{"id":"https://openalex.org/W2804675477","doi":"https://doi.org/10.1109/tim.2018.2830859","title":"Noncontact Wideband Current Probes With High Sensitivity and Spatial Resolution for Noise Location on PCB","display_name":"Noncontact Wideband Current Probes With High Sensitivity and Spatial Resolution for Noise Location on PCB","publication_year":2018,"publication_date":"2018-05-15","ids":{"openalex":"https://openalex.org/W2804675477","doi":"https://doi.org/10.1109/tim.2018.2830859","mag":"2804675477"},"language":"en","primary_location":{"id":"doi:10.1109/tim.2018.2830859","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2018.2830859","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5027985916","display_name":"Zhaowen Yan","orcid":"https://orcid.org/0000-0003-0994-7578"},"institutions":[{"id":"https://openalex.org/I82880672","display_name":"Beihang University","ror":"https://ror.org/00wk2mp56","country_code":"CN","type":"education","lineage":["https://openalex.org/I82880672"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Zhaowen Yan","raw_affiliation_strings":["School of Electronic and Information Engineering, Beihang University, Beijing, China"],"raw_orcid":"https://orcid.org/0000-0003-0994-7578","affiliations":[{"raw_affiliation_string":"School of Electronic and Information Engineering, Beihang University, Beijing, China","institution_ids":["https://openalex.org/I82880672"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034182755","display_name":"Wei Liu","orcid":"https://orcid.org/0000-0002-3880-7075"},"institutions":[{"id":"https://openalex.org/I82880672","display_name":"Beihang University","ror":"https://ror.org/00wk2mp56","country_code":"CN","type":"education","lineage":["https://openalex.org/I82880672"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Wei Liu","raw_affiliation_strings":["School of Electronic and Information Engineering, Beihang University, Beijing, China"],"raw_orcid":"https://orcid.org/0000-0002-3880-7075","affiliations":[{"raw_affiliation_string":"School of Electronic and Information Engineering, Beihang University, Beijing, China","institution_ids":["https://openalex.org/I82880672"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100606290","display_name":"Jianwei Wang","orcid":"https://orcid.org/0000-0002-4028-8198"},"institutions":[{"id":"https://openalex.org/I82880672","display_name":"Beihang University","ror":"https://ror.org/00wk2mp56","country_code":"CN","type":"education","lineage":["https://openalex.org/I82880672"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jianwei Wang","raw_affiliation_strings":["School of Electronic and Information Engineering, Beihang University, Beijing, China"],"raw_orcid":"https://orcid.org/0000-0002-4028-8198","affiliations":[{"raw_affiliation_string":"School of Electronic and Information Engineering, Beihang University, Beijing, China","institution_ids":["https://openalex.org/I82880672"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017747634","display_name":"Donglin Su","orcid":"https://orcid.org/0000-0003-4852-0569"},"institutions":[{"id":"https://openalex.org/I82880672","display_name":"Beihang University","ror":"https://ror.org/00wk2mp56","country_code":"CN","type":"education","lineage":["https://openalex.org/I82880672"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Donglin Su","raw_affiliation_strings":["School of Electronic and Information Engineering, Beihang University, Beijing, China"],"raw_orcid":"https://orcid.org/0000-0003-4852-0569","affiliations":[{"raw_affiliation_string":"School of Electronic and Information Engineering, Beihang University, Beijing, China","institution_ids":["https://openalex.org/I82880672"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100367769","display_name":"Xin Yan","orcid":"https://orcid.org/0000-0001-7481-8516"},"institutions":[{"id":"https://openalex.org/I20382870","display_name":"Missouri University of Science and Technology","ror":"https://ror.org/00scwqd12","country_code":"US","type":"education","lineage":["https://openalex.org/I20382870"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Xin Yan","raw_affiliation_strings":["EMC Laboratory, Missouri University of Science and Technology, Rolla, MO, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"EMC Laboratory, Missouri University of Science and Technology, Rolla, MO, USA","institution_ids":["https://openalex.org/I20382870"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100761733","display_name":"Jun Fan","orcid":"https://orcid.org/0000-0001-5674-033X"},"institutions":[{"id":"https://openalex.org/I20382870","display_name":"Missouri University of Science and Technology","ror":"https://ror.org/00scwqd12","country_code":"US","type":"education","lineage":["https://openalex.org/I20382870"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jun