{"id":"https://openalex.org/W2920432508","doi":"https://doi.org/10.1109/tencon.2018.8650539","title":"Tunable Aperture with Single layer Blades Actuated by Thermal Expansion of Silicon Beams","display_name":"Tunable Aperture with Single layer Blades Actuated by Thermal Expansion of Silicon Beams","publication_year":2018,"publication_date":"2018-10-01","ids":{"openalex":"https://openalex.org/W2920432508","doi":"https://doi.org/10.1109/tencon.2018.8650539","mag":"2920432508"},"language":"en","primary_location":{"id":"doi:10.1109/tencon.2018.8650539","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tencon.2018.8650539","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"TENCON 2018 - 2018 IEEE Region 10 Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5075722943","display_name":"Chong Ho Hong","orcid":"https://orcid.org/0000-0003-0892-7022"},"institutions":[{"id":"https://openalex.org/I139264467","display_name":"Seoul National University","ror":"https://ror.org/04h9pn542","country_code":"KR","type":"education","lineage":["https://openalex.org/I139264467"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Chong Ho Hong","raw_affiliation_strings":["Electrical and Computer Engineering, Seoul National University, Seoul, Republic of Korea","Department of Electrical and Computer Engineering, Seoul National University, Seoul, Korea"],"affiliations":[{"raw_affiliation_string":"Electrical and Computer Engineering, Seoul National University, Seoul, Republic of Korea","institution_ids":["https://openalex.org/I139264467"]},{"raw_affiliation_string":"Department of Electrical and Computer Engineering, Seoul National University, Seoul, Korea","institution_ids":["https://openalex.org/I139264467"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5104073119","display_name":"Kukjin Chun","orcid":null},"institutions":[{"id":"https://openalex.org/I139264467","display_name":"Seoul National University","ror":"https://ror.org/04h9pn542","country_code":"KR","type":"education","lineage":["https://openalex.org/I139264467"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kukjin Chun","raw_affiliation_strings":["Electrical and Computer Engineering, Seoul National University, Seoul, Republic of Korea","Department of Electrical and Computer Engineering, Seoul National University, Seoul, Korea"],"affiliations":[{"raw_affiliation_string":"Electrical and Computer Engineering, Seoul National University, Seoul, Republic of Korea","institution_ids":["https://openalex.org/I139264467"]},{"raw_affiliation_string":"Department of Electrical and Computer Engineering, Seoul National University, Seoul, Korea","institution_ids":["https://openalex.org/I139264467"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5075722943"],"corresponding_institution_ids":["https://openalex.org/I139264467"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.17608873,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"0579","last_page":"0582"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12452","display_name":"Electrowetting and Microfluidic Technologies","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12452","display_name":"Electrowetting and Microfluidic Technologies","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.9976999759674072,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12784","display_name":"Modular Robots and Swarm Intelligence","score":0.993399977684021,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/aperture","display_name":"Aperture (computer memory)","score":0.7755837440490723},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7552643418312073},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.6640007495880127},{"id":"https://openalex.org/keywords/microelectromechanical-systems","display_name":"Microelectromechanical systems","score":0.6466696262359619},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.6157164573669434},{"id":"https://openalex.org/keywords/multiphysics","display_name":"Multiphysics","score":0.5806922912597656},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.5682150721549988},{"id":"https://openalex.org/keywords/beam","display_name":"Beam (structure)","score":0.4791830778121948},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.45524802803993225},{"id":"https://openalex.org/keywords/beam-divergence","display_name":"Beam divergence","score":0.43365800380706787},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.41361963748931885},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.3809744119644165},{"id":"https://openalex.org/keywords/beam-diameter","display_name":"Beam diameter","score":0.19552373886108398},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.11442598700523376},{"id":"https://openalex.org/keywords/acoustics","display_name":"Acoustics","score":0.10586574673652649},{"id":"https://openalex.org/keywords/finite-element-method","display_name":"Finite element method","score":0.10472899675369263},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.09021028876304626},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.07617676258087158},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.06577226519584656}],"concepts":[{"id":"https://openalex.org/C78336883","wikidata":"https://www.wikidata.org/wiki/Q4779385","display_name":"Aperture (computer