{"id":"https://openalex.org/W2107901835","doi":"https://doi.org/10.1109/vts.2013.6548931","title":"Innovative practices session 9C: Yield improvement: Challenges and directions","display_name":"Innovative practices session 9C: Yield improvement: Challenges and directions","publication_year":2013,"publication_date":"2013-04-01","ids":{"openalex":"https://openalex.org/W2107901835","doi":"https://doi.org/10.1109/vts.2013.6548931","mag":"2107901835"},"language":"en","primary_location":{"id":"doi:10.1109/vts.2013.6548931","is_oa":false,"landing_page_url":"https://doi.org/10.1109/vts.2013.6548931","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2013 IEEE 31st VLSI Test Symposium (VTS)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5050508691","display_name":"B. Seshadri","orcid":null},"institutions":[{"id":"https://openalex.org/I4210127875","display_name":"Nvidia (United States)","ror":"https://ror.org/03jdj4y14","country_code":"US","type":"company","lineage":["https://openalex.org/I4210127875"]},{"id":"https://openalex.org/I1304085615","display_name":"Nvidia (United Kingdom)","ror":"https://ror.org/02kr42612","country_code":"GB","type":"company","lineage":["https://openalex.org/I1304085615","https://openalex.org/I4210127875"]}],"countries":["GB","US"],"is_corresponding":true,"raw_author_name":"B. Seshadri","raw_affiliation_strings":["Nvidia Corp","NVIDIA.CORPORATION"],"affiliations":[{"raw_affiliation_string":"Nvidia Corp","institution_ids":["https://openalex.org/I4210127875"]},{"raw_affiliation_string":"NVIDIA.CORPORATION","institution_ids":["https://openalex.org/I1304085615"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004526258","display_name":"Bruce Cory","orcid":null},"institutions":[{"id":"https://openalex.org/I1304085615","display_name":"Nvidia (United Kingdom)","ror":"https://ror.org/02kr42612","country_code":"GB","type":"company","lineage":["https://openalex.org/I1304085615","https://openalex.org/I4210127875"]},{"id":"https://openalex.org/I4210127875","display_name":"Nvidia (United States)","ror":"https://ror.org/03jdj4y14","country_code":"US","type":"company","lineage":["https://openalex.org/I4210127875"]}],"countries":["GB","US"],"is_corresponding":false,"raw_author_name":"B. Cory","raw_affiliation_strings":["Nvidia Corp","NVIDIA.CORPORATION"],"affiliations":[{"raw_affiliation_string":"Nvidia Corp","institution_ids":["https://openalex.org/I4210127875"]},{"raw_affiliation_string":"NVIDIA.CORPORATION","institution_ids":["https://openalex.org/I1304085615"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5036312663","display_name":"Subhasish Mitra","orcid":"https://orcid.org/0000-0002-5572-5194"},"institutions":[{"id":"https://openalex.org/I97018004","display_name":"Stanford University","ror":"https://ror.org/00f54p054","country_code":"US","type":"education","lineage":["https://openalex.org/I97018004"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Mitra","raw_affiliation_strings":["Stanford Univ","Stanford University"],"affiliations":[{"raw_affiliation_string":"Stanford Univ","institution_ids":["https://openalex.org/I97018004"]},{"raw_affiliation_string":"Stanford University","institution_ids":["https://openalex.org/I97018004"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5050508691"],"corresponding_institution_ids":["https://openalex.org/I1304085615","https://openalex.org/I4210127875"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.14769723,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"1"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9779000282287598,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9779000282287598,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9650999903678894,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9315000176429749,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/node","display_name":"Node (physics)","score":0.6915862560272217},{"id":"https://openalex.org/keywords/session","display_name":"Session (web analytics)","score":0.6582252979278564},{"id":"https://openalex.org/keywords/yield","display_name":"Yield (engineering)","score":0.6478517055511475},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.586664617061615},{"id":"https://openalex.org/keywords/reliability-engineering","display_name":"Reliability engineering","score":0.5435450077056885},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5104140639305115},{"id":"https://openalex.org/keywords/parametric-statistics","display_name":"Parametric