Fan","raw_affiliation_strings":["EMC Laboratory, Missouri University of Science and Technology, Rolla, MO, USA"],"raw_orcid":"https://orcid.org/0000-0001-5674-033X","affiliations":[{"raw_affiliation_string":"EMC Laboratory, Missouri University of Science and Technology, Rolla, MO, USA","institution_ids":["https://openalex.org/I20382870"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":6,"corresponding_author_ids":["https://openalex.org/A5027985916"],"corresponding_institution_ids":["https://openalex.org/I82880672"],"apc_list":null,"apc_paid":null,"fwci":2.7486,"has_fulltext":false,"cited_by_count":59,"citation_normalized_percentile":{"value":0.90903012,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":94,"max":99},"biblio":{"volume":"67","issue":"12","first_page":"2881","last_page":"2891"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11851","display_name":"Electromagnetic Compatibility and Measurements","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11851","display_name":"Electromagnetic Compatibility and Measurements","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11444","display_name":"Electromagnetic Compatibility and Noise Suppression","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11607","display_name":"Microwave and Dielectric Measurement Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/wideband","display_name":"Wideband","score":0.7273050546646118},{"id":"https://openalex.org/keywords/printed-circuit-board","display_name":"Printed circuit board","score":0.7007354497909546},{"id":"https://openalex.org/keywords/electromagnetic-interference","display_name":"Electromagnetic interference","score":0.5795119404792786},{"id":"https://openalex.org/keywords/electromagnetic-compatibility","display_name":"Electromagnetic compatibility","score":0.5748423337936401},{"id":"https://openalex.org/keywords/image-resolution","display_name":"Image resolution","score":0.5690901875495911},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.492901086807251},{"id":"https://openalex.org/keywords/noise","display_name":"Noise (video)","score":0.4796912372112274},{"id":"https://openalex.org/keywords/near-and-far-field","display_name":"Near and far field","score":0.4789641201496124},{"id":"https://openalex.org/keywords/current","display_name":"Current (fluid)","score":0.478561669588089},{"id":"https://openalex.org/keywords/acoustics","display_name":"Acoustics","score":0.4708632528781891},{"id":"https://openalex.org/keywords/sensitivity","display_name":"Sensitivity (control systems)","score":0.4328973889350891},{"id":"https://openalex.org/keywords/noise-measurement","display_name":"Noise measurement","score":0.43164360523223877},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.4301786720752716},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3613625764846802},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.30456602573394775},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.2539060115814209},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.20792388916015625},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.19212570786476135},{"id":"https://openalex.org/keywords/noise-reduction","display_name":"Noise reduction","score":0.10499584674835205}],"concepts":[{"id":"https://openalex.org/C2780202535","wikidata":"https://www.wikidata.org/wiki/Q4524457","display_name":"Wideband","level":2,"score":0.7273050546646118},{"id":"https://openalex.org/C120793396","wikidata":"https://www.wikidata.org/wiki/Q173350","display_name":"Printed circuit board","level":2,"score":0.7007354497909546},{"id":"https://openalex.org/C184892835","wikidata":"https://www.wikidata.org/wiki/Q1474513","display_name":"Electromagnetic interference","level":2,"score":0.5795119404792786},{"id":"https://openalex.org/C125470083","wikidata":"https://www.wikidata.org/wiki/Q747288","display_name":"Electromagnetic compatibility","level":2,"score":0.5748423337936401},{"id":"https://openalex.org/C205372480","wikidata":"https://www.wikidata.org/wiki/Q210521","display_name":"Image resolution","level":2,"score":0.5690901875495911},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.492901086807251},{"id":"https://openalex.org/C99498987","wikidata":"https://www.wikidata.org/wiki/Q2210247","display_name":"Noise (video)","level":3,"score":0.4796912372112274},{"id":"https://openalex.org/C25227671","wikidata":"https://www.wikidata.org/wiki/Q13405516","display_name":"Near and far field","level":2,"score":0.4789641201496124},{"id":"https://openalex.org/C148043351","wikidata":"https://www.wikidata.org/wiki/Q4456944","display_name":"Current (fluid)","level":2,"score":0.478561669588089},{"id":"https://openalex.org/C24890656","wikidata":"https://www.wikidata.org/wiki/Q82811","display_name":"Acoustics","level":1,"score":0.4708632528781891},{"id":"https://openalex.org/C21200559","wikidata":"https://www.wikidata.org/wiki/Q7451068","display_name":"Sensitivity (control systems)","level":2,"score":0.4328973889350891},{"id":"https://openalex.org/C29265498","wikidata":"https://www.wikidata.org/wiki/Q7047719","display_name":"Noise measurement","level":3,"score":0.43164360523223877},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.4301786720752716},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3613625764846802},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.30456602573394775},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.2539060115814209},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.20792388916015625},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.19212570786476135},{"id":"https://openalex.org/C163294075","wikidata":"https://www.wikidata.org/wiki/Q581861","display_name":"Noise reduction","level":2,"score":0.10499584674835205},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tim.2018.2830859","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2018.2830859","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.8100000023841858,"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy"}],"awards":[{"id":"https://openalex.org/G2904211840","display_name":null,"funder_award_id":"61427803","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G6990995154","display_name":null,"funder_award_id":"61271044","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"}],"funders":[{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":23,"referenced_works":["https://openalex.org/W1539863139","https://openalex.org/W1565593134","https://openalex.org/W1966222663","https://openalex.org/W1976231106","https://openalex.org/W2036223281","https://openalex.org/W2069027562","https://openalex.org/W2078831586","https://openalex.org/W2100618431","https://openalex.org/W2103538185","https://openalex.org/W2121486892","https://openalex.org/W2124772380","https://openalex.org/W2127394451","https://openalex.org/W2144441974","https://openalex.org/W2157723960","https://openalex.org/W2165141993","https://openalex.org/W2168913760","https://openalex.org/W2331272991","https://openalex.org/W2517518879","https://openalex.org/W2601162384","https://openalex.org/W2604136476","https://openalex.org/W2617451795","https://openalex.org/W2769982840","https://openalex.org/W6678280718"],"related_works":["https://openalex.org/W2535925839","https://openalex.org/W2019210652","https://openalex.org/W1490563459","https://openalex.org/W3085095443","https://openalex.org/W2093735734","https://openalex.org/W1944930841","https://openalex.org/W2154453460","https://openalex.org/W1893653312","https://openalex.org/W3019204841","https://openalex.org/W2804675477"],"abstract_inverted_index":{"This":[0],"paper":[1],"develops":[2],"an":[3],"improved":[4],"noncontact":[5],"current":[6,26,79,89,107],"probe":[7,27,57,80,108,134],"for":[8,62],"locating":[9],"the":[10,15,52,87,132,139,143],"noise":[11,110],"source":[12],"to":[13,50,70,85,137],"estimate":[14],"electromagnetic":[16,64],"interference":[17],"emission":[18],"on":[19,112,115],"printed":[20],"circuit":[21],"board":[22],"(PCB).":[23],"The":[24,38,56,78,104],"miniature":[25],"is":[28,120],"fabricated":[29],"in":[30,109,122],"a":[31,98],"four-layer":[32],"PCB":[33],"with":[34,131],"high-performance":[35],"dielectric":[36],"RO4003C.":[37],"designs":[39],"of":[40,54,101,106,142],"isolated":[41],"via":[42],"array":[43],"and":[44,75,96],"matching":[45],"via-pad":[46],"structures":[47],"are":[48,135],"used":[49,61,136],"optimize":[51],"performance":[53],"probe.":[55,144],"can":[58,81],"then":[59],"be":[60,82],"wideband":[63],"compatibility":[65],"test":[66],"from":[67],"9":[68],"kHz":[69],"10":[71],"GHz":[72],"under":[73],"narrow":[74],"complex":[76],"conditions.":[77],"sensitive":[83],"enough":[84],"detect":[86],"weak":[88],"signal":[90],"as":[91,93],"small":[92],"-130":[94],"dBA":[95],"has":[97],"spatial":[99],"resolution":[100],"1":[102],"mm.":[103],"application":[105],"location":[111],"PCBs":[113],"based":[114],"measured":[116],"surface":[117],"scan":[118],"method":[119],"investigated":[121],"this":[123],"paper.":[124],"And":[125],"two":[126],"near-field":[127],"measurement":[128],"results":[129],"compared":[130],"reference":[133],"illustrate":[138],"new":[140],"features":[141]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":10},{"year":2024,"cited_by_count":9},{"year":2023,"cited_by_count":10},{"year":2022,"cited_by_count":8},{"year":2021,"cited_by_count":6},{"year":2020,"cited_by_count":8},{"year":2019,"cited_by_count":5},{"year":2018,"cited_by_count":2}],"updated_date":"2026-03-27T05:58:40.876381","created_date":"2025-10-10T00:00:00"}