{"id":"https://openalex.org/W2023347947","doi":"https://doi.org/10.1109/isqed.2012.6187534","title":"CMOS op-amp circuit synthesis with geometric programming models for layout-dependent effects","display_name":"CMOS op-amp circuit synthesis with geometric programming models for layout-dependent effects","publication_year":2012,"publication_date":"2012-03-01","ids":{"openalex":"https://openalex.org/W2023347947","doi":"https://doi.org/10.1109/isqed.2012.6187534","mag":"2023347947"},"language":"en","primary_location":{"id":"doi:10.1109/isqed.2012.6187534","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isqed.2012.6187534","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thirteenth International Symposium on Quality Electronic Design (ISQED)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5102260148","display_name":"Yu Zhang","orcid":"https://orcid.org/0009-0008-0180-6555"},"institutions":[{"id":"https://openalex.org/I17056963","display_name":"The University of Kitakyushu","ror":"https://ror.org/03mfefw72","country_code":"JP","type":"education","lineage":["https://openalex.org/I17056963"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Yu Zhang","raw_affiliation_strings":["The University of Kitakyushu, Fukuoka, Japan","The University of Kitakyushu Fukuoka 808-0135, Japan"],"affiliations":[{"raw_affiliation_string":"The University of Kitakyushu, Fukuoka, Japan","institution_ids":["https://openalex.org/I17056963"]},{"raw_affiliation_string":"The University of Kitakyushu Fukuoka 808-0135, Japan","institution_ids":["https://openalex.org/I17056963"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100461643","display_name":"Bo Liu","orcid":"https://orcid.org/0000-0002-3093-4571"},"institutions":[{"id":"https://openalex.org/I17056963","display_name":"The University of Kitakyushu","ror":"https://ror.org/03mfefw72","country_code":"JP","type":"education","lineage":["https://openalex.org/I17056963"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Bo Liu","raw_affiliation_strings":["The University of Kitakyushu, Fukuoka, Japan","The University of Kitakyushu Fukuoka 808-0135, Japan"],"affiliations":[{"raw_affiliation_string":"The University of Kitakyushu, Fukuoka, Japan","institution_ids":["https://openalex.org/I17056963"]},{"raw_affiliation_string":"The University of Kitakyushu Fukuoka 808-0135, Japan","institution_ids":["https://openalex.org/I17056963"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5065368480","display_name":"Bo Yang","orcid":"https://orcid.org/0000-0001-7961-853X"},"institutions":[{"id":"https://openalex.org/I17056963","display_name":"The University of Kitakyushu","ror":"https://ror.org/03mfefw72","country_code":"JP","type":"education","lineage":["https://openalex.org/I17056963"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Bo Yang","raw_affiliation_strings":["The University of Kitakyushu, Fukuoka, Japan","The University of Kitakyushu Fukuoka 808-0135, Japan"],"affiliations":[{"raw_affiliation_string":"The University of Kitakyushu, Fukuoka, Japan","institution_ids":["https://openalex.org/I17056963"]},{"raw_affiliation_string":"The University of Kitakyushu Fukuoka 808-0135, Japan","institution_ids":["https://openalex.org/I17056963"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100336796","display_name":"Jing Li","orcid":"https://orcid.org/0000-0001-7792-4322"},"institutions":[{"id":"https://openalex.org/I17056963","display_name":"The University of Kitakyushu","ror":"https://ror.org/03mfefw72","country_code":"JP","type":"education","lineage":["https://openalex.org/I17056963"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Jing Li","raw_affiliation_strings":["The University of Kitakyushu, Fukuoka, Japan","The University of Kitakyushu Fukuoka 808-0135, Japan"],"affiliations":[{"raw_affiliation_string":"The University of Kitakyushu, Fukuoka, Japan","institution_ids":["https://openalex.org/I17056963"]},{"raw_affiliation_string":"The University of Kitakyushu Fukuoka 808-0135, Japan","institution_ids":["https://openalex.org/I17056963"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5000531897","display_name":"Shigetoshi