{"id":"https://openalex.org/W2107458461","doi":"https://doi.org/10.1145/2024724.2024741","title":"Self-aligned double patterning decomposition for overlay minimization and hot spot detection","display_name":"Self-aligned double patterning decomposition for overlay minimization and hot spot detection","publication_year":2011,"publication_date":"2011-06-05","ids":{"openalex":"https://openalex.org/W2107458461","doi":"https://doi.org/10.1145/2024724.2024741","mag":"2107458461"},"language":"en","primary_location":{"id":"doi:10.1145/2024724.2024741","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2024724.2024741","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 48th Design Automation Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100461085","display_name":"Hongbo Zhang","orcid":"https://orcid.org/0000-0001-7259-5419"},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Hongbo Zhang","raw_affiliation_strings":["University of Illinois at Urbana-Champaign","Department of ECE, Univ. of Illinois at Urbana-Champaign, USA"],"affiliations":[{"raw_affiliation_string":"University of Illinois at Urbana-Champaign","institution_ids":["https://openalex.org/I157725225"]},{"raw_affiliation_string":"Department of ECE, Univ. of Illinois at Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069931478","display_name":"Yuelin Du","orcid":null},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Yuelin Du","raw_affiliation_strings":["University of Illinois at Urbana-Champaign","Department of ECE, Univ. of Illinois at Urbana-Champaign, USA"],"affiliations":[{"raw_affiliation_string":"University of Illinois at Urbana-Champaign","institution_ids":["https://openalex.org/I157725225"]},{"raw_affiliation_string":"Department of ECE, Univ. of Illinois at Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053378706","display_name":"Martin D. F. Wong","orcid":"https://orcid.org/0000-0001-8274-9688"},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Martin D. F. Wong","raw_affiliation_strings":["University of Illinois at Urbana-Champaign","Department of ECE, Univ. of Illinois at Urbana-Champaign, USA"],"affiliations":[{"raw_affiliation_string":"University of Illinois at Urbana-Champaign","institution_ids":["https://openalex.org/I157725225"]},{"raw_affiliation_string":"Department of ECE, Univ. of Illinois at Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5084170591","display_name":"Rasit Onur Topaloglu","orcid":"https://orcid.org/0000-0001-8759-6959"},"institutions":[{"id":"https://openalex.org/I35662394","display_name":"GlobalFoundries (United States)","ror":"https://ror.org/02h0ps145","country_code":"US","type":"company","lineage":["https://openalex.org/I35662394"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Rasit Topaloglu","raw_affiliation_strings":["Global Foundries Inc","GLOBAL FOUNDRIES Inc. (USA)"],"affiliations":[{"raw_affiliation_string":"Global Foundries Inc","institution_ids":[]},{"raw_affiliation_string":"GLOBAL FOUNDRIES Inc. (USA)","institution_ids":["https://openalex.org/I35662394"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5100461085"],"corresponding_institution_ids":["https://openalex.org/I157725225"],"apc_list":null,"apc_paid":null,"fwci":6.4836,"has_fulltext":false,"cited_by_count":47,"citation_normalized_percentile":{"value":0.96916479,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":90,"max":99},"biblio":{"volume":null,"issue":null,"first_page":"71","last_page":"76"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9987000226974487,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9980999827384949,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/overlay","display_name":"Overlay","score":0.9291938543319702},{"id":"https://openalex.org/keywords/decomposition","display_name":"Decomposition","score":0.7866805791854858},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.7104564905166626},{"id":"https://openalex.org/keywords/hot-spot","display_name":"Hot spot (computer programming)","score":0.6974839568138123},{"id":"https://openalex.org/keywords/minification","display_name":"Minification","score":0.6147046089172363},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.5116941928863525},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.4582899808883667},{"id":"https://openalex.org/keywords/multiple-patterning","display_name":"Multiple patterning","score":0.44369152188301086},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.44121119379997253},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.3721691370010376},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.11343622207641602},{"id":"https://openalex.org/keywords/computer-network","display_name":"Computer