{"id":"https://openalex.org/W4416342215","doi":"https://doi.org/10.1109/socc66126.2025.11235485","title":"SiGe BiCMOS Process Design Kit for Cryogenic High-Frequency Applications","display_name":"SiGe BiCMOS Process Design Kit for Cryogenic High-Frequency Applications","publication_year":2025,"publication_date":"2025-09-29","ids":{"openalex":"https://openalex.org/W4416342215","doi":"https://doi.org/10.1109/socc66126.2025.11235485"},"language":"en","primary_location":{"id":"doi:10.1109/socc66126.2025.11235485","is_oa":false,"landing_page_url":"https://doi.org/10.1109/socc66126.2025.11235485","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2025 IEEE 38th International System-on-Chip Conference (SOCC)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5062176488","display_name":"Anton Datsuk","orcid":null},"institutions":[{"id":"https://openalex.org/I92894754","display_name":"Leibniz Institute for High Performance Microelectronics","ror":"https://ror.org/0489gab80","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I92894754"]},{"id":"https://openalex.org/I96578850","display_name":"Leibniz Institute for Neurobiology","ror":"https://ror.org/01zwmgk08","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I96578850"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"A. Datsuk","raw_affiliation_strings":["IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236","institution_ids":["https://openalex.org/I92894754","https://openalex.org/I96578850"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108585438","display_name":"Alexey Balashov","orcid":null},"institutions":[{"id":"https://openalex.org/I92894754","display_name":"Leibniz Institute for High Performance Microelectronics","ror":"https://ror.org/0489gab80","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I92894754"]},{"id":"https://openalex.org/I96578850","display_name":"Leibniz Institute for Neurobiology","ror":"https://ror.org/01zwmgk08","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I96578850"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"A. Balashov","raw_affiliation_strings":["IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236","institution_ids":["https://openalex.org/I92894754","https://openalex.org/I96578850"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015651336","display_name":"P. Ostrovskyy","orcid":null},"institutions":[{"id":"https://openalex.org/I92894754","display_name":"Leibniz Institute for High Performance Microelectronics","ror":"https://ror.org/0489gab80","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I92894754"]},{"id":"https://openalex.org/I96578850","display_name":"Leibniz Institute for Neurobiology","ror":"https://ror.org/01zwmgk08","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I96578850"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"P. Ostrovskyy","raw_affiliation_strings":["IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236","institution_ids":["https://openalex.org/I92894754","https://openalex.org/I96578850"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001928936","display_name":"Mustafa Volkan Yaz\u0131c\u0131","orcid":"https://orcid.org/0000-0002-4975-8256"},"institutions":[{"id":"https://openalex.org/I92894754","display_name":"Leibniz Institute for High Performance Microelectronics","ror":"https://ror.org/0489gab80","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I92894754"]},{"id":"https://openalex.org/I96578850","display_name":"Leibniz Institute for Neurobiology","ror":"https://ror.org/01zwmgk08","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I96578850"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"M. Yazici","raw_affiliation_strings":["IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236","institution_ids":["https://openalex.org/I92894754","https://openalex.org/I96578850"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082585588","display_name":"Christian Wipf","orcid":"https://orcid.org/0009-0005-3716-584X"},"institutions":[{"id":"https://openalex.org/I92894754","display_name":"Leibniz Institute for High Performance Microelectronics","ror":"https://ror.org/0489gab80","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I92894754"]},{"id":"https://openalex.org/I96578850","display_name":"Leibniz Institute for Neurobiology","ror":"https://ror.org/01zwmgk08","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I96578850"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"C. Wipf","raw_affiliation_strings":["IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236","institution_ids":["https://openalex.org/I92894754","https://openalex.org/I96578850"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079880979","display_name":"Frank Vater","orcid":null},"institutions":[{"id":"https://openalex.org/I92894754","display_name":"Leibniz Institute for High Performance Microelectronics","ror":"https://ror.org/0489gab80","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I92894754"]},{"id":"https://openalex.org/I96578850","display_name":"Leibniz Institute for Neurobiology","ror":"https://ror.org/01zwmgk08","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I96578850"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"F. Vater","raw_affiliation_strings":["IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IHP - Leibniz-Institut f&#x00FC;r innovative Mikroelektronik,Germany,15236","institution_ids":["https://openalex.org/I92894754","https://openalex.org/I96578850"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090513368","display_name":"G. Popken","orcid":null},"institutions":[{"id":"https://openalex.org/I4210124274","display_name":"Fraunhofer Institute for Integrated Circuits","ror":"https://ror.org/024ape423","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210124274","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"G. Popken","raw_affiliation_strings":["IHP - Leibniz-Institut f&#x00FC;r Innovative Mikroelektronik,Fraunhofer Institute for Integrated Circuits IIS,Erlangen,Germany,91058"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IHP - Leibniz-Institut f&#x00FC;r Innovative Mikroelektronik,Fraunhofer Institute for Integrated Circuits IIS,Erlangen,Germany,91058","institution_ids":["https://openalex.org/I4210124274"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089067945","display_name":"Thomas Th\u00f6nes","orcid":null},"institutions":[{"id":"https://openalex.org/I4210124274","display_name":"Fraunhofer Institute for Integrated Circuits","ror":"https://ror.org/024ape423","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210124274","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"T. Th\u00f6nes","raw_affiliation_strings":["IHP - Leibniz-Institut f&#x00FC;r Innovative Mikroelektronik,Fraunhofer Institute for Integrated Circuits IIS,Erlangen,Germany,91058"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IHP - Leibniz-Institut f&#x00FC;r Innovative Mikroelektronik,Fraunhofer Institute for Integrated Circuits IIS,Erlangen,Germany,91058","institution_ids":["https://openalex.org/I4210124274"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5109002103","display_name":"S. K. Panneer Selvam","orcid":null},"institutions":[{"id":"https://openalex.org/I4210124274","display_name":"Fraunhofer Institute for Integrated Circuits","ror":"https://ror.org/024ape423","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210124274","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"S. Selvam","raw_affiliation_strings":["IHP - Leibniz-Institut f&#x00FC;r Innovative Mikroelektronik,Fraunhofer Institute for Integrated Circuits IIS,Erlangen,Germany,91058"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IHP - Leibniz-Institut f&#x00FC;r Innovative Mikroelektronik,Fraunhofer Institute for Integrated Circuits IIS,Erlangen,Germany,91058","institution_ids":["https://openalex.org/I4210124274"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.29186264,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"6"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.3506999909877777,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.3506999909877777,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10187","display_name":"Radio Frequency Integrated Circuit Design","score":0.22110000252723694,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.16279999911785126,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/heterojunction-bipolar-transistor","display_name":"Heterojunction bipolar transistor","score":0.7034000158309937},{"id":"https://openalex.org/keywords/bicmos","display_name":"BiCMOS","score":0.6976000070571899},{"id":"https://openalex.org/keywords/cryogenic-temperature","display_name":"Cryogenic temperature","score":0.5503000020980835},{"id":"https://openalex.org/keywords/bipolar-junction-transistor","display_name":"Bipolar junction transistor","score":0.4966999888420105},{"id":"https://openalex.org/keywords/reliability","display_name":"Reliability (semiconductor)","score":0.48840001225471497},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.4587000012397766},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.45840001106262207},{"id":"https://openalex.org/keywords/electronic-circuit","display_name":"Electronic circuit","score":0.4339999854564667},{"id":"https://openalex.org/keywords/circuit-design","display_name":"Circuit design","score":0.4058000147342682}],"concepts":[{"id":"https://openalex.org/C173408217","wikidata":"https://www.wikidata.org/wiki/Q1428898","display_name":"Heterojunction bipolar transistor","level":5,"score":0.7034000158309937},{"id":"https://openalex.org/C62427370","wikidata":"https://www.wikidata.org/wiki/Q173416","display_name":"BiCMOS","level":4,"score":0.6976000070571899},{"id":"https://openalex.org/C2985130431","wikidata":"https://www.wikidata.org/wiki/Q192116","display_name":"Cryogenic temperature","level":2,"score":0.5503000020980835},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5297999978065491},{"id":"https://openalex.org/C23061349","wikidata":"https://www.wikidata.org/wiki/Q188946","display_name":"Bipolar junction transistor","level":4,"score":0.4966999888420105},{"id":"https://openalex.org/C43214815","wikidata":"https://www.wikidata.org/wiki/Q7310987","display_name":"Reliability (semiconductor)","level":3,"score":0.48840001225471497},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.4587000012397766},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.45840001106262207},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.45089998841285706},{"id":"https://openalex.org/C134146338","wikidata":"https://www.wikidata.org/wiki/Q1815901","display_name":"Electronic