{"id":"https://openalex.org/W2900227079","doi":"https://doi.org/10.1109/tci.2018.2880342","title":"Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography","display_name":"Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography","publication_year":2018,"publication_date":"2018-11-09","ids":{"openalex":"https://openalex.org/W2900227079","doi":"https://doi.org/10.1109/tci.2018.2880342","mag":"2900227079"},"language":"en","primary_location":{"id":"doi:10.1109/tci.2018.2880342","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tci.2018.2880342","pdf_url":null,"source":{"id":"https://openalex.org/S4210233665","display_name":"IEEE Transactions on Computational Imaging","issn_l":"2333-9403","issn":["2333-9403","2334-0118","2573-0436"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Computational Imaging","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5031836304","display_name":"Xu Ma","orcid":"https://orcid.org/0000-0003-2012-9808"},"institutions":[{"id":"https://openalex.org/I125839683","display_name":"Beijing Institute of Technology","ror":"https://ror.org/01skt4w74","country_code":"CN","type":"education","lineage":["https://openalex.org/I125839683","https://openalex.org/I890469752"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xu Ma","raw_affiliation_strings":["Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China"],"raw_orcid":"https://orcid.org/0000-0003-2012-9808","affiliations":[{"raw_affiliation_string":"Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China","institution_ids":["https://openalex.org/I125839683"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100404698","display_name":"Zhiqiang Wang","orcid":"https://orcid.org/0000-0001-6398-5298"},"institutions":[{"id":"https://openalex.org/I125839683","display_name":"Beijing Institute of Technology","ror":"https://ror.org/01skt4w74","country_code":"CN","type":"education","lineage":["https://openalex.org/I125839683","https://openalex.org/I890469752"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Zhiqiang Wang","raw_affiliation_strings":["Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China","institution_ids":["https://openalex.org/I125839683"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5074127412","display_name":"Xuanbo Chen","orcid":null},"institutions":[{"id":"https://openalex.org/I125839683","display_name":"Beijing Institute of Technology","ror":"https://ror.org/01skt4w74","country_code":"CN","type":"education","lineage":["https://openalex.org/I125839683","https://openalex.org/I890469752"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xuanbo Chen","raw_affiliation_strings":["Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China","institution_ids":["https://openalex.org/I125839683"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100664466","display_name":"Yanqiu Li","orcid":"https://orcid.org/0000-0001-8228-610X"},"institutions":[{"id":"https://openalex.org/I125839683","display_name":"Beijing Institute of Technology","ror":"https://ror.org/01skt4w74","country_code":"CN","type":"education","lineage":["https://openalex.org/I125839683","https://openalex.org/I890469752"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yanqiu Li","raw_affiliation_strings":["Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China"],"raw_orcid":"https://orcid.org/0000-0001-8228-610X","affiliations":[{"raw_affiliation_string":"Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China","institution_ids":["https://openalex.org/I125839683"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5005357824","display_name":"Gonzalo R. Arce","orcid":"https://orcid.org/0000-0001-7163-7111"},"institutions":[{"id":"https://openalex.org/I86501945","display_name":"University of Delaware","ror":"https://ror.org/01sbq1a82","country_code":"US","type":"education","lineage":["https://openalex.org/I86501945"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Gonzalo R. Arce","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of Delaware, Newark, DE, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of Delaware, Newark, DE, USA","institution_ids":["https://openalex.org/I86501945"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.8838,"has_fulltext":false,"cited_by_count":33,"citation_normalized_percentile":{"value":0.76146101,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":96,"max":99},"biblio":{"volume":"5","issue":"1","first_page":"120","last_page":"135"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13114","display_name":"Image Processing Techniques and