{"id":"https://openalex.org/W1879884738","doi":"https://doi.org/10.1109/vlsi-dat.2015.7114565","title":"Accurate 3-D capacitance extractions for advanced nanometer CMOS nodes","display_name":"Accurate 3-D capacitance extractions for advanced nanometer CMOS nodes","publication_year":2015,"publication_date":"2015-04-01","ids":{"openalex":"https://openalex.org/W1879884738","doi":"https://doi.org/10.1109/vlsi-dat.2015.7114565","mag":"1879884738"},"language":"en","primary_location":{"id":"doi:10.1109/vlsi-dat.2015.7114565","is_oa":false,"landing_page_url":"https://doi.org/10.1109/vlsi-dat.2015.7114565","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"VLSI Design, Automation and Test(VLSI-DAT)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5081005661","display_name":"Keh-Jeng Chang","orcid":"https://orcid.org/0009-0000-9559-7302"},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]},{"id":"https://openalex.org/I1334877674","display_name":"Taiwan Semiconductor Manufacturing Company (United States)","ror":"https://ror.org/02rvfjx92","country_code":"US","type":"company","lineage":["https://openalex.org/I1334877674","https://openalex.org/I4210120917"]}],"countries":["TW","US"],"is_corresponding":true,"raw_author_name":"Keh-Jeng Chang","raw_affiliation_strings":["Research and Development, Taiwan Semiconductor Manufacturing Company","[Research and Development, Taiwan Semiconductor Manufacturing Company]"],"affiliations":[{"raw_affiliation_string":"Research and Development, Taiwan Semiconductor Manufacturing Company","institution_ids":["https://openalex.org/I4210120917"]},{"raw_affiliation_string":"[Research and Development, Taiwan Semiconductor Manufacturing Company]","institution_ids":["https://openalex.org/I1334877674"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060943814","display_name":"Shih-Hao Lee","orcid":null},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]},{"id":"https://openalex.org/I1334877674","display_name":"Taiwan Semiconductor Manufacturing Company (United States)","ror":"https://ror.org/02rvfjx92","country_code":"US","type":"company","lineage":["https://openalex.org/I1334877674","https://openalex.org/I4210120917"]}],"countries":["TW","US"],"is_corresponding":false,"raw_author_name":"Shih-Hao Lee","raw_affiliation_strings":["Research and Development, Taiwan Semiconductor Manufacturing Company","[Research and Development, Taiwan Semiconductor Manufacturing Company]"],"affiliations":[{"raw_affiliation_string":"Research and Development, Taiwan Semiconductor Manufacturing Company","institution_ids":["https://openalex.org/I4210120917"]},{"raw_affiliation_string":"[Research and Development, Taiwan Semiconductor Manufacturing Company]","institution_ids":["https://openalex.org/I1334877674"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041878654","display_name":"Kuo-Fu Lee","orcid":null},"institutions":[{"id":"https://openalex.org/I1334877674","display_name":"Taiwan Semiconductor Manufacturing Company (United States)","ror":"https://ror.org/02rvfjx92","country_code":"US","type":"company","lineage":["https://openalex.org/I1334877674","https://openalex.org/I4210120917"]},{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW","US"],"is_corresponding":false,"raw_author_name":"Kuo-Fu Lee","raw_affiliation_strings":["Research and Development, Taiwan Semiconductor Manufacturing Company","[Research and Development, Taiwan Semiconductor Manufacturing Company]"],"affiliations":[{"raw_affiliation_string":"Research and Development, Taiwan Semiconductor Manufacturing Company","institution_ids":["https://openalex.org/I4210120917"]},{"raw_affiliation_string":"[Research and Development, Taiwan Semiconductor Manufacturing Company]","institution_ids":["https://openalex.org/I1334877674"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056424993","display_name":"Ping-Hung Yuh","orcid":null},"institutions":[{"id":"https://openalex.org/I1334877674","display_name":"Taiwan Semiconductor Manufacturing Company (United States)","ror":"https://ror.org/02rvfjx92","country_code":"US","type":"company","lineage":["https://openalex.org/I1334877674","https://openalex.org/I4210120917"]},{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW","US"],"is_corresponding":false,"raw_author_name":"Ping-Hung Yuh","raw_affiliation_strings":["Research and Development, Taiwan Semiconductor Manufacturing Company","[Research and Development, Taiwan