circuit","level":2,"score":0.4339999854564667},{"id":"https://openalex.org/C190560348","wikidata":"https://www.wikidata.org/wiki/Q3245116","display_name":"Circuit design","level":2,"score":0.4058000147342682},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.40400001406669617},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.39250001311302185},{"id":"https://openalex.org/C74524168","wikidata":"https://www.wikidata.org/wiki/Q1074539","display_name":"Integrated circuit design","level":2,"score":0.39239999651908875},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3822999894618988},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.36649999022483826},{"id":"https://openalex.org/C179725390","wikidata":"https://www.wikidata.org/wiki/Q192116","display_name":"Cryogenics","level":2,"score":0.3564999997615814},{"id":"https://openalex.org/C79794668","wikidata":"https://www.wikidata.org/wiki/Q1616270","display_name":"Heterojunction","level":2,"score":0.34630000591278076},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3174999952316284},{"id":"https://openalex.org/C120398109","wikidata":"https://www.wikidata.org/wiki/Q175751","display_name":"Quantum tunnelling","level":2,"score":0.31290000677108765},{"id":"https://openalex.org/C51140833","wikidata":"https://www.wikidata.org/wiki/Q6822740","display_name":"Metal gate","level":5,"score":0.30410000681877136},{"id":"https://openalex.org/C2780389399","wikidata":"https://www.wikidata.org/wiki/Q367849","display_name":"Silicon-germanium","level":3,"score":0.28940001130104065},{"id":"https://openalex.org/C55396564","wikidata":"https://www.wikidata.org/wiki/Q3084971","display_name":"Process design","level":3,"score":0.2842999994754791},{"id":"https://openalex.org/C138331895","wikidata":"https://www.wikidata.org/wiki/Q11650","display_name":"Electronics","level":2,"score":0.26669999957084656},{"id":"https://openalex.org/C61696701","wikidata":"https://www.wikidata.org/wiki/Q770766","display_name":"Engineering physics","level":1,"score":0.2603999972343445},{"id":"https://openalex.org/C2778309119","wikidata":"https://www.wikidata.org/wiki/Q5121614","display_name":"Circuit reliability","level":4,"score":0.25380000472068787},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.25369998812675476},{"id":"https://openalex.org/C131321042","wikidata":"https://www.wikidata.org/wiki/Q656685","display_name":"Operating temperature","level":2,"score":0.2531999945640564}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/socc66126.2025.11235485","is_oa":false,"landing_page_url":"https://doi.org/10.1109/socc66126.2025.11235485","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2025 IEEE 38th International System-on-Chip Conference (SOCC)","raw_type":"proceedings-article"},{"id":"pmh:oai:publica.fraunhofer.de:publica/512355","is_oa":false,"landing_page_url":"https://publica.fraunhofer.de/handle/publica/512355","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"conference paper"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W3152790712","https://openalex.org/W4381331949","https://openalex.org/W4388623346","https://openalex.org/W4388691840","https://openalex.org/W4399728858","https://openalex.org/W4400275997","https://openalex.org/W4405855709"],"related_works":[],"abstract_inverted_index":{"Cryogenic":[0],"process":[1,38],"design":[2,10],"kits":[3],"(PDKs)":[4],"are":[5],"essential":[6],"for":[7,32,43,87,95],"advancing":[8,148],"the":[9,25,133,138,149],"of":[11,29,105,137,151],"integrated":[12,107],"circuits":[13,108],"operating":[14],"at":[15,20,57,64,123],"extremely":[16],"low":[17],"temperatures,":[18],"particularly":[19],"high-frequencies.":[21],"This":[22],"work":[23],"presents":[24],"development":[26],"and":[27,49,61,84,111,126,135,147],"validation":[28],"a":[30,33,103],"PDK":[31,73],"0.13":[34],"\u03bcm":[35],"SiGe":[36,153],"BiCMOS":[37,154],"that":[39],"includes":[40],"cryogenic":[41,62,124,144],"models":[42],"MOSFETs,":[44],"heterojunction":[45],"bipolar":[46],"transistors":[47],"(HBTs),":[48],"polysilicon":[50,96],"resistors.":[51,97],"Each":[52],"component":[53],"has":[54],"been":[55],"characterized":[56],"both":[58],"room":[59],"temperature":[60],"temperatures":[63,125],"4":[65],"K":[66],"to":[67,76],"ensure":[68],"accurate":[69],"performance":[70],"prediction.":[71],"The":[72,130],"incorporates":[74],"modifications":[75],"address":[77],"key":[78],"phenomena":[79],"such":[80],"as":[81,89,91],"tunneling":[82],"currents":[83],"temperature-dependent":[85],"effects":[86],"HBTs,":[88],"well":[90],"non-linear":[92],"resistance":[93],"behavior":[94],"Validation":[98],"was":[99],"performed":[100],"by":[101],"measuring":[102],"variety":[104],"monolithically":[106],"including":[109],"CMOS":[110],"HBT":[112,115],"ring":[113],"oscillators,":[114],"low-noise":[116],"amplifiers.":[117],"All":[118],"fabricated":[119],"ICs":[120],"were":[121],"tested":[122],"compared":[127],"with":[128],"simulation.":[129],"results":[131],"confirm":[132],"accuracy":[134],"reliability":[136],"PDK,":[139],"supporting":[140],"its":[141],"application":[142],"in":[143],"electronic":[145],"systems":[146],"capabilities":[150],"high-frequency":[152],"technology.":[155]},"counts_by_year":[],"updated_date":"2026-07-02T09:51:11.867554","created_date":"2025-11-17T00:00:00"}
