{"id":"https://openalex.org/W2919701803","doi":"https://doi.org/10.1109/vlsi-soc.2018.8644828","title":"Evaluating the Impact of Process Variability and Radiation Effects on Different Transistor Arrangements","display_name":"Evaluating the Impact of Process Variability and Radiation Effects on Different Transistor Arrangements","publication_year":2018,"publication_date":"2018-10-01","ids":{"openalex":"https://openalex.org/W2919701803","doi":"https://doi.org/10.1109/vlsi-soc.2018.8644828","mag":"2919701803"},"language":"en","primary_location":{"id":"doi:10.1109/vlsi-soc.2018.8644828","is_oa":false,"landing_page_url":"https://doi.org/10.1109/vlsi-soc.2018.8644828","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2018 IFIP/IEEE International Conference on Very Large Scale Integration (VLSI-SoC)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5001630532","display_name":"Leonardo H. Brendler","orcid":"https://orcid.org/0000-0002-8055-9597"},"institutions":[{"id":"https://openalex.org/I130442723","display_name":"Universidade Federal do Rio Grande do Sul","ror":"https://ror.org/041yk2d64","country_code":"BR","type":"education","lineage":["https://openalex.org/I130442723"]}],"countries":["BR"],"is_corresponding":false,"raw_author_name":"Leonardo H. Brendler","raw_affiliation_strings":["Instituto de Inform\u00e1tica, PPGC/PGMicro - Universidade Federal do Rio Grande do Sul (UFRGS)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Instituto de Inform\u00e1tica, PPGC/PGMicro - Universidade Federal do Rio Grande do Sul (UFRGS)","institution_ids":["https://openalex.org/I130442723"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004138848","display_name":"Alexandra L. Zimpeck","orcid":"https://orcid.org/0000-0002-3583-1002"},"institutions":[{"id":"https://openalex.org/I130442723","display_name":"Universidade Federal do Rio Grande do Sul","ror":"https://ror.org/041yk2d64","country_code":"BR","type":"education","lineage":["https://openalex.org/I130442723"]}],"countries":["BR"],"is_corresponding":false,"raw_author_name":"Alexandra L. Zimpeck","raw_affiliation_strings":["Instituto de Inform\u00e1tica, PPGC/PGMicro - Universidade Federal do Rio Grande do Sul (UFRGS)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Instituto de Inform\u00e1tica, PPGC/PGMicro - Universidade Federal do Rio Grande do Sul (UFRGS)","institution_ids":["https://openalex.org/I130442723"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016825373","display_name":"Cristina Meinhardt","orcid":"https://orcid.org/0000-0003-1088-1000"},"institutions":[{"id":"https://openalex.org/I4104125","display_name":"Universidade Federal de Santa Catarina","ror":"https://ror.org/041akq887","country_code":"BR","type":"education","lineage":["https://openalex.org/I4104125"]}],"countries":["BR"],"is_corresponding":false,"raw_author_name":"Cristina Meinhardt","raw_affiliation_strings":["Departamento de Inform\u00e1tica e Estat\u00edstica, Universidade Federal de Santa Catarina (UFSC)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Departamento de Inform\u00e1tica e Estat\u00edstica, Universidade Federal de Santa Catarina (UFSC)","institution_ids":["https://openalex.org/I4104125"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5108043721","display_name":"Ricardo Reis","orcid":"https://orcid.org/0000-0001-5781-5858"},"institutions":[{"id":"https://openalex.org/I130442723","display_name":"Universidade Federal do Rio Grande do Sul","ror":"https://ror.org/041yk2d64","country_code":"BR","type":"education","lineage":["https://openalex.org/I130442723"]}],"countries":["BR"],"is_corresponding":false,"raw_author_name":"Ricardo Reis","raw_affiliation_strings":["Instituto de Inform\u00e1tica, PPGC/PGMicro - Universidade Federal do Rio Grande do Sul (UFRGS)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Instituto de Inform\u00e1tica, PPGC/PGMicro - Universidade Federal do Rio Grande do Sul (UFRGS)","institution_ids":["https://openalex.org/I130442723"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.6547,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.7276154,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"71","last_page":"76"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11005","display_name":"Radiation Effects in Electronics","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/electronic-circuit","display_name":"Electronic circuit","score":0.7502803802490234},{"id":"https://openalex.org/keywords/digital-electronics","display_name":"Digital electronics","score":0.6363211274147034},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.6109615564346313},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.6034579277038574},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.5737206339836121},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.5469253063201904},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.544712245464325},{"id":"https://openalex.org/keywords/logic-gate","display_name":"Logic gate","score":0.48431196808815},{"id":"https://openalex.org/keywords/work-in-process","display_name":"Work in process","score":0.42811641097068787},{"id":"https://openalex.org/keywords/reliability-engineering","display_name":"Reliability