{"id":"https://openalex.org/W2081148001","doi":"https://doi.org/10.1109/socc.2013.6749658","title":"Layout regularity metric as a fast indicator of high variability circuits","display_name":"Layout regularity metric as a fast indicator of high variability circuits","publication_year":2013,"publication_date":"2013-09-01","ids":{"openalex":"https://openalex.org/W2081148001","doi":"https://doi.org/10.1109/socc.2013.6749658","mag":"2081148001"},"language":"en","primary_location":{"id":"doi:10.1109/socc.2013.6749658","is_oa":false,"landing_page_url":"https://doi.org/10.1109/socc.2013.6749658","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2013 IEEE International SOC Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5077449820","display_name":"Mohamed A. Swillam","orcid":"https://orcid.org/0000-0002-7962-2341"},"institutions":[{"id":"https://openalex.org/I105695857","display_name":"Siemens (Hungary)","ror":"https://ror.org/01rk7mv85","country_code":"HU","type":"company","lineage":["https://openalex.org/I105695857","https://openalex.org/I1325886976"]}],"countries":["HU"],"is_corresponding":true,"raw_author_name":"Esraa Swillam","raw_affiliation_strings":["Mentor Graphics Egypt","[Mentor Graphics Egypt, Egypt]"],"affiliations":[{"raw_affiliation_string":"Mentor Graphics Egypt","institution_ids":[]},{"raw_affiliation_string":"[Mentor Graphics Egypt, Egypt]","institution_ids":["https://openalex.org/I105695857"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026256153","display_name":"Loutfy H. Madkour","orcid":"https://orcid.org/0000-0002-3101-8356"},"institutions":[{"id":"https://openalex.org/I105695857","display_name":"Siemens (Hungary)","ror":"https://ror.org/01rk7mv85","country_code":"HU","type":"company","lineage":["https://openalex.org/I105695857","https://openalex.org/I1325886976"]},{"id":"https://openalex.org/I151746483","display_name":"University of Waterloo","ror":"https://ror.org/01aff2v68","country_code":"CA","type":"education","lineage":["https://openalex.org/I151746483"]}],"countries":["CA","HU"],"is_corresponding":false,"raw_author_name":"Kareem Madkour","raw_affiliation_strings":["University of Waterloo","[Mentor Graphics Egypt, Egypt]"],"affiliations":[{"raw_affiliation_string":"University of Waterloo","institution_ids":["https://openalex.org/I151746483"]},{"raw_affiliation_string":"[Mentor Graphics Egypt, Egypt]","institution_ids":["https://openalex.org/I105695857"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112829693","display_name":"Mohab Anis","orcid":null},"institutions":[{"id":"https://openalex.org/I80693520","display_name":"American University in Cairo","ror":"https://ror.org/0176yqn58","country_code":"EG","type":"education","lineage":["https://openalex.org/I80693520"]}],"countries":["EG"],"is_corresponding":false,"raw_author_name":"Mohab Anis","raw_affiliation_strings":["The American University in Cairo, Cairo, Egypt","American Univ. in Cairo, Cairo, Egypt"],"affiliations":[{"raw_affiliation_string":"The American University in Cairo, Cairo, Egypt","institution_ids":["https://openalex.org/I80693520"]},{"raw_affiliation_string":"American Univ. in Cairo, Cairo, Egypt","institution_ids":["https://openalex.org/I80693520"]}]}],"institutions":[],"countries_distinct_count":3,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5077449820"],"corresponding_institution_ids":["https://openalex.org/I105695857"],"apc_list":null,"apc_paid":null,"fwci":0.4729,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.70218084,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":94},"biblio":{"volume":"7275","issue":null,"first_page":"43","last_page":"48"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.9993000030517578,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9991000294685364,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/design-for-manufacturability","display_name":"Design for manufacturability","score":0.9304666519165039},{"id":"https://openalex.org/keywords/metric","display_name":"Metric (unit)","score":0.8513218760490417},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.655904233455658},{"id":"https://openalex.org/keywords/matching","display_name":"Matching (statistics)","score":0.5835670232772827},{"id":"https://openalex.org/keywords/electronic-circuit","display_name":"Electronic circuit","score":0.5759572386741638},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5036198496818542},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.5029003024101257},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5004777908325195},{"id":"https://openalex.org/keywords/sensitivity","display_name":"Sensitivity (control systems)","score":0.48122668266296387},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.45999252796173096},{"id":"https://openalex.org/keywords/integrated-circuit-layout","display_name":"Integrated circuit layout","score":0.4345037043094635},{"id":"https://openalex.org/keywords/physical-design","display_name":"Physical design","score":0.41777896881103516},{"id":"https://openalex.org/keywords/circuit-design","display_name":"Circuit