{"id":"https://openalex.org/W2149414399","doi":"https://doi.org/10.1109/isqed.2009.4810286","title":"Control of design specific variation in etch-assisted via pattern transfer by means of full-chip simulation","display_name":"Control of design specific variation in etch-assisted via pattern transfer by means of full-chip simulation","publication_year":2009,"publication_date":"2009-03-01","ids":{"openalex":"https://openalex.org/W2149414399","doi":"https://doi.org/10.1109/isqed.2009.4810286","mag":"2149414399"},"language":"en","primary_location":{"id":"doi:10.1109/isqed.2009.4810286","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isqed.2009.4810286","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2009 10th International Symposium on Quality Electronic Design","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5021627904","display_name":"Valeriy Sukharev","orcid":"https://orcid.org/0000-0002-5647-0584"},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Valeriy Sukharev","raw_affiliation_strings":["Mentor Graphics Corporation, San Jose, CA, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, San Jose, CA, USA","institution_ids":["https://openalex.org/I4210156212"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5013605756","display_name":"Ara Markosian","orcid":null},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ara Markosian","raw_affiliation_strings":["Mentor Graphics Corporation, San Jose, CA, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, San Jose, CA, USA","institution_ids":["https://openalex.org/I4210156212"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5036199179","display_name":"Armen Kteyan","orcid":"https://orcid.org/0000-0002-8743-0155"},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Armen Kteyan","raw_affiliation_strings":["Mentor Graphics Corporation, San Jose, CA, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, San Jose, CA, USA","institution_ids":["https://openalex.org/I4210156212"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071260916","display_name":"Levon Manukyan","orcid":"https://orcid.org/0000-0003-3314-5284"},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Levon Manukyan","raw_affiliation_strings":["Mentor Graphics Corporation, San Jose, CA, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, San Jose, CA, USA","institution_ids":["https://openalex.org/I4210156212"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5024092243","display_name":"N. K. Khachatryan","orcid":null},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Nikolay Khachatryan","raw_affiliation_strings":["Mentor Graphics Corporation, San Jose, CA, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, San Jose, CA, USA","institution_ids":["https://openalex.org/I4210156212"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089574594","display_name":"Jun-Ho Choy","orcid":"https://orcid.org/0000-0002-8977-5720"},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jun-Ho Choy","raw_affiliation_strings":["Mentor Graphics Corporation, San Jose, CA, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, San Jose, CA, USA","institution_ids":["https://openalex.org/I4210156212"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5058620246","display_name":"Hasmik Lazaryan","orcid":null},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Hasmik Lazaryan","raw_affiliation_strings":["Mentor Graphics Corporation, San Jose, CA, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, San Jose, CA, USA","institution_ids":["https://openalex.org/I4210156212"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000720628","display_name":"Henrik Hovsepyan","orcid":null},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Henrik Hovsepyan","raw_affiliation_strings":["Mentor Graphics Corporation, San Jose, CA, USA"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, San Jose, CA, USA","institution_ids":["https://openalex.org/I4210156212"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080178958","display_name":"Seiji Onoue","orcid":null},"institutions":[{"id":"https://openalex.org/I1292669757","display_name":"Toshiba (Japan)","ror":"https://ror.org/0326v3z14","country_code":"JP","type":"company","lineage":["https://openalex.org/I1292669757"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Seiji Onoue","raw_affiliation_strings":["Corporate Manufacturing Engineering Center, Toshiba Corporation, Japan"],"affiliations":[{"raw_affiliation_string":"Corporate Manufacturing Engineering Center, Toshiba Corporation, Japan","institution_ids":["https://openalex.org/I1292669757"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102169526","display_name":"Takuo Kikuchi","orcid":null},"institutions":[{"id":"https://openalex.org/I1292669757","display_name":"Toshiba (Japan)","ror":"https://ror.org/0326v3z14","country_code":"JP","type":"company","lineage":["https://openalex.org/I1292669757"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takuo Kikuchi","raw_affiliation_strings":["Corporate Manufacturing Engineering Center, Toshiba Corporation, Japan"],"affiliations":[{"raw_affiliation_string":"Corporate Manufacturing Engineering Center, Toshiba Corporation, Japan","institution_ids":["https://openalex.org/I1292669757"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5020263997","display_name":"Tetsuya Kamigaki","orcid":null},"institutions":[{"id":"https://openalex.org/I1292669757","display_name":"Toshiba (Japan)","ror":"https://ror.org/0326v3z14","country_code":"JP","type":"company","lineage":["https://openalex.org/I1292669757"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tetsuya Kamigaki","raw_affiliation_strings":["Advanced Memory Development Center, Toshiba Corporation, Japan"],"affiliations":[{"raw_affiliation_string":"Advanced Memory Development Center, Toshiba Corporation, Japan","institution_ids":["https://openalex.org/I1292669757"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":11,"corresponding_author_ids":["https://openalex.org/A5021627904"],"corresponding_institution_ids":["https://openalex.org/I4210156212"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.19538177,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"a19","issue":null,"first_page":"156","last_page":"161"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T13126","display_name":"Scientific