4221782088279724},{"id":"https://openalex.org/keywords/next-generation-lithography","display_name":"Next-generation lithography","score":0.4195566773414612},{"id":"https://openalex.org/keywords/parallel-computing","display_name":"Parallel computing","score":0.3975007236003876},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.3537054657936096},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"Electron-beam lithography","score":0.1796574592590332},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.16585534811019897},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.15702471137046814},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.14206025004386902},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.13085651397705078},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.09868770837783813},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.09255218505859375}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7448008060455322},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6863248348236084},{"id":"https://openalex.org/C56086750","wikidata":"https://www.wikidata.org/wiki/Q6042592","display_name":"Integer programming","level":2,"score":0.5717990398406982},{"id":"https://openalex.org/C90327742","wikidata":"https://www.wikidata.org/wiki/Q947396","display_name":"Insertion loss","level":2,"score":0.566210150718689},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4691143333911896},{"id":"https://openalex.org/C43214815","wikidata":"https://www.wikidata.org/wiki/Q7310987","display_name":"Reliability (semiconductor)","level":3,"score":0.4221782088279724},{"id":"https://openalex.org/C163581340","wikidata":"https://www.wikidata.org/wiki/Q1983848","display_name":"Next-generation lithography","level":5,"score":0.4195566773414612},{"id":"https://openalex.org/C173608175","wikidata":"https://www.wikidata.org/wiki/Q232661","display_name":"Parallel computing","level":1,"score":0.3975007236003876},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.3537054657936096},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.1796574592590332},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.16585534811019897},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.15702471137046814},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.14206025004386902},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.13085651397705078},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.09868770837783813},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.09255218505859375},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C163258240","wikidata":"https://www.wikidata.org/wiki/Q25342","display_name":"Power (physics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1145/2872334.2872352","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2872334.2872352","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 2016 on International Symposium on Physical Design","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/9","score":0.4000000059604645,"display_name":"Industry, innovation and infrastructure"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":27,"referenced_works":["https://openalex.org/W7671684","https://openalex.org/W1913994609","https://openalex.org/W1964377386","https://openalex.org/W1976143853","https://openalex.org/W1992342771","https://openalex.org/W1993999542","https://openalex.org/W1995865561","https://openalex.org/W1996145581","https://openalex.org/W2003427112","https://openalex.org/W2008074787","https://openalex.org/W2020343777","https://openalex.org/W2034249953","https://openalex.org/W2050442553","https://openalex.org/W2061083860","https://openalex.org/W2068165923","https://openalex.org/W2069569817","https://openalex.org/W2075614116","https://openalex.org/W2083274833","https://openalex.org/W2091842838","https://openalex.org/W2138558692","https://openalex.org/W2139653724","https://openalex.org/W2154881556","https://openalex.org/W2168578526","https://openalex.org/W2997651386","https://openalex.org/W4248126276","https://openalex.org/W6649487752","https://openalex.org/W6680789846"],"related_works":["https://openalex.org/W2363991779","https://openalex.org/W2115795789","https://openalex.org/W2379570117","https://openalex.org/W1946880670","https://openalex.org/W2028711229","https://openalex.org/W69224963","https://openalex.org/W2503993276","https://openalex.org/W2025251804","https://openalex.org/W2541440459","https://openalex.org/W2122563195"],"abstract_inverted_index":{"Directed":[0],"Self-Assembly":[1],"(DSA)":[2],"is":[3,37,132],"a":[4,14,69,106],"very":[5],"promising":[6],"emerging":[7],"lithography":[8,22],"for":[9,34,72,145],"7nm":[10],"and":[11,59,78,103,114,141],"beyond,":[12],"where":[13],"coarse":[15],"guiding":[16,39,75,89,138],"template":[17,40,76,90,139],"produced":[18],"by":[19],"conventional":[20],"optical":[21],"can":[23],"\"magically\"":[24],"generate":[25],"fine-pitch":[26],"vias/contacts":[27],"through":[28],"self-assembly":[29],"process.":[30],"A":[31],"key":[32],"challenge":[33],"DSA-friendly":[35],"layout":[36],"the":[38,62,95,121,124,133],"assignment":[41,77,140],"to":[42,56,110],"cover":[43],"all":[44],"vias":[45],"under":[46],"consideration.":[47],"Meanwhile,":[48],"redundant":[49,79,142],"via":[50,80,143],"insertion":[51,81,144],"has":[52],"been":[53],"widely":[54],"adopted":[55],"improve":[57],"yield":[58],"reliability":[60],"of":[61,84,123],"circuit.":[63],"In":[64],"this":[65,131],"paper,":[66],"we":[67],"propose":[68,105],"comprehensive":[70],"framework":[71],"concurrent":[73,137],"DSA":[74],"with":[82],"consideration":[83],"multiple":[85],"patterning":[86],"(MP)":[87],"in":[88,136],"generation.":[91],"We":[92],"first":[93,134],"formulate":[94],"problem":[96],"as":[97],"an":[98],"integer":[99],"linear":[100],"programming":[101],"(ILP),":[102],"then":[104],"novel":[107],"approximation":[108],"algorithm":[109],"achieve":[111],"good":[112],"performance":[113],"runtime":[115],"trade-off.":[116],"The":[117],"experimental":[118],"results":[119],"demonstrate":[120],"effectiveness":[122],"proposed":[125],"algorithms.":[126],"To":[127],"our":[128],"best":[129],"knowledge,":[130],"work":[135],"DSA-MP":[146],"hybrid":[147],"lithography.":[148]},"counts_by_year":[{"year":2019,"cited_by_count":4},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":14},{"year":2016,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}