{"id":"https://openalex.org/W2052163612","doi":"https://doi.org/10.1145/2228360.2228468","title":"Triple patterning aware routing and its comparison with double patterning aware routing in 14nm technology","display_name":"Triple patterning aware routing and its comparison with double patterning aware routing in 14nm technology","publication_year":2012,"publication_date":"2012-05-31","ids":{"openalex":"https://openalex.org/W2052163612","doi":"https://doi.org/10.1145/2228360.2228468","mag":"2052163612"},"language":"en","primary_location":{"id":"doi:10.1145/2228360.2228468","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2228360.2228468","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 49th Annual Design Automation Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100648940","display_name":"Qiang Ma","orcid":"https://orcid.org/0000-0002-1028-3505"},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Qiang Ma","raw_affiliation_strings":["University of Illinois at Urbana-Champaign","Dept. of Electrical and Computer Engineering, University of Illinois at Urbana Champaign"],"affiliations":[{"raw_affiliation_string":"University of Illinois at Urbana-Champaign","institution_ids":["https://openalex.org/I157725225"]},{"raw_affiliation_string":"Dept. of Electrical and Computer Engineering, University of Illinois at Urbana Champaign","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100461106","display_name":"Hongbo Zhang","orcid":"https://orcid.org/0009-0001-3886-3763"},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Hongbo Zhang","raw_affiliation_strings":["University of Illinois at Urbana-Champaign","Dept. of Electrical and Computer Engineering, University of Illinois at Urbana Champaign"],"affiliations":[{"raw_affiliation_string":"University of Illinois at Urbana-Champaign","institution_ids":["https://openalex.org/I157725225"]},{"raw_affiliation_string":"Dept. of Electrical and Computer Engineering, University of Illinois at Urbana Champaign","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5053378706","display_name":"Martin D. F. Wong","orcid":"https://orcid.org/0000-0001-8274-9688"},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Martin D. F. Wong","raw_affiliation_strings":["University of Illinois at Urbana-Champaign","Dept. of Electrical and Computer Engineering, University of Illinois at Urbana Champaign"],"affiliations":[{"raw_affiliation_string":"University of Illinois at Urbana-Champaign","institution_ids":["https://openalex.org/I157725225"]},{"raw_affiliation_string":"Dept. of Electrical and Computer Engineering, University of Illinois at Urbana Champaign","institution_ids":["https://openalex.org/I157725225"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5100648940"],"corresponding_institution_ids":["https://openalex.org/I157725225"],"apc_list":null,"apc_paid":null,"fwci":9.4867,"has_fulltext":false,"cited_by_count":57,"citation_normalized_percentile":{"value":0.98351254,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":100},"biblio":{"volume":null,"issue":null,"first_page":"591","last_page":"596"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.9986000061035156,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9973000288009644,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/multiple-patterning","display_name":"Multiple patterning","score":0.7726356983184814},{"id":"https://openalex.org/keywords/routing","display_name":"Routing (electronic design automation)","score":0.6840389966964722},{"id":"https://openalex.org/keywords/node","display_name":"Node (physics)","score":0.6362765431404114},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6057548522949219},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5851337909698486},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.4805055856704712},{"id":"https://openalex.org/keywords/parallel-computing","display_name":"Parallel computing","score":0.38350173830986023},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.3637610077857971},{"id":"https://openalex.org/keywords/distributed-computing","display_name":"Distributed computing","score":0.36256271600723267},{"id":"https://openalex.org/keywords/computer-network","display_name":"Computer network","score":0.3294306993484497},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.21118402481079102},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.1813308596611023},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.1762320101261139},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.13734915852546692},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.12744683027267456}],"concepts":[{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.7726356983184814},{"id":"https://openalex.org/C74172769","wikidata":"https://www.wikidata.org/wiki/Q1446839","display_name":"Routing (electronic design automation)","level":2,"score":0.6840389966964722},{"id":"https://openalex.org/C62611344","wikidata":"https://www.wikidata.org/wiki/Q1062658","display_name":"Node (physics)","level":2,"score":0.6362765431404114},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6057548522949219},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5851337909698486},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4805055856704712},{"id":"https://openalex.org/C173608175","wikidata":"https://www.wikidata.org/wiki/Q232661","display_name":"Parallel computing","level":1,"score":0.38350173830986023},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3637610077857971},{"id":"https://openalex.org/C120314980","wikidata":"https://www.wikidata.org/wiki/Q180634","display_name":"Distributed computing","level":1,"score":0.36256271600723267},{"id":"https://openalex.org/C31258907","wikidata":"https://www.wikidata.org/wiki/Q1301371","display_name":"Computer network","level":1,"score":0.3294306993484497},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.21118402481079102},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.1813308596611023},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1762320101261139},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.13734915852546692},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.12744683027267456},{"id":"https://openalex.org/C66938386","wikidata":"https://www.wikidata.org/wiki/Q633538","display_name":"Structural engineering","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1145/2228360.2228468","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2228360.2228468","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 49th Annual Design Automation Conference","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[{"id":"https://openalex.org/G7057901070","display_name":null,"funder_award_id":"CCF-1017516","funder_id":"https://openalex.org/F4320337387","funder_display_name":"Division of Computing and Communication Foundations"}],"funders":[{"id":"https://openalex.org/F4320337387","display_name":"Division of Computing and Communication Foundations","ror":"https://ror.org/01mng8331"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":15,"referenced_works":["https://openalex.org/W1980519916","https://openalex.org/W1985761733","https://openalex.org/W1990184359","https://openalex.org/W1992649420","https://openalex.org/W2009284762","https://openalex.org/W2015622761","https://openalex.org/W2046206692","https://openalex.org/W2090972413","https://openalex.org/W2108069061","https://openalex.org/W2152190733","https://openalex.org/W2159287000","https://openalex.org/W2161958538","https://openalex.org/W2275304190","https://openalex.org/W3149318025","https://openalex.org/W4229826372"],"related_works":["https://openalex.org/W2140942945","https://openalex.org/W2541440459","https://openalex.org/W2050847819","https://openalex.org/W2115795789","https://openalex.org/W2000620740","https://openalex.org/W2025251804","https://openalex.org/W1975854055","https://openalex.org/W2032413298","https://openalex.org/W2066716951","https://openalex.org/W2062836254"],"abstract_inverted_index":{"As":[0],"technology":[1],"continues":[2],"to":[3,5,14,37,45,134],"scale":[4],"14nm":[6,109],"node,":[7],"Double":[8],"Patterning":[9,19],"Lithography":[10,20],"(DPL)":[11],"is":[12,22],"pushed":[13],"near":[15],"its":[16,101],"limit.":[17],"Triple":[18],"(TPL)":[21],"a":[23,75],"considerable":[24],"and":[25,50,62,79,99,125],"natural":[26],"extension":[27],"along":[28],"the":[29,39,47,52,65,83,91,104,117,126],"paradigm":[30],"of":[31,54],"DPL.":[32,135],"With":[33],"an":[34],"extra":[35],"mask":[36],"accommodate":[38],"features,":[40],"TPL":[41,70],"can":[42,80,119,128],"be":[43,120,129],"used":[44],"eliminate":[46],"unresolvable":[48],"conflicts":[49,118],"minimize":[51],"number":[53],"stitches,":[55],"which":[56],"are":[57],"pervasive":[58],"in":[59,108,132],"DPL":[60],"process,":[61],"thus":[63],"smoothen":[64],"layout":[66,84],"decomposition":[67],"step.":[68],"Considering":[69],"during":[71],"routing":[72,97],"stage":[73],"explores":[74],"larger":[76],"solution":[77],"space":[78],"further":[81],"improve":[82],"decomposability.":[85],"In":[86],"this":[87],"paper,":[88],"we":[89],"propose":[90],"first":[92],"triple":[93],"patterning":[94,106],"aware":[95],"detailed":[96],"scheme,":[98],"compare":[100],"performance":[102],"with":[103],"double":[105],"version":[107],"node.":[110],"Experimental":[111],"results":[112],"show":[113],"that,":[114],"using":[115],"TPL,":[116],"resolved":[121],"much":[122],"more":[123],"easily":[124],"stitches":[127],"significantly":[130],"reduced":[131],"contrast":[133]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":3},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":5},{"year":2016,"cited_by_count":6},{"year":2015,"cited_by_count":18},{"year":2014,"cited_by_count":11},{"year":2013,"cited_by_count":7},{"year":2012,"cited_by_count":2}],"updated_date":"2026-04-05T17:49:38.594831","created_date":"2025-10-10T00:00:00"}