{"id":"https://openalex.org/W4285162586","doi":"https://doi.org/10.1109/tim.2022.3172435","title":"A Synchronous Measurement System for the First Derivative of Out-of-Plane Deformation of Double Ends","display_name":"A Synchronous Measurement System for the First Derivative of Out-of-Plane Deformation of Double Ends","publication_year":2022,"publication_date":"2022-01-01","ids":{"openalex":"https://openalex.org/W4285162586","doi":"https://doi.org/10.1109/tim.2022.3172435"},"language":"en","primary_location":{"id":"doi:10.1109/tim.2022.3172435","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2022.3172435","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5075282044","display_name":"Shuangle Wu","orcid":"https://orcid.org/0000-0002-2179-1687"},"institutions":[{"id":"https://openalex.org/I16365422","display_name":"Hefei University of Technology","ror":"https://ror.org/02czkny70","country_code":"CN","type":"education","lineage":["https://openalex.org/I16365422"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Shuangle Wu","raw_affiliation_strings":["School of Instrument Science and Opto-electronic Engineering, Hefei University of Technology, Hefei, China"],"raw_orcid":"https://orcid.org/0000-0002-2179-1687","affiliations":[{"raw_affiliation_string":"School of Instrument Science and Opto-electronic Engineering, Hefei University of Technology, Hefei, China","institution_ids":["https://openalex.org/I16365422"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083398254","display_name":"Yanfeng Yao","orcid":"https://orcid.org/0000-0002-3510-2491"},"institutions":[{"id":"https://openalex.org/I16365422","display_name":"Hefei University of Technology","ror":"https://ror.org/02czkny70","country_code":"CN","type":"education","lineage":["https://openalex.org/I16365422"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yanfeng Yao","raw_affiliation_strings":["School of Instrument Science and Opto-electronic Engineering, Hefei University of Technology, Hefei, China"],"raw_orcid":"https://orcid.org/0000-0002-3510-2491","affiliations":[{"raw_affiliation_string":"School of Instrument Science and Opto-electronic Engineering, Hefei University of Technology, Hefei, China","institution_ids":["https://openalex.org/I16365422"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100439512","display_name":"Biao Wang","orcid":"https://orcid.org/0000-0003-4656-8278"},"institutions":[{"id":"https://openalex.org/I16365422","display_name":"Hefei University of Technology","ror":"https://ror.org/02czkny70","country_code":"CN","type":"education","lineage":["https://openalex.org/I16365422"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Biao Wang","raw_affiliation_strings":["School of Instrument Science and Opto-electronic Engineering, Hefei University of Technology, Hefei, China"],"raw_orcid":"https://orcid.org/0000-0003-4656-8278","affiliations":[{"raw_affiliation_string":"School of Instrument Science and Opto-electronic Engineering, Hefei University of Technology, Hefei, China","institution_ids":["https://openalex.org/I16365422"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100643754","display_name":"Yonghong Wang","orcid":"https://orcid.org/0000-0003-1232-8305"},"institutions":[{"id":"https://openalex.org/I16365422","display_name":"Hefei University of Technology","ror":"https://ror.org/02czkny70","country_code":"CN","type":"education","lineage":["https://openalex.org/I16365422"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yonghong Wang","raw_affiliation_strings":["School of Instrument Science and Opto-electronic Engineering and the Anhui Province Key Laboratory of Measuring Theory and Precision Instrument, Hefei University of Technology, Hefei, China"],"raw_orcid":"https://orcid.org/0000-0003-1232-8305","affiliations":[{"raw_affiliation_string":"School of Instrument Science and Opto-electronic Engineering and the Anhui Province Key Laboratory of Measuring Theory and Precision Instrument, Hefei University of Technology, Hefei, China","institution_ids":["https://openalex.org/I16365422"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5004737754","display_name":"Fenglong Yang","orcid":"https://orcid.org/0000-0001-9322-3147"},"institutions":[{"id":"https://openalex.org/I4210134214","display_name":"Beijing Research Institute of Uranium Geology","ror":"https://ror.org/046qx3a23","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4210134214"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Fenglong Yang","raw_affiliation_strings":["Beijing Satellite Manufacturing Factory Corporation, Beijing, China"],"raw_orcid":"https://orcid.org/0000-0001-9322-3147","affiliations":[{"raw_affiliation_string":"Beijing Satellite Manufacturing Factory Corporation, Beijing, China","institution_ids":["https://openalex.org/I4210134214"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.8809,"has_fulltext":false,"cited_by_count":9,"citation_normalized_percentile":{"value":0.73835541,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":97},"biblio":{"volume":"71","issue":null,"first_page":"1","last_page":"8"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14158","display_name":"Optical Systems and Laser Technology","score":0.9988999962806702,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13114","display_name":"Image Processing Techniques and Applications","score":0.9987999796867371,"subfield":{"id":"https://openalex.org/subfields/2214","display_name":"Media Technology"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/shearography","display_name":"Shearography","score":0.8154023885726929},{"id":"https://openalex.org/keywords/system-of-measurement","display_name":"System of measurement","score":0.6522135138511658},{"id":"https://openalex.org/keywords/plane","display_name":"Plane (geometry)","score":0.509252667427063},{"id":"https://openalex.org/keywords/shear","display_name":"Shear (geology)","score":0.4919528663158417},{"id":"https://openalex.org/keywords/deformation","display_name":"Deformation (meteorology)","score":0.4893454909324646},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.4714950919151306},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.40509477257728577},{"id":"https://openalex.org/keywords/acoustics","display_name":"Acoustics","score":0.37779733538627625},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.30769091844558716},{"id":"https://openalex.org/keywords/interferometry","display_name":"Interferometry","score":0.27324628829956055},{"id":"https://openalex.org/keywords/geometry","display_name":"Geometry","score":0.22102555632591248},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.1738668978214264},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.15701046586036682}],"concepts":[{"id":"https://openalex.org/C138246806","wikidata":"https://www.wikidata.org/wiki/Q638475","display_name":"Shearography","level":3,"score":0.8154023885726929},{"id":"https://openalex.org/C37649242","wikidata":"https://www.wikidata.org/wiki/Q932268","display_name":"System of measurement","level":2,"score":0.6522135138511658},{"id":"https://openalex.org/C17825722","wikidata":"https://www.wikidata.org/wiki/Q17285","display_name":"Plane (geometry)","level":2,"score":0.509252667427063},{"id":"https://openalex.org/C96035792","wikidata":"https://www.wikidata.org/wiki/Q43606218","display_name":"Shear (geology)","level":2,"score":0.4919528663158417},{"id":"https://openalex.org/C204366326","wikidata":"https://www.wikidata.org/wiki/Q3027650","display_name":"Deformation (meteorology)","level":2,"score":0.4893454909324646},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4714950919151306},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.40509477257728577},{"id":"https://openalex.org/C24890656","wikidata":"https://www.wikidata.org/wiki/Q82811","display_name":"Acoustics","level":1,"score":0.37779733538627625},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.30769091844558716},{"id":"https://openalex.org/C166689943","wikidata":"https://www.wikidata.org/wiki/Q850283","display_name":"Interferometry","level":2,"score":0.27324628829956055},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.22102555632591248},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.1738668978214264},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.15701046586036682},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0},{"id":"https://openalex.org/C153294291","wikidata":"https://www.wikidata.org/wiki/Q25261","display_name":"Meteorology","level":1,"score":0.0},{"id":"https://openalex.org/C1276947","wikidata":"https://www.wikidata.org/wiki/Q333","display_name":"Astronomy","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tim.2022.3172435","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2022.3172435","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[{"id":"https://openalex.org/G7249685685","display_name":null,"funder_award_id":"2016YFF0101803","funder_id":"https://openalex.org/F4320335777","funder_display_name":"National Key Research and Development Program of China"}],"funders":[{"id":"https://openalex.org/F4320335777","display_name":"National Key Research and Development Program of China","ror":null}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":21,"referenced_works":["https://openalex.org/W979260112","https://openalex.org/W2018773877","https://openalex.org/W2018897626","https://openalex.org/W2040574895","https://openalex.org/W2057544797","https://openalex.org/W2058186977","https://openalex.org/W2078045092","https://openalex.org/W2092685856","https://openalex.org/W2488107300","https://openalex.org/W2535556564","https://openalex.org/W2889426815","https://openalex.org/W2902764421","https://openalex.org/W2969871109","https://openalex.org/W2982291065","https://openalex.org/W2995776708","https://openalex.org/W3008264830","https://openalex.org/W3012547862","https://openalex.org/W3033746839","https://openalex.org/W3099908396","https://openalex.org/W3199291528","https://openalex.org/W4206569603"],"related_works":["https://openalex.org/W2058186977","https://openalex.org/W2079887826","https://openalex.org/W149502296","https://openalex.org/W4285678948","https://openalex.org/W118328020","https://openalex.org/W56465586","https://openalex.org/W2129834062","https://openalex.org/W4245368485","https://openalex.org/W2371168590","https://openalex.org/W4285162586"],"abstract_inverted_index":{"In":[0,89],"current":[1],"practical":[2],"applications,":[3],"synchronously":[4],"obtaining":[5],"the":[6,23,41,50,54,65,73,81,99,107,111,117,126,134,139],"information":[7],"about":[8],"out-of-plane":[9],"deformation":[10,56,67],"of":[11,26,32,53,64,80,103,110,125,138],"double":[12,27],"ends":[13,105],"is":[14,68,129],"often":[15,36],"necessary.":[16],"However,":[17],"traditional":[18],"measurement":[19,25,33,47,102,127],"systems":[20,34],"cannot":[21],"achieve":[22],"synchronous":[24,46,100],"ends,":[28],"as":[29],"two":[30,74],"sets":[31],"are":[35,121,142],"needed.":[37],"This":[38],"study":[39],"solves":[40],"problem":[42],"by":[43,71,91,144],"designing":[44],"a":[45],"system":[48,120,128,141],"for":[49],"first":[51,61],"derivative":[52,62],"double-end":[55,66],"based":[57],"on":[58],"shearography.":[59],"The":[60,123],"distribution":[63,115],"measured":[69],"synchronically":[70],"imaging":[72],"end":[75],"surfaces":[76],"in":[77,94,116,131],"different":[78,86],"areas":[79],"camera\u2019s":[82],"target":[83],"plane":[84],"through":[85],"shear":[87,97,112],"structures.":[88],"addition,":[90],"placing":[92],"apertures":[93],"each":[95],"Michelson":[96,118],"structure,":[98],"dynamic":[101],"both":[104],"and":[106,113,133,136],"independent":[108],"adjustment":[109],"spectral":[114],"shearography":[119],"realized.":[122],"principle":[124],"introduced":[130],"detail,":[132],"feasibility":[135],"practicability":[137],"proposed":[140],"verified":[143],"experiments.":[145]},"counts_by_year":[{"year":2025,"cited_by_count":3},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}