{"id":"https://openalex.org/W1978366843","doi":"https://doi.org/10.1109/test.2012.6401546","title":"Systematic defect screening in controlled experiments using volume diagnosis","display_name":"Systematic defect screening in controlled experiments using volume diagnosis","publication_year":2012,"publication_date":"2012-11-01","ids":{"openalex":"https://openalex.org/W1978366843","doi":"https://doi.org/10.1109/test.2012.6401546","mag":"1978366843"},"language":"en","primary_location":{"id":"doi:10.1109/test.2012.6401546","is_oa":false,"landing_page_url":"https://doi.org/10.1109/test.2012.6401546","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2012 IEEE International Test Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5050508691","display_name":"B. Seshadri","orcid":null},"institutions":[{"id":"https://openalex.org/I1304085615","display_name":"Nvidia (United Kingdom)","ror":"https://ror.org/02kr42612","country_code":"GB","type":"company","lineage":["https://openalex.org/I1304085615","https://openalex.org/I4210127875"]},{"id":"https://openalex.org/I4210127875","display_name":"Nvidia (United States)","ror":"https://ror.org/03jdj4y14","country_code":"US","type":"company","lineage":["https://openalex.org/I4210127875"]}],"countries":["GB","US"],"is_corresponding":true,"raw_author_name":"B. Seshadri","raw_affiliation_strings":["Nvidia, Santa Clara, CA, USA","[Nvidia, Santa Clara, CA, USA]"],"affiliations":[{"raw_affiliation_string":"Nvidia, Santa Clara, CA, USA","institution_ids":["https://openalex.org/I4210127875"]},{"raw_affiliation_string":"[Nvidia, Santa Clara, CA, USA]","institution_ids":["https://openalex.org/I1304085615"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054728270","display_name":"Pallav Gupta","orcid":null},"institutions":[{"id":"https://openalex.org/I4210127875","display_name":"Nvidia (United States)","ror":"https://ror.org/03jdj4y14","country_code":"US","type":"company","lineage":["https://openalex.org/I4210127875"]},{"id":"https://openalex.org/I1304085615","display_name":"Nvidia (United Kingdom)","ror":"https://ror.org/02kr42612","country_code":"GB","type":"company","lineage":["https://openalex.org/I1304085615","https://openalex.org/I4210127875"]}],"countries":["GB","US"],"is_corresponding":false,"raw_author_name":"P. Gupta","raw_affiliation_strings":["Nvidia, Santa Clara, CA, USA","[Nvidia, Santa Clara, CA, USA]"],"affiliations":[{"raw_affiliation_string":"Nvidia, Santa Clara, CA, USA","institution_ids":["https://openalex.org/I4210127875"]},{"raw_affiliation_string":"[Nvidia, Santa Clara, CA, USA]","institution_ids":["https://openalex.org/I1304085615"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101766906","display_name":"Yi Lin","orcid":"https://orcid.org/0000-0002-9683-4960"},"institutions":[{"id":"https://openalex.org/I4210127875","display_name":"Nvidia (United States)","ror":"https://ror.org/03jdj4y14","country_code":"US","type":"company","lineage":["https://openalex.org/I4210127875"]},{"id":"https://openalex.org/I1304085615","display_name":"Nvidia (United Kingdom)","ror":"https://ror.org/02kr42612","country_code":"GB","type":"company","lineage":["https://openalex.org/I1304085615","https://openalex.org/I4210127875"]}],"countries":["GB","US"],"is_corresponding":false,"raw_author_name":"Y. T. Lin","raw_affiliation_strings":["Nvidia, Santa Clara, CA, USA","[Nvidia, Santa Clara, CA, USA]"],"affiliations":[{"raw_affiliation_string":"Nvidia, Santa Clara, CA, USA","institution_ids":["https://openalex.org/I4210127875"]},{"raw_affiliation_string":"[Nvidia, Santa Clara, CA, USA]","institution_ids":["https://openalex.org/I1304085615"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5004526258","display_name":"Bruce Cory","orcid":null},"institutions":[{"id":"https://openalex.org/I1304085615","display_name":"Nvidia (United Kingdom)","ror":"https://ror.org/02kr42612","country_code":"GB","type":"company","lineage":["https://openalex.org/I1304085615","https://openalex.org/I4210127875"]},{"id":"https://openalex.org/I4210127875","display_name":"Nvidia (United States)","ror":"https://ror.org/03jdj4y14","country_code":"US","type":"company","lineage":["https://openalex.org/I4210127875"]}],"countries":["GB","US"],"is_corresponding":false,"raw_author_name":"B. Cory","raw_affiliation_strings":["Nvidia, Santa Clara, CA, USA","[Nvidia, Santa Clara, CA, USA]"],"affiliations":[{"raw_affiliation_string":"Nvidia, Santa Clara, CA, USA","institution_ids":["https://openalex.org/I4210127875"]},{"raw_affiliation_string":"[Nvidia, Santa Clara, CA, USA]","institution_ids":["https://openalex.org/I1304085615"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5050508691"],"corresponding_institution_ids":["https://openalex.org/I1304085615","https://openalex.org/I4210127875"],"apc_list":null,"apc_paid":null,"fwci":0.2455,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.56551091,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":97},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"7"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9983999729156494,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/volume","display_name":"Volume (thermodynamics)","score":0.7025454044342041},{"id":"https://openalex.org/keywords/key","display_name":"Key (lock)","score":0.594416081905365},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5676395893096924},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5608540773391724},{"id":"https://openalex.org/keywords/production","display_name":"Production (economics)","score":0.5402112007141113},{"id":"https://openalex.org/keywords/work","display_name":"Work (physics)","score":0.5117497444152832},{"id":"https://openalex.org/keywords/yield","display_name":"Yield (engineering)","score":0.49384385347366333},{"id":"https://openalex.org/keywords/reliability-engineering","display_name":"Reliability engineering","score":0.4650052487850189},{"id":"https://openalex.org/keywords/process-engineering","display_name":"Process engineering","score":0.4179638624191284},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.23952266573905945},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.20517924427986145},{"id":"https://openalex.org/keywords/mechanical-engineering","display_name":"Mechanical engineering","score":0.11309531331062317}],"concepts":[{"id":"https://openalex.org/C20556612","wikidata":"https://www.wikidata.org/wiki/Q4469374","display_name":"Volume (thermodynamics)","level":2,"score":0.7025454044342041},{"id":"https://openalex.org/C26517878","wikidata":"https://www.wikidata.org/wiki/Q228039","display_name":"Key (lock)","level":2,"score":0.594416081905365},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5676395893096924},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5608540773391724},{"id":"https://openalex.org/C2778348673","wikidata":"https://www.wikidata.org/wiki/Q739302","display_name":"Production (economics)","level":2,"score":0.5402112007141113},{"id":"https://openalex.org/C18762648","wikidata":"https://www.wikidata.org/wiki/Q42213","display_name":"Work (physics)","level":2,"score":0.5117497444152832},{"id":"https://openalex.org/C134121241","wikidata":"https://www.wikidata.org/wiki/Q899301","display_name":"Yield (engineering)","level":2,"score":0.49384385347366333},{"id":"https://openalex.org/C200601418","wikidata":"https://www.wikidata.org/wiki/Q2193887","display_name":"Reliability engineering","level":1,"score":0.4650052487850189},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.4179638624191284},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.23952266573905945},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.20517924427986145},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.11309531331062317},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0},{"id":"https://openalex.org/C139719470","wikidata":"https://www.wikidata.org/wiki/Q39680","display_name":"Macroeconomics","level":1,"score":0.0},{"id":"https://openalex.org/C38652104","wikidata":"https://www.wikidata.org/wiki/Q3510521","display_name":"Computer security","level":1,"score":0.0},{"id":"https://openalex.org/C162324750","wikidata":"https://www.wikidata.org/wiki/Q8134","display_name":"Economics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/test.2012.6401546","is_oa":false,"landing_page_url":"https://doi.org/10.1109/test.2012.6401546","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2012 IEEE International Test Conference","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9","score":0.41999998688697815}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":16,"referenced_works":["https://openalex.org/W3489370","https://openalex.org/W1564266201","https://openalex.org/W1995945562","https://openalex.org/W2063626119","https://openalex.org/W2099792073","https://openalex.org/W2103396665","https://openalex.org/W2107609659","https://openalex.org/W2131819669","https://openalex.org/W2135640247","https://openalex.org/W2141844817","https://openalex.org/W2161229078","https://openalex.org/W2331432542","https://openalex.org/W2483664965","https://openalex.org/W3116478505","https://openalex.org/W4231580960","https://openalex.org/W6666474464"],"related_works":["https://openalex.org/W2798121181","https://openalex.org/W2016805743","https://openalex.org/W2140798747","https://openalex.org/W4242592912","https://openalex.org/W435830328","https://openalex.org/W2948169060","https://openalex.org/W2386800167","https://openalex.org/W2087896742","https://openalex.org/W2730112582","https://openalex.org/W2384315363"],"abstract_inverted_index":{"Controlled":[0],"modification":[1],"of":[2,13,46,66],"different":[3],"process":[4],"parameters,":[5],"using":[6,47],"designed":[7],"experiments,":[8],"is":[9],"a":[10,18,43],"key":[11],"method":[12],"achieving":[14],"high":[15],"yield":[16],"in":[17,52],"volume":[19,48],"manufacturing":[20],"environment.":[21],"However,":[22],"these":[23],"changes":[24],"need":[25],"to":[26,38,50,61],"be":[27],"validated":[28],"extensively":[29],"and":[30],"screened":[31],"for":[32],"new":[33],"systematic":[34],"defects":[35],"before":[36],"release":[37],"production.":[39],"This":[40],"work":[41],"presents":[42],"novel":[44],"approach":[45],"diagnosis":[49],"aid":[51],"the":[53,63],"screening":[54],"process.":[55],"Silicon":[56],"case":[57],"studies":[58],"are":[59],"presented":[60],"validate":[62],"production":[64],"worthiness":[65],"this":[67],"approach.":[68]},"counts_by_year":[{"year":2019,"cited_by_count":3},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}