{"id":"https://openalex.org/W2122080710","doi":"https://doi.org/10.1109/tcad.2010.2049041","title":"Timing Yield-Aware Color Reassignment and Detailed Placement Perturbation for Bimodal CD Distribution in Double Patterning Lithography","display_name":"Timing Yield-Aware Color Reassignment and Detailed Placement Perturbation for Bimodal CD Distribution in Double Patterning Lithography","publication_year":2010,"publication_date":"2010-07-23","ids":{"openalex":"https://openalex.org/W2122080710","doi":"https://doi.org/10.1109/tcad.2010.2049041","mag":"2122080710"},"language":"en","primary_location":{"id":"doi:10.1109/tcad.2010.2049041","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tcad.2010.2049041","pdf_url":null,"source":{"id":"https://openalex.org/S100835903","display_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","issn_l":"0278-0070","issn":["0278-0070","1937-4151"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101885160","display_name":"Mohit Gupta","orcid":"https://orcid.org/0000-0002-1924-1264"},"institutions":[{"id":"https://openalex.org/I36258959","display_name":"University of California, San Diego","ror":"https://ror.org/0168r3w48","country_code":"US","type":"education","lineage":["https://openalex.org/I36258959"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Mohit Gupta","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of California, San Diego, CA, USA","Dept. of Electr. & Comput. Eng., Univ. of California at San Diego, La Jolla, CA, USA#TAB#"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of California, San Diego, CA, USA","institution_ids":["https://openalex.org/I36258959"]},{"raw_affiliation_string":"Dept. of Electr. & Comput. Eng., Univ. of California at San Diego, La Jolla, CA, USA#TAB#","institution_ids":["https://openalex.org/I36258959"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014444815","display_name":"Kwangok Jeong","orcid":"https://orcid.org/0009-0002-6830-9154"},"institutions":[{"id":"https://openalex.org/I36258959","display_name":"University of California, San Diego","ror":"https://ror.org/0168r3w48","country_code":"US","type":"education","lineage":["https://openalex.org/I36258959"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Kwangok Jeong","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of California, San Diego, CA, USA","Dept. of Electr. & Comput. Eng., Univ. of California at San Diego, La Jolla, CA, USA#TAB#"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of California, San Diego, CA, USA","institution_ids":["https://openalex.org/I36258959"]},{"raw_affiliation_string":"Dept. of Electr. & Comput. Eng., Univ. of California at San Diego, La Jolla, CA, USA#TAB#","institution_ids":["https://openalex.org/I36258959"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5073558386","display_name":"Andrew B. Kahng","orcid":"https://orcid.org/0000-0002-4490-5018"},"institutions":[{"id":"https://openalex.org/I36258959","display_name":"University of California, San Diego","ror":"https://ror.org/0168r3w48","country_code":"US","type":"education","lineage":["https://openalex.org/I36258959"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Andrew B. Kahng","raw_affiliation_strings":["Departments of Computer Science and Engineering and Electrical and Computer Engineering, University of California, La Jolla, CA, USA","Depts. of Comput. Sci. & Eng., Univ. of California at San Diego, La Jolla, CA, USA"],"affiliations":[{"raw_affiliation_string":"Departments of Computer Science and Engineering and Electrical and Computer Engineering, University of California, La Jolla, CA, USA","institution_ids":["https://openalex.org/I36258959"]},{"raw_affiliation_string":"Depts. of Comput. Sci. & Eng., Univ. of California at San Diego, La Jolla, CA, USA","institution_ids":["https://openalex.org/I36258959"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5101885160"],"corresponding_institution_ids":["https://openalex.org/I36258959"],"apc_list":null,"apc_paid":null,"fwci":2.0587,"has_fulltext":false,"cited_by_count":20,"citation_normalized_percentile":{"value":0.88056493,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":98},"biblio":{"volume":"29","issue":"8","first_page":"1229","last_page":"1242"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9991000294685364,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.9975000023841858,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/multiple-patterning","display_name":"Multiple