{"id":"https://openalex.org/W2102773410","doi":"https://doi.org/10.1109/tcad.2011.2164537","title":"High Performance Lithography Hotspot Detection With Successively Refined Pattern Identifications and Machine Learning","display_name":"High Performance Lithography Hotspot Detection With Successively Refined Pattern Identifications and Machine Learning","publication_year":2011,"publication_date":"2011-10-18","ids":{"openalex":"https://openalex.org/W2102773410","doi":"https://doi.org/10.1109/tcad.2011.2164537","mag":"2102773410"},"language":"en","primary_location":{"id":"doi:10.1109/tcad.2011.2164537","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tcad.2011.2164537","pdf_url":null,"source":{"id":"https://openalex.org/S100835903","display_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","issn_l":"0278-0070","issn":["0278-0070","1937-4151"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5110183841","display_name":"Duo Ding","orcid":null},"institutions":[{"id":"https://openalex.org/I86519309","display_name":"The University of Texas at Austin","ror":"https://ror.org/00hj54h04","country_code":"US","type":"education","lineage":["https://openalex.org/I86519309"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Duo Ding","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of Texas at Austin, Austin, TX, USA","Dept. of Electr. &, Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of Texas at Austin, Austin, TX, USA","institution_ids":["https://openalex.org/I86519309"]},{"raw_affiliation_string":"Dept. of Electr. &, Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA","institution_ids":["https://openalex.org/I86519309"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103405487","display_name":"J. Andres Torres","orcid":"https://orcid.org/0009-0004-4708-4683"},"institutions":[{"id":"https://openalex.org/I105695857","display_name":"Siemens (Hungary)","ror":"https://ror.org/01rk7mv85","country_code":"HU","type":"company","lineage":["https://openalex.org/I105695857","https://openalex.org/I1325886976"]},{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["HU","US"],"is_corresponding":false,"raw_author_name":"J. A. Torres","raw_affiliation_strings":["Design-to-Silicon Division, Mentor Graphics Corporation, Wilsonville, OR, USA","Design to Silicon Div., Mentor Graphics Corp., Wilsonville, OR, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Design-to-Silicon Division, Mentor Graphics Corporation, Wilsonville, OR, USA","institution_ids":["https://openalex.org/I4210156212"]},{"raw_affiliation_string":"Design to Silicon Div., Mentor Graphics Corp., Wilsonville, OR, USA","institution_ids":["https://openalex.org/I105695857"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5011883763","display_name":"David Z. Pan","orcid":"https://orcid.org/0000-0002-5705-2501"},"institutions":[{"id":"https://openalex.org/I86519309","display_name":"The University of Texas at Austin","ror":"https://ror.org/00hj54h04","country_code":"US","type":"education","lineage":["https://openalex.org/I86519309"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"D. Z. Pan","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of Texas at Austin, Austin, TX, USA","Dept. of Electr. &, Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of Texas at Austin, Austin, TX, USA","institution_ids":["https://openalex.org/I86519309"]},{"raw_affiliation_string":"Dept. of Electr. &, Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA","institution_ids":["https://openalex.org/I86519309"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.6262,"has_fulltext":false,"cited_by_count":80,"citation_normalized_percentile":{"value":0.85122647,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":99},"biblio":{"volume":"30","issue":"11","first_page":"1621","last_page":"1634"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.9943000078201294,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12072","display_name":"Machine Learning and Algorithms","score":0.9929999709129333,"subfield":{"id":"https://openalex.org/subfields/1702","display_name":"Artificial Intelligence"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/hotspot","display_name":"Hotspot (geology)","score":0.8899157643318176},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6961624622344971},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.5194813013076782},{"id":"https://openalex.org/keywords/generality","display_name":"Generality","score":0.5008144378662109},{"id":"https://openalex.org/keywords/pattern-matching","display_name":"Pattern matching","score":0.4768756031990051},{"id":"https://openalex.org/keywords/pattern-recognition","display_name":"Pattern recognition (psychology)","score":0.3538288474082947},{"id":"https://openalex.org/keywords/data-mining","display_name":"Data mining","score":0.34995895624160767},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.3262529969215393}],"concepts":[{"id":"https://openalex.org/C146481406","wikidata":"https://www.wikidata.org/wiki/Q105131","display_name":"Hotspot (geology)","level":2,"score":0.8899157643318176},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6961624622344971},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5194813013076782},{"id":"https://openalex.org/C2780767217","wikidata":"https://www.wikidata.org/wiki/Q5532421","display_name":"Generality","level":2,"score":0.5008144378662109},{"id":"https://openalex.org/C68859911","wikidata":"https://www.wikidata.org/wiki/Q1503724","display_name":"Pattern matching","level":2,"score":0.4768756031990051},{"id":"https://openalex.org/C153180895","wikidata":"https://www.wikidata.org/wiki/Q7148389","display_name":"Pattern recognition (psychology)","level":2,"score":0.3538288474082947},{"id":"https://openalex.org/C124101348","wikidata":"https://www.wikidata.org/wiki/Q172491","display_name":"Data