{"id":"https://openalex.org/W1990330574","doi":"https://doi.org/10.1145/2451916.2451938","title":"Simultaneous OPC- and CMP-aware routing based on accurate closed-form modeling","display_name":"Simultaneous OPC- and CMP-aware routing based on accurate closed-form modeling","publication_year":2013,"publication_date":"2013-03-24","ids":{"openalex":"https://openalex.org/W1990330574","doi":"https://doi.org/10.1145/2451916.2451938","mag":"1990330574"},"language":"en","primary_location":{"id":"doi:10.1145/2451916.2451938","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2451916.2451938","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 2013 ACM International symposium on Physical Design","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5065439030","display_name":"Shao\u2010Yun Fang","orcid":"https://orcid.org/0000-0001-6675-2676"},"institutions":[{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]}],"countries":["TW"],"is_corresponding":true,"raw_author_name":"Shao-Yun Fang","raw_affiliation_strings":["National Taiwan University, Taipei, Taiwan Roc","National Taiwan University, Taipei, Taiwan, ROC"],"affiliations":[{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan Roc","institution_ids":["https://openalex.org/I16733864"]},{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan, ROC","institution_ids":["https://openalex.org/I16733864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080854858","display_name":"Chung\u2010Wei Lin","orcid":"https://orcid.org/0000-0001-8309-7028"},"institutions":[{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Chung-Wei Lin","raw_affiliation_strings":["National Taiwan University, Taipei, Taiwan Roc","National Taiwan University, Taipei, Taiwan, ROC"],"affiliations":[{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan Roc","institution_ids":["https://openalex.org/I16733864"]},{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan, ROC","institution_ids":["https://openalex.org/I16733864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019937333","display_name":"Guang-Wan Liao","orcid":"https://orcid.org/0009-0003-3587-9246"},"institutions":[{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Guang-Wan Liao","raw_affiliation_strings":["National Taiwan University, Taipei, Taiwan Roc","National Taiwan University, Taipei, Taiwan, ROC"],"affiliations":[{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan Roc","institution_ids":["https://openalex.org/I16733864"]},{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan, ROC","institution_ids":["https://openalex.org/I16733864"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5018371636","display_name":"Yao\u2010Wen Chang","orcid":"https://orcid.org/0000-0002-0564-5719"},"institutions":[{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Yao-Wen Chang","raw_affiliation_strings":["National Taiwan University, Taipei, Taiwan Roc","National Taiwan University, Taipei, Taiwan, ROC"],"affiliations":[{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan Roc","institution_ids":["https://openalex.org/I16733864"]},{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan, ROC","institution_ids":["https://openalex.org/I16733864"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5065439030"],"corresponding_institution_ids":["https://openalex.org/I16733864"],"apc_list":null,"apc_paid":null,"fwci":0.20656357,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.58754858,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"77","last_page":"84"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.9966999888420105,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/chemical-mechanical-planarization","display_name":"Chemical-mechanical planarization","score":0.8625504374504089},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"Optical proximity correction","score":0.8013087511062622},{"id":"https://openalex.org/keywords/router","display_name":"Router","score":0.7521566152572632},{"id":"https://openalex.org/keywords/routing","display_name":"Routing (electronic design automation)","score":0.6229291558265686},{"id":"https://openalex.org/keywords/interconnection","display_name":"Interconnection","score":0.58985435962677},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5495622158050537},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.5449674129486084},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.43475186824798584},{"id":"https://openalex.org/keywords/photolithography","display_name":"Photolithography","score":0.41165751218795776},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.39061135053634644},{"id":"https://openalex.org/keywords/polishing","display_name":"Polishing","score":0.34228700399398804},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.3130154311656952},{"id":"https://openalex.org/keywords/embedded-system","display_name":"Embedded system","score":0.2932273745536804},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.18343958258628845},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.11663356423377991},{"id":"https://openalex.org/keywords/computer-network","display_name":"Computer network","score":0.10538563132286072}],"concepts":[{"id":"https://openalex.org/C180088628","wikidata":"https://www.wikidata.org/wiki/Q1069404","display_name":"Chemical-mechanical