patterning","score":0.729880154132843},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6138217449188232},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5821642279624939},{"id":"https://openalex.org/keywords/critical-dimension","display_name":"Critical dimension","score":0.5783651471138},{"id":"https://openalex.org/keywords/integer-programming","display_name":"Integer programming","score":0.5063766241073608},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.5005083084106445},{"id":"https://openalex.org/keywords/correctness","display_name":"Correctness","score":0.49154695868492126},{"id":"https://openalex.org/keywords/linear-programming","display_name":"Linear programming","score":0.4750247597694397},{"id":"https://openalex.org/keywords/maximization","display_name":"Maximization","score":0.46003255248069763},{"id":"https://openalex.org/keywords/covariance","display_name":"Covariance","score":0.431851863861084},{"id":"https://openalex.org/keywords/computer-engineering","display_name":"Computer engineering","score":0.3422655463218689},{"id":"https://openalex.org/keywords/mathematical-optimization","display_name":"Mathematical optimization","score":0.31015586853027344},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.25755202770233154},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.226029634475708},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.15053772926330566},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.149073988199234},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.12669652700424194},{"id":"https://openalex.org/keywords/statistics","display_name":"Statistics","score":0.09814569354057312}],"concepts":[{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.729880154132843},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6138217449188232},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5821642279624939},{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.5783651471138},{"id":"https://openalex.org/C56086750","wikidata":"https://www.wikidata.org/wiki/Q6042592","display_name":"Integer programming","level":2,"score":0.5063766241073608},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.5005083084106445},{"id":"https://openalex.org/C55439883","wikidata":"https://www.wikidata.org/wiki/Q360812","display_name":"Correctness","level":2,"score":0.49154695868492126},{"id":"https://openalex.org/C41045048","wikidata":"https://www.wikidata.org/wiki/Q202843","display_name":"Linear programming","level":2,"score":0.4750247597694397},{"id":"https://openalex.org/C2776330181","wikidata":"https://www.wikidata.org/wiki/Q18358244","display_name":"Maximization","level":2,"score":0.46003255248069763},{"id":"https://openalex.org/C178650346","wikidata":"https://www.wikidata.org/wiki/Q201984","display_name":"Covariance","level":2,"score":0.431851863861084},{"id":"https://openalex.org/C113775141","wikidata":"https://www.wikidata.org/wiki/Q428691","display_name":"Computer engineering","level":1,"score":0.3422655463218689},{"id":"https://openalex.org/C126255220","wikidata":"https://www.wikidata.org/wiki/Q141495","display_name":"Mathematical optimization","level":1,"score":0.31015586853027344},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.25755202770233154},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.226029634475708},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.15053772926330566},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.149073988199234},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.12669652700424194},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.09814569354057312},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.0},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tcad.2010.2049041","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tcad.2010.2049041","pdf_url":null,"source":{"id":"https://openalex.org/S100835903","display_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","issn_l":"0278-0070","issn":["0278-0070","1937-4151"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":33,"referenced_works":["https://openalex.org/W2017820380","https://openalex.org/W2021311077","https://openalex.org/W2022187398","https://openalex.org/W2029632467","https://openalex.org/W2034006444","https://openalex.org/W2050847819","https://openalex.org/W2071050051","https://openalex.org/W2072411676","https://openalex.org/W2090972413","https://openalex.org/W2094370252","https://openalex.org/W2094459016","https://openalex.org/W2097032051","https://openalex.org/W2103803680","https://openalex.org/W2129294024","https://openalex.org/W2142278129","https://openalex.org/W2148380380","https://openalex.org/W2152190733","https://openalex.org/W2154483361","https://openalex.org/W2158732322","https://openalex.org/W2175772671","https://openalex.org/W3141689769","https://openalex.org/W3149318025","https://openalex.org/W4237361992","https://openalex.org/W4247596845","https://openalex.org/W4253680680","https://openalex.org/W4254569978","https://openalex.org/W6654863839","https://openalex.org/W6668479131","https://openalex.org/W6668507243","https://openalex.org/W6673376693","https://openalex.org/W6673907574","https://openalex.org/W6674088159","https://openalex.org/W6681657607"],"related_works":["https://openalex.org/W4299592249","https://openalex.org/W2049018842","https://openalex.org/W1937820206","https://openalex.org/W1520139605","https://openalex.org/W2323412376","https://openalex.org/W4241084411","https://openalex.org/W3126542092","https://openalex.org/W3006257911","https://openalex.org/W3009768885","https://openalex.org/W60144559"],"abstract_inverted_index":{"Double":[0],"patterning":[1,200],"lithography":[2],"(DPL)":[3],"is":[4,12,140,157],"in":[5,35,169,248,259],"current":[6],"production":[7],"for":[8,17,80,113],"memory":[9],"products,":[10],"and":[11,27,53,68,83,97,99,106,121,176,193,228,235,254],"widely":[13],"viewed":[14],"as":[15],"inevitable":[16],"logic":[18],"products":[19],"at":[20],"the":[21,29,87,102,211],"32":[22],"nm":[23,226],"node.":[24],"DPL":[25],"decomposes":[26],"prints":[28],"shapes":[30],"of":[31,77,90,128,151,163,167,213],"a":[32,74,141,182,224],"critical-layer":[33],"layout":[34,44],"two":[36],"exposures.":[37],"In":[38],"traditional":[39,103],"single-exposure":[40],"lithography,":[41],"adjacent":[42,61],"identical":[43,48],"features":[45,62],"will":[46],"have":[47,64],"mean":[49,66],"critical":[50],"dimension":[51],"(CD),":[52],"spatially":[54],"correlated":[55],"CD":[56,70,92],"variations.":[57,71],"However,":[58],"with":[59,216],"DPL,":[60],"can":[63,194],"distinct":[65],"CDs,":[67],"uncorrelated":[69],"This":[72],"introduces":[73],"new":[75,117],"set":[76],"\u201cbimodal\u201d":[78],"challenges":[79],"timing":[81,95,119,126,145],"analysis":[82,96,107,120,150],"optimization.":[84],"We":[85,115],"assess":[86],"potential":[88],"impact":[89],"bimodal":[91],"distribution":[93],"on":[94,148],"guardbanding,":[98],"find":[100],"that":[101,132,188],"\u201cunimodal\u201d":[104],"characterization":[105],"framework":[108],"may":[109],"not":[110],"be":[111,195],"viable":[112],"DPL.":[114,136],"propose":[116,181],"bimodal-aware":[118],"optimization":[122,237],"methods":[123],"to":[124,144,172,197,241],"improve":[125],"yield":[127],"standard-cell":[129],"based":[130,147],"designs":[131],"are":[133],"manufactured":[134],"using":[135],"Our":[137,154],"first":[138],"contribution":[139,156],"DPL-aware":[142],"approach":[143],"modeling,":[146],"detailed":[149,185,207],"cell":[152],"layouts.":[153],"second":[155],"an":[158],"integer":[159],"linear":[160],"programming-based":[161,184],"maximization":[162],"\u201calternate\u201d":[164],"mask":[165,190],"coloring":[166,191],"instances":[168],"timing-critical":[170,214],"paths,":[171],"minimize":[173],"harmful":[174],"covariance":[175],"performance":[177],"variation.":[178],"Third,":[179],"we":[180],"dynamic":[183],"placement":[186,203,236],"algorithm":[187],"solves":[189],"conflicts":[192],"used":[196],"ensure":[198],"\u201cdouble":[199],"correctness\u201d":[201],"after":[202,206],"or":[204],"even":[205],"routing,":[208],"while":[209],"minimizing":[210],"displacement":[212],"cells":[215],"manageable":[217],"engineering":[218],"change":[219],"order":[220],"(ECO)":[221],"impact.":[222],"With":[223],"45":[225],"library":[227],"open-source":[229],"design":[230],"testcases,":[231],"our":[232],"timing-aware":[233],"recoloring":[234],"together":[238],"achieve":[239],"up":[240],"271":[242],"ps":[243],"(respectively,":[244,250,256,261],"55.75":[245],"ns)":[246],"reduction":[247,258],"worst":[249,260],"total)":[251,262],"negative":[252,263],"slack,":[253],"70%":[255],"72%)":[257],"slack":[264],"variation,":[265],"respectively.":[266]},"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":3},{"year":2015,"cited_by_count":5},{"year":2014,"cited_by_count":2},{"year":2012,"cited_by_count":3}],"updated_date":"2026-04-05T17:49:38.594831","created_date":"2025-10-10T00:00:00"}