{"id":"https://openalex.org/W2042534689","doi":"https://doi.org/10.1109/aspdac.2012.6165049","title":"Efficient pattern relocation for EUV blank defect mitigation","display_name":"Efficient pattern relocation for EUV blank defect mitigation","publication_year":2012,"publication_date":"2012-01-01","ids":{"openalex":"https://openalex.org/W2042534689","doi":"https://doi.org/10.1109/aspdac.2012.6165049","mag":"2042534689"},"language":"en","primary_location":{"id":"doi:10.1109/aspdac.2012.6165049","is_oa":false,"landing_page_url":"https://doi.org/10.1109/aspdac.2012.6165049","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"17th Asia and South Pacific Design Automation Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100461085","display_name":"Hongbo Zhang","orcid":"https://orcid.org/0000-0001-7259-5419"},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Hongbo Zhang","raw_affiliation_strings":["Department of ECE, University of Illinois, Urbana-Champaign, USA","Department of ECE, Univ. of Illinois at Urbana-Champaign, USA"],"affiliations":[{"raw_affiliation_string":"Department of ECE, University of Illinois, Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]},{"raw_affiliation_string":"Department of ECE, Univ. of Illinois at Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069931478","display_name":"Yuelin Du","orcid":null},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Yuelin Du","raw_affiliation_strings":["Department of ECE, University of Illinois, Urbana-Champaign, USA","Department of ECE, Univ. of Illinois at Urbana-Champaign, USA"],"affiliations":[{"raw_affiliation_string":"Department of ECE, University of Illinois, Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]},{"raw_affiliation_string":"Department of ECE, Univ. of Illinois at Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053378706","display_name":"Martin D. F. Wong","orcid":"https://orcid.org/0000-0001-8274-9688"},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Martin D.F. Wong","raw_affiliation_strings":["Department of ECE, University of Illinois, Urbana-Champaign, USA","Department of ECE, Univ. of Illinois at Urbana-Champaign, USA"],"affiliations":[{"raw_affiliation_string":"Department of ECE, University of Illinois, Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]},{"raw_affiliation_string":"Department of ECE, Univ. of Illinois at Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5026321175","display_name":"Rasit O. Topalaglu","orcid":null},"institutions":[{"id":"https://openalex.org/I4210142027","display_name":"GlobalFoundries (Germany)","ror":"https://ror.org/045jad561","country_code":"DE","type":"company","lineage":["https://openalex.org/I35662394","https://openalex.org/I4210142027"]},{"id":"https://openalex.org/I35662394","display_name":"GlobalFoundries (United States)","ror":"https://ror.org/02h0ps145","country_code":"US","type":"company","lineage":["https://openalex.org/I35662394"]}],"countries":["DE","US"],"is_corresponding":false,"raw_author_name":"Rasit O. Topalaglu","raw_affiliation_strings":["GLOBALFOUNDRIES Inc., Germany","GLOBALFOUNDRIES Inc.,USA"],"affiliations":[{"raw_affiliation_string":"GLOBALFOUNDRIES Inc., Germany","institution_ids":["https://openalex.org/I4210142027"]},{"raw_affiliation_string":"GLOBALFOUNDRIES Inc.,USA","institution_ids":["https://openalex.org/I35662394"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5100461085"],"corresponding_institution_ids":["https://openalex.org/I157725225"],"apc_list":null,"apc_paid":null,"fwci":4.6646,"has_fulltext":false,"cited_by_count":20,"citation_normalized_percentile":{"value":0.9512819,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":90,"max":99},"biblio":{"volume":null,"issue":null,"first_page":"719","last_page":"724"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.9898999929428101,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/blank","display_name":"Blank","score":0.9373931884765625},{"id":"https://openalex.org/keywords/relocation","display_name":"Relocation","score":0.9175131916999817},{"id":"https://openalex.org/keywords/extreme-ultraviolet-lithography","display_name":"Extreme ultraviolet lithography","score":0.8987927436828613},{"id":"https://openalex.org/keywords/extreme-ultraviolet","display_name":"Extreme ultraviolet","score":0.6148030757904053},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.581723153591156},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.493897020816803},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.45267415046691895},{"id":"https://openalex.org/keywords/position","display_name":"Position (finance)","score":0.42049315571784973},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.24540665745735168},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.214262455701828},{"id":"https://openalex.org/keywords/mechanical-engineering","display_name":"Mechanical