{"id":"https://openalex.org/W2102727435","doi":"https://doi.org/10.1109/tim.2010.2090691","title":"A Precision Dose Control Circuit for Maskless E-Beam Lithography With Massively Parallel Vertically Aligned Carbon Nanofibers","display_name":"A Precision Dose Control Circuit for Maskless E-Beam Lithography With Massively Parallel Vertically Aligned Carbon Nanofibers","publication_year":2010,"publication_date":"2010-12-11","ids":{"openalex":"https://openalex.org/W2102727435","doi":"https://doi.org/10.1109/tim.2010.2090691","mag":"2102727435"},"language":"en","primary_location":{"id":"doi:10.1109/tim.2010.2090691","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2010.2090691","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5069607754","display_name":"Sazia A. Eliza","orcid":"https://orcid.org/0009-0000-8706-0791"},"institutions":[{"id":"https://openalex.org/I75027704","display_name":"University of Tennessee at Knoxville","ror":"https://ror.org/020f3ap87","country_code":"US","type":"education","lineage":["https://openalex.org/I75027704"]},{"id":"https://openalex.org/I158011677","display_name":"Sonoma State University","ror":"https://ror.org/04wjxkk25","country_code":"US","type":"education","lineage":["https://openalex.org/I158011677"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Sazia A. Eliza","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science, University of Tennessee, Knoxville, TN, USA","Department of Engineering Science, Sonoma State University, Rohnert Park, CA, USA","Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA"],"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science, University of Tennessee, Knoxville, TN, USA","institution_ids":["https://openalex.org/I75027704"]},{"raw_affiliation_string":"Department of Engineering Science, Sonoma State University, Rohnert Park, CA, USA","institution_ids":["https://openalex.org/I158011677"]},{"raw_affiliation_string":"Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA","institution_ids":["https://openalex.org/I75027704"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062878427","display_name":"Syed K. Islam","orcid":"https://orcid.org/0000-0002-0501-0027"},"institutions":[{"id":"https://openalex.org/I75027704","display_name":"University of Tennessee at Knoxville","ror":"https://ror.org/020f3ap87","country_code":"US","type":"education","lineage":["https://openalex.org/I75027704"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Syed K. Islam","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science, University of Tennessee, Knoxville, TN, USA","Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA"],"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science, University of Tennessee, Knoxville, TN, USA","institution_ids":["https://openalex.org/I75027704"]},{"raw_affiliation_string":"Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA","institution_ids":["https://openalex.org/I75027704"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101486879","display_name":"Tauhidur Rahman","orcid":"https://orcid.org/0000-0003-1981-6395"},"institutions":[{"id":"https://openalex.org/I107639228","display_name":"University of Notre Dame","ror":"https://ror.org/00mkhxb43","country_code":"US","type":"education","lineage":["https://openalex.org/I107639228"]},{"id":"https://openalex.org/I75027704","display_name":"University of Tennessee at Knoxville","ror":"https://ror.org/020f3ap87","country_code":"US","type":"education","lineage":["https://openalex.org/I75027704"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Touhidur Rahman","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science, University of Tennessee, Knoxville, TN, USA","Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN, USA","Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA"],"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science, University of Tennessee, Knoxville, TN, USA","institution_ids":["https://openalex.org/I75027704"]},{"raw_affiliation_string":"Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN, USA","institution_ids":["https://openalex.org/I107639228"]},{"raw_affiliation_string":"Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA","institution_ids":["https://openalex.org/I75027704"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108071964","display_name":"N. D. Bull","orcid":null},"institutions":[{"id":"https://openalex.org/I75027704","display_name":"University of Tennessee at Knoxville","ror":"https://ror.org/020f3ap87","country_code":"US","type":"education","lineage":["https://openalex.org/I75027704"]},{"id":"https://openalex.org/I1289243028","display_name":"Oak Ridge National Laboratory","ror":"https://ror.org/01qz5mb56","country_code":"US","type":"facility","lineage":["https://openalex.org/I1289243028","https://openalex.org/I1330989302","https://openalex.org/I39565521","https://openalex.org/I4210159294"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Nora Dianne Bull","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science, University of Tennessee, Knoxville, TN, USA","Oak Ridge National Laboratory, Oak Ridge, TN, USA","Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA"],"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science, University of Tennessee, Knoxville, TN, USA","institution_ids":["https://openalex.org/I75027704"]},{"raw_affiliation_string":"Oak