{"id":"https://openalex.org/W4404563256","doi":"https://doi.org/10.1109/tim.2024.3502828","title":"Design of a Compact Broadband Vector Network Analyzer to Diagnose a Semiconductor Process Chamber","display_name":"Design of a Compact Broadband Vector Network Analyzer to Diagnose a Semiconductor Process Chamber","publication_year":2024,"publication_date":"2024-11-20","ids":{"openalex":"https://openalex.org/W4404563256","doi":"https://doi.org/10.1109/tim.2024.3502828"},"language":"en","primary_location":{"id":"doi:10.1109/tim.2024.3502828","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2024.3502828","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5013777500","display_name":"Seong\u2010Jin Kim","orcid":"https://orcid.org/0000-0002-1682-9361"},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seong-Jin Kim","raw_affiliation_strings":["School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0002-1682-9361","affiliations":[{"raw_affiliation_string":"School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110181975","display_name":"Hyun-Gang Jung","orcid":"https://orcid.org/0009-0003-7275-5955"},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Heechul Jung","raw_affiliation_strings":["School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea"],"raw_orcid":"https://orcid.org/0009-0003-7275-5955","affiliations":[{"raw_affiliation_string":"School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102860768","display_name":"Jong\u2010Won Yu","orcid":"https://orcid.org/0000-0001-9932-757X"},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jong-Won Yu","raw_affiliation_strings":["School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0001-9932-757X","affiliations":[{"raw_affiliation_string":"School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5005084212","display_name":"Jeong-Wook Kim","orcid":"https://orcid.org/0000-0001-7401-2977"},"institutions":[{"id":"https://openalex.org/I57664883","display_name":"Ajou University","ror":"https://ror.org/03tzb2h73","country_code":"KR","type":"education","lineage":["https://openalex.org/I57664883"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jeong-Wook Kim","raw_affiliation_strings":["Department of Electronical and Computer Engineering, Ajou University, Suwon, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0001-7401-2977","affiliations":[{"raw_affiliation_string":"Department of Electronical and Computer Engineering, Ajou University, Suwon, Republic of Korea","institution_ids":["https://openalex.org/I57664883"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090628921","display_name":"Hanam Kim","orcid":"https://orcid.org/0009-0001-2837-2063"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hanam Kim","raw_affiliation_strings":["Aether Institute, Daejeon, Republic of Korea"],"raw_orcid":"https://orcid.org/0009-0001-2837-2063","affiliations":[{"raw_affiliation_string":"Aether Institute, Daejeon, Republic of Korea","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5012616712","display_name":"Sang-Won Lee","orcid":"https://orcid.org/0009-0006-4686-9504"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Sang-Won Lee","raw_affiliation_strings":["Aether Institute, Daejeon, Republic of Korea"],"raw_orcid":"https://orcid.org/0009-0006-4686-9504","affiliations":[{"raw_affiliation_string":"Aether Institute, Daejeon, Republic of Korea","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.1244,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.40673786,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":91,"max":95},"biblio":{"volume":"74","issue":null,"first_page":"1","last_page":"10"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11444","display_name":"Electromagnetic Compatibility and Noise Suppression","score":0.9836000204086304,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11444","display_name":"Electromagnetic Compatibility and Noise Suppression","score":0.9836000204086304,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.9781000018119812,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","score":0.9771999716758728,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/broadband","display_name":"Broadband","score":0.6032824516296387},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5896573066711426},{"id":"https://openalex.org/keywords/spectrum-analyzer","display_name":"Spectrum