mining","level":1,"score":0.34995895624160767},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.3262529969215393},{"id":"https://openalex.org/C15744967","wikidata":"https://www.wikidata.org/wiki/Q9418","display_name":"Psychology","level":0,"score":0.0},{"id":"https://openalex.org/C8058405","wikidata":"https://www.wikidata.org/wiki/Q46255","display_name":"Geophysics","level":1,"score":0.0},{"id":"https://openalex.org/C542102704","wikidata":"https://www.wikidata.org/wiki/Q183257","display_name":"Psychotherapist","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C142362112","wikidata":"https://www.wikidata.org/wiki/Q735","display_name":"Art","level":0,"score":0.0},{"id":"https://openalex.org/C153349607","wikidata":"https://www.wikidata.org/wiki/Q36649","display_name":"Visual arts","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tcad.2011.2164537","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tcad.2011.2164537","pdf_url":null,"source":{"id":"https://openalex.org/S100835903","display_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","issn_l":"0278-0070","issn":["0278-0070","1937-4151"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/9","score":0.6299999952316284,"display_name":"Industry, innovation and infrastructure"}],"awards":[],"funders":[{"id":"https://openalex.org/F4320310620","display_name":"University of Texas at Austin","ror":"https://ror.org/00hj54h04"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":32,"referenced_works":["https://openalex.org/W1987429233","https://openalex.org/W2002428239","https://openalex.org/W2008307696","https://openalex.org/W2011883144","https://openalex.org/W2025250515","https://openalex.org/W2037378117","https://openalex.org/W2039117578","https://openalex.org/W2051050853","https://openalex.org/W2055299283","https://openalex.org/W2055375155","https://openalex.org/W2082706261","https://openalex.org/W2101703365","https://openalex.org/W2108961335","https://openalex.org/W2113125366","https://openalex.org/W2115092649","https://openalex.org/W2115694019","https://openalex.org/W2117532720","https://openalex.org/W2121359873","https://openalex.org/W2125031708","https://openalex.org/W2138275253","https://openalex.org/W2143908786","https://openalex.org/W2169435381","https://openalex.org/W2170802486","https://openalex.org/W3147744269","https://openalex.org/W3150329878","https://openalex.org/W3150640074","https://openalex.org/W4247085725","https://openalex.org/W4297970700","https://openalex.org/W6657051623","https://openalex.org/W6664060705","https://openalex.org/W6671128129","https://openalex.org/W6677380243"],"related_works":["https://openalex.org/W2045049461","https://openalex.org/W4381094582","https://openalex.org/W1978893398","https://openalex.org/W1977906818","https://openalex.org/W2201908702","https://openalex.org/W2369625323","https://openalex.org/W2364579609","https://openalex.org/W1522139108","https://openalex.org/W2353528968","https://openalex.org/W2051997388"],"abstract_inverted_index":{"Under":[0],"the":[1,83],"real":[2,14,125],"and":[3,24,41,51,75,106,110,128,143],"evolving":[4],"manufacturing":[5,126],"conditions,":[6],"lithography":[7],"hotspot":[8,44,67,91,103,154,191],"detection":[9,68,92,175,192],"faces":[10],"many":[11],"challenges.":[12],"First,":[13],"hotspots":[15,167],"become":[16],"hard":[17,25],"to":[18,26,38,70,140,146,184],"identify":[19],"at":[20,28],"early":[21],"design":[22],"stages":[23],"fix":[27],"post-layout":[29],"stages.":[30],"Second,":[31],"false":[32,137],"alarms":[33,138],"must":[34],"be":[35],"kept":[36],"low":[37],"avoid":[39,71],"excessive":[40,76],"expensive":[42,183],"post-processing":[43],"removal.":[45],"Third,":[46],"full":[47],"chip":[48],"physical":[49,198],"verification":[50],"optimization":[52],"require":[53],"very":[54],"fast":[55,98],"turn-around":[56],"time.":[57],"Last":[58],"but":[59],"not":[60,170],"least,":[61],"rapid":[62],"technology":[63,79],"advancement":[64],"favors":[65],"generic":[66,109],"methodologies":[69],"exhaustive":[72,178],"pattern":[73,104,158,179],"enumeration":[74,180],"development/update":[77],"as":[78],"evolves.":[80],"To":[81],"address":[82],"above":[84],"issues,":[85],"we":[86],"propose":[87],"a":[88,97,108,186],"high":[89,189],"performance":[90,115,190],"methodology":[93],"consisting":[94],"of:":[95],"1)":[96],"layout":[99],"analyzer;":[100],"2)":[101],"powerful":[102],"identifiers;":[105],"3)":[107],"efficient":[111],"flow":[112],"with":[113,121,157],"successive":[114],"refinements.":[116],"We":[117],"implement":[118],"our":[119,160],"algorithms":[120,135],"industry-strength":[122],"engine":[123],"under":[124],"conditions":[127],"show":[129],"that":[130,168],"it":[131],"significantly":[132],"outperforms":[133],"state-of-the-art":[134],"in":[136],"(2.4X":[139],"2300X":[141],"reduction)":[142],"runtime":[144],"(5X":[145],"237X":[147],"reduction),":[148],"meanwhile":[149],"achieving":[150],"similar":[151],"or":[152],"better":[153],"accuracies.":[155],"Compared":[156],"matching,":[159],"method":[161],"achieves":[162],"higher":[163],"prediction":[164],"accuracy":[165],"for":[166,196],"are":[169],"previously":[171],"characterized,":[172],"therefore,":[173],"more":[174],"generality":[176],"when":[177],"is":[181,193],"too":[182],"perform":[185],"priori.":[187],"Such":[188],"especially":[194],"suitable":[195],"lithography-friendly":[197],"design.":[199]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":4},{"year":2024,"cited_by_count":6},{"year":2023,"cited_by_count":7},{"year":2022,"cited_by_count":6},{"year":2021,"cited_by_count":7},{"year":2020,"cited_by_count":3},{"year":2019,"cited_by_count":12},{"year":2018,"cited_by_count":8},{"year":2017,"cited_by_count":9},{"year":2016,"cited_by_count":5},{"year":2015,"cited_by_count":5},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":3},{"year":2012,"cited_by_count":3}],"updated_date":"2026-07-30T17:31:21.811387","created_date":"2025-10-10T00:00:00"}