Ridge National Laboratory, Oak Ridge, TN, USA","institution_ids":["https://openalex.org/I1289243028"]},{"raw_affiliation_string":"Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA","institution_ids":["https://openalex.org/I75027704"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5043686014","display_name":"Benjamin J. Blalock","orcid":"https://orcid.org/0000-0002-3160-6529"},"institutions":[{"id":"https://openalex.org/I75027704","display_name":"University of Tennessee at Knoxville","ror":"https://ror.org/020f3ap87","country_code":"US","type":"education","lineage":["https://openalex.org/I75027704"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Benjamin J. Blalock","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science, University of Tennessee, Knoxville, TN, USA","Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA"],"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science, University of Tennessee, Knoxville, TN, USA","institution_ids":["https://openalex.org/I75027704"]},{"raw_affiliation_string":"Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA","institution_ids":["https://openalex.org/I75027704"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075969768","display_name":"L. R. Baylor","orcid":"https://orcid.org/0000-0002-0325-7771"},"institutions":[{"id":"https://openalex.org/I1289243028","display_name":"Oak Ridge National Laboratory","ror":"https://ror.org/01qz5mb56","country_code":"US","type":"facility","lineage":["https://openalex.org/I1289243028","https://openalex.org/I1330989302","https://openalex.org/I39565521","https://openalex.org/I4210159294"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Larry R. Baylor","raw_affiliation_strings":["Fusion Energy Division, Oak Ridge National Laboratory, Oak Ridge, TN, USA","Fusion Energy Div., Oak Ridge Nat. Lab., Oak Ridge, TN, USA"],"affiliations":[{"raw_affiliation_string":"Fusion Energy Division, Oak Ridge National Laboratory, Oak Ridge, TN, USA","institution_ids":["https://openalex.org/I1289243028"]},{"raw_affiliation_string":"Fusion Energy Div., Oak Ridge Nat. Lab., Oak Ridge, TN, USA","institution_ids":["https://openalex.org/I1289243028"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002004469","display_name":"M.N. Ericson","orcid":"https://orcid.org/0000-0002-6628-4865"},"institutions":[{"id":"https://openalex.org/I1289243028","display_name":"Oak Ridge National Laboratory","ror":"https://ror.org/01qz5mb56","country_code":"US","type":"facility","lineage":["https://openalex.org/I1289243028","https://openalex.org/I1330989302","https://openalex.org/I39565521","https://openalex.org/I4210159294"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. Nance Ericson","raw_affiliation_strings":["Engineering Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN, USA","Eng. Sci. & Technol. Div., Oak Ridge Nat. Lab., Oak Ridge, TN, USA"],"affiliations":[{"raw_affiliation_string":"Engineering Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN, USA","institution_ids":["https://openalex.org/I1289243028"]},{"raw_affiliation_string":"Eng. Sci. & Technol. Div., Oak Ridge Nat. Lab., Oak Ridge, TN, USA","institution_ids":["https://openalex.org/I1289243028"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113568925","display_name":"W. L. Gardner","orcid":null},"institutions":[{"id":"https://openalex.org/I1289243028","display_name":"Oak Ridge National Laboratory","ror":"https://ror.org/01qz5mb56","country_code":"US","type":"facility","lineage":["https://openalex.org/I1289243028","https://openalex.org/I1330989302","https://openalex.org/I39565521","https://openalex.org/I4210159294"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Walter L. Gardner","raw_affiliation_strings":["Fusion Energy Division, Oak Ridge National Laboratory, Oak Ridge, TN, USA","Fusion Energy Div., Oak Ridge Nat. Lab., Oak Ridge, TN, USA"],"affiliations":[{"raw_affiliation_string":"Fusion Energy Division, Oak Ridge National Laboratory, Oak Ridge, TN, USA","institution_ids":["https://openalex.org/I1289243028"]},{"raw_affiliation_string":"Fusion Energy Div., Oak Ridge Nat. Lab., Oak Ridge, TN, USA","institution_ids":["https://openalex.org/I1289243028"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":8,"corresponding_author_ids":["https://openalex.org/A5069607754"],"corresponding_institution_ids":["https://openalex.org/I158011677","https://openalex.org/I75027704"],"apc_list":null,"apc_paid":null,"fwci":0.1536,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.51542537,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":96},"biblio":{"volume":"60","issue":"4","first_page":"1132","last_page":"1140"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10074","display_name":"Carbon Nanotubes in Composites","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10074","display_name":"Carbon Nanotubes in Composites","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10083","display_name":"Graphene research and applications","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11005","display_name":"Radiation Effects in Electronics","score":0.9958000183105469,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7212202548980713},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"Electron-beam