{"id":"https://openalex.org/W4396506033","doi":"https://doi.org/10.1109/tcsvt.2024.3395274","title":"LithoPW: Leveraging Visual Memory Encoding and Defect-Aware Optimization for Precise Determination of the Lithography Process Windows","display_name":"LithoPW: Leveraging Visual Memory Encoding and Defect-Aware Optimization for Precise Determination of the Lithography Process Windows","publication_year":2024,"publication_date":"2024-04-30","ids":{"openalex":"https://openalex.org/W4396506033","doi":"https://doi.org/10.1109/tcsvt.2024.3395274"},"language":"en","primary_location":{"id":"doi:10.1109/tcsvt.2024.3395274","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tcsvt.2024.3395274","pdf_url":null,"source":{"id":"https://openalex.org/S115173108","display_name":"IEEE Transactions on Circuits and Systems for Video Technology","issn_l":"1051-8215","issn":["1051-8215","1558-2205"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Circuits and Systems for Video Technology","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5055933562","display_name":"Jiwei Shen","orcid":"https://orcid.org/0000-0002-1987-4926"},"institutions":[{"id":"https://openalex.org/I66867065","display_name":"East China Normal University","ror":"https://ror.org/02n96ep67","country_code":"CN","type":"education","lineage":["https://openalex.org/I66867065"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Jiwei Shen","raw_affiliation_strings":["Shanghai Key Laboratory of Multidimensional Information Processing, School of Communication and Electronic Engineering, East China Normal University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"Shanghai Key Laboratory of Multidimensional Information Processing, School of Communication and Electronic Engineering, East China Normal University, Shanghai, China","institution_ids":["https://openalex.org/I66867065"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075220317","display_name":"Shujing Lyu","orcid":"https://orcid.org/0000-0003-2623-1379"},"institutions":[{"id":"https://openalex.org/I66867065","display_name":"East China Normal University","ror":"https://ror.org/02n96ep67","country_code":"CN","type":"education","lineage":["https://openalex.org/I66867065"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Shujing Lyu","raw_affiliation_strings":["Shanghai Key Laboratory of Multidimensional Information Processing, School of Communication and Electronic Engineering, East China Normal University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"Shanghai Key Laboratory of Multidimensional Information Processing, School of Communication and Electronic Engineering, East China Normal University, Shanghai, China","institution_ids":["https://openalex.org/I66867065"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101615349","display_name":"Yue Lu","orcid":"https://orcid.org/0000-0002-8784-4657"},"institutions":[{"id":"https://openalex.org/I66867065","display_name":"East China Normal University","ror":"https://ror.org/02n96ep67","country_code":"CN","type":"education","lineage":["https://openalex.org/I66867065"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yue Lu","raw_affiliation_strings":["Shanghai Key Laboratory of Multidimensional Information Processing, School of Communication and Electronic Engineering, East China Normal University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"Shanghai Key Laboratory of Multidimensional Information Processing, School of Communication and Electronic Engineering, East China Normal University, Shanghai, China","institution_ids":["https://openalex.org/I66867065"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5055933562"],"corresponding_institution_ids":["https://openalex.org/I66867065"],"apc_list":null,"apc_paid":null,"fwci":2.447,"has_fulltext":false,"cited_by_count":11,"citation_normalized_percentile":{"value":0.89119916,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":96,"max":99},"biblio":{"volume":"34","issue":"10","first_page":"9298","last_page":"9310"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9943000078201294,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9943000078201294,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9890999794006348,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.9667999744415283,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/encoding","display_name":"Encoding (memory)","score":0.7459955215454102},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.7409865856170654},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.6695920825004578},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6232575178146362},{"id":"https://openalex.org/keywords/random-access-memory","display_name":"Random access memory","score":0.4857774078845978},{"id":"https://openalex.org/keywords/parallel-computing","display_name":"Parallel computing","score":0.338120698928833},{"id":"https://openalex.org/keywords/computer-hardware","display_name":"Computer hardware","score":0.30185601115226746},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.2445213496685028},{"id":"https://openalex.org/keywords/programming-language","display_name":"Programming language","score":0.14526697993278503},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.1380290389060974},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.10087800025939941}],"concepts":[{"id":"https://openalex.org/C125411270","wikidata":"https://www.wikidata.org/wiki/Q18653","display_name":"Encoding (memory)","level":2,"score":0.7459955215454102},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.7409865856170654},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.6695920825004578},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6232575178146362},{"id":"https://openalex.org/C2994168587","wikidata":"https://www.wikidata.org/wiki/Q5295","display_name":"Random access memory","level":2,"score":0.4857774078845978},{"id":"https://openalex.org/C173608175","wikidata":"https://www.wikidata.org/wiki/Q232661","display_name":"Parallel