Applications","score":0.994700014591217,"subfield":{"id":"https://openalex.org/subfields/2214","display_name":"Media Technology"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9904000163078308,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/extreme-ultraviolet-lithography","display_name":"Extreme ultraviolet lithography","score":0.9326858520507812},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6988587379455566},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5243744850158691},{"id":"https://openalex.org/keywords/photolithography","display_name":"Photolithography","score":0.5124990940093994},{"id":"https://openalex.org/keywords/extreme-ultraviolet","display_name":"Extreme ultraviolet","score":0.5023367404937744},{"id":"https://openalex.org/keywords/parametric-statistics","display_name":"Parametric statistics","score":0.488562673330307},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.48544174432754517},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.4650237560272217},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"Optical proximity correction","score":0.41827499866485596},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.36757442355155945},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.29854148626327515},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.1968672275543213},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.12972572445869446},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.11645200848579407},{"id":"https://openalex.org/keywords/laser","display_name":"Laser","score":0.11086452007293701}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9326858520507812},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6988587379455566},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5243744850158691},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5124990940093994},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.5023367404937744},{"id":"https://openalex.org/C117251300","wikidata":"https://www.wikidata.org/wiki/Q1849855","display_name":"Parametric statistics","level":2,"score":0.488562673330307},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.48544174432754517},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.4650237560272217},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.41827499866485596},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.36757442355155945},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.29854148626327515},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1968672275543213},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.12972572445869446},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.11645200848579407},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.11086452007293701},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tci.2018.2880342","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tci.2018.2880342","pdf_url":null,"source":{"id":"https://openalex.org/S4210233665","display_name":"IEEE Transactions on Computational Imaging","issn_l":"2333-9403","issn":["2333-9403","2334-0118","2573-0436"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Computational Imaging","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/9","score":0.4300000071525574,"display_name":"Industry, innovation and infrastructure"}],"awards":[{"id":"https://openalex.org/G1371077724","display_name":null,"funder_award_id":"61675021","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G5435879440","display_name":null,"funder_award_id":"4173078","funder_id":"https://openalex.org/F4320322919","funder_display_name":"Natural Science Foundation of Beijing Municipality"},{"id":"https://openalex.org/G8689945564","display_name":null,"funder_award_id":"61675026","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"}],"funders":[{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"},{"id":"https://openalex.org/F4320322919","display_name":"Natural Science Foundation of Beijing