{"id":"https://openalex.org/W2172169799","doi":"https://doi.org/10.1145/2228360.2228579","title":"A novel layout decomposition algorithm for triple patterning lithography","display_name":"A novel layout decomposition algorithm for triple patterning lithography","publication_year":2012,"publication_date":"2012-05-31","ids":{"openalex":"https://openalex.org/W2172169799","doi":"https://doi.org/10.1145/2228360.2228579","mag":"2172169799"},"language":"en","primary_location":{"id":"doi:10.1145/2228360.2228579","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2228360.2228579","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 49th Annual Design Automation Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5065439030","display_name":"Shao\u2010Yun Fang","orcid":"https://orcid.org/0000-0001-6675-2676"},"institutions":[{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]}],"countries":["TW"],"is_corresponding":true,"raw_author_name":"Shao-Yun Fang","raw_affiliation_strings":["National Taiwan University, Taipei, Taiwan"],"affiliations":[{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan","institution_ids":["https://openalex.org/I16733864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018371636","display_name":"Yao\u2010Wen Chang","orcid":"https://orcid.org/0000-0002-0564-5719"},"institutions":[{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Yao-Wen Chang","raw_affiliation_strings":["National Taiwan University, Taipei, Taiwan"],"affiliations":[{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan","institution_ids":["https://openalex.org/I16733864"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5082568073","display_name":"Wei\u2010Yu Chen","orcid":"https://orcid.org/0000-0001-6975-1759"},"institutions":[{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Wei-Yu Chen","raw_affiliation_strings":["National Taiwan University, Taipei, Taiwan"],"affiliations":[{"raw_affiliation_string":"National Taiwan University, Taipei, Taiwan","institution_ids":["https://openalex.org/I16733864"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5065439030"],"corresponding_institution_ids":["https://openalex.org/I16733864"],"apc_list":null,"apc_paid":null,"fwci":10.735,"has_fulltext":false,"cited_by_count":63,"citation_normalized_percentile":{"value":0.98692424,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":90,"max":100},"biblio":{"volume":null,"issue":null,"first_page":"1185","last_page":"1190"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9987999796867371,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9987999796867371,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10996","display_name":"Computational Geometry and Mesh Generation","score":0.996399998664856,"subfield":{"id":"https://openalex.org/subfields/1704","display_name":"Computer Graphics and Computer-Aided Design"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11245","display_name":"Advanced Numerical Analysis Techniques","score":0.9879000186920166,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.671812117099762},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6529531478881836},{"id":"https://openalex.org/keywords/node","display_name":"Node (physics)","score":0.6293789148330688},{"id":"https://openalex.org/keywords/decomposition","display_name":"Decomposition","score":0.5306301116943359},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.5053963661193848},{"id":"https://openalex.org/keywords/multiple-patterning","display_name":"Multiple patterning","score":0.4917059540748596},{"id":"https://openalex.org/keywords/reduction","display_name":"Reduction (mathematics)","score":0.4883882403373718},{"id":"https://openalex.org/keywords/integrated-circuit-layout","display_name":"Integrated circuit layout","score":0.46334394812583923},{"id":"https://openalex.org/keywords/heuristic","display_name":"Heuristic","score":0.46008989214897156},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.2577683925628662},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.182101309299469},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.14364096522331238},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.14096665382385254},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.1366998255252838},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.1198149025440216},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.11403325200080872}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.671812117099762},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6529531478881836},{"id":"https://openalex.org/C62611344","wikidata":"https://www.wikidata.org/wiki/Q1062658","display_name":"Node (physics)","level":2,"score":0.6293789148330688},{"id":"https://openalex.org/C124681953","wikidata":"https://www.wikidata.org/wiki/Q339062","display_name":"Decomposition","level":2,"score":0.5306301116943359},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.5053963661193848},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.4917059540748596},{"id":"https://openalex.org/C111335779","wikidata":"https://www.wikidata.org/wiki/Q3454686","display_name":"Reduction (mathematics)","level":2,"score":0.4883882403373718},{"id":"https://openalex.org/C2765594","wikidata":"https://www.wikidata.org/wiki/Q2624187","display_name":"Integrated circuit