engineering","score":0.3477395474910736},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.31142503023147583},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.2810025215148926},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.06886473298072815}],"concepts":[{"id":"https://openalex.org/C134146338","wikidata":"https://www.wikidata.org/wiki/Q1815901","display_name":"Electronic circuit","level":2,"score":0.7502803802490234},{"id":"https://openalex.org/C81843906","wikidata":"https://www.wikidata.org/wiki/Q173156","display_name":"Digital electronics","level":3,"score":0.6363211274147034},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.6109615564346313},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.6034579277038574},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.5737206339836121},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.5469253063201904},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.544712245464325},{"id":"https://openalex.org/C131017901","wikidata":"https://www.wikidata.org/wiki/Q170451","display_name":"Logic gate","level":2,"score":0.48431196808815},{"id":"https://openalex.org/C174998907","wikidata":"https://www.wikidata.org/wiki/Q357662","display_name":"Work in process","level":2,"score":0.42811641097068787},{"id":"https://openalex.org/C200601418","wikidata":"https://www.wikidata.org/wiki/Q2193887","display_name":"Reliability engineering","level":1,"score":0.3477395474910736},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.31142503023147583},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.2810025215148926},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.06886473298072815},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C21547014","wikidata":"https://www.wikidata.org/wiki/Q1423657","display_name":"Operations management","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/vlsi-soc.2018.8644828","is_oa":false,"landing_page_url":"https://doi.org/10.1109/vlsi-soc.2018.8644828","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2018 IFIP/IEEE International Conference on Very Large Scale Integration (VLSI-SoC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Affordable and clean energy","score":0.47999998927116394,"id":"https://metadata.un.org/sdg/7"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":28,"referenced_works":["https://openalex.org/W1969390180","https://openalex.org/W2009720143","https://openalex.org/W2017465863","https://openalex.org/W2025338205","https://openalex.org/W2026605801","https://openalex.org/W2030501553","https://openalex.org/W2037173912","https://openalex.org/W2054210827","https://openalex.org/W2076719376","https://openalex.org/W2082209063","https://openalex.org/W2096562756","https://openalex.org/W2099569658","https://openalex.org/W2106865643","https://openalex.org/W2107353844","https://openalex.org/W2126810113","https://openalex.org/W2141565132","https://openalex.org/W2157229905","https://openalex.org/W2160840734","https://openalex.org/W2161242714","https://openalex.org/W2171736840","https://openalex.org/W2346205343","https://openalex.org/W2536886358","https://openalex.org/W2539566014","https://openalex.org/W3149410719","https://openalex.org/W4233344314","https://openalex.org/W4242786083","https://openalex.org/W6669629026","https://openalex.org/W6683891485"],"related_works":["https://openalex.org/W2796521923","https://openalex.org/W3215142653","https://openalex.org/W1980349267","https://openalex.org/W2098419840","https://openalex.org/W2140610743","https://openalex.org/W2116326546","https://openalex.org/W2770163697","https://openalex.org/W2110521006","https://openalex.org/W2097637358","https://openalex.org/W2151104031"],"abstract_inverted_index":{"The":[0,19,84],"high":[1],"integration":[2],"capacity":[3],"of":[4,21,51,76],"digital":[5],"circuits,":[6],"which":[7,36],"occurs":[8],"due":[9],"to":[10,29,39,64,107,111],"technological":[11],"scaling,":[12],"presents":[13],"new":[14],"challenges":[15],"for":[16],"nanotechnology":[17],"designs.":[18],"evolution":[20],"integrated":[22],"circuits":[23,40,66,104],"has":[24],"made":[25],"them":[26],"more":[27,117],"susceptible":[28],"faults,":[30],"besides":[31],"increasing":[32],"the":[33,49,69],"process":[34,52,120],"variability,":[35],"can":[37],"lead":[38],"operating":[41],"outside":[42],"their":[43],"specification":[44],"ranges.":[45],"This":[46],"work":[47],"evaluates":[48],"effects":[50,61],"variability":[53],"and":[54,82,100,114],"radiation":[55,112],"faults":[56,113],"on":[57],"complex":[58,95],"gates.":[59],"These":[60],"are":[62,105],"compared":[63],"alternative":[65],"that":[67,93],"implement":[68],"same":[70],"functions":[71],"but":[72],"exploring":[73],"a":[74],"multi-level":[75,103],"basic":[77],"cells":[78,96],"as":[79],"NAND2,":[80],"NOR2":[81],"Inverters.":[83],"technology":[85],"adopted":[86],"is":[87],"7nm":[88],"FinFET":[89],"ASAP.":[90],"Results":[91],"show":[92],"although":[94],"present":[97],"better":[98],"timing":[99],"power":[101],"results,":[102],"up":[106],"28%":[108],"less":[109],"sensible":[110],"about":[115],"40%":[116],"stable":[118],"under":[119],"variability.":[121]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":2},{"year":2019,"cited_by_count":2}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}