Municipality","ror":null}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":62,"referenced_works":["https://openalex.org/W1594489858","https://openalex.org/W1928825210","https://openalex.org/W1968557601","https://openalex.org/W1978743468","https://openalex.org/W1979151999","https://openalex.org/W1984559644","https://openalex.org/W1987253564","https://openalex.org/W1990449692","https://openalex.org/W1991610979","https://openalex.org/W1995660891","https://openalex.org/W1998578989","https://openalex.org/W2017193810","https://openalex.org/W2019115220","https://openalex.org/W2027095012","https://openalex.org/W2028111547","https://openalex.org/W2031364729","https://openalex.org/W2043713727","https://openalex.org/W2047661987","https://openalex.org/W2053066651","https://openalex.org/W2056712250","https://openalex.org/W2059988141","https://openalex.org/W2060331973","https://openalex.org/W2068486091","https://openalex.org/W2070350923","https://openalex.org/W2076309478","https://openalex.org/W2076498087","https://openalex.org/W2077382595","https://openalex.org/W2078885248","https://openalex.org/W2080447637","https://openalex.org/W2082512893","https://openalex.org/W2092391606","https://openalex.org/W2095152150","https://openalex.org/W2095847028","https://openalex.org/W2098870234","https://openalex.org/W2125859958","https://openalex.org/W2127619078","https://openalex.org/W2129996279","https://openalex.org/W2141556703","https://openalex.org/W2144191147","https://openalex.org/W2145868347","https://openalex.org/W2160093801","https://openalex.org/W2307612934","https://openalex.org/W2331816947","https://openalex.org/W2409757223","https://openalex.org/W2502925949","https://openalex.org/W2538542119","https://openalex.org/W2595155430","https://openalex.org/W2602793000","https://openalex.org/W2735274161","https://openalex.org/W2804428498","https://openalex.org/W4301014524","https://openalex.org/W6647870914","https://openalex.org/W6650172115","https://openalex.org/W6663543078","https://openalex.org/W6669580929","https://openalex.org/W6669851621","https://openalex.org/W6670296585","https://openalex.org/W6671358668","https://openalex.org/W6673826799","https://openalex.org/W6681534588","https://openalex.org/W6697821577","https://openalex.org/W6735716757"],"related_works":["https://openalex.org/W2068898653","https://openalex.org/W2141625811","https://openalex.org/W2012716935","https://openalex.org/W4387328786","https://openalex.org/W2314437508","https://openalex.org/W3121175235","https://openalex.org/W2064679241","https://openalex.org/W2332029428","https://openalex.org/W2003889775","https://openalex.org/W2560257625"],"abstract_inverted_index":{"Extreme":[0],"ultraviolet":[1],"(EUV)":[2],"lithography":[3,19,32],"is":[4,83,98,135,156,177],"the":[5,10,24,56,60,70,77,80,92,95,118,141,172,180,193],"most":[6],"promising":[7],"technology":[8],"for":[9,38,68,140],"next":[11],"generation":[12],"very-large":[13],"scale":[14],"integrated":[15],"circuit":[16],"fabrication.":[17],"EUV":[18,74],"invariably":[20],"introduces":[21],"distortions":[22],"in":[23,91,126],"projected":[25],"lithographic":[26],"mask":[27,49,142],"patterns":[28],"and":[29,48,59,123,168,189],"thus":[30],"inverse":[31],"tools":[33],"are":[34,108],"needed":[35],"to":[36,54,64,137,157,171],"compensate":[37,139],"these.":[39],"This":[40],"paper":[41,155],"develops":[42],"two":[43,105],"kinds":[44],"of":[45,73,153],"model-based":[46],"source":[47,81,97],"optimization":[50,162],"(SMO)":[51],"frameworks,":[52],"referred":[53],"as":[55],"parametric":[57,78],"SMO":[58,106,174,182,195],"pixelated":[61,93],"SMO,":[62,79,94],"both":[63],"provide":[65],"primary":[66],"strategies":[67],"improving":[69],"image":[71],"fidelity":[72],"lithography.":[75],"In":[76,130],"pattern":[82],"defined":[84],"by":[85,100],"a":[86,101,111,132,147,159],"few":[87],"geometrical":[88],"parameters.":[89],"Meanwhile,":[90],"light":[96],"represented":[99],"grid":[102],"pattern.":[103],"These":[104],"frameworks":[107],"established":[109],"using":[110],"nonlinear":[112],"imaging":[113],"model":[114],"that":[115,179],"coarsely":[116],"approximates":[117],"optical":[119],"proximity":[120],"effect,":[121],"flare":[122],"photoresist":[124],"effects":[125,144],"an":[127],"analytic":[128],"closed-form.":[129],"addition,":[131],"retargeting":[133],"method":[134],"used":[136],"approximately":[138],"shadowing":[143,149],"based":[145,164],"on":[146,165],"calibrated":[148],"model.":[150],"Another":[151],"contribution":[152],"this":[154],"develop":[158],"hybrid":[160,181],"cooperative":[161],"algorithm":[163,183],"conjugate":[166],"gradient":[167],"compare":[169],"it":[170],"simultaneous":[173,194],"algorithm.":[175,196],"It":[176],"shown":[178],"can":[184],"achieve":[185],"superior":[186],"convergence":[187],"characteristics":[188],"computational":[190],"efficiency":[191],"over":[192]},"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2025,"cited_by_count":9},{"year":2024,"cited_by_count":7},{"year":2023,"cited_by_count":4},{"year":2022,"cited_by_count":4},{"year":2021,"cited_by_count":4},{"year":2019,"cited_by_count":3}],"updated_date":"2026-03-27T05:58:40.876381","created_date":"2025-10-10T00:00:00"}