Semiconductor Manufacturing Company]"],"affiliations":[{"raw_affiliation_string":"Research and Development, Taiwan Semiconductor Manufacturing Company","institution_ids":["https://openalex.org/I4210120917"]},{"raw_affiliation_string":"[Research and Development, Taiwan Semiconductor Manufacturing Company]","institution_ids":["https://openalex.org/I1334877674"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017571263","display_name":"Ho-Che Yu","orcid":null},"institutions":[{"id":"https://openalex.org/I1334877674","display_name":"Taiwan Semiconductor Manufacturing Company (United States)","ror":"https://ror.org/02rvfjx92","country_code":"US","type":"company","lineage":["https://openalex.org/I1334877674","https://openalex.org/I4210120917"]},{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW","US"],"is_corresponding":false,"raw_author_name":"Ho-Che Yu","raw_affiliation_strings":["Research and Development, Taiwan Semiconductor Manufacturing Company","[Research and Development, Taiwan Semiconductor Manufacturing Company]"],"affiliations":[{"raw_affiliation_string":"Research and Development, Taiwan Semiconductor Manufacturing Company","institution_ids":["https://openalex.org/I4210120917"]},{"raw_affiliation_string":"[Research and Development, Taiwan Semiconductor Manufacturing Company]","institution_ids":["https://openalex.org/I1334877674"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034103764","display_name":"Wen-Cheng Huang","orcid":null},"institutions":[{"id":"https://openalex.org/I1334877674","display_name":"Taiwan Semiconductor Manufacturing Company (United States)","ror":"https://ror.org/02rvfjx92","country_code":"US","type":"company","lineage":["https://openalex.org/I1334877674","https://openalex.org/I4210120917"]},{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW","US"],"is_corresponding":false,"raw_author_name":"Wen-Cheng Huang","raw_affiliation_strings":["Research and Development, Taiwan Semiconductor Manufacturing Company","[Research and Development, Taiwan Semiconductor Manufacturing Company]"],"affiliations":[{"raw_affiliation_string":"Research and Development, Taiwan Semiconductor Manufacturing Company","institution_ids":["https://openalex.org/I4210120917"]},{"raw_affiliation_string":"[Research and Development, Taiwan Semiconductor Manufacturing Company]","institution_ids":["https://openalex.org/I1334877674"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5057380570","display_name":"Victor C. Y. Chang","orcid":null},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]},{"id":"https://openalex.org/I1334877674","display_name":"Taiwan Semiconductor Manufacturing Company (United States)","ror":"https://ror.org/02rvfjx92","country_code":"US","type":"company","lineage":["https://openalex.org/I1334877674","https://openalex.org/I4210120917"]}],"countries":["TW","US"],"is_corresponding":false,"raw_author_name":"Victor C. Y. Chang","raw_affiliation_strings":["Research and Development, Taiwan Semiconductor Manufacturing Company","[Research and Development, Taiwan Semiconductor Manufacturing Company]"],"affiliations":[{"raw_affiliation_string":"Research and Development, Taiwan Semiconductor Manufacturing Company","institution_ids":["https://openalex.org/I4210120917"]},{"raw_affiliation_string":"[Research and Development, Taiwan Semiconductor Manufacturing Company]","institution_ids":["https://openalex.org/I1334877674"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":7,"corresponding_author_ids":["https://openalex.org/A5081005661"],"corresponding_institution_ids":["https://openalex.org/I1334877674","https://openalex.org/I4210120917"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.04575226,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.797994077205658},{"id":"https://openalex.org/keywords/capacitance","display_name":"Capacitance","score":0.6626629829406738},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.559959888458252},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5364741683006287},{"id":"https://openalex.org/keywords/nanometre","display_name":"Nanometre","score":0.4963300824165344},{"id":"https://openalex.org/keywords/software","display_name":"Software","score":0.46407297253608704},{"id":"https://openalex.org/keywords/semiconductor-device-modeling","display_name":"Semiconductor device