{"id":"https://openalex.org/W4230518009","doi":"https://doi.org/10.1109/wsc.2011.6147915","title":"Implementing Virtual Metrology into semiconductor production processes - an investment assessment","display_name":"Implementing Virtual Metrology into semiconductor production processes - an investment assessment","publication_year":2011,"publication_date":"2011-12-01","ids":{"openalex":"https://openalex.org/W4230518009","doi":"https://doi.org/10.1109/wsc.2011.6147915"},"language":"en","primary_location":{"id":"doi:10.1109/wsc.2011.6147915","is_oa":false,"landing_page_url":"https://doi.org/10.1109/wsc.2011.6147915","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 2011 Winter Simulation Conference (WSC)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"http://publica.fraunhofer.de/documents/N-195955.html","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5053405471","display_name":"Matthias Koitzsch","orcid":null},"institutions":[{"id":"https://openalex.org/I160414472","display_name":"Schott (Germany)","ror":"https://ror.org/000q08p21","country_code":"DE","type":"company","lineage":["https://openalex.org/I160414472"]},{"id":"https://openalex.org/I4210148684","display_name":"Fraunhofer Institute for Integrated Systems and Device Technology","ror":"https://ror.org/04q5rka56","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210148684","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"Matthias Koitzsch","raw_affiliation_strings":["Fraunhofer IISB, Schottkystr. 10, 91058 Erlangen, GERMANY"],"affiliations":[{"raw_affiliation_string":"Fraunhofer IISB, Schottkystr. 10, 91058 Erlangen, GERMANY","institution_ids":["https://openalex.org/I4210148684","https://openalex.org/I160414472"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004167465","display_name":"Jochen Merhof","orcid":null},"institutions":[{"id":"https://openalex.org/I181369854","display_name":"Friedrich-Alexander-Universit\u00e4t Erlangen-N\u00fcrnberg","ror":"https://ror.org/00f7hpc57","country_code":"DE","type":"education","lineage":["https://openalex.org/I181369854"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Jochen Merhof","raw_affiliation_strings":["FAPS University of Erlangen-Nuremberg, Egerlandstr. 7-9, 91058, GERMANY"],"affiliations":[{"raw_affiliation_string":"FAPS University of Erlangen-Nuremberg, Egerlandstr. 7-9, 91058, GERMANY","institution_ids":["https://openalex.org/I181369854"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070471352","display_name":"Markus Michl","orcid":null},"institutions":[{"id":"https://openalex.org/I181369854","display_name":"Friedrich-Alexander-Universit\u00e4t Erlangen-N\u00fcrnberg","ror":"https://ror.org/00f7hpc57","country_code":"DE","type":"education","lineage":["https://openalex.org/I181369854"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Markus Michl","raw_affiliation_strings":["FAPS University of Erlangen-Nuremberg, Egerlandstr. 7-9, 91058, GERMANY"],"affiliations":[{"raw_affiliation_string":"FAPS University of Erlangen-Nuremberg, Egerlandstr. 7-9, 91058, GERMANY","institution_ids":["https://openalex.org/I181369854"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019955728","display_name":"Humbert Noll","orcid":null},"institutions":[{"id":"https://openalex.org/I38523324","display_name":"Fachhochschule Wiener Neustadt","ror":"https://ror.org/03k7r0z51","country_code":"AT","type":"education","lineage":["https://openalex.org/I38523324"]}],"countries":["AT"],"is_corresponding":false,"raw_author_name":"Humbert Noll","raw_affiliation_strings":["University of Applied Sciences, Johannes Guttenberg-Str. 3, 2700 Wiener Neustadt, AUSTRIA","InReCon AG, Sinzing, Germany"],"affiliations":[{"raw_affiliation_string":"University of Applied Sciences, Johannes Guttenberg-Str. 3, 2700 Wiener Neustadt, AUSTRIA","institution_ids":["https://openalex.org/I38523324"]},{"raw_affiliation_string":"InReCon AG, Sinzing, Germany","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089225557","display_name":"Alexander Nemecek","orcid":null},"institutions":[{"id":"https://openalex.org/I38523324","display_name":"Fachhochschule Wiener Neustadt","ror":"https://ror.org/03k7r0z51","country_code":"AT","type":"education","lineage":["https://openalex.org/I38523324"]}],"countries":["AT"],"is_corresponding":false,"raw_author_name":"Alexander Nemecek","raw_affiliation_strings":["University of Applied Sciences, Johannes Guttenberg-Str. 3, 2700 Wiener Neustadt, AUSTRIA"],"affiliations":[{"raw_affiliation_string":"University of Applied Sciences, Johannes Guttenberg-Str. 3, 2700 Wiener Neustadt, AUSTRIA","institution_ids":["https://openalex.org/I38523324"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014438674","display_name":"A. Honold","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Alfred Honold","raw_affiliation_strings":["InReCon AG, Von-Henle-Ring 44, 93161 Sinzing, GERMANY"],"affiliations":[{"raw_affiliation_string":"InReCon AG, Von-Henle-Ring 44, 93161 Sinzing, GERMANY","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010572903","display_name":"Gerhard Kleineidam","orcid":"https://orcid.org/0000-0001-7921-7293"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Gerhard Kleineidam","raw_affiliation_strings":["InReCon AG, Von-Henle-Ring 44, 93161 