{"id":"https://openalex.org/W3041870864","doi":"https://doi.org/10.1109/drc50226.2020.9135186","title":"Tri-Gate Ferroelectric FET Characterization and Modelling for Online Training of Neural Networks at Room Temperature and 233K","display_name":"Tri-Gate Ferroelectric FET Characterization and Modelling for Online Training of Neural Networks at Room Temperature and 233K","publication_year":2020,"publication_date":"2020-06-01","ids":{"openalex":"https://openalex.org/W3041870864","doi":"https://doi.org/10.1109/drc50226.2020.9135186","mag":"3041870864"},"language":"en","primary_location":{"id":"doi:10.1109/drc50226.2020.9135186","is_oa":false,"landing_page_url":"https://doi.org/10.1109/drc50226.2020.9135186","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2020 Device Research Conference (DRC)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5064120844","display_name":"Sourav De","orcid":"https://orcid.org/0000-0002-1930-8799"},"institutions":[{"id":"https://openalex.org/I91807558","display_name":"National Cheng Kung University","ror":"https://ror.org/01b8kcc49","country_code":"TW","type":"education","lineage":["https://openalex.org/I91807558"]}],"countries":["TW"],"is_corresponding":true,"raw_author_name":"Sourav De","raw_affiliation_strings":["Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan"],"affiliations":[{"raw_affiliation_string":"Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan","institution_ids":["https://openalex.org/I91807558"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5025534658","display_name":"Md. Aftab Baig","orcid":"https://orcid.org/0000-0002-4727-1006"},"institutions":[{"id":"https://openalex.org/I91807558","display_name":"National Cheng Kung University","ror":"https://ror.org/01b8kcc49","country_code":"TW","type":"education","lineage":["https://openalex.org/I91807558"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Md. Aftab Baig","raw_affiliation_strings":["Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan"],"affiliations":[{"raw_affiliation_string":"Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan","institution_ids":["https://openalex.org/I91807558"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014710055","display_name":"Bo-Han Qiu","orcid":null},"institutions":[{"id":"https://openalex.org/I91807558","display_name":"National Cheng Kung University","ror":"https://ror.org/01b8kcc49","country_code":"TW","type":"education","lineage":["https://openalex.org/I91807558"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Bo-Han Qiu","raw_affiliation_strings":["Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan"],"affiliations":[{"raw_affiliation_string":"Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan","institution_ids":["https://openalex.org/I91807558"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5038947493","display_name":"Darsen D. Lu","orcid":"https://orcid.org/0000-0002-1956-6093"},"institutions":[{"id":"https://openalex.org/I91807558","display_name":"National Cheng Kung University","ror":"https://ror.org/01b8kcc49","country_code":"TW","type":"education","lineage":["https://openalex.org/I91807558"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Darsen Lu","raw_affiliation_strings":["Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan"],"affiliations":[{"raw_affiliation_string":"Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan","institution_ids":["https://openalex.org/I91807558"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112534819","display_name":"Po-Jung Sung","orcid":null},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Po-Jung Sung","raw_affiliation_strings":["Taiwan Semiconductor Research Institute, Hsinchu, Taiwan"],"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Research Institute, Hsinchu, Taiwan","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108271671","display_name":"F.K. Hsueh","orcid":null},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Fu.K Hsueh","raw_affiliation_strings":["Taiwan Semiconductor Research Institute, Hsinchu, Taiwan"],"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Research Institute, Hsinchu, Taiwan","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5038015120","display_name":"Yao\u2010Jen Lee","orcid":"https://orcid.org/0000-0001-9643-111X"},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Yao-Jen Lee","raw_affiliation_strings":["Taiwan Semiconductor Research Institute, Hsinchu, Taiwan"],"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Research Institute, Hsinchu, Taiwan","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5014936927","display_name":"Chun-Jung Su","orcid":"https://orcid.org/0000-0003-4791-1381"},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Chun-Jung Su","raw_affiliation_strings":["Taiwan Semiconductor Research Institute, Hsinchu, Taiwan"],"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Research Institute, Hsinchu, Taiwan","institution_ids":["https://openalex.org/I4210120917"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":8,"corresponding_author_ids":["https://openalex.org/A5064120844"],"corresponding_institution_ids":["https://openalex.org/I91807558"],"apc_list":null,"apc_paid":null,"fwci":2.3932,"has_fulltext":false,"cited_by_count":28,"citation_normalized_percentile":{"value":0.89155994,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":91,"max":99},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"2"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":0.9991000294685364,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.991599977016449,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ferroelectricity","display_name":"Ferroelectricity","score":0.8226686716079712},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7322065830230713},{"id":"https://openalex.org/keywords/neuromorphic-engineering","display_name":"Neuromorphic