engineering","score":0.10370665788650513},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.10006299614906311},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.08553719520568848}],"concepts":[{"id":"https://openalex.org/C2778089247","wikidata":"https://www.wikidata.org/wiki/Q368951","display_name":"Blank","level":2,"score":0.9373931884765625},{"id":"https://openalex.org/C2779019381","wikidata":"https://www.wikidata.org/wiki/Q3499564","display_name":"Relocation","level":2,"score":0.9175131916999817},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.8987927436828613},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.6148030757904053},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.581723153591156},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.493897020816803},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.45267415046691895},{"id":"https://openalex.org/C198082294","wikidata":"https://www.wikidata.org/wiki/Q3399648","display_name":"Position (finance)","level":2,"score":0.42049315571784973},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.24540665745735168},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.214262455701828},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.10370665788650513},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.10006299614906311},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.08553719520568848},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C10138342","wikidata":"https://www.wikidata.org/wiki/Q43015","display_name":"Finance","level":1,"score":0.0},{"id":"https://openalex.org/C162324750","wikidata":"https://www.wikidata.org/wiki/Q8134","display_name":"Economics","level":0,"score":0.0},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/aspdac.2012.6165049","is_oa":false,"landing_page_url":"https://doi.org/10.1109/aspdac.2012.6165049","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"17th Asia and South Pacific Design Automation Conference","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.5299999713897705,"display_name":"Climate action","id":"https://metadata.un.org/sdg/13"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":17,"referenced_works":["https://openalex.org/W58706342","https://openalex.org/W1971791869","https://openalex.org/W1980601158","https://openalex.org/W1988761585","https://openalex.org/W2003289079","https://openalex.org/W2016439177","https://openalex.org/W2026806489","https://openalex.org/W2033987415","https://openalex.org/W2042000605","https://openalex.org/W2060223929","https://openalex.org/W2068660836","https://openalex.org/W2077256885","https://openalex.org/W2084328804","https://openalex.org/W2088537148","https://openalex.org/W2091504528","https://openalex.org/W2129369441","https://openalex.org/W4249963095"],"related_works":["https://openalex.org/W2141625811","https://openalex.org/W2012716935","https://openalex.org/W4387328786","https://openalex.org/W3121175235","https://openalex.org/W2314437508","https://openalex.org/W2064679241","https://openalex.org/W2018924450","https://openalex.org/W2332029428","https://openalex.org/W2057154335","https://openalex.org/W2003889775"],"abstract_inverted_index":{"Blank":[0],"defect":[1,42,69],"mitigation":[2],"is":[3,46],"a":[4,16,29],"critical":[5],"step":[6],"for":[7],"extreme":[8],"ultraviolet":[9],"(EUV)":[10],"lithography.":[11],"Targeting":[12],"the":[13,24,55,61,64,98,120],"defective":[14],"blank,":[15],"layout":[17,26],"relocation":[18,90,99],"method,":[19,96],"to":[20,28,35,40,53,59,119],"shift":[21],"and":[22,71,97],"rotate":[23],"whole":[25],"pattern":[27,57,89],"proper":[30],"position,":[31],"has":[32,111],"been":[33],"proved":[34],"be":[36],"an":[37,82],"effective":[38],"way":[39],"reduce":[41],"impact.":[43],"Yet,":[44],"there":[45],"still":[47],"no":[48],"published":[49],"work":[50],"about":[51],"how":[52],"find":[54],"best":[56],"location":[58],"minimize":[60],"impact":[62],"from":[63,106],"buried":[65],"defects":[66],"with":[67,101,115],"reasonable":[68],"model":[70],"considerable":[72],"process":[73],"variation":[74],"control.":[75],"In":[76],"this":[77,88],"paper,":[78],"we":[79],"successfully":[80],"present":[81],"algorithm":[83],"that":[84],"can":[85],"optimally":[86],"solve":[87],"problem.":[91],"Experimental":[92],"results":[93,100],"validate":[94],"our":[95],"full":[102],"scale":[103],"layouts":[104],"generated":[105],"Nangate":[107],"Open":[108],"Cell":[109],"Library":[110],"shown":[112],"great":[113],"advantages":[114],"competitive":[116],"runtimes":[117],"compared":[118],"existing":[121],"commercial":[122],"tool.":[123]},"counts_by_year":[{"year":2018,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":6},{"year":2013,"cited_by_count":7},{"year":2012,"cited_by_count":4}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}