Nakatake","orcid":null},"institutions":[{"id":"https://openalex.org/I17056963","display_name":"The University of Kitakyushu","ror":"https://ror.org/03mfefw72","country_code":"JP","type":"education","lineage":["https://openalex.org/I17056963"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shigetoshi Nakatake","raw_affiliation_strings":["The University of Kitakyushu, Fukuoka, Japan","The University of Kitakyushu Fukuoka 808-0135, Japan"],"affiliations":[{"raw_affiliation_string":"The University of Kitakyushu, Fukuoka, Japan","institution_ids":["https://openalex.org/I17056963"]},{"raw_affiliation_string":"The University of Kitakyushu Fukuoka 808-0135, Japan","institution_ids":["https://openalex.org/I17056963"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":5,"corresponding_author_ids":["https://openalex.org/A5102260148"],"corresponding_institution_ids":["https://openalex.org/I17056963"],"apc_list":null,"apc_paid":null,"fwci":1.2449,"has_fulltext":false,"cited_by_count":16,"citation_normalized_percentile":{"value":0.81349009,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":98},"biblio":{"volume":"111","issue":"216","first_page":"464","last_page":"469"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/shallow-trench-isolation","display_name":"Shallow trench isolation","score":0.9401490092277527},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.795591413974762},{"id":"https://openalex.org/keywords/geometric-programming","display_name":"Geometric programming","score":0.6372644901275635},{"id":"https://openalex.org/keywords/integrated-circuit-layout","display_name":"Integrated circuit layout","score":0.5326549410820007},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.4949018359184265},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.4834212064743042},{"id":"https://openalex.org/keywords/trench","display_name":"Trench","score":0.4653623402118683},{"id":"https://openalex.org/keywords/circuit-design","display_name":"Circuit design","score":0.4359460771083832},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.425883412361145},{"id":"https://openalex.org/keywords/semiconductor-device-modeling","display_name":"Semiconductor device modeling","score":0.4248512089252472},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.4166768193244934},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.31631791591644287},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.24662691354751587},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.07956746220588684}],"concepts":[{"id":"https://openalex.org/C105066941","wikidata":"https://www.wikidata.org/wiki/Q1424524","display_name":"Shallow trench isolation","level":4,"score":0.9401490092277527},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.795591413974762},{"id":"https://openalex.org/C20729856","wikidata":"https://www.wikidata.org/wiki/Q2078279","display_name":"Geometric programming","level":2,"score":0.6372644901275635},{"id":"https://openalex.org/C2765594","wikidata":"https://www.wikidata.org/wiki/Q2624187","display_name":"Integrated circuit layout","level":3,"score":0.5326549410820007},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4949018359184265},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.4834212064743042},{"id":"https://openalex.org/C155310634","wikidata":"https://www.wikidata.org/wiki/Q1852785","display_name":"Trench","level":3,"score":0.4653623402118683},{"id":"https://openalex.org/C190560348","wikidata":"https://www.wikidata.org/wiki/Q3245116","display_name":"Circuit design","level":2,"score":0.4359460771083832},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.425883412361145},{"id":"https://openalex.org/C4775677","wikidata":"https://www.wikidata.org/wiki/Q7449393","display_name":"Semiconductor device modeling","level":3,"score":0.4248512089252472},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.4166768193244934},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.31631791591644287},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.24662691354751587},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.07956746220588684},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0},{"id":"https://openalex.org/C119857082","wikidata":"https://www.wikidata.org/wiki/Q2539","display_name":"Machine