{"id":"https://openalex.org/W2125559374","doi":"https://doi.org/10.1145/2206781.2206818","title":"Lithography-aware layout compaction","display_name":"Lithography-aware layout compaction","publication_year":2012,"publication_date":"2012-05-03","ids":{"openalex":"https://openalex.org/W2125559374","doi":"https://doi.org/10.1145/2206781.2206818","mag":"2125559374"},"language":"en","primary_location":{"id":"doi:10.1145/2206781.2206818","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2206781.2206818","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the great lakes symposium on VLSI","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5077254311","display_name":"Curtis Andrus","orcid":"https://orcid.org/0009-0008-1435-9555"},"institutions":[{"id":"https://openalex.org/I185103710","display_name":"University of California, Santa Cruz","ror":"https://ror.org/03s65by71","country_code":"US","type":"education","lineage":["https://openalex.org/I185103710"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Curtis Andrus","raw_affiliation_strings":["University of California, Santa Cruz, Santa Cruz, CA, USA","University of California-Santa Cruz, Santa Cruz, CA, USA,"],"affiliations":[{"raw_affiliation_string":"University of California, Santa Cruz, Santa Cruz, CA, USA","institution_ids":["https://openalex.org/I185103710"]},{"raw_affiliation_string":"University of California-Santa Cruz, Santa Cruz, CA, USA,","institution_ids":["https://openalex.org/I185103710"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5065218759","display_name":"Matthew R. Guthaus","orcid":"https://orcid.org/0000-0002-8113-4531"},"institutions":[{"id":"https://openalex.org/I185103710","display_name":"University of California, Santa Cruz","ror":"https://ror.org/03s65by71","country_code":"US","type":"education","lineage":["https://openalex.org/I185103710"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Matthew R. Guthaus","raw_affiliation_strings":["University of California, Santa Cruz, Santa Cruz, CA, USA","University of California-Santa Cruz, Santa Cruz, CA, USA,"],"affiliations":[{"raw_affiliation_string":"University of California, Santa Cruz, Santa Cruz, CA, USA","institution_ids":["https://openalex.org/I185103710"]},{"raw_affiliation_string":"University of California-Santa Cruz, Santa Cruz, CA, USA,","institution_ids":["https://openalex.org/I185103710"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5077254311"],"corresponding_institution_ids":["https://openalex.org/I185103710"],"apc_list":null,"apc_paid":null,"fwci":0.491,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.70355449,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"147","last_page":"152"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.998199999332428,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.7759258151054382},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6189817190170288},{"id":"https://openalex.org/keywords/routing","display_name":"Routing (electronic design automation)","score":0.5789948105812073},{"id":"https://openalex.org/keywords/integrated-circuit-layout","display_name":"Integrated circuit layout","score":0.5205210447311401},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5030228495597839},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"Optical proximity correction","score":0.48731932044029236},{"id":"https://openalex.org/keywords/compaction","display_name":"Compaction","score":0.48365676403045654},{"id":"https://openalex.org/keywords/page-layout","display_name":"Page layout","score":0.43965643644332886},{"id":"https://openalex.org/keywords/engineering-drawing","display_name":"Engineering drawing","score":0.3714835047721863},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.3419508934020996},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.25176769495010376},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.2425723373889923},{"id":"https://openalex.org/keywords/embedded-system","display_name":"Embedded system","score":0.21506547927856445},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.09327948093414307},{"id":"https://openalex.org/keywords/programming-language","display_name":"Programming language","score":0.07364758849143982}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7759258151054382},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6189817190170288},{"id":"https://openalex.org/C74172769","wikidata":"https://www.wikidata.org/wiki/Q1446839","display_name":"Routing (electronic design automation)","level":2,"score":0.5789948105812073},{"id":"https://openalex.org/C2765594","wikidata":"https://www.wikidata.org/wiki/Q2624187","display_name":"Integrated circuit layout","level":3,"score":0.5205210447311401},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5030228495597839},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.48731932044029236},{"id":"https://openalex.org/C196715460","wikidata":"https://www.wikidata.org/wiki/Q1414356","display_name":"Compaction","level":2,"score":0.48365676403045654},{"id":"https://openalex.org/C188985296","wikidata":"https://www.wikidata.org/wiki/Q868954","display_name":"Page layout","level":2,"score":0.43965643644332886},{"id":"https://openalex.org/C199639397","wikidata":"https://www.wikidata.org/wiki/Q1788588","display_name":"Engineering drawing","level":1,"score":0.3714835047721863},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3419508934020996},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.25176769495010376},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.2425723373889923},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.21506547927856445},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.09327948093414307},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.07364758849143982},{"id":"https://openalex.org/C112698675","wikidata":"https://www.wikidata.org/wiki/Q37038","display_name":"Advertising","level":1,"score":0.0},{"id":"https://openalex.org/C187320778","wikidata":"https://www.wikidata.org/wiki/Q1349130","display_name":"Geotechnical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C144133560","wikidata":"https://www.wikidata.org/wiki/Q4830453","display_name":"Business","level":0,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1145/2206781.2206818","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2206781.2206818","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the great lakes symposium on VLSI","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":15,"referenced_works":["https://openalex.org/W1514655958","https://openalex.org/W1588006733","https://openalex.org/W1989727057","https://openalex.org/W2029988103","https://openalex.org/W2036789660","https://openalex.org/W2049967610","https://openalex.org/W2065791406","https://openalex.org/W2085006603","https://openalex.org/W2102766615","https://openalex.org/W2115092649","https://openalex.org/W2125031708","https://openalex.org/W2153587647","https://openalex.org/W2167005602","https://openalex.org/W4285719527","https://openalex.org/W6666727119"],"related_works":["https://openalex.org/W2802459864","https://openalex.org/W4306406015","https://openalex.org/W2125031708","https://openalex.org/W2088068989","https://openalex.org/W1976544989","https://openalex.org/W3143665566","https://openalex.org/W1987855151","https://openalex.org/W2138070010","https://openalex.org/W2050847819","https://openalex.org/W2005047684"],"abstract_inverted_index":{"Optical":[0],"Proximity":[1],"Correction":[2],"(OPC)":[3],"tools":[4],"can":[5],"suffer":[6],"if":[7],"the":[8,23,33,37,65,75,87],"origi-":[9],"nal":[10],"layout":[11,34,56,88],"is":[12],"inherently":[13],"difficult":[14],"to":[15,31,40,58,63,85,105],"print.":[16],"Most":[17],"routing":[18],"techniques":[19],"are":[20],"unaware":[21],"of":[22,67],"lithographic":[24],"process,":[25],"but":[26],"several":[27],"have":[28],"been":[29],"proposed":[30],"make":[32],"easier":[35],"for":[36,49,94],"OPC":[38,50,68,76],"tool":[39],"correct.":[41],"This":[42,71],"paper":[43],"proposes":[44],"a":[45,53,82,92],"generalized":[46],"preprocess":[47],"step":[48],"that":[51],"uses":[52,81],"modified":[54],"1D":[55],"compactor":[57,73],"expand":[59],"or":[60],"shrink":[61],"geometry":[62],"decrease":[64],"amount":[66],"work":[69],"needed.":[70],"lithography-aware":[72],"estimates":[74],"effort":[77],"required":[78],"and":[79,101],"then":[80,102],"non-linear":[83],"formulation":[84],"adjust":[86],"geometry.":[89],"We":[90],"describe":[91],"method":[93],"performing":[95],"this":[96],"compaction":[97],"on":[98],"small":[99],"layouts":[100],"extend":[103],"it":[104],"handle":[106],"larger":[107],"hierarchical":[108],"standard":[109],"cell":[110],"layouts.":[111]},"counts_by_year":[{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":2}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}