{"id":"https://openalex.org/W2527777934","doi":"https://doi.org/10.1109/tcad.2016.2614777","title":"Nanowire-Aware Routing Considering High Cut Mask Complexity","display_name":"Nanowire-Aware Routing Considering High Cut Mask Complexity","publication_year":2016,"publication_date":"2016-10-03","ids":{"openalex":"https://openalex.org/W2527777934","doi":"https://doi.org/10.1109/tcad.2016.2614777","mag":"2527777934"},"language":"en","primary_location":{"id":"doi:10.1109/tcad.2016.2614777","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tcad.2016.2614777","pdf_url":null,"source":{"id":"https://openalex.org/S100835903","display_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","issn_l":"0278-0070","issn":["0278-0070","1937-4151"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5026811322","display_name":"Yu-Hsuan Su","orcid":null},"institutions":[{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]}],"countries":["TW"],"is_corresponding":true,"raw_author_name":"Yu-Hsuan Su","raw_affiliation_strings":["Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan"],"affiliations":[{"raw_affiliation_string":"Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan","institution_ids":["https://openalex.org/I16733864"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5018371636","display_name":"Yao\u2010Wen Chang","orcid":"https://orcid.org/0000-0002-0564-5719"},"institutions":[{"id":"https://openalex.org/I4210086894","display_name":"Research Center for Information Technology Innovation, Academia Sinica","ror":"https://ror.org/000zgvm20","country_code":"TW","type":"facility","lineage":["https://openalex.org/I4210086894","https://openalex.org/I84653119"]},{"id":"https://openalex.org/I16733864","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95","country_code":"TW","type":"education","lineage":["https://openalex.org/I16733864"]},{"id":"https://openalex.org/I4210117802","display_name":"Institute of Electronics","ror":"https://ror.org/0299eyn73","country_code":"BG","type":"nonprofit","lineage":["https://openalex.org/I24768866","https://openalex.org/I4210117802"]}],"countries":["BG","TW"],"is_corresponding":false,"raw_author_name":"Yao-Wen Chang","raw_affiliation_strings":["Department of Computer Science and Information Engineering, National Taiwan University, Taipei, Taiwan","Department of Electrical Engineering, Graduate Institute of Electronics Engineering","Research Center for Information Technology Innovation, Academia Sinica, Taipei, Taiwan"],"affiliations":[{"raw_affiliation_string":"Department of Computer Science and Information Engineering, National Taiwan University, Taipei, Taiwan","institution_ids":["https://openalex.org/I16733864"]},{"raw_affiliation_string":"Department of Electrical Engineering, Graduate Institute of Electronics Engineering","institution_ids":["https://openalex.org/I4210117802"]},{"raw_affiliation_string":"Research Center for Information Technology Innovation, Academia Sinica, Taipei, Taiwan","institution_ids":["https://openalex.org/I4210086894"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5026811322"],"corresponding_institution_ids":["https://openalex.org/I16733864"],"apc_list":null,"apc_paid":null,"fwci":0.1838,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.583693,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":94},"biblio":{"volume":"36","issue":"6","first_page":"964","last_page":"977"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9993000030517578,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9987999796867371,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/design-for-manufacturability","display_name":"Design for manufacturability","score":0.8252178430557251},{"id":"https://openalex.org/keywords/nanowire","display_name":"Nanowire","score":0.7382714152336121},{"id":"https://openalex.org/keywords/routing","display_name":"Routing (electronic design automation)","score":0.6879873275756836},{"id":"https://openalex.org/keywords/router","display_name":"Router","score":0.651382565498352},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5962570905685425},{"id":"https://openalex.org/keywords/node","display_name":"Node (physics)","score":0.5501575469970703},{"id":"https://openalex.org/keywords/multiple-patterning","display_name":"Multiple patterning","score":0.545263946056366},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.5252817869186401},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.48321521282196045},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.3383025527000427},{"id":"https://openalex.org/keywords/topology","display_name":"Topology (electrical circuits)","score":0.3307863175868988},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.3143409490585327},{"id":"https://openalex.org/keywords/embedded-system","display_name":"Embedded system","score":0.22809842228889465},{"id":"https://openalex.org/keywords/computer-network","display_name":"Computer network","score":0.21756064891815186},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.1489691436290741},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.1126745343208313},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.08594810962677002},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.08275589346885681}],"concepts":[{"id":"https://openalex.org/C62064638","wikidata":"https://www.wikidata.org/wiki/Q553878","display_name":"Design for manufacturability","level":2,"score":0.8252178430557251},{"id":"https://openalex.org/C74214498","wikidata":"https://www.wikidata.org/wiki/Q631739","display_name":"Nanowire","level":2,"score":0.7382714152336121},{"id":"https://openalex.org/C74172769","wikidata":"https://www.wikidata.org/wiki/Q1446839","display_name":"Routing (electronic design