lithography","score":0.7036266326904297},{"id":"https://openalex.org/keywords/massively-parallel","display_name":"Massively parallel","score":0.6782557964324951},{"id":"https://openalex.org/keywords/maskless-lithography","display_name":"Maskless lithography","score":0.6561013460159302},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6498559713363647},{"id":"https://openalex.org/keywords/photoresist","display_name":"Photoresist","score":0.5944758653640747},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.5834532380104065},{"id":"https://openalex.org/keywords/x-ray-lithography","display_name":"X-ray lithography","score":0.5150665640830994},{"id":"https://openalex.org/keywords/cathode-ray","display_name":"Cathode ray","score":0.42224615812301636},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.4015198349952698},{"id":"https://openalex.org/keywords/electron","display_name":"Electron","score":0.3659358620643616},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.32410961389541626},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.26175180077552795},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.1762755811214447},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.15772292017936707},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.05885857343673706}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7212202548980713},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.7036266326904297},{"id":"https://openalex.org/C190475519","wikidata":"https://www.wikidata.org/wiki/Q544384","display_name":"Massively parallel","level":2,"score":0.6782557964324951},{"id":"https://openalex.org/C137905882","wikidata":"https://www.wikidata.org/wiki/Q6783445","display_name":"Maskless lithography","level":5,"score":0.6561013460159302},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6498559713363647},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.5944758653640747},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5834532380104065},{"id":"https://openalex.org/C41794268","wikidata":"https://www.wikidata.org/wiki/Q1408939","display_name":"X-ray lithography","level":4,"score":0.5150665640830994},{"id":"https://openalex.org/C95312477","wikidata":"https://www.wikidata.org/wiki/Q207340","display_name":"Cathode ray","level":3,"score":0.42224615812301636},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4015198349952698},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.3659358620643616},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.32410961389541626},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.26175180077552795},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.1762755811214447},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.15772292017936707},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.05885857343673706},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C173608175","wikidata":"https://www.wikidata.org/wiki/Q232661","display_name":"Parallel computing","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tim.2010.2090691","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2010.2090691","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":19,"referenced_works":["https://openalex.org/W1566916904","https://openalex.org/W1994838791","https://openalex.org/W2001731916","https://openalex.org/W2005910156","https://openalex.org/W2007835163","https://openalex.org/W2023771774","https://openalex.org/W2035433694","https://openalex.org/W2043913337","https://openalex.org/W2044716238","https://openalex.org/W2077829772","https://openalex.org/W2101899813","https://openalex.org/W2103817521","https://openalex.org/W2112859828","https://openalex.org/W2115693774","https://openalex.org/W2120695919","https://openalex.org/W2133308441","https://openalex.org/W2133672707","https://openalex.org/W2154438029","https://openalex.org/W2160544251"],"related_works":["https://openalex.org/W2135099569","https://openalex.org/W806091262","https://openalex.org/W2071670783","https://openalex.org/W2183602760","https://openalex.org/W4390650236","https://openalex.org/W2027333059","https://openalex.org/W1985666002","https://openalex.org/W4238142582","https://openalex.org/W2113684589","https://openalex.org/W4375810091"],"abstract_inverted_index":{"This":[0],"paper":[1],"describes":[2],"a":[3,14,26,41,77],"highly":[4],"accurate":[5],"dose":[6,90],"control":[7],"circuit":[8],"(DCC)":[9],"for":[10,59,91],"the":[11,37,45,52,60,63,70,73,84,88,92],"emission":[12],"of":[13,17,44,51,62,72,80],"desired":[15],"number":[16],"electrons":[18,82],"from":[19,83],"vertically":[20],"aligned":[21],"carbon":[22],"nanofibers":[23],"(VACNFs)":[24],"in":[25,49],"massively":[27],"parallel":[28],"maskless":[29],"e-beam":[30,93],"lithography":[31],"system.":[32],"The":[33],"parasitic":[34,64],"components":[35,65],"within":[36],"VACNF":[38],"device":[39],"cause":[40],"premature":[42],"termination":[43],"electron":[46],"emission,":[47],"resulting":[48],"underexposure":[50],"photoresist.":[53],"In":[54],"this":[55],"paper,":[56],"we":[57],"compensate":[58],"effects":[61],"and":[66,75],"noise":[67],"while":[68],"reducing":[69],"area":[71],"chip":[74],"achieving":[76],"precise":[78],"count":[79],"emitted":[81],"VACNFs":[85],"to":[86],"obtain":[87],"optimum":[89],"lithography.":[94]},"counts_by_year":[{"year":2020,"cited_by_count":2},{"year":2016,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}