analyzer","score":0.5283318758010864},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.4624033570289612},{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.4346335530281067},{"id":"https://openalex.org/keywords/semiconductor","display_name":"Semiconductor","score":0.4157432019710541},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.4081270098686218},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.3838151693344116},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3770264983177185},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.3758469521999359},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.30960845947265625},{"id":"https://openalex.org/keywords/telecommunications","display_name":"Telecommunications","score":0.17779511213302612}],"concepts":[{"id":"https://openalex.org/C509933004","wikidata":"https://www.wikidata.org/wiki/Q194163","display_name":"Broadband","level":2,"score":0.6032824516296387},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5896573066711426},{"id":"https://openalex.org/C158007255","wikidata":"https://www.wikidata.org/wiki/Q1055222","display_name":"Spectrum analyzer","level":2,"score":0.5283318758010864},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.4624033570289612},{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.4346335530281067},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.4157432019710541},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4081270098686218},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3838151693344116},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3770264983177185},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3758469521999359},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.30960845947265625},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.17779511213302612},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tim.2024.3502828","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2024.3502828","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":21,"referenced_works":["https://openalex.org/W169940010","https://openalex.org/W1012379536","https://openalex.org/W1978765653","https://openalex.org/W2037368216","https://openalex.org/W2044949162","https://openalex.org/W2093576830","https://openalex.org/W2146255104","https://openalex.org/W2590763900","https://openalex.org/W2911154684","https://openalex.org/W3016203856","https://openalex.org/W3097091417","https://openalex.org/W3123607960","https://openalex.org/W3186803715","https://openalex.org/W3192939874","https://openalex.org/W3201873879","https://openalex.org/W4281961757","https://openalex.org/W4313055724","https://openalex.org/W4319599798","https://openalex.org/W4375929002","https://openalex.org/W4392026686","https://openalex.org/W6606971436"],"related_works":["https://openalex.org/W2391061712","https://openalex.org/W2094171095","https://openalex.org/W4231462422","https://openalex.org/W2546380746","https://openalex.org/W2018394392","https://openalex.org/W2360439310","https://openalex.org/W1979303977","https://openalex.org/W2372452257","https://openalex.org/W2506093188","https://openalex.org/W2271382194"],"abstract_inverted_index":{"This":[0],"article":[1],"presents":[2],"a":[3,44,50,75,113,127,146],"compact":[4],"broadband":[5],"vector":[6],"network":[7],"analyzer":[8],"(VNA)":[9],"designed":[10,114],"for":[11,31,149],"the":[12,21,40,53,56,61,89,98,103,107,110,151,154],"cost-effective":[13],"diagnosis":[14],"of":[15,24,43,84,102,112,153],"semiconductor":[16],"process":[17,155],"chambers":[18],"operating":[19],"in":[20,74],"frequency":[22],"range":[23],"3\u201313.6":[25],"GHz.":[26],"The":[27],"proposed":[28,104],"system,":[29],"optimized":[30],"compactness,":[32],"comprises":[33],"various":[34],"monolithic":[35],"microwave-integrated":[36],"circuits":[37],"(MMICs)":[38],"under":[39,120],"digital":[41],"control":[42],"microcontroller":[45],"unit":[46],"(MCU).":[47],"By":[48],"employing":[49],"gain/phase":[51],"detector,":[52],"disparity":[54],"between":[55],"reference":[57],"signal":[58,63,71,86],"($P_{a}$)":[59],"and":[60,95,100,123,137],"reflected":[62],"($P_{b}$)":[64],"can":[65],"be":[66],"efficiently":[67],"measured":[68,119],"through":[69],"analog":[70],"paths,":[72],"resulting":[73],"short":[76],"measurement":[77],"time.":[78],"A":[79],"comprehensive":[80],"link":[81],"budget":[82],"analysis":[83],"each":[85],"path,":[87,94],"encompassing":[88],"transmitter,":[90],"local":[91],"oscillator":[92],"(LO)":[93],"receiver,":[96],"informed":[97],"design":[99],"implementation":[101],"system.":[105],"Utilizing":[106],"implemented":[108],"VNA,":[109],"broadband$S_{11}$parameters":[111],"test":[115],"bed":[116],"chamber":[117],"were":[118,140],"both":[121],"normal":[122,136],"abnormal":[124,138],"conditions.":[125],"Applying":[126],"similarity":[128],"algorithm":[129],"such":[130],"as":[131],"Euclidean":[132],"distance,":[133],"differences":[134],"in$S_{11}$between":[135],"conditions":[139],"analyzed":[141],"according":[142],"to":[143],"frequency,":[144],"providing":[145],"diagnostic":[147],"tool":[148],"assessing":[150],"condition":[152],"chamber.":[156]},"counts_by_year":[{"year":2025,"cited_by_count":1}],"updated_date":"2026-07-29T09:40:50.615796","created_date":"2025-10-10T00:00:00"}