layout","level":3,"score":0.46334394812583923},{"id":"https://openalex.org/C173801870","wikidata":"https://www.wikidata.org/wiki/Q201413","display_name":"Heuristic","level":2,"score":0.46008989214897156},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.2577683925628662},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.182101309299469},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.14364096522331238},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.14096665382385254},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.1366998255252838},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.1198149025440216},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.11403325200080872},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.0},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0},{"id":"https://openalex.org/C66938386","wikidata":"https://www.wikidata.org/wiki/Q633538","display_name":"Structural engineering","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1145/2228360.2228579","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2228360.2228579","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 49th Annual Design Automation Conference","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[{"id":"https://openalex.org/G1030298154","display_name":null,"funder_award_id":"NSC 100-2221-E-002-088-MY3NSC 99-2221-E-002-207-MY3NSC 99-2221-E-002-210-MY3NSC 98-2221-E-002-119-MY3","funder_id":"https://openalex.org/F4320321040","funder_display_name":"National Science Council"}],"funders":[{"id":"https://openalex.org/F4320321040","display_name":"National Science Council","ror":"https://ror.org/02kv4zf79"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W1479863711","https://openalex.org/W1507039213","https://openalex.org/W1990184359","https://openalex.org/W1997420670","https://openalex.org/W2032950184","https://openalex.org/W2037726504","https://openalex.org/W2068006581","https://openalex.org/W2104254886","https://openalex.org/W2152190733","https://openalex.org/W2153638045","https://openalex.org/W2159287000","https://openalex.org/W2324827308","https://openalex.org/W2534652523"],"related_works":["https://openalex.org/W2140942945","https://openalex.org/W2541440459","https://openalex.org/W2050847819","https://openalex.org/W2115795789","https://openalex.org/W2000620740","https://openalex.org/W2025251804","https://openalex.org/W1975854055","https://openalex.org/W2032413298","https://openalex.org/W2066716951","https://openalex.org/W2062836254"],"abstract_inverted_index":{"While":[0],"double":[1],"patterning":[2,26],"lithography":[3,27],"(DPL)":[4],"has":[5],"been":[6],"widely":[7],"recognized":[8],"as":[9,203,206],"one":[10],"of":[11,222],"the":[12,17,52,66,76,81,87,131,152,179,182,185,212,231],"most":[13],"promising":[14],"solutions":[15],"for":[16,32,51,69,84,112],"sub-22nm":[18],"technology":[19,54],"node":[20,55],"to":[21,44,150,191,201,230],"enhance":[22],"pattern":[23],"printability,":[24],"triple":[25],"(TPL)":[28],"will":[29],"be":[30,45,107,192],"required":[31],"gate,":[33],"contact,":[34],"and":[35,42,56,102,125,224],"metal-1":[36],"layers":[37],"which":[38],"are":[39,188,199],"too":[40],"complex":[41],"dense":[43],"split":[46],"into":[47],"only":[48],"two":[49,120,132,145],"masks,":[50],"15nm":[53],"beyond.":[57],"Nevertheless,":[58],"there":[59],"is":[60],"very":[61],"little":[62],"research":[63],"focusing":[64],"on":[65,80,130,169],"layout":[67,82,127,139,214],"decomposition":[68,83,140,215],"TPL.":[70,85,113],"The":[71],"recent":[72],"work":[73],"[16]":[74],"proposed":[75,88,213],"first":[77,143],"systematic":[78],"study":[79],"However,":[86],"algorithm":[89,216],"extending":[90],"a":[91,136,163,170,174],"stitch-finding":[92],"method":[93],"used":[94],"in":[95,184],"DPL":[96,124],"may":[97],"miss":[98],"legal":[99],"stitch":[100],"locations":[101],"generate":[103],"conflicts":[104,180,205,223],"that":[105,172,178,211],"can":[106,217],"resolved":[108,193],"by":[109,194],"inserting":[110,195],"stitches":[111,198],"In":[114],"this":[115],"paper,":[116],"we":[117,134],"point":[118],"out":[119],"main":[121],"differences":[122],"between":[123],"TPL":[126,138],"decompositions.":[128],"Based":[129],"differences,":[133],"propose":[135,162],"novel":[137],"algorithm.":[141],"We":[142,160],"present":[144],"new":[146],"graph":[147],"reduction":[148,221],"techniques":[149],"reduce":[151],"problem":[153],"size":[154],"without":[155],"degrading":[156],"overall":[157],"solution":[158],"quality.":[159],"then":[161],"stitch-aware":[164],"mask":[165,175,187],"assignment":[166,176],"algorithm,":[167],"based":[168],"heuristic":[171],"finds":[173],"such":[177],"among":[181],"features":[183],"same":[186],"more":[189,225],"likely":[190],"stitches.":[196],"Finally,":[197],"inserted":[200],"resolve":[202],"many":[204],"possible.":[207],"Experimental":[208],"results":[209],"show":[210],"achieve":[218],"around":[219],"56%":[220],"than":[226],"40X":[227],"speed-up":[228],"compared":[229],"previous":[232],"work.":[233]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":2},{"year":2021,"cited_by_count":2},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":4},{"year":2016,"cited_by_count":8},{"year":2015,"cited_by_count":14},{"year":2014,"cited_by_count":17},{"year":2013,"cited_by_count":8},{"year":2012,"cited_by_count":4}],"updated_date":"2026-04-05T17:49:38.594831","created_date":"2025-10-10T00:00:00"}