computing","level":1,"score":0.338120698928833},{"id":"https://openalex.org/C9390403","wikidata":"https://www.wikidata.org/wiki/Q3966","display_name":"Computer hardware","level":1,"score":0.30185601115226746},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.2445213496685028},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.14526697993278503},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.1380290389060974},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.10087800025939941}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tcsvt.2024.3395274","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tcsvt.2024.3395274","pdf_url":null,"source":{"id":"https://openalex.org/S115173108","display_name":"IEEE Transactions on Circuits and Systems for Video Technology","issn_l":"1051-8215","issn":["1051-8215","1558-2205"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Circuits and Systems for Video Technology","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[{"id":"https://openalex.org/G2973223028","display_name":null,"funder_award_id":"22DZ2229004","funder_id":"https://openalex.org/F4320321885","funder_display_name":"Science and Technology Commission of Shanghai Municipality"}],"funders":[{"id":"https://openalex.org/F4320321885","display_name":"Science and Technology Commission of Shanghai Municipality","ror":"https://ror.org/03kt66j61"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":46,"referenced_works":["https://openalex.org/W1536680647","https://openalex.org/W1861492603","https://openalex.org/W2025426445","https://openalex.org/W2039528738","https://openalex.org/W2102605133","https://openalex.org/W2109723732","https://openalex.org/W2137834578","https://openalex.org/W2786061353","https://openalex.org/W2792824541","https://openalex.org/W2799192307","https://openalex.org/W2804151869","https://openalex.org/W2922049910","https://openalex.org/W2922883886","https://openalex.org/W2963037989","https://openalex.org/W2963351448","https://openalex.org/W2963552000","https://openalex.org/W2982083293","https://openalex.org/W2995458002","https://openalex.org/W3014007163","https://openalex.org/W3083181217","https://openalex.org/W3096609285","https://openalex.org/W3111802831","https://openalex.org/W3122173535","https://openalex.org/W3164671318","https://openalex.org/W4206816508","https://openalex.org/W4225672218","https://openalex.org/W4235262418","https://openalex.org/W4281570010","https://openalex.org/W4281572381","https://openalex.org/W4285236966","https://openalex.org/W4296558729","https://openalex.org/W4297676427","https://openalex.org/W4312812783","https://openalex.org/W4321770459","https://openalex.org/W4367307847","https://openalex.org/W4385245566","https://openalex.org/W4386076325","https://openalex.org/W4388709698","https://openalex.org/W4389252624","https://openalex.org/W4391474911","https://openalex.org/W4402754006","https://openalex.org/W6768810269","https://openalex.org/W6784094891","https://openalex.org/W6846652169","https://openalex.org/W6849520326","https://openalex.org/W6873058455"],"related_works":["https://openalex.org/W1969741087","https://openalex.org/W4235381733","https://openalex.org/W2355022049","https://openalex.org/W2060429446","https://openalex.org/W2741782512","https://openalex.org/W2001217203","https://openalex.org/W1990364645","https://openalex.org/W3011302839","https://openalex.org/W2392958391","https://openalex.org/W3155227409"],"abstract_inverted_index":{"Lithography":[0],"stands":[1],"as":[2,131,140],"a":[3,59,80,83,89,99,132],"critical":[4],"step":[5],"in":[6,115,138,194],"the":[7,13,70,104,110,153,163,166,170,175,179,185],"manufacturing":[8],"of":[9,16,66,72,79,106,112,165,187],"integrated":[10],"circuits,":[11],"where":[12],"precise":[14,147],"control":[15],"focus":[17],"and":[18,45,88,142],"exposure":[19],"dose":[20],"parameters":[21],"is":[22,77],"vital":[23],"for":[24,30,69,197],"optimal":[25],"results.":[26],"The":[27,95,122,156],"conventional":[28],"methodologies":[29],"defining":[31],"lithography":[32,148,195],"process":[33,73,91,158,171,199],"windows":[34],"often":[35],"face":[36],"difficulties":[37],"with":[38,152],"managing":[39],"measurement":[40],"errors,":[41],"detecting":[42],"printed":[43],"defects,":[44],"exploiting":[46],"visual":[47,64,85,124],"features":[48,65],"from":[49],"Scanning":[50],"Electron":[51],"Microscope":[52],"(SEM)":[53],"images.":[54,121,181],"This":[55,75],"paper":[56],"proposes":[57],"LithoPW,":[58],"novel":[60],"framework":[61],"that":[62],"utilizes":[63],"SEM":[67,120,129,136,180],"images":[68,137],"determination":[71],"windows.":[74],"approach":[76],"comprised":[78],"denoising":[81,96],"module,":[82],"Transformer-based":[84],"memory":[86,125,139],"encoder,":[87],"defect-aware":[90,157],"window":[92,159,172,200],"optimization":[93,160],"module.":[94],"module":[97,161],"incorporates":[98],"Transformer":[100],"architecture":[101],"to":[102,174],"mitigate":[103],"impact":[105],"noise,":[107],"thereby":[108,145],"enhancing":[109],"efficiency":[111],"downstream":[113],"tasks":[114],"leveraging":[116],"information":[117],"embedded":[118],"within":[119,178],"transformer-based":[123],"encoder":[126],"discerns":[127],"each":[128],"image":[130],"Query,":[133],"maintaining":[134],"neighbouring":[135],"Key":[141],"Value":[143],"elements,":[144],"facilitating":[146],"quality":[149],"classification":[150],"associated":[151],"query":[154],"image.":[155],"heightens":[162],"reliability":[164],"results":[167,183],"by":[168],"adjusting":[169],"according":[173],"defects":[176],"identified":[177],"Experimental":[182],"confirm":[184],"efficacy":[186],"our":[188],"framework,":[189],"highlighting":[190],"its":[191],"promising":[192],"application":[193],"production":[196],"accurate":[198],"determination.":[201]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":7},{"year":2024,"cited_by_count":3}],"updated_date":"2025-12-21T23:12:01.093139","created_date":"2025-10-10T00:00:00"}