automation)","level":2,"score":0.6879873275756836},{"id":"https://openalex.org/C2775896111","wikidata":"https://www.wikidata.org/wiki/Q642560","display_name":"Router","level":2,"score":0.651382565498352},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5962570905685425},{"id":"https://openalex.org/C62611344","wikidata":"https://www.wikidata.org/wiki/Q1062658","display_name":"Node (physics)","level":2,"score":0.5501575469970703},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.545263946056366},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5252817869186401},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.48321521282196045},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3383025527000427},{"id":"https://openalex.org/C184720557","wikidata":"https://www.wikidata.org/wiki/Q7825049","display_name":"Topology (electrical circuits)","level":2,"score":0.3307863175868988},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3143409490585327},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.22809842228889465},{"id":"https://openalex.org/C31258907","wikidata":"https://www.wikidata.org/wiki/Q1301371","display_name":"Computer network","level":1,"score":0.21756064891815186},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.1489691436290741},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.1126745343208313},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.08594810962677002},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.08275589346885681},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C66938386","wikidata":"https://www.wikidata.org/wiki/Q633538","display_name":"Structural engineering","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tcad.2016.2614777","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tcad.2016.2614777","pdf_url":null,"source":{"id":"https://openalex.org/S100835903","display_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","issn_l":"0278-0070","issn":["0278-0070","1937-4151"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[{"id":"https://openalex.org/G8025620321","display_name":null,"funder_award_id":"NTU-ERP-104R8951","funder_id":"https://openalex.org/F4320323900","funder_display_name":"National Taiwan University"},{"id":"https://openalex.org/G8355911810","display_name":null,"funder_award_id":"NTU-ERP-105R8951","funder_id":"https://openalex.org/F4320323900","funder_display_name":"National Taiwan University"}],"funders":[{"id":"https://openalex.org/F4320321041","display_name":"Academia Sinica","ror":"https://ror.org/05bxb3784"},{"id":"https://openalex.org/F4320322410","display_name":"MediaTek","ror":"https://ror.org/05g9jck81"},{"id":"https://openalex.org/F4320322589","display_name":"Taiwan Semiconductor Manufacturing Company","ror":"https://ror.org/02wx79d08"},{"id":"https://openalex.org/F4320323900","display_name":"National Taiwan University","ror":"https://ror.org/05bqach95"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":26,"referenced_works":["https://openalex.org/W1966027043","https://openalex.org/W1992342771","https://openalex.org/W2020343777","https://openalex.org/W2025304056","https://openalex.org/W2035821057","https://openalex.org/W2055182387","https://openalex.org/W2066495677","https://openalex.org/W2103241566","https://openalex.org/W2119546707","https://openalex.org/W2122848041","https://openalex.org/W2128719541","https://openalex.org/W2159746935","https://openalex.org/W2159944793","https://openalex.org/W2161793164","https://openalex.org/W2165545669","https://openalex.org/W2168008340","https://openalex.org/W2168114925","https://openalex.org/W2168578526","https://openalex.org/W2330089912","https://openalex.org/W2334471970","https://openalex.org/W2505563498","https://openalex.org/W4230223219","https://openalex.org/W4239186902","https://openalex.org/W4245297984","https://openalex.org/W4382135095","https://openalex.org/W6655575089"],"related_works":["https://openalex.org/W1520032252","https://openalex.org/W2157255030","https://openalex.org/W2140942945","https://openalex.org/W2541440459","https://openalex.org/W2575916813","https://openalex.org/W2050847819","https://openalex.org/W2115795789","https://openalex.org/W2000620740","https://openalex.org/W2025251804","https://openalex.org/W1975854055"],"abstract_inverted_index":{"1-D":[0,19,25],"nanowires":[1],"are":[2],"one":[3],"of":[4],"the":[5,44,67,78],"most":[6],"promising":[7],"next-generation":[8],"lithography":[9],"technologies":[10],"for":[11],"7":[12],"nm":[13],"process":[14,21],"node":[15],"and":[16,42,53,104,112],"beyond.":[17],"The":[18],"nanowire":[20],"first":[22,79],"constructs":[23],"a":[24,60,89],"nanoarray":[26],"through":[27],"template":[28],"synthesis":[29],"followed":[30],"by":[31],"line-end":[32,113],"cutting":[33],"with":[34],"additional":[35],"cut":[36,45,71,107,109],"masks.":[37],"To":[38],"achieve":[39],"better":[40,65],"yield":[41],"manufacturability,":[43],"patterns":[46],"shall":[47],"satisfy":[48],"specified":[49],"restricted":[50],"design":[51],"rules,":[52],"thus":[54],"it":[55],"is":[56],"desirable":[57],"to":[58,64],"develop":[59],"novel":[61],"routing":[62,81,93],"methodology":[63],"address":[66],"challenges":[68],"arising":[69],"from":[70],"patterns.":[72],"In":[73],"this":[74],"paper,":[75],"we":[76],"propose":[77],"nanowire-aware":[80,100],"system,":[82],"considering":[83],"high":[84],"cut-mask":[85],"complexity":[86],"based":[87],"on":[88],"two-pass,":[90],"bottom-up":[91],"multilevel":[92],"framework.":[94],"Experimental":[95],"results":[96],"show":[97],"that":[98],"our":[99],"router":[101],"can":[102],"effectively":[103],"efficiently":[105],"reduce":[106],"numbers,":[108],"spacing":[110],"violations,":[111],"extension":[114],"length.":[115]},"counts_by_year":[{"year":2018,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}