Research and Discoveries","score":0.9987000226974487,"subfield":{"id":"https://openalex.org/subfields/3109","display_name":"Statistical and Nonlinear Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T13126","display_name":"Scientific Research and Discoveries","score":0.9987000226974487,"subfield":{"id":"https://openalex.org/subfields/3109","display_name":"Statistical and Nonlinear Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.996399998664856,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9937000274658203,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5980027318000793},{"id":"https://openalex.org/keywords/chip","display_name":"Chip","score":0.5909230709075928},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5459297299385071},{"id":"https://openalex.org/keywords/process-variation","display_name":"Process variation","score":0.5366740822792053},{"id":"https://openalex.org/keywords/critical-dimension","display_name":"Critical dimension","score":0.524744987487793},{"id":"https://openalex.org/keywords/dimension","display_name":"Dimension (graph theory)","score":0.4556288421154022},{"id":"https://openalex.org/keywords/process-design","display_name":"Process design","score":0.45268478989601135},{"id":"https://openalex.org/keywords/design-of-experiments","display_name":"Design of experiments","score":0.4442261755466461},{"id":"https://openalex.org/keywords/optimal-design","display_name":"Optimal design","score":0.4229263365268707},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.2150658369064331},{"id":"https://openalex.org/keywords/process-engineering","display_name":"Process engineering","score":0.14607617259025574},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.13050639629364014},{"id":"https://openalex.org/keywords/process-integration","display_name":"Process integration","score":0.07514688372612},{"id":"https://openalex.org/keywords/machine-learning","display_name":"Machine learning","score":0.07414910197257996}],"concepts":[{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5980027318000793},{"id":"https://openalex.org/C165005293","wikidata":"https://www.wikidata.org/wiki/Q1074500","display_name":"Chip","level":2,"score":0.5909230709075928},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5459297299385071},{"id":"https://openalex.org/C93389723","wikidata":"https://www.wikidata.org/wiki/Q7247313","display_name":"Process variation","level":3,"score":0.5366740822792053},{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.524744987487793},{"id":"https://openalex.org/C33676613","wikidata":"https://www.wikidata.org/wiki/Q13415176","display_name":"Dimension (graph theory)","level":2,"score":0.4556288421154022},{"id":"https://openalex.org/C55396564","wikidata":"https://www.wikidata.org/wiki/Q3084971","display_name":"Process design","level":3,"score":0.45268478989601135},{"id":"https://openalex.org/C34559072","wikidata":"https://www.wikidata.org/wiki/Q2334061","display_name":"Design of experiments","level":2,"score":0.4442261755466461},{"id":"https://openalex.org/C186394612","wikidata":"https://www.wikidata.org/wiki/Q7098942","display_name":"Optimal design","level":2,"score":0.4229263365268707},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.2150658369064331},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.14607617259025574},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.13050639629364014},{"id":"https://openalex.org/C54725748","wikidata":"https://www.wikidata.org/wiki/Q7247277","display_name":"Process integration","level":2,"score":0.07514688372612},{"id":"https://openalex.org/C119857082","wikidata":"https://www.wikidata.org/wiki/Q2539","display_name":"Machine learning","level":1,"score":0.07414910197257996},{"id":"https://openalex.org/C202444582","wikidata":"https://www.wikidata.org/wiki/Q837863","display_name":"Pure mathematics","level":1,"score":0.0},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.0},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/isqed.2009.4810286","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isqed.2009.4810286","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2009 10th International Symposium on Quality Electronic Design","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":8,"referenced_works":["https://openalex.org/W1562617726","https://openalex.org/W2018102233","https://openalex.org/W2033531564","https://openalex.org/W2057313040","https://openalex.org/W2074400411","https://openalex.org/W2113699851","https://openalex.org/W2147474017","https://openalex.org/W2150109955"],"related_works":["https://openalex.org/W2262437913","https://openalex.org/W1977714017","https://openalex.org/W2146747462","https://openalex.org/W3027127513","https://openalex.org/W38003520","https://openalex.org/W1975031781","https://openalex.org/W2918335920","https://openalex.org/W2114517996","https://openalex.org/W2082729972","https://openalex.org/W3184080862"],"abstract_inverted_index":{"A":[0,82],"novel":[1,96],"model-based":[2],"algorithm":[3,24],"provides":[4],"a":[5,50,62,73,79],"capability":[6],"to":[7,27,68,110],"control":[8],"full-chip":[9],"design":[10,104,115],"specific":[11],"variation":[12],"in":[13,42,78,108],"pattern":[14],"transfer":[15],"caused":[16],"by":[17,89],"via/contact":[18],"etch":[19,31,53,65,98],"processes.":[20],"This":[21],"physics":[22],"based":[23,33],"is":[25],"capable":[26],"detect":[28],"and":[29],"report":[30],"hotspots":[32],"on":[34],"the":[35,70,90,103,111],"fab":[36],"defined":[37],"thresholds":[38],"of":[39,46,72,75,85],"acceptable":[40],"variations":[41],"critical":[43],"dimension":[44],"(CD)":[45],"etched":[47],"shapes":[48],"for":[49,64,102],"prospective":[51],"dry":[52],"process":[54,66,86,106,113],"step.":[55],"It":[56],"can":[57],"be":[58],"used":[59],"also":[60],"as":[61],"tool":[63,101],"optimization":[67,107],"capture":[69],"impact":[71],"variety":[74],"patterns":[76],"presented":[77],"particular":[80],"design.":[81],"realistic":[83],"set":[84],"parameters":[87],"employed":[88],"developed":[91],"model":[92],"allows":[93],"using":[94],"this":[95],"via-contact":[97],"(VCE)":[99],"EDA":[100],"aware":[105,114],"addition":[109],"\"standard\"":[112],"optimization.":[116]},"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}