{"id":"https://openalex.org/W7165139828","doi":"https://doi.org/10.1109/vts69484.2026.11563372","title":"A Physics-Informed Machine Learning Framework for Electromigration Time-to-Failure Prediction","display_name":"A Physics-Informed Machine Learning Framework for Electromigration Time-to-Failure Prediction","publication_year":2026,"publication_date":"2026-04-27","ids":{"openalex":"https://openalex.org/W7165139828","doi":"https://doi.org/10.1109/vts69484.2026.11563372"},"language":null,"primary_location":{"id":"doi:10.1109/vts69484.2026.11563372","is_oa":false,"landing_page_url":"https://doi.org/10.1109/vts69484.2026.11563372","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2026 IEEE 44th VLSI Test Symposium (VTS)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5114231322","display_name":"Saeid Karimpour","orcid":"https://orcid.org/0009-0009-6669-8812"},"institutions":[{"id":"https://openalex.org/I173911158","display_name":"Iowa State University","ror":"https://ror.org/04rswrd78","country_code":"US","type":"education","lineage":["https://openalex.org/I173911158"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Saeid Karimpour","raw_affiliation_strings":["Iowa State University,Department of Electrical and Computer Engineering,Ames,IA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Iowa State University,Department of Electrical and Computer Engineering,Ames,IA,USA","institution_ids":["https://openalex.org/I173911158"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5093828063","display_name":"Emmanuel Nti Darko","orcid":"https://orcid.org/0009-0003-8237-2384"},"institutions":[{"id":"https://openalex.org/I173911158","display_name":"Iowa State University","ror":"https://ror.org/04rswrd78","country_code":"US","type":"education","lineage":["https://openalex.org/I173911158"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Emmanuel Nti Darko","raw_affiliation_strings":["Iowa State University,Department of Electrical and Computer Engineering,Ames,IA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Iowa State University,Department of Electrical and Computer Engineering,Ames,IA,USA","institution_ids":["https://openalex.org/I173911158"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5093883106","display_name":"Kelvin Tamakloe","orcid":null},"institutions":[{"id":"https://openalex.org/I173911158","display_name":"Iowa State University","ror":"https://ror.org/04rswrd78","country_code":"US","type":"education","lineage":["https://openalex.org/I173911158"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Kelvin Tamakloe","raw_affiliation_strings":["Iowa State University,Department of Electrical and Computer Engineering,Ames,IA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Iowa State University,Department of Electrical and Computer Engineering,Ames,IA,USA","institution_ids":["https://openalex.org/I173911158"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5138846443","display_name":"Degang Chen","orcid":null},"institutions":[{"id":"https://openalex.org/I173911158","display_name":"Iowa State University","ror":"https://ror.org/04rswrd78","country_code":"US","type":"education","lineage":["https://openalex.org/I173911158"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Degang Chen","raw_affiliation_strings":["Iowa State University,Department of Electrical and Computer Engineering,Ames,IA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Iowa State University,Department of Electrical and Computer Engineering,Ames,IA,USA","institution_ids":["https://openalex.org/I173911158"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I173911158"],"apc_list":null,"apc_paid":null,"fwci":null,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":null,"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"7"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.955299973487854,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.955299973487854,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.009399999864399433,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.0034000000450760126,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/feature","display_name":"Feature (linguistics)","score":0.31299999356269836},{"id":"https://openalex.org/keywords/measure","display_name":"Measure (data warehouse)","score":0.27390000224113464},{"id":"https://openalex.org/keywords/electromigration","display_name":"Electromigration","score":0.26350000500679016},{"id":"https://openalex.org/keywords/reliability","display_name":"Reliability (semiconductor)","score":0.25690001249313354}],"concepts":[{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.5544000267982483},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5254999995231628},{"id":"https://openalex.org/C119857082","wikidata":"https://www.wikidata.org/wiki/Q2539","display_name":"Machine learning","level":1,"score":0.4697999954223633},{"id":"https://openalex.org/C2776401178","wikidata":"https://www.wikidata.org/wiki/Q12050496","display_name":"Feature (linguistics)","level":2,"score":0.31299999356269836},{"id":"https://openalex.org/C2780009758","wikidata":"https://www.wikidata.org/wiki/Q6804172","display_name":"Measure (data warehouse)","level":2,"score":0.27390000224113464},{"id":"https://openalex.org/C138055206","wikidata":"https://www.wikidata.org/wiki/Q1319010","display_name":"Electromigration","level":2,"score":0.26350000500679016},{"id":"https://openalex.org/C124101348","wikidata":"https://www.wikidata.org/wiki/Q172491","display_name":"Data mining","level":1,"score":0.2590999901294708},{"id":"https://openalex.org/C43214815","wikidata":"https://www.wikidata.org/wiki/Q7310987","display_name":"Reliability (semiconductor)","level":3,"score":0.25690001249313354},{"id":"https://openalex.org/C50292564","wikidata":"https://www.wikidata.org/wiki/Q2462783","display_name":"Computational learning theory","level":3,"score":0.25119999051094055},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.250900000333786}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/vts69484.2026.11563372","is_oa":false,"landing_page_url":"https://doi.org/10.1109/vts69484.2026.11563372","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2026 IEEE 44th VLSI Test Symposium (VTS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Reduced inequalities","score":0.618107795715332,"id":"https://metadata.un.org/sdg/10"}],"awards":[],"funders":[{"id":"https://openalex.org/F4320306087","display_name":"Semiconductor Research Corporation","ror":"https://ror.org/047z4n946"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":21,"referenced_works":["https://openalex.org/W2114668332","https://openalex.org/W3040013232","https://openalex.org/W3167204903","https://openalex.org/W3213035978","https://openalex.org/W4295832488","https://openalex.org/W4312556563","https://openalex.org/W4402715958","https://openalex.org/W4403638047","https://openalex.org/W4406427978","https://openalex.org/W4407088906","https://openalex.org/W4408892723","https://openalex.org/W4411172892","https://openalex.org/W4411726658","https://openalex.org/W4411749386","https://openalex.org/W4413847143","https://openalex.org/W4414648171","https://openalex.org/W4415821581","https://openalex.org/W4415821758","https://openalex.org/W4416726316","https://openalex.org/W4416727444","https://openalex.org/W4416728704"],"related_works":[],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-07-14T23:27:15.235271","created_date":"2026-06-19T00:00:00"}