Sinzing, GERMANY"],"affiliations":[{"raw_affiliation_string":"InReCon AG, Von-Henle-Ring 44, 93161 Sinzing, GERMANY","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5073273552","display_name":"Holger Lebrecht","orcid":null},"institutions":[{"id":"https://openalex.org/I1325886976","display_name":"Siemens (Germany)","ror":"https://ror.org/059mq0909","country_code":"DE","type":"company","lineage":["https://openalex.org/I1325886976"]},{"id":"https://openalex.org/I4210131793","display_name":"Infineon Technologies (Austria)","ror":"https://ror.org/03msng824","country_code":"AT","type":"company","lineage":["https://openalex.org/I137594350","https://openalex.org/I4210131793"]}],"countries":["AT","DE"],"is_corresponding":false,"raw_author_name":"Holger Lebrecht","raw_affiliation_strings":["Infineon Technologies AG, Siemensstra\u00dfe 2, 9500 Villach, AUSTRIA"],"affiliations":[{"raw_affiliation_string":"Infineon Technologies AG, Siemensstra\u00dfe 2, 9500 Villach, AUSTRIA","institution_ids":["https://openalex.org/I4210131793","https://openalex.org/I1325886976"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":8,"corresponding_author_ids":["https://openalex.org/A5053405471"],"corresponding_institution_ids":["https://openalex.org/I160414472","https://openalex.org/I4210148684"],"apc_list":null,"apc_paid":null,"fwci":1.5112,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.87343413,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"38","issue":null,"first_page":"2017","last_page":"2028"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11159","display_name":"Manufacturing Process and Optimization","score":0.9991999864578247,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11159","display_name":"Manufacturing Process and Optimization","score":0.9991999864578247,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9962999820709229,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11443","display_name":"Advanced Statistical Process Monitoring","score":0.9896000027656555,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.7988086938858032},{"id":"https://openalex.org/keywords/metrology","display_name":"Metrology","score":0.7696305513381958},{"id":"https://openalex.org/keywords/wafer-fabrication","display_name":"Wafer fabrication","score":0.767754316329956},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.6832543611526489},{"id":"https://openalex.org/keywords/reliability-engineering","display_name":"Reliability engineering","score":0.5945574641227722},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5556410551071167},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.50751793384552},{"id":"https://openalex.org/keywords/discrete-event-simulation","display_name":"Discrete event simulation","score":0.4989511966705322},{"id":"https://openalex.org/keywords/semiconductor-device-modeling","display_name":"Semiconductor device modeling","score":0.4326639771461487},{"id":"https://openalex.org/keywords/investment","display_name":"Investment (military)","score":0.42756056785583496},{"id":"https://openalex.org/keywords/process-control","display_name":"Process control","score":0.42210307717323303},{"id":"https://openalex.org/keywords/manufacturing-engineering","display_name":"Manufacturing engineering","score":0.38093167543411255},{"id":"https://openalex.org/keywords/industrial-engineering","display_name":"Industrial engineering","score":0.35217827558517456},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.3438999056816101},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.28339236974716187},{"id":"https://openalex.org/keywords/simulation","display_name":"Simulation","score":0.2616357207298279},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.1255744993686676},{"id":"https://openalex.org/keywords/operating-system","display_name":"Operating system","score":0.10209891200065613}],"concepts":[{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.7988086938858032},{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.7696305513381958},{"id":"https://openalex.org/C35750839","wikidata":"https://www.wikidata.org/wiki/Q7959421","display_name":"Wafer fabrication","level":3,"score":0.767754316329956},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.6832543611526489},{"id":"https://openalex.org/C200601418","wikidata":"https://www.wikidata.org/wiki/Q2193887","display_name":"Reliability engineering","level":1,"score":0.5945574641227722},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5556410551071167},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.50751793384552},{"id":"https://openalex.org/C147203929","wikidata":"https://www.wikidata.org/wiki/Q574814","display_name":"Discrete event simulation","level":2,"score":0.4989511966705322},{"id":"https://openalex.org/C4775677","wikidata":"https://www.wikidata.org/wiki/Q7449393","display_name":"Semiconductor device modeling","level":3,"score":0.4326639771461487},{"id":"https://openalex.org/C27548731","wikidata":"https://www.wikidata.org/wiki/Q88272","display_name":"Investment (military)","level":3,"score":0.42756056785583496},{"id":"https://openalex.org/C155386361","wikidata":"https://www.wikidata.org/wiki/Q1649571","display_name":"Process