statistics","score":0.4824400544166565},{"id":"https://openalex.org/keywords/characterization","display_name":"Characterization (materials science)","score":0.43502235412597656},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.26801300048828125},{"id":"https://openalex.org/keywords/operating-system","display_name":"Operating system","score":0.10135039687156677},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.100839763879776},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.09859248995780945},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.09081658720970154}],"concepts":[{"id":"https://openalex.org/C62611344","wikidata":"https://www.wikidata.org/wiki/Q1062658","display_name":"Node (physics)","level":2,"score":0.6915862560272217},{"id":"https://openalex.org/C2779182362","wikidata":"https://www.wikidata.org/wiki/Q17126187","display_name":"Session (web analytics)","level":2,"score":0.6582252979278564},{"id":"https://openalex.org/C134121241","wikidata":"https://www.wikidata.org/wiki/Q899301","display_name":"Yield (engineering)","level":2,"score":0.6478517055511475},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.586664617061615},{"id":"https://openalex.org/C200601418","wikidata":"https://www.wikidata.org/wiki/Q2193887","display_name":"Reliability engineering","level":1,"score":0.5435450077056885},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5104140639305115},{"id":"https://openalex.org/C117251300","wikidata":"https://www.wikidata.org/wiki/Q1849855","display_name":"Parametric statistics","level":2,"score":0.4824400544166565},{"id":"https://openalex.org/C2780841128","wikidata":"https://www.wikidata.org/wiki/Q5073781","display_name":"Characterization (materials science)","level":2,"score":0.43502235412597656},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.26801300048828125},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.10135039687156677},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.100839763879776},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.09859248995780945},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.09081658720970154},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C66938386","wikidata":"https://www.wikidata.org/wiki/Q633538","display_name":"Structural engineering","level":1,"score":0.0},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0},{"id":"https://openalex.org/C136764020","wikidata":"https://www.wikidata.org/wiki/Q466","display_name":"World Wide Web","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/vts.2013.6548931","is_oa":false,"landing_page_url":"https://doi.org/10.1109/vts.2013.6548931","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2013 IEEE 31st VLSI Test Symposium (VTS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/10","score":0.6299999952316284,"display_name":"Reduced inequalities"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4296749040","https://openalex.org/W4230197055","https://openalex.org/W621808327","https://openalex.org/W644007644","https://openalex.org/W3012257603","https://openalex.org/W3177475962","https://openalex.org/W4292264782","https://openalex.org/W3016450995","https://openalex.org/W2141646567","https://openalex.org/W2069896622"],"abstract_inverted_index":{"At":[0],"the":[1,27,48],"32/28nm":[2],"node":[3,34],"and":[4,7,41,50,67],"below,":[5],"parametric":[6],"process":[8],"marginality":[9],"contribute":[10],"increasing":[11,33],"yield":[12,16,70],"loss.":[13],"Additionally,":[14],"this":[15],"loss":[17,71],"is":[18,25,32,61],"often":[19],"asserted":[20],"spatially.":[21],"A":[22],"further":[23],"complication":[24],"that":[26],"interaction":[28],"of":[29,52],"design":[30],"rules":[31],"over":[35],"node,":[36],"requiring":[37],"ever":[38],"more":[39],"characterization":[40,54],"modeling.":[42],"Thus,":[43],"a":[44],"significant":[45],"increase":[46],"in":[47],"quantity":[49],"quality":[51],"electrical":[53],"\u2014":[55,60],"including":[56],"full":[57],"wafer":[58],"coverage":[59],"necessary":[62],"to":[63,86],"rapidly":[64],"diagnose,":[65],"eliminate,":[66],"monitor":[68],"these":[69,88],"mechanisms.":[72],"However,":[73],"present":[74],"test":[75],"time":[76],"budgets":[77],"must":[78],"be":[79],"maintained.":[80],"Our":[81],"presentation":[82],"focuses":[83],"on":[84],"methods":[85],"meet":[87],"requirements.":[89]},"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}