memory)","level":2,"score":0.7755837440490723},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7552643418312073},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6640007495880127},{"id":"https://openalex.org/C37977207","wikidata":"https://www.wikidata.org/wiki/Q175561","display_name":"Microelectromechanical systems","level":2,"score":0.6466696262359619},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6157164573669434},{"id":"https://openalex.org/C46435376","wikidata":"https://www.wikidata.org/wiki/Q1829750","display_name":"Multiphysics","level":3,"score":0.5806922912597656},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5682150721549988},{"id":"https://openalex.org/C168834538","wikidata":"https://www.wikidata.org/wiki/Q3705329","display_name":"Beam (structure)","level":2,"score":0.4791830778121948},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.45524802803993225},{"id":"https://openalex.org/C62172962","wikidata":"https://www.wikidata.org/wiki/Q1230543","display_name":"Beam divergence","level":5,"score":0.43365800380706787},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.41361963748931885},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3809744119644165},{"id":"https://openalex.org/C119440689","wikidata":"https://www.wikidata.org/wiki/Q4876179","display_name":"Beam diameter","level":4,"score":0.19552373886108398},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.11442598700523376},{"id":"https://openalex.org/C24890656","wikidata":"https://www.wikidata.org/wiki/Q82811","display_name":"Acoustics","level":1,"score":0.10586574673652649},{"id":"https://openalex.org/C135628077","wikidata":"https://www.wikidata.org/wiki/Q220184","display_name":"Finite element method","level":2,"score":0.10472899675369263},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.09021028876304626},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.07617676258087158},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.06577226519584656},{"id":"https://openalex.org/C2984025587","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser beams","level":3,"score":0.0},{"id":"https://openalex.org/C66938386","wikidata":"https://www.wikidata.org/wiki/Q633538","display_name":"Structural engineering","level":1,"score":0.0},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/tencon.2018.8650539","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tencon.2018.8650539","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"TENCON 2018 - 2018 IEEE Region 10 Conference","raw_type":"proceedings-article"},{"id":"pmh:oai:s-space.snu.ac.kr:10371/186832","is_oa":false,"landing_page_url":"https://hdl.handle.net/10371/186832","pdf_url":null,"source":{"id":"https://openalex.org/S4306401345","display_name":"Seoul National University Open Repository (Seoul National University)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I139264467","host_organization_name":"Seoul National University","host_organization_lineage":["https://openalex.org/I139264467"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"Article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Affordable and clean energy","score":0.8199999928474426,"id":"https://metadata.un.org/sdg/7"}],"awards":[],"funders":[{"id":"https://openalex.org/F4320322030","display_name":"Ministry of Science, ICT and Future Planning","ror":"https://ror.org/032e49973"},{"id":"https://openalex.org/F4320322120","display_name":"National Research Foundation of Korea","ror":"https://ror.org/013aysd81"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W2007506650","https://openalex.org/W2076545532","https://openalex.org/W2089870281","https://openalex.org/W2108708986","https://openalex.org/W2571412408","https://openalex.org/W2734792108","https://openalex.org/W6741548433"],"related_works":["https://openalex.org/W2077065100","https://openalex.org/W2362631035","https://openalex.org/W2392139081","https://openalex.org/W2046322630","https://openalex.org/W2045113356","https://openalex.org/W2607465342","https://openalex.org/W2202700607","https://openalex.org/W906436387","https://openalex.org/W1903359640","https://openalex.org/W2022106670"],"abstract_inverted_index":{"A":[0],"tunable":[1,17,39,54,69,95,99],"aperture":[2,18,55,70,100],"with":[3],"single":[4,110],"layer":[5],"blades":[6],"actuated":[7],"by":[8],"thermal":[9],"expansion":[10],"of":[11,21,32,52,66,83,94],"silicon":[12,25],"beams":[13],"is":[14,56,71],"developed.":[15],"The":[16,50],"that":[19],"consists":[20],"blade":[22],"including":[23],"misaligned":[24],"chevron":[26],"beam":[27],"can":[28],"achieve":[29],"high":[30],"displacement":[31],"the":[33,37,53,63,67,98],"blade.":[34],"To":[35],"design":[36],"desired":[38],"aperture,":[40],"COMSOL":[41],"MULTIPHYSICS":[42],"simulator":[43],"and":[44,78,105],"MEMS":[45],"fabrication":[46],"process":[47],"are":[48],"used.":[49],"dimension":[51],"10.2mm":[57,59],"X":[58,60],"0.365mm.":[61],"In":[62],"results,":[64],"diameter":[65],"fabricated":[68],"achieved":[72],"1.6mm":[73],"under":[74,80],"no":[75],"applied":[76,81],"voltage":[77,82],"1.25mm":[79],"3V.":[84],"Also":[85],"it":[86],"has":[87],"analog":[88],"state":[89],"compared":[90],"to":[91],"other":[92],"type":[93],"aperture.":[96],"Using":[97],"could":[101],"obtain":[102],"3D":[103],"image":[104],"distance":[106],"information":[107],"in":[108],"a":[109],"camera":[111],"system":[112],"simultaneously.":[113]},"counts_by_year":[],"updated_date":"2026-04-04T16:13:02.066488","created_date":"2025-10-10T00:00:00"}