{"id":"https://openalex.org/W2589769495","doi":"https://doi.org/10.1109/tim.2017.2662538","title":"Study of Contact Resistance in Connectors With Physical Simulation Using Nanofabrication","display_name":"Study of Contact Resistance in Connectors With Physical Simulation Using Nanofabrication","publication_year":2017,"publication_date":"2017-02-24","ids":{"openalex":"https://openalex.org/W2589769495","doi":"https://doi.org/10.1109/tim.2017.2662538","mag":"2589769495"},"language":"en","primary_location":{"id":"doi:10.1109/tim.2017.2662538","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2017.2662538","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5041358979","display_name":"Yasuhiro Fukuyama","orcid":"https://orcid.org/0000-0001-7145-9861"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Yasuhiro Fukuyama","raw_affiliation_strings":["National Metrology Institute of Japan, Tsukuba, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, Tsukuba, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5005311753","display_name":"Norihiko Sakamoto","orcid":"https://orcid.org/0000-0002-0102-7198"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Norihiko Sakamoto","raw_affiliation_strings":["National Metrology Institute of Japan, Tsukuba, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, Tsukuba, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110481599","display_name":"Takaya Kondo","orcid":null},"institutions":[{"id":"https://openalex.org/I4210137110","display_name":"Yazaki (Japan)","ror":"https://ror.org/04dgpsg75","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210137110"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takaya Kondo","raw_affiliation_strings":["Yazaki Parts Co., Ltd., Makinohara, Shizuoka, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Yazaki Parts Co., Ltd., Makinohara, Shizuoka, Japan","institution_ids":["https://openalex.org/I4210137110"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5040476057","display_name":"Masanori Onuma","orcid":null},"institutions":[{"id":"https://openalex.org/I4210137110","display_name":"Yazaki (Japan)","ror":"https://ror.org/04dgpsg75","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210137110"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masanori Onuma","raw_affiliation_strings":["Yazaki Parts Co., Ltd., Makinohara, Shizuoka, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Yazaki Parts Co., Ltd., Makinohara, Shizuoka, Japan","institution_ids":["https://openalex.org/I4210137110"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5089866154","display_name":"Nobu\u2010Hisa Kaneko","orcid":"https://orcid.org/0000-0003-3857-7940"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Nobu-Hisa Kaneko","raw_affiliation_strings":["National Metrology Institute of Japan, Tsukuba, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, Tsukuba, Japan","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":5,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.2036,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.51027685,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":98},"biblio":{"volume":"66","issue":"6","first_page":"1248","last_page":"1253"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12371","display_name":"Electrical Contact Performance and Analysis","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12371","display_name":"Electrical Contact Performance and Analysis","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9969000220298767,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10913","display_name":"Molecular Junctions and Nanostructures","score":0.9969000220298767,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/contact-resistance","display_name":"Contact resistance","score":0.8640332221984863},{"id":"https://openalex.org/keywords/constriction","display_name":"Constriction","score":0.8362593650817871},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.707561194896698},{"id":"https://openalex.org/keywords/electrical-contacts","display_name":"Electrical contacts","score":0.6935142874717712},{"id":"https://openalex.org/keywords/electrical-resistance-and-conductance","display_name":"Electrical resistance and conductance","score":0.5550312995910645},{"id":"https://openalex.org/keywords/electrical-resistivity-and-conductivity","display_name":"Electrical resistivity and conductivity","score":0.5262005925178528},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.4610975980758667},{"id":"https://openalex.org/keywords/nanolithography","display_name":"Nanolithography","score":0.4317716062068939},{"id":"https://openalex.org/keywords/electrical-conductor","display_name":"Electrical conductor","score":0.4140876531600952},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.24757486581802368},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.235081285238266},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.1368710994720459},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.09712603688240051}],"concepts":[{"id":"https://openalex.org/C123671423","wikidata":"https://www.wikidata.org/wiki/Q332329","display_name":"Contact resistance","level":3,"score":0.8640332221984863},{"id":"https://openalex.org/C174940676","wikidata":"https://www.wikidata.org/wiki/Q495626","display_name":"Constriction","level":2,"score":0.8362593650817871},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.707561194896698},{"id":"https://openalex.org/C132235601","wikidata":"https://www.wikidata.org/wiki/Q394001","display_name":"Electrical contacts","level":2,"score":0.6935142874717712},{"id":"https://openalex.org/C94857076","wikidata":"https://www.wikidata.org/wiki/Q106603432","display_name":"Electrical resistance and conductance","level":2,"score":0.5550312995910645},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.5262005925178528},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.4610975980758667},{"id":"https://openalex.org/C162117346","wikidata":"https://www.wikidata.org/wiki/Q1106386","display_name":"Nanolithography","level":4,"score":0.4317716062068939},{"id":"https://openalex.org/C202374169","wikidata":"https://www.wikidata.org/wiki/Q124291","display_name":"Electrical conductor","level":2,"score":0.4140876531600952},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.24757486581802368},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.235081285238266},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.1368710994720459},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.09712603688240051},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C134018914","wikidata":"https://www.wikidata.org/wiki/Q162606","display_name":"Endocrinology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tim.2017.2662538","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2017.2662538","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":14,"referenced_works":["https://openalex.org/W1973247290","https://openalex.org/W1991841155","https://openalex.org/W1994839092","https://openalex.org/W2018672445","https://openalex.org/W2024722136","https://openalex.org/W2068485252","https://openalex.org/W2070103852","https://openalex.org/W2088887061","https://openalex.org/W2093333193","https://openalex.org/W2151489477","https://openalex.org/W2187636587","https://openalex.org/W3014141305","https://openalex.org/W4237716869","https://openalex.org/W6648428743"],"related_works":["https://openalex.org/W2198259623","https://openalex.org/W2168702377","https://openalex.org/W4285032180","https://openalex.org/W2393490813","https://openalex.org/W1979150147","https://openalex.org/W2509915917","https://openalex.org/W4301184902","https://openalex.org/W2570470819","https://openalex.org/W2088887061","https://openalex.org/W2165522438"],"abstract_inverted_index":{"The":[0,32],"contact":[1,40,80,89],"resistance":[2,11,23,34,55],"of":[3,9,17,24,39,48,77],"electrical":[4,79],"contacts":[5],"in":[6],"connectors":[7],"consists":[8],"constriction":[10,16,33,54,83,99],"that":[12,86],"results":[13],"from":[14],"the":[15,21,25,29,37,46,53,64,74,88,98],"current":[18],"flow":[19],"and":[20,42,81],"film":[22],"high-resistivity":[26],"material":[27],"between":[28,73],"two":[30],"electrodes.":[31],"depends":[35],"on":[36,93],"number":[38],"points":[41],"their":[43],"sizes.":[44],"In":[45],"case":[47,65],"a":[49,71,94],"simplified":[50],"single-point":[51],"contact,":[52],"can":[56],"be":[57],"calculated":[58],"analytically;":[59],"however,":[60],"this":[61],"is":[62],"not":[63],"for":[66,96],"real":[67],"contact.":[68],"To":[69],"establish":[70],"relationship":[72],"physical":[75],"structure":[76,90],"an":[78],"its":[82],"resistance,":[84],"samples":[85],"represent":[87],"were":[91],"fabricated":[92],"Si-chip":[95],"measuring":[97],"resistance.":[100]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2018,"cited_by_count":1}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}