{"id":"https://openalex.org/W2575590966","doi":"https://doi.org/10.1109/tetc.2017.2653399","title":"Printability Enhancement with Color Balancing for Multiple Patterning Lithography","display_name":"Printability Enhancement with Color Balancing for Multiple Patterning Lithography","publication_year":2017,"publication_date":"2017-01-17","ids":{"openalex":"https://openalex.org/W2575590966","doi":"https://doi.org/10.1109/tetc.2017.2653399","mag":"2575590966"},"language":"en","primary_location":{"id":"doi:10.1109/tetc.2017.2653399","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tetc.2017.2653399","pdf_url":null,"source":{"id":"https://openalex.org/S2496326734","display_name":"IEEE Transactions on Emerging Topics in Computing","issn_l":"2168-6750","issn":["2168-6750","2376-4562"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Emerging Topics in Computing","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5071671494","display_name":"Kuan\u2010Jung Chen","orcid":null},"institutions":[{"id":"https://openalex.org/I154864474","display_name":"National Taiwan University of Science and Technology","ror":"https://ror.org/00q09pe49","country_code":"TW","type":"education","lineage":["https://openalex.org/I154864474"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Kuan-Jung Chen","raw_affiliation_strings":["Department of Electrical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan","institution_ids":["https://openalex.org/I154864474"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5065439030","display_name":"Shao\u2010Yun Fang","orcid":"https://orcid.org/0000-0001-6675-2676"},"institutions":[{"id":"https://openalex.org/I154864474","display_name":"National Taiwan University of Science and Technology","ror":"https://ror.org/00q09pe49","country_code":"TW","type":"education","lineage":["https://openalex.org/I154864474"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Shao-Yun Fang","raw_affiliation_strings":["Department of Electrical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan"],"raw_orcid":"https://orcid.org/0000-0001-6675-2676","affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan","institution_ids":["https://openalex.org/I154864474"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I154864474"],"apc_list":{"value":2645,"currency":"USD","value_usd":2645},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.00525593,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":98},"biblio":{"volume":"7","issue":"2","first_page":"244","last_page":"252"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10996","display_name":"Computational Geometry and Mesh Generation","score":0.9916999936103821,"subfield":{"id":"https://openalex.org/subfields/1704","display_name":"Computer Graphics and Computer-Aided Design"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.8094133138656616},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.7014301419258118},{"id":"https://openalex.org/keywords/simulated-annealing","display_name":"Simulated annealing","score":0.6801890134811401},{"id":"https://openalex.org/keywords/multiple-patterning","display_name":"Multiple patterning","score":0.5723117589950562},{"id":"https://openalex.org/keywords/distortion","display_name":"Distortion (music)","score":0.5187419056892395},{"id":"https://openalex.org/keywords/next-generation-lithography","display_name":"Next-generation lithography","score":0.5117509365081787},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.4003715515136719},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"Electron-beam lithography","score":0.32963845133781433},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.24772661924362183},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.21570193767547607},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.17736110091209412},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.12476018071174622},{"id":"https://openalex.org/keywords/telecommunications","display_name":"Telecommunications","score":0.09267133474349976}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.8094133138656616},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.7014301419258118},{"id":"https://openalex.org/C126980161","wikidata":"https://www.wikidata.org/wiki/Q863783","display_name":"Simulated annealing","level":2,"score":0.6801890134811401},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.5723117589950562},{"id":"https://openalex.org/C126780896","wikidata":"https://www.wikidata.org/wiki/Q899871","display_name":"Distortion (music)","level":4,"score":0.5187419056892395},{"id":"https://openalex.org/C163581340","wikidata":"https://www.wikidata.org/wiki/Q1983848","display_name":"Next-generation