control","level":3,"score":0.42210307717323303},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.38093167543411255},{"id":"https://openalex.org/C13736549","wikidata":"https://www.wikidata.org/wiki/Q4489420","display_name":"Industrial engineering","level":1,"score":0.35217827558517456},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3438999056816101},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.28339236974716187},{"id":"https://openalex.org/C44154836","wikidata":"https://www.wikidata.org/wiki/Q45045","display_name":"Simulation","level":1,"score":0.2616357207298279},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.1255744993686676},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.10209891200065613},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.0},{"id":"https://openalex.org/C94625758","wikidata":"https://www.wikidata.org/wiki/Q7163","display_name":"Politics","level":2,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C199539241","wikidata":"https://www.wikidata.org/wiki/Q7748","display_name":"Law","level":1,"score":0.0},{"id":"https://openalex.org/C17744445","wikidata":"https://www.wikidata.org/wiki/Q36442","display_name":"Political science","level":0,"score":0.0}],"mesh":[],"locations_count":4,"locations":[{"id":"doi:10.1109/wsc.2011.6147915","is_oa":false,"landing_page_url":"https://doi.org/10.1109/wsc.2011.6147915","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 2011 Winter Simulation Conference (WSC)","raw_type":"proceedings-article"},{"id":"pmh:oai:CiteSeerX.psu:10.1.1.416.4574","is_oa":false,"landing_page_url":"http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.416.4574","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"http://www.informs-sim.org/wsc11papers/181.pdf","raw_type":"text"},{"id":"pmh:oai:fraunhofer.de:N-195955","is_oa":true,"landing_page_url":"http://publica.fraunhofer.de/documents/N-195955.html","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Fraunhofer IISB","raw_type":"Conference Paper"},{"id":"pmh:oai:publica.fraunhofer.de:publica/373834","is_oa":false,"landing_page_url":"https://publica.fraunhofer.de/handle/publica/373834","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"conference paper"}],"best_oa_location":{"id":"pmh:oai:fraunhofer.de:N-195955","is_oa":true,"landing_page_url":"http://publica.fraunhofer.de/documents/N-195955.html","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Fraunhofer IISB","raw_type":"Conference Paper"},"sustainable_development_goals":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320873","display_name":"Friedrich-Alexander-Universit\u00e4t Erlangen-N\u00fcrnberg","ror":"https://ror.org/00f7hpc57"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W2106485576","https://openalex.org/W2147973445","https://openalex.org/W2185417236","https://openalex.org/W2484470889","https://openalex.org/W2612907864","https://openalex.org/W2979006918","https://openalex.org/W3203992401","https://openalex.org/W4256167503","https://openalex.org/W6656594533","https://openalex.org/W6677553139","https://openalex.org/W6686318603","https://openalex.org/W6768650569"],"related_works":["https://openalex.org/W1849611347","https://openalex.org/W2027697249","https://openalex.org/W2146435486","https://openalex.org/W2006086900","https://openalex.org/W1965337273","https://openalex.org/W2098276944","https://openalex.org/W4365790995","https://openalex.org/W2117515897","https://openalex.org/W2108209131","https://openalex.org/W2062810585"],"abstract_inverted_index":{"Continuously":[0],"increasing":[1],"complexity":[2],"of":[3,63,82,89,127,136,147],"semiconductor":[4,85],"manufacturing":[5],"processes":[6],"drives":[7],"the":[8,32,50,61,71,90,119,134,144],"need":[9],"for":[10,74,99,118],"wafer":[11,13,17],"to":[12,30,41,55,113,133],"and":[14,37,58,65,141,150],"even":[15],"within":[16],"control":[18],"loops":[19],"metrology.":[20],"Applying":[21],"Virtual":[22],"Metrology":[23],"(VM)":[24],"techniques":[25],"is":[26,93],"one":[27],"promising":[28],"approach":[29],"reduce":[31],"time":[33],"between":[34],"process,":[35],"measurement":[36],"corrective":[38],"actions.":[39],"Prior":[40],"implementation":[42,135],"-":[43,49,124,131],"besides":[44],"technical":[45],"aspects":[46],"like":[47],"testing":[48],"investment":[51,72,91],"into":[52,78],"VM":[53,76,129,137],"has":[54],"be":[56],"assessed":[57],"justified":[59],"on":[60],"basis":[62],"reliable":[64],"reasonable":[66],"data.":[67],"This":[68],"paper":[69],"presents":[70],"assessment":[73],"implementing":[75],"algorithms":[77],"plasma":[79],"etcher":[80],"tools":[81],"a":[83,94,100],"model":[84,110],"fabrication":[86],"line.":[87],"Core":[88],"calculation":[92,96],"spreadsheet-based":[95],"which":[97],"allows":[98],"results":[101,130],"per":[102],"quarter":[103],"evaluation.":[104],"A":[105],"Discrete":[106],"Event":[107],"Simulation":[108],"(DES)":[109],"was":[111],"developed":[112],"produce":[114],"relevant":[115],"input":[116],"data":[117],"spreadsheet":[120],"calculation.":[121],"Potential":[122],"risks":[123],"e.g.,":[125],"delivery":[126],"wrong":[128],"due":[132],"have":[138],"been":[139],"identified":[140],"evaluated":[142],"using":[143],"standardized":[145],"method":[146],"Failure":[148],"Mode":[149],"Effects":[151],"Analysis":[152],"(FMEA).":[153]},"counts_by_year":[{"year":2021,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}