{"id":"https://openalex.org/W1965102452","doi":"https://doi.org/10.1142/s1465876303001587","title":"DESIGN AND FABRICATION OF <font>SIO</font><sub>2</sub> MICROMECHANICAL STRUCTURES INSIDE ANISOTROPICALLY ETCHED CAVITY","display_name":"DESIGN AND FABRICATION OF <font>SIO</font><sub>2</sub> MICROMECHANICAL STRUCTURES INSIDE ANISOTROPICALLY ETCHED CAVITY","publication_year":2003,"publication_date":"2003-09-01","ids":{"openalex":"https://openalex.org/W1965102452","doi":"https://doi.org/10.1142/s1465876303001587","mag":"1965102452"},"language":"en","primary_location":{"id":"doi:10.1142/s1465876303001587","is_oa":false,"landing_page_url":"https://doi.org/10.1142/s1465876303001587","pdf_url":null,"source":{"id":"https://openalex.org/S107240834","display_name":"International Journal of Computational Engineering Science","issn_l":"1465-8763","issn":["1465-8763","2047-6086"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310311754","host_organization_name":"Imperial College Press","host_organization_lineage":["https://openalex.org/P4310311754"],"host_organization_lineage_names":["Imperial College Press"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"International Journal of Computational Engineering Science","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5025481205","display_name":"Prem Pal","orcid":"https://orcid.org/0009-0000-9724-9299"},"institutions":[{"id":"https://openalex.org/I68891433","display_name":"Indian Institute of Technology Delhi","ror":"https://ror.org/049tgcd06","country_code":"IN","type":"education","lineage":["https://openalex.org/I68891433"]}],"countries":["IN"],"is_corresponding":true,"raw_author_name":"PREM PAL","raw_affiliation_strings":["Centre for Applied Research in Electronics, Indian Institute of Technology, Delhi, Hauz Khas, New Delhi - 110016, India"],"affiliations":[{"raw_affiliation_string":"Centre for Applied Research in Electronics, Indian Institute of Technology, Delhi, Hauz Khas, New Delhi - 110016, India","institution_ids":["https://openalex.org/I68891433"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112257323","display_name":"Suneet Tuli","orcid":null},"institutions":[{"id":"https://openalex.org/I68891433","display_name":"Indian Institute of Technology Delhi","ror":"https://ror.org/049tgcd06","country_code":"IN","type":"education","lineage":["https://openalex.org/I68891433"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"SUNEET TULI","raw_affiliation_strings":["Centre for Applied Research in Electronics, Indian Institute of Technology, Delhi, Hauz Khas, New Delhi - 110016, India"],"affiliations":[{"raw_affiliation_string":"Centre for Applied Research in Electronics, Indian Institute of Technology, Delhi, Hauz Khas, New Delhi - 110016, India","institution_ids":["https://openalex.org/I68891433"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5103678756","display_name":"Sudhir Chandra","orcid":null},"institutions":[{"id":"https://openalex.org/I68891433","display_name":"Indian Institute of Technology Delhi","ror":"https://ror.org/049tgcd06","country_code":"IN","type":"education","lineage":["https://openalex.org/I68891433"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"SUDHIR CHANDRA","raw_affiliation_strings":["Centre for Applied Research in Electronics, Indian Institute of Technology, Delhi, Hauz Khas, New Delhi - 110016, India"],"affiliations":[{"raw_affiliation_string":"Centre for Applied Research in Electronics, Indian Institute of Technology, Delhi, Hauz Khas, New Delhi - 110016, India","institution_ids":["https://openalex.org/I68891433"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5025481205"],"corresponding_institution_ids":["https://openalex.org/I68891433"],"apc_list":null,"apc_paid":null,"fwci":0.3087,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.58271004,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"04","issue":"03","first_page":"489","last_page":"492"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9988999962806702,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9988999962806702,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.996999979019165,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12452","display_name":"Electrowetting and Microfluidic Technologies","score":0.9918000102043152,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/new-delhi","display_name":"New delhi","score":0.5802505612373352},{"id":"https://openalex.org/keywords/photoresist","display_name":"Photoresist","score":0.5709224939346313},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.536961019039154},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.5278499126434326},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5255778431892395},{"id":"https://openalex.org/keywords/substrate","display_name":"Substrate (aquarium)","score":0.5126635432243347},{"id":"https://openalex.org/keywords/electronics","display_name":"Electronics","score":0.5034758448600769},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.500368595123291},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.443812757730484},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.4386325478553772},{"id":"https://openalex.org/keywords/photolithography","display_name":"Photolithography","score":0.4295123219490051},{"id":"https://openalex.org/keywords/engineering-physics","display_name":"Engineering physics","score":0.33142566680908203},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.3082801401615143},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.2691642642021179},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.2484009861946106},{"id":"https://openalex.org/keywords/geography","display_name":"Geography","score":0.07885313034057617}],"concepts":[{"id":"https://openalex.org/C3020456351","wikidata":"https://www.wikidata.org/wiki/Q987","display_name":"New delhi","level":3,"score":0.5802505612373352},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.5709224939346313},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.536961019039154},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.5278499126434326},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5255778431892395},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5126635432243347},{"id":"https://openalex.org/C138331895","wikidata":"https://www.wikidata.org/wiki/Q11650","display_name":"Electronics","level":2,"score":0.5034758448600769},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.500368595123291},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.443812757730484},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.4386325478553772},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.4295123219490051},{"id":"https://openalex.org/C61696701","wikidata":"https://www.wikidata.org/wiki/Q770766","display_name":"Engineering physics","level":1,"score":0.33142566680908203},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3082801401615143},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.2691642642021179},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2484009861946106},{"id":"https://openalex.org/C205649164","wikidata":"https://www.wikidata.org/wiki/Q1071","display_name":"Geography","level":0,"score":0.07885313034057617},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C166957645","wikidata":"https://www.wikidata.org/wiki/Q23498","display_name":"Archaeology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C158739034","wikidata":"https://www.wikidata.org/wiki/Q1907114","display_name":"Metropolitan area","level":2,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1142/s1465876303001587","is_oa":false,"landing_page_url":"https://doi.org/10.1142/s1465876303001587","pdf_url":null,"source":{"id":"https://openalex.org/S107240834","display_name":"International Journal of Computational Engineering Science","issn_l":"1465-8763","issn":["1465-8763","2047-6086"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310311754","host_organization_name":"Imperial College Press","host_organization_lineage":["https://openalex.org/P4310311754"],"host_organization_lineage_names":["Imperial College Press"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"International Journal of Computational Engineering Science","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9","score":0.5600000023841858}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":1,"referenced_works":["https://openalex.org/W1977165930"],"related_works":["https://openalex.org/W2376266960","https://openalex.org/W2021565488","https://openalex.org/W2004754773","https://openalex.org/W2044269754","https://openalex.org/W2178933900","https://openalex.org/W4226294346","https://openalex.org/W2051685665","https://openalex.org/W2262246617","https://openalex.org/W2042235194","https://openalex.org/W2388542182"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}