lithography","level":5,"score":0.5117509365081787},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.4003715515136719},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.32963845133781433},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.24772661924362183},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.21570193767547607},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.17736110091209412},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.12476018071174622},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.09267133474349976},{"id":"https://openalex.org/C2776257435","wikidata":"https://www.wikidata.org/wiki/Q1576430","display_name":"Bandwidth (computing)","level":2,"score":0.0},{"id":"https://openalex.org/C194257627","wikidata":"https://www.wikidata.org/wiki/Q211554","display_name":"Amplifier","level":3,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tetc.2017.2653399","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tetc.2017.2653399","pdf_url":null,"source":{"id":"https://openalex.org/S2496326734","display_name":"IEEE Transactions on Emerging Topics in Computing","issn_l":"2168-6750","issn":["2168-6750","2376-4562"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Emerging Topics in Computing","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":27,"referenced_works":["https://openalex.org/W71992527","https://openalex.org/W1966025699","https://openalex.org/W1971739315","https://openalex.org/W1984417816","https://openalex.org/W2000999402","https://openalex.org/W2018868256","https://openalex.org/W2032622168","https://openalex.org/W2034194269","https://openalex.org/W2039468162","https://openalex.org/W2093576521","https://openalex.org/W2095117703","https://openalex.org/W2105685623","https://openalex.org/W2116621052","https://openalex.org/W2143286762","https://openalex.org/W2152190733","https://openalex.org/W2156916628","https://openalex.org/W2159287000","https://openalex.org/W2949126383","https://openalex.org/W2949805432","https://openalex.org/W3149715914","https://openalex.org/W3150135088","https://openalex.org/W4240075604","https://openalex.org/W4251247564","https://openalex.org/W4251430640","https://openalex.org/W4255476700","https://openalex.org/W6676165970","https://openalex.org/W6677494453"],"related_works":["https://openalex.org/W2541440459","https://openalex.org/W2115795789","https://openalex.org/W2140942945","https://openalex.org/W2025251804","https://openalex.org/W806091262","https://openalex.org/W2379570117","https://openalex.org/W2032413298","https://openalex.org/W1975854055","https://openalex.org/W2000620740","https://openalex.org/W1977820409"],"abstract_inverted_index":{"Due":[0],"to":[1,38,71,85,100],"the":[2,15,19,59,114,159],"delay":[3],"of":[4,22,47,62,130],"Next":[5],"Generation":[6],"Lithography":[7],"technologies,":[8],"multiple":[9,31],"patterning":[10,140,145],"lithography":[11,141,146],"(MPL)":[12],"is":[13,36,83,98,110,121],"still":[14],"major":[16],"solution":[17,107],"for":[18,123],"continuous":[20],"advance":[21],"process":[23],"nodes.":[24],"Considering":[25],"pattern":[26,40,73],"color":[27,52,65,169],"(density)":[28],"balancing":[29,53],"on":[30,113,138],"masks":[32],"during":[33,54],"layout":[34,55],"decomposition":[35],"crucial":[37],"reduce":[39],"distortion":[41],"and":[42,91,132,143,158],"lithographic":[43],"hotspots.":[44],"While":[45],"most":[46],"previous":[48],"studies":[49],"consider":[50],"global":[51],"decomposition,":[56],"we":[57,133],"propose":[58],"first":[60],"work":[61],"post-decomposition":[63],"local":[64],"uniformity":[66],"optimization,":[67],"which":[68],"will":[69],"contribute":[70],"better":[72],"printability.":[74],"In":[75],"our":[76,152],"flow,":[77],"a":[78,87,93,106,167],"linear":[79],"programming":[80],"(LP)":[81],"formulation":[82],"developed":[84],"derive":[86,155],"good":[88],"initial":[89],"solution,":[90],"then":[92],"simulated":[94],"annealing":[95],"(SA)-based":[96],"algorithm":[97],"proposed":[99,119],"globally":[101],"search":[102],"optimal":[103],"solutions.":[104],"Finally,":[105],"refinement":[108],"procedure":[109],"applied":[111],"based":[112],"FM":[115],"partitioning":[116],"heuristic.":[117],"The":[118,148],"flow":[120,153],"suitable":[122],"general":[124],"MPL":[125],"with":[126],"an":[127],"arbitrary":[128],"number":[129],"masks,":[131],"respectively":[134],"demonstrate":[135],"its":[136],"effectiveness":[137],"double":[139],"(DPL)":[142],"triple":[144],"(TPL).":[147],"former":[149],"indicates":[150],"that":[151],"can":[154],"near-optimal":[156],"solutions,":[157],"latter":[160],"shows":[161],"about":[162],"29":[163],"percent":[164],"improvement":[165],"over":[166],"state-of-the-art":[168],"balancing-aware":[170],"TPL":[171],"decomposer.":[172]},"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2023,"cited_by_count":1},{"year":2021,"cited_by_count":2}],"updated_date":"2026-08-21T09:56:20.448147","created_date":"2025-10-10T00:00:00"}