engineering","score":0.6770696043968201},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.6187799572944641},{"id":"https://openalex.org/keywords/artificial-neural-network","display_name":"Artificial neural network","score":0.6110137104988098},{"id":"https://openalex.org/keywords/process-window","display_name":"Process window","score":0.4893748164176941},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.4548552334308624},{"id":"https://openalex.org/keywords/silicon-on-insulator","display_name":"Silicon on insulator","score":0.4475541412830353},{"id":"https://openalex.org/keywords/window","display_name":"Window (computing)","score":0.43230023980140686},{"id":"https://openalex.org/keywords/atmospheric-temperature-range","display_name":"Atmospheric temperature range","score":0.4313836991786957},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.4113466143608093},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.3527919054031372},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.22311511635780334},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.15223905444145203},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.11680176854133606},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.11048126220703125}],"concepts":[{"id":"https://openalex.org/C79090758","wikidata":"https://www.wikidata.org/wiki/Q1045739","display_name":"Ferroelectricity","level":3,"score":0.8226686716079712},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7322065830230713},{"id":"https://openalex.org/C151927369","wikidata":"https://www.wikidata.org/wiki/Q1981312","display_name":"Neuromorphic engineering","level":3,"score":0.6770696043968201},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6187799572944641},{"id":"https://openalex.org/C50644808","wikidata":"https://www.wikidata.org/wiki/Q192776","display_name":"Artificial neural network","level":2,"score":0.6110137104988098},{"id":"https://openalex.org/C2777441419","wikidata":"https://www.wikidata.org/wiki/Q16969460","display_name":"Process window","level":3,"score":0.4893748164176941},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.4548552334308624},{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.4475541412830353},{"id":"https://openalex.org/C2778751112","wikidata":"https://www.wikidata.org/wiki/Q835016","display_name":"Window (computing)","level":2,"score":0.43230023980140686},{"id":"https://openalex.org/C39353612","wikidata":"https://www.wikidata.org/wiki/Q5283759","display_name":"Atmospheric temperature range","level":2,"score":0.4313836991786957},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.4113466143608093},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3527919054031372},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.22311511635780334},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.15223905444145203},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.11680176854133606},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.11048126220703125},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.0},{"id":"https://openalex.org/C153294291","wikidata":"https://www.wikidata.org/wiki/Q25261","display_name":"Meteorology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/drc50226.2020.9135186","is_oa":false,"landing_page_url":"https://doi.org/10.1109/drc50226.2020.9135186","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2020 Device Research Conference (DRC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.46000000834465027,"display_name":"Affordable and clean energy","id":"https://metadata.un.org/sdg/7"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2986579802","https://openalex.org/W3108691306","https://openalex.org/W4389237622","https://openalex.org/W4385753159","https://openalex.org/W4200152843","https://openalex.org/W4214914769","https://openalex.org/W4387251107","https://openalex.org/W2166309310","https://openalex.org/W4317717548","https://openalex.org/W2113107144"],"abstract_inverted_index":{"This":[0],"paper":[1],"reports":[2],"detailed":[3],"analysis":[4],"on":[5,34],"switching":[6,43,70],"dynamics":[7],"and":[8,47,55,67],"device":[9],"variability":[10],"over":[11,53],"a":[12],"wide":[13],"range":[14],"of":[15,60],"temperatures":[16],"for":[17,77],"deeply":[18],"scaled":[19],"(40nm":[20],"gate":[21,31,57],"length)":[22],"tri-gate":[23],"ferroelectric":[24,42,74],"FETs":[25,75],"with":[26,82],"10nm":[27],"HZO":[28],"fabricated":[29],"using":[30],"first":[32],"process":[33],"SOI":[35],"wafers.":[36],"Our":[37],"experimental":[38],"results":[39],"manifest,":[40],"99%":[41],"at":[44,48],"room":[45],"temperature":[46],"233K.":[49],"A":[50],"memory":[51,61],"window":[52,62],"5V":[54],"strong":[56],"length":[58],"dependence":[59],"is":[63],"observed.":[64],"Highly":[65],"linear":[66],"symmetric":[68],"multilevel":[69],"characteristics":[71],"makes":[72],"our":[73],"suitable":[76],"neuromorphic":[78],"applications,":[79],"as":[80],"demonstrated":[81],"neural":[83],"network":[84],"online":[85],"training":[86],"simulations.":[87]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":11},{"year":2022,"cited_by_count":6},{"year":2021,"cited_by_count":4},{"year":2020,"cited_by_count":2}],"updated_date":"2026-04-01T17:29:45.350535","created_date":"2025-10-10T00:00:00"}