design","score":0.29188066720962524},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.28784191608428955},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.22486159205436707},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.15867289900779724},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.1547008454799652},{"id":"https://openalex.org/keywords/statistics","display_name":"Statistics","score":0.13179102540016174}],"concepts":[{"id":"https://openalex.org/C62064638","wikidata":"https://www.wikidata.org/wiki/Q553878","display_name":"Design for manufacturability","level":2,"score":0.9304666519165039},{"id":"https://openalex.org/C176217482","wikidata":"https://www.wikidata.org/wiki/Q860554","display_name":"Metric (unit)","level":2,"score":0.8513218760490417},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.655904233455658},{"id":"https://openalex.org/C165064840","wikidata":"https://www.wikidata.org/wiki/Q1321061","display_name":"Matching (statistics)","level":2,"score":0.5835670232772827},{"id":"https://openalex.org/C134146338","wikidata":"https://www.wikidata.org/wiki/Q1815901","display_name":"Electronic circuit","level":2,"score":0.5759572386741638},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5036198496818542},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.5029003024101257},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5004777908325195},{"id":"https://openalex.org/C21200559","wikidata":"https://www.wikidata.org/wiki/Q7451068","display_name":"Sensitivity (control systems)","level":2,"score":0.48122668266296387},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.45999252796173096},{"id":"https://openalex.org/C2765594","wikidata":"https://www.wikidata.org/wiki/Q2624187","display_name":"Integrated circuit layout","level":3,"score":0.4345037043094635},{"id":"https://openalex.org/C188817802","wikidata":"https://www.wikidata.org/wiki/Q13426855","display_name":"Physical design","level":3,"score":0.41777896881103516},{"id":"https://openalex.org/C190560348","wikidata":"https://www.wikidata.org/wiki/Q3245116","display_name":"Circuit design","level":2,"score":0.29188066720962524},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.28784191608428955},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.22486159205436707},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.15867289900779724},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.1547008454799652},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.13179102540016174},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.0},{"id":"https://openalex.org/C21547014","wikidata":"https://www.wikidata.org/wiki/Q1423657","display_name":"Operations management","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/socc.2013.6749658","is_oa":false,"landing_page_url":"https://doi.org/10.1109/socc.2013.6749658","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2013 IEEE International SOC Conference","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":16,"referenced_works":["https://openalex.org/W2016669084","https://openalex.org/W2034308082","https://openalex.org/W2042245870","https://openalex.org/W2058763898","https://openalex.org/W2064165471","https://openalex.org/W2081646486","https://openalex.org/W2090804649","https://openalex.org/W2109604935","https://openalex.org/W2117477421","https://openalex.org/W2125952738","https://openalex.org/W2138876803","https://openalex.org/W2155731457","https://openalex.org/W3143960331","https://openalex.org/W3144863085","https://openalex.org/W3150660474","https://openalex.org/W6666593277"],"related_works":["https://openalex.org/W2157255030","https://openalex.org/W2147584640","https://openalex.org/W2151510696","https://openalex.org/W2048044560","https://openalex.org/W2388589331","https://openalex.org/W3129613221","https://openalex.org/W3012974818","https://openalex.org/W2023303593","https://openalex.org/W1985112711","https://openalex.org/W2036121598"],"abstract_inverted_index":{"Integrated":[0],"circuits":[1,107],"design":[2,32],"faces":[3],"increasing":[4],"challenge":[5],"as":[6,84],"we":[7],"scale":[8],"down":[9],"due":[10,67],"to":[11,19,36,52,63,68,92,105,124],"the":[12,15,27,102,113,125,139],"increase":[13],"of":[14,17,26,88,100,138],"effect":[16],"sensitivity":[18],"process":[20,38],"variations.":[21,71,97],"Layout":[22],"regularity":[23,75,103],"is":[24,43,61,118],"one":[25],"trending":[28],"techniques":[29],"suggested":[30],"by":[31],"for":[33],"manufacturability":[34],"(DFM)":[35],"mitigate":[37],"variations":[39,51,66,116],"effect.":[40],"However,":[41],"there":[42],"no":[44],"study":[45],"relating":[46],"either":[47],"lithography":[48,93],"or":[49],"electrical":[50,65,96,115,126],"layout":[53,74],"regularity.":[54],"In":[55],"this":[56,79],"paper,":[57],"a":[58,85],"novel":[59],"method":[60],"presented":[62],"model":[64,117,128],"systematic":[69],"lithographic":[70],"Then,":[72],"geometrical-based":[73],"metric":[76,80,104,121,140],"was":[77],"derived;":[78],"can":[81,134],"be":[82],"used":[83],"fast":[86],"indicator":[87],"designs":[89],"more":[90],"susceptible":[91],"and":[94],"hence":[95],"The":[98,120],"validity":[99],"using":[101,112],"flag":[106],"that":[108,133],"have":[109],"high":[110],"variability":[111,127],"developed":[114],"shown.":[119],"results":[122,129],"compared":[123],"show":[130],"matching":[131],"percentage":[132],"reach":[135],"80%.":[136],"Calculation":[137],"takes":[141],"only":[142],"few":[143],"minutes":[144],"on":[145],"1":[146,149],"mm":[147],"\u00d7":[148],"mm.":[150]},"counts_by_year":[{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}