network","score":0.11203616857528687},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.09031370282173157},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.06941136717796326}],"concepts":[{"id":"https://openalex.org/C136085584","wikidata":"https://www.wikidata.org/wiki/Q910289","display_name":"Overlay","level":2,"score":0.9291938543319702},{"id":"https://openalex.org/C124681953","wikidata":"https://www.wikidata.org/wiki/Q339062","display_name":"Decomposition","level":2,"score":0.7866805791854858},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.7104564905166626},{"id":"https://openalex.org/C199672914","wikidata":"https://www.wikidata.org/wiki/Q4241353","display_name":"Hot spot (computer programming)","level":2,"score":0.6974839568138123},{"id":"https://openalex.org/C147764199","wikidata":"https://www.wikidata.org/wiki/Q6865248","display_name":"Minification","level":2,"score":0.6147046089172363},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5116941928863525},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4582899808883667},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.44369152188301086},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.44121119379997253},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.3721691370010376},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.11343622207641602},{"id":"https://openalex.org/C31258907","wikidata":"https://www.wikidata.org/wiki/Q1301371","display_name":"Computer network","level":1,"score":0.11203616857528687},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.09031370282173157},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.06941136717796326},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1145/2024724.2024741","is_oa":false,"landing_page_url":"https://doi.org/10.1145/2024724.2024741","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 48th Design Automation Conference","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[{"id":"https://openalex.org/G7057901070","display_name":null,"funder_award_id":"CCF-1017516","funder_id":"https://openalex.org/F4320337387","funder_display_name":"Division of Computing and Communication Foundations"}],"funders":[{"id":"https://openalex.org/F4320337387","display_name":"Division of Computing and Communication Foundations","ror":"https://ror.org/01mng8331"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W1969492842","https://openalex.org/W1994759998","https://openalex.org/W2004752952","https://openalex.org/W2006010964","https://openalex.org/W2012552926","https://openalex.org/W2038600423","https://openalex.org/W2079830077","https://openalex.org/W2108352706","https://openalex.org/W2152190733","https://openalex.org/W2161958538","https://openalex.org/W2175772671","https://openalex.org/W2486040343","https://openalex.org/W3149318025"],"related_works":["https://openalex.org/W2046544336","https://openalex.org/W1937820206","https://openalex.org/W2021819509","https://openalex.org/W2077286051","https://openalex.org/W2034006444","https://openalex.org/W2029079688","https://openalex.org/W1996426988","https://openalex.org/W2079044085","https://openalex.org/W1993158799","https://openalex.org/W2033266705"],"abstract_inverted_index":{"Self-aligned":[0],"double":[1],"patterning":[2],"(SADP)":[3],"lithography":[4],"is":[5,36],"a":[6,25,57,65,72],"promising":[7],"technology":[8],"which":[9],"can":[10,49],"reduce":[11],"the":[12,29,52],"overlay":[13,30],"and":[14,31,88,96],"print":[15],"2D":[16],"features":[17],"for":[18,91],"sub-32nm":[19],"process.":[20],"Yet,":[21],"how":[22],"to":[23,27,63,78],"decompose":[24],"layout":[26,74],"minimize":[28],"perform":[32],"hot":[33,81],"spot":[34],"detection":[35],"still":[37],"an":[38,46],"open":[39],"problem.":[40,55],"In":[41],"this":[42],"paper,":[43],"we":[44],"present":[45],"algorithm":[47,61,76],"that":[48,68],"optimally":[50],"solve":[51],"SADP":[53],"decomposition":[54,66,89],"For":[56,71],"decomposable":[58],"layout,":[59],"our":[60,75,86],"guarantees":[62,77],"find":[64,79],"solution":[67],"minimizes":[69],"overlay.":[70],"non-decomposable":[73],"all":[80],"spots.":[82],"Experimental":[83],"results":[84,90],"validate":[85],"method,":[87],"Nangate":[92],"Open":[93],"Cell":[94],"Library":[95],"larger":[97],"testcases":[98],"are":[99],"also":[100],"provided":[101],"with":[102],"competitive":[103],"runtimes.":[104]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2022,"cited_by_count":2},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":6},{"year":2015,"cited_by_count":9},{"year":2014,"cited_by_count":7},{"year":2013,"cited_by_count":8},{"year":2012,"cited_by_count":8}],"updated_date":"2026-04-05T17:49:38.594831","created_date":"2025-10-10T00:00:00"}