learning","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/isqed.2012.6187534","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isqed.2012.6187534","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thirteenth International Symposium on Quality Electronic Design (ISQED)","raw_type":"proceedings-article"},{"id":"mag:2943535738","is_oa":false,"landing_page_url":"https://www.ieice.org/ken/paper/20110926w0iY/eng/","pdf_url":null,"source":{"id":"https://openalex.org/S4306512848","display_name":"IEICE Technical Report; IEICE Tech. Rep.","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":null,"raw_source_name":"IEICE Technical Report; IEICE Tech. Rep.","raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":20,"referenced_works":["https://openalex.org/W72161989","https://openalex.org/W1598638350","https://openalex.org/W2021951579","https://openalex.org/W2090769959","https://openalex.org/W2106476087","https://openalex.org/W2107793705","https://openalex.org/W2118456109","https://openalex.org/W2118783459","https://openalex.org/W2125411772","https://openalex.org/W2128369443","https://openalex.org/W2128613910","https://openalex.org/W2148808647","https://openalex.org/W2163318360","https://openalex.org/W2169661305","https://openalex.org/W2170465406","https://openalex.org/W2171048418","https://openalex.org/W3140034169","https://openalex.org/W4285719527","https://openalex.org/W6602860226","https://openalex.org/W6677766680"],"related_works":["https://openalex.org/W2138392249","https://openalex.org/W2153345224","https://openalex.org/W1993164156","https://openalex.org/W2023347947","https://openalex.org/W2143655922","https://openalex.org/W2099895617","https://openalex.org/W2163197801","https://openalex.org/W2376028644","https://openalex.org/W2036121598","https://openalex.org/W2070475173"],"abstract_inverted_index":{"This":[0],"paper":[1],"addresses":[2],"CMOS":[3,78,148],"analog":[4,114],"circuit":[5,23,57,115,157],"synthesis":[6,58],"in":[7,55,76],"the":[8,17,26,34,40,47,56,61,86,91,98,101,109,113,118,126,130,134,138,142,156,159,166,170,173],"nanometer":[9],"process":[10],"based":[11,136],"on":[12,137],"geometric":[13,160],"programming":[14,161],"models.":[15],"In":[16,104,141],"current":[18],"era":[19],"of":[20,60,100,112,145],"electronic":[21],"integrated":[22],"(IC)":[24],"manufacturing,":[25],"channel":[27],"length":[28],"modulation":[29],"\u03bb":[30,119],"as":[31,33,39,122,124],"well":[32,48,102,123],"layout-dependent":[35],"effects":[36],"(LDE)":[37],"such":[38],"shallow":[41],"trench":[42],"isolation":[43,72],"(STI)":[44],"stress":[45,83,132],"and":[46,63,84,133,163],"proximity":[49],"effect":[50],"(WPE)":[51],"must":[52],"be":[53],"considered":[54],"because":[59],"more":[62,64],"shrinking":[65],"process.":[66],"The":[67,88],"STI":[68,131],"is":[69,90],"a":[70,146],"popular":[71],"between":[73],"active":[74],"regions":[75],"advanced":[77],"technologies":[79],"but":[80],"it":[81],"causes":[82],"influences":[85],"mobility.":[87],"WPE":[89,135],"characteristics":[92],"variation":[93],"for":[94],"devices":[95],"located":[96],"near":[97],"edge":[99],"mask.":[103],"this":[105],"paper,":[106],"we":[107,154],"provide":[108],"posynomial":[110],"models":[111],"specification":[116,171],"taking":[117],"into":[120],"account":[121],"introducing":[125],"curve":[127],"fitting":[128],"to":[129],"BSIM":[139],"model.":[140],"design":[143],"case":[144],"typical":[147],"op-amp,":[149],"with":[150],"these":[151],"LDE-aware":[152],"models,":[153],"optimized":[155],"by":[158,172],"(GP)":[162],"showed":[164],"that":[165],"optimal":[167],"results":[168],"satisfied":[169],"simulation.":[174]},"counts_by_year":[{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2018,"cited_by_count":4},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":2},{"year":2013,"cited_by_count":2}],"updated_date":"2026-04-04T16:13:02.066488","created_date":"2025-10-10T00:00:00"}