modeling","score":0.44862040877342224},{"id":"https://openalex.org/keywords/chip","display_name":"Chip","score":0.4399957060813904},{"id":"https://openalex.org/keywords/extractor","display_name":"Extractor","score":0.42422378063201904},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.2752651572227478},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.14648014307022095},{"id":"https://openalex.org/keywords/telecommunications","display_name":"Telecommunications","score":0.07683885097503662}],"concepts":[{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.797994077205658},{"id":"https://openalex.org/C30066665","wikidata":"https://www.wikidata.org/wiki/Q164399","display_name":"Capacitance","level":3,"score":0.6626629829406738},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.559959888458252},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5364741683006287},{"id":"https://openalex.org/C77066764","wikidata":"https://www.wikidata.org/wiki/Q178674","display_name":"Nanometre","level":2,"score":0.4963300824165344},{"id":"https://openalex.org/C2777904410","wikidata":"https://www.wikidata.org/wiki/Q7397","display_name":"Software","level":2,"score":0.46407297253608704},{"id":"https://openalex.org/C4775677","wikidata":"https://www.wikidata.org/wiki/Q7449393","display_name":"Semiconductor device modeling","level":3,"score":0.44862040877342224},{"id":"https://openalex.org/C165005293","wikidata":"https://www.wikidata.org/wiki/Q1074500","display_name":"Chip","level":2,"score":0.4399957060813904},{"id":"https://openalex.org/C117978034","wikidata":"https://www.wikidata.org/wiki/Q5422192","display_name":"Extractor","level":2,"score":0.42422378063201904},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.2752651572227478},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.14648014307022095},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.07683885097503662},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.0},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/vlsi-dat.2015.7114565","is_oa":false,"landing_page_url":"https://doi.org/10.1109/vlsi-dat.2015.7114565","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"VLSI Design, Automation and Test(VLSI-DAT)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W315413564","https://openalex.org/W324409780","https://openalex.org/W1605773447","https://openalex.org/W1964405784","https://openalex.org/W1974260817","https://openalex.org/W2064473896","https://openalex.org/W2105729768","https://openalex.org/W2120802550","https://openalex.org/W2126770398","https://openalex.org/W2138558886","https://openalex.org/W2158966844","https://openalex.org/W2164203851","https://openalex.org/W2731873610"],"related_works":["https://openalex.org/W2362687133","https://openalex.org/W2356695127","https://openalex.org/W2379723447","https://openalex.org/W2356634767","https://openalex.org/W2366500017","https://openalex.org/W2381754230","https://openalex.org/W2388143409","https://openalex.org/W2388721831","https://openalex.org/W2370553820","https://openalex.org/W2351378491"],"abstract_inverted_index":{"During":[0],"the":[1,31,72,95,100,104,110],"R&D":[2,22,96],"of":[3,48],"advanced":[4],"nanometer":[5,34,84],"CMOS":[6,44,85],"technologies":[7],"such":[8],"as":[9],"20nm":[10],"and":[11,36,52,60,63,88,102,112],"beyond,":[12],"we":[13,75],"implemented":[14],"in-house":[15],"3-D":[16,33,57],"capacitance":[17],"extraction":[18],"software":[19],"to":[20,29,98],"provide":[21],"engineers":[23,97],"with":[24],"an":[25],"accurate":[26,66],"modeling":[27],"tool":[28],"optimize":[30],"complex":[32],"dimensions":[35],"materials":[37],"that":[38,93],"may":[39],"be":[40],"used":[41],"for":[42,80],"competitive":[43],"devices":[45],"in":[46,83],"terms":[47],"power":[49],"consumption,":[50],"performance,":[51],"area.":[53],"Our":[54],"extractor":[55],"solves":[56],"Laplace's":[58],"equation":[59],"extracts":[61],"capacitances":[62],"resistances":[64],"targeting":[65],"on-chip":[67],"parasitic":[68],"modeling.":[69],"In":[70],"essence,":[71],"numerical":[73],"method":[74],"adopted":[76],"features":[77],"flexible":[78],"grids":[79],"arbitrary":[81],"shapes":[82],"devices.":[86],"Robust":[87],"rigorous":[89],"algorithms":[90],"are":[91],"described":[92],"allow":[94],"monitor":[99],"convergence":[101],"specify":[103],"corresponding":[105],"accuracy":[106],"level":[107],"based":[108],"on":[109],"resource":[111],"allowed":[113],"turnaround":[114],"time.":[115]},"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}