{"id":"https://openalex.org/W2002985325","doi":"https://doi.org/10.1145/1629911.1629931","title":"Use of lithography simulation for the calibration of equation-based design rule checks","display_name":"Use of lithography simulation for the calibration of equation-based design rule checks","publication_year":2009,"publication_date":"2009-07-26","ids":{"openalex":"https://openalex.org/W2002985325","doi":"https://doi.org/10.1145/1629911.1629931","mag":"2002985325"},"language":"en","primary_location":{"id":"doi:10.1145/1629911.1629931","is_oa":false,"landing_page_url":"https://doi.org/10.1145/1629911.1629931","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 46th Annual Design Automation Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5035003414","display_name":"David Abercrombie","orcid":null},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"David Abercrombie","raw_affiliation_strings":["Mentor Graphics Corp., Wilsonville, OR","Mentor Graphics Corporation, 8005 SW Boeckman Rd., Wilsonville, OR 97070, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corp., Wilsonville, OR","institution_ids":["https://openalex.org/I4210156212"]},{"raw_affiliation_string":"Mentor Graphics Corporation, 8005 SW Boeckman Rd., Wilsonville, OR 97070, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061711514","display_name":"Fedor G. Pikus","orcid":null},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Fedor Pikus","raw_affiliation_strings":["Mentor Graphics Corp., Wilsonville, OR","Mentor Graphics Corporation, 8005 SW Boeckman Rd., Wilsonville, OR 97070, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corp., Wilsonville, OR","institution_ids":["https://openalex.org/I4210156212"]},{"raw_affiliation_string":"Mentor Graphics Corporation, 8005 SW Boeckman Rd., Wilsonville, OR 97070, USA","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5083546447","display_name":"Cosmin Cazan","orcid":null},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Cosmin Cazan","raw_affiliation_strings":["Mentor Graphics Corp., Wilsonville, OR","Mentor Graphics Corporation, 8005 SW Boeckman Rd., Wilsonville, OR 97070, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corp., Wilsonville, OR","institution_ids":["https://openalex.org/I4210156212"]},{"raw_affiliation_string":"Mentor Graphics Corporation, 8005 SW Boeckman Rd., Wilsonville, OR 97070, USA","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5035003414"],"corresponding_institution_ids":["https://openalex.org/I4210156212"],"apc_list":null,"apc_paid":null,"fwci":1.1963,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.79600143,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":95},"biblio":{"volume":null,"issue":null,"first_page":"67","last_page":"70"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11206","display_name":"Model Reduction and Neural Networks","score":0.9944000244140625,"subfield":{"id":"https://openalex.org/subfields/3109","display_name":"Statistical and Nonlinear Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12169","display_name":"Non-Destructive Testing Techniques","score":0.988099992275238,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/calibration","display_name":"Calibration","score":0.6911888122558594},{"id":"https://openalex.org/keywords/dimension","display_name":"Dimension (graph theory)","score":0.6517811417579651},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6390643119812012},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5997005701065063},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.5721086263656616},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.1500970423221588},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.09147727489471436},{"id":"https://openalex.org/keywords/programming-language","display_name":"Programming language","score":0.08438441157341003}],"concepts":[{"id":"https://openalex.org/C165838908","wikidata":"https://www.wikidata.org/wiki/Q736777","display_name":"Calibration","level":2,"score":0.6911888122558594},{"id":"https://openalex.org/C33676613","wikidata":"https://www.wikidata.org/wiki/Q13415176","display_name":"Dimension (graph theory)","level":2,"score":0.6517811417579651},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6390643119812012},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5997005701065063},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5721086263656616},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.1500970423221588},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.09147727489471436},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.08438441157341003},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.0},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C202444582","wikidata":"https://www.wikidata.org/wiki/Q837863","display_name":"Pure mathematics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1145/1629911.1629931","is_oa":false,"landing_page_url":"https://doi.org/10.1145/1629911.1629931","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 46th Annual Design Automation Conference","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","score":0.4300000071525574,"id":"https://metadata.un.org/sdg/9"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":1,"referenced_works":["https://openalex.org/W2071618485"],"related_works":["https://openalex.org/W4391375266","https://openalex.org/W2748952813","https://openalex.org/W2390279801","https://openalex.org/W2358668433","https://openalex.org/W4396701345","https://openalex.org/W2376932109","https://openalex.org/W2001405890","https://openalex.org/W4396696052","https://openalex.org/W2362494555","https://openalex.org/W2371281775"],"abstract_inverted_index":{"Designers":[0],"using":[1,43],"one-dimension":[2],"measurements":[3],"in":[4],"nanometer":[5],"designs":[6],"can't":[7],"readily":[8],"identify":[9],"features":[10],"prone":[11],"to":[12,48,69],"excessive":[13],"variation":[14],"during":[15],"processing.":[16],"Process":[17],"simulation":[18],"provides":[19],"high":[20],"resolution":[21],"checking,":[22],"but":[23],"requires":[24],"significant":[25],"computing":[26],"resources.":[27],"Equation-based":[28],"design":[29],"rule":[30],"checking":[31],"(eqDRC)":[32],"offers":[33],"the":[34,52,57],"DRC":[35],"performance":[36],"with":[37],"capture":[38],"of":[39,56],"complex":[40],"process":[41],"issues":[42],"multi-dimensional":[44],"equations.":[45,58],"One":[46],"challenge":[47],"adopting":[49],"eqDRC":[50,74],"is":[51],"definition":[53],"and":[54,71],"calibration":[55],"We":[59],"will":[60],"show":[61],"how":[62],"a":[63],"lithographic":[64],"simulator":[65],"can":[66],"be":[67],"used":[68],"define":[70],"calibrate":[72],"an":[73],"equation.":[75]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}