{"id":"https://openalex.org/W4317792292","doi":"https://doi.org/10.1109/wsc57314.2022.10015311","title":"Machine Learning Powered Capacity Planning for Semiconductor Fab","display_name":"Machine Learning Powered Capacity Planning for Semiconductor Fab","publication_year":2022,"publication_date":"2022-12-11","ids":{"openalex":"https://openalex.org/W4317792292","doi":"https://doi.org/10.1109/wsc57314.2022.10015311"},"language":"en","primary_location":{"id":"doi:10.1109/wsc57314.2022.10015311","is_oa":false,"landing_page_url":"http://dx.doi.org/10.1109/wsc57314.2022.10015311","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2022 Winter Simulation Conference (WSC)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5103553874","display_name":"Keyhoon Ko","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Keyhoon Ko","raw_affiliation_strings":["VMS Global, Inc.,Vienna,VA,USA,22182"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"VMS Global, Inc.,Vienna,VA,USA,22182","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108188015","display_name":"Seokcheol Chang","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Seokcheol Chang","raw_affiliation_strings":["VMS Global, Inc.,Vienna,VA,USA,22182"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"VMS Global, Inc.,Vienna,VA,USA,22182","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100602696","display_name":"Won\u2010Jun Lee","orcid":"https://orcid.org/0000-0001-6442-8151"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Won-Jun Lee","raw_affiliation_strings":["VMS Solutions Co. Ltd.,Yongin,REPUBLIC OF KOREA,16827"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"VMS Solutions Co. Ltd.,Yongin,REPUBLIC OF KOREA,16827","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5039585419","display_name":"Byung-Hee Kim","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Byung-Hee Kim","raw_affiliation_strings":["VMS Solutions Co. Ltd.,Yongin,REPUBLIC OF KOREA,16827"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"VMS Solutions Co. Ltd.,Yongin,REPUBLIC OF KOREA,16827","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.32234709,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"3263","last_page":"3274"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10551","display_name":"Scheduling and Optimization Algorithms","score":0.9879000186920166,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10551","display_name":"Scheduling and Optimization Algorithms","score":0.9879000186920166,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9861000180244446,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9771000146865845,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.8227952122688293},{"id":"https://openalex.org/keywords/workstation","display_name":"Workstation","score":0.774146318435669},{"id":"https://openalex.org/keywords/wafer-fabrication","display_name":"Wafer fabrication","score":0.7358522415161133},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.7280832529067993},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6279159784317017},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.594255805015564},{"id":"https://openalex.org/keywords/semiconductor-industry","display_name":"Semiconductor industry","score":0.5147883892059326},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.4726240634918213},{"id":"https://openalex.org/keywords/work","display_name":"Work (physics)","score":0.4638860821723938},{"id":"https://openalex.org/keywords/engineering-drawing","display_name":"Engineering drawing","score":0.3503992557525635},{"id":"https://openalex.org/keywords/manufacturing-engineering","display_name":"Manufacturing engineering","score":0.2557034492492676},{"id":"https://openalex.org/keywords/mechanical-engineering","display_name":"Mechanical engineering","score":0.22951802611351013},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.21361082792282104},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.17060378193855286},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.12319767475128174},{"id":"https://openalex.org/keywords/operating-system","display_name":"Operating system","score":0.08448529243469238}],"concepts":[{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.8227952122688293},{"id":"https://openalex.org/C67953723","wikidata":"https://www.wikidata.org/wiki/Q192525","display_name":"Workstation","level":2,"score":0.774146318435669},{"id":"https://openalex.org/C35750839","wikidata":"https://www.wikidata.org/wiki/Q7959421","display_name":"Wafer fabrication","level":3,"score":0.7358522415161133},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.7280832529067993},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6279159784317017},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.594255805015564},{"id":"https://openalex.org/C2987888538","wikidata":"https://www.wikidata.org/wiki/Q2986369","display_name":"Semiconductor industry","level":2,"score":0.5147883892059326},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.4726240634918213},{"id":"https://openalex.org/C18762648","wikidata":"https://www.wikidata.org/wiki/Q42213","display_name":"Work (physics)","level":2,"score":0.4638860821723938},{"id":"https://openalex.org/C199639397","wikidata":"https://www.wikidata.org/wiki/Q1788588","display_name":"Engineering drawing","level":1,"score":0.3503992557525635},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.2557034492492676},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.22951802611351013},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.21361082792282104},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.17060378193855286},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.12319767475128174},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.08448529243469238},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/wsc57314.2022.10015311","is_oa":false,"landing_page_url":"http://dx.doi.org/10.1109/wsc57314.2022.10015311","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2022 Winter Simulation Conference (WSC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W2006470654","https://openalex.org/W2025975790","https://openalex.org/W2092496771","https://openalex.org/W2094620615","https://openalex.org/W2114153514","https://openalex.org/W2137104525","https://openalex.org/W2478112258","https://openalex.org/W2794225564","https://openalex.org/W4244879915"],"related_works":["https://openalex.org/W2146435486","https://openalex.org/W2170726572","https://openalex.org/W2006086900","https://openalex.org/W1483119123","https://openalex.org/W2377558694","https://openalex.org/W2394172622","https://openalex.org/W1594978932","https://openalex.org/W2083418455","https://openalex.org/W2168704563","https://openalex.org/W2140718007"],"abstract_inverted_index":{"Semiconductor":[0],"wafers":[1],"are":[2],"manufactured":[3],"by":[4],"stacking":[5],"hundreds":[6],"of":[7,19,28],"layers":[8],"engraved":[9],"with":[10,16,44],"circuit":[11],"patterns.":[12],"Wafer":[13],"fabrication":[14],"process":[15],"the":[17,51,65,81],"characteristic":[18],"re-entrant":[20],"flow":[21],"is":[22,60],"a":[23,57,77,109],"complex":[24],"job-shop":[25],"that":[26,49,91,103],"consists":[27],"several":[29,42],"work":[30,39],"areas":[31],"such":[32],"as":[33],"lithography,":[34],"etch,":[35],"and":[36,95,111],"diffusion.":[37],"Each":[38],"area":[40],"has":[41],"workstations":[43],"one":[45,62],"or":[46],"more":[47],"machines":[48],"execute":[50],"same":[52],"operation.":[53],"Capacity":[54],"planning":[55],"for":[56,85],"wafer":[58],"fab":[59],"difficult;":[61],"must":[63],"determine":[64],"required":[66],"machine":[67,83,96],"count":[68,84],"to":[69,79],"meet":[70],"demands":[71],"on":[72],"time.":[73],"This":[74],"study":[75],"proposes":[76],"methodology":[78],"find":[80],"optimal":[82],"each":[86],"workstation":[87],"using":[88],"an":[89],"approach":[90,105],"combines":[92],"optimization,":[93],"simulation,":[94],"learning":[97],"techniques.":[98],"The":[99],"experimental":[100],"example":[101],"demonstrates":[102],"this":[104],"can":[106],"systematically":[107],"provide":[108],"good":[110],"practical":[112],"solution.":[113]},"counts_by_year":[],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}