planarization","level":3,"score":0.8625504374504089},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.8013087511062622},{"id":"https://openalex.org/C2775896111","wikidata":"https://www.wikidata.org/wiki/Q642560","display_name":"Router","level":2,"score":0.7521566152572632},{"id":"https://openalex.org/C74172769","wikidata":"https://www.wikidata.org/wiki/Q1446839","display_name":"Routing (electronic design automation)","level":2,"score":0.6229291558265686},{"id":"https://openalex.org/C123745756","wikidata":"https://www.wikidata.org/wiki/Q1665949","display_name":"Interconnection","level":2,"score":0.58985435962677},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5495622158050537},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5449674129486084},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.43475186824798584},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.41165751218795776},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.39061135053634644},{"id":"https://openalex.org/C138113353","wikidata":"https://www.wikidata.org/wiki/Q611639","display_name":"Polishing","level":2,"score":0.34228700399398804},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3130154311656952},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.2932273745536804},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.18343958258628845},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.11663356423377991},{"id":"https://openalex.org/C31258907","wikidata":"https://www.wikidata.org/wiki/Q1301371","display_name":"Computer network","level":1,"score":0.10538563132286072},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1145/2451916.2451938","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2451916.2451938","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 2013 ACM International symposium on Physical Design","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9","score":0.6200000047683716}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":14,"referenced_works":["https://openalex.org/W565218912","https://openalex.org/W1975628451","https://openalex.org/W2002428239","https://openalex.org/W2016999260","https://openalex.org/W2096890327","https://openalex.org/W2103241566","https://openalex.org/W2105474957","https://openalex.org/W2113335196","https://openalex.org/W2115092649","https://openalex.org/W2120447706","https://openalex.org/W2157910601","https://openalex.org/W2168114925","https://openalex.org/W2170088633","https://openalex.org/W2535372780"],"related_works":["https://openalex.org/W2378882722","https://openalex.org/W1983603153","https://openalex.org/W1987381242","https://openalex.org/W2555128348","https://openalex.org/W4281622355","https://openalex.org/W1769680814","https://openalex.org/W2050580654","https://openalex.org/W1973071557","https://openalex.org/W1933867914","https://openalex.org/W1517244022"],"abstract_inverted_index":{"As":[0],"the":[1,6,14,26,34,38,52,59,65,72,120,125,132,141,151,166,174,184,199],"process":[2,42],"technology":[3],"advances":[4],"to":[5,130],"nanometer":[7],"nodes,":[8],"Optical":[9],"Proximity":[10],"Correction":[11],"(OPC)":[12],"is":[13],"most":[15],"popular":[16],"Resolution-Enhancement":[17],"Technique":[18],"(RET)":[19],"in":[20,165,198],"industry":[21],"for":[22,48,96,111,219],"subwavelength":[23],"lithography,":[24],"and":[25,54,67,80,100,114,122,137,162,168,195,202,212],"inter-level":[27],"dielectric":[28],"(ILD)":[29],"thickness":[30,68,201,203],"variation":[31],"caused":[32],"by":[33],"planarization":[35],"step":[36],"of":[37,77,134],"Chemical-Mechanical":[39],"Polishing":[40],"(CMP)":[41],"also":[43],"plays":[44],"a":[45,108,216],"key":[46],"role":[47],"interconnect":[49],"yield.":[50],"Considering":[51],"OPC":[53,113,121],"CMP":[55,81,115,123],"effects":[56,133],"simultaneously":[57],"during":[58,117],"routing":[60,102],"stage":[61],"can":[62,127,158,191],"significantly":[63],"alleviate":[64],"width":[66,98],"variations":[69],"(and":[70],"thus":[71],"whole":[73],"3D":[74],"geometry":[75],"variations)":[76],"post-layout":[78,112],"RET":[79],"operations.":[82],"In":[83],"this":[84],"paper,":[85],"we":[86],"first":[87],"present":[88],"an":[89],"efficient,":[90],"yet":[91],"sufficiently":[92],"accurate":[93],"closed-form":[94],"formula":[95,106],"printed":[97],"computation":[99],"dummy-insertion-aware":[101],"cost":[103,109],"derivation.":[104],"The":[105],"provides":[107],"modeling":[110],"optimization":[116],"routing.":[118],"Incorporating":[119],"costs,":[124],"router":[126,214],"be":[128],"guided":[129],"optimize":[131],"layout":[135,170,220],"correction":[136],"planarization.":[138],"Compared":[139,172],"with":[140,173],"state-of-the-art":[142,175],"OPC-friendly":[143],"router,":[144,177],"QL-MGR":[145],"(which":[146,179],"does":[147,180],"not":[148,181],"consider":[149,182],"CMP),":[150],"experimental":[152,185],"results":[153,186,206],"show":[154,187],"that":[155,188,208],"our":[156,189,209],"approach":[157,190],"achieve":[159,192],"respective":[160,193],"19%":[161,194],"6%":[163],"reductions":[164,197],"maximum":[167],"average":[169],"distortions.":[171],"CMP-aware":[176,213],"TTR":[178],"OPC),":[183],"25%":[196],"peak-to-peak":[200],"variance.":[204],"These":[205],"indicate":[207],"simultaneous":[210],"OPC-":[211],"contributes":[215],"significant":[217],"improvement":[218],"integrity.":[221]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":2},{"year":2016,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}