{"id":"https://openalex.org/W2033702540","doi":"https://doi.org/10.1109/socc.2012.6398383","title":"Invited talk: Noise and mismatch in sub 28nm silicon processes","display_name":"Invited talk: Noise and mismatch in sub 28nm silicon processes","publication_year":2012,"publication_date":"2012-09-01","ids":{"openalex":"https://openalex.org/W2033702540","doi":"https://doi.org/10.1109/socc.2012.6398383","mag":"2033702540"},"language":"en","primary_location":{"id":"doi:10.1109/socc.2012.6398383","is_oa":false,"landing_page_url":"https://doi.org/10.1109/socc.2012.6398383","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2012 IEEE International SOC Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5037689313","display_name":"Andrew Marshall","orcid":"https://orcid.org/0000-0001-5653-7059"},"institutions":[{"id":"https://openalex.org/I74760111","display_name":"Texas Instruments (United States)","ror":"https://ror.org/03vsmv677","country_code":"US","type":"company","lineage":["https://openalex.org/I74760111"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Andrew Marshall","raw_affiliation_strings":["Advanced CMOS Technology Development, Texas Instruments Inc., Dallas, TX, USA","Texas Instruments, Advanced CMOS Technology Development, 13121 TI Boulevard, Dallas, TX 75243, USA"],"affiliations":[{"raw_affiliation_string":"Advanced CMOS Technology Development, Texas Instruments Inc., Dallas, TX, USA","institution_ids":["https://openalex.org/I74760111"]},{"raw_affiliation_string":"Texas Instruments, Advanced CMOS Technology Development, 13121 TI Boulevard, Dallas, TX 75243, USA","institution_ids":["https://openalex.org/I74760111"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5037689313"],"corresponding_institution_ids":["https://openalex.org/I74760111"],"apc_list":null,"apc_paid":null,"fwci":0.21871674,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.5879312,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"88","last_page":"93"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11032","display_name":"VLSI and Analog Circuit Testing","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/1708","display_name":"Hardware and Architecture"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/noise","display_name":"Noise (video)","score":0.6963107585906982},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6187734603881836},{"id":"https://openalex.org/keywords/electronic-circuit","display_name":"Electronic circuit","score":0.5669883489608765},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5476204752922058},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.5132734775543213},{"id":"https://openalex.org/keywords/yield","display_name":"Yield (engineering)","score":0.4859012961387634},{"id":"https://openalex.org/keywords/analogue-electronics","display_name":"Analogue electronics","score":0.41715019941329956},{"id":"https://openalex.org/keywords/digital-electronics","display_name":"Digital electronics","score":0.41514843702316284},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3628281056880951},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.22164225578308105},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.12524035573005676},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.1231309175491333}],"concepts":[{"id":"https://openalex.org/C99498987","wikidata":"https://www.wikidata.org/wiki/Q2210247","display_name":"Noise (video)","level":3,"score":0.6963107585906982},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6187734603881836},{"id":"https://openalex.org/C134146338","wikidata":"https://www.wikidata.org/wiki/Q1815901","display_name":"Electronic circuit","level":2,"score":0.5669883489608765},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5476204752922058},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.5132734775543213},{"id":"https://openalex.org/C134121241","wikidata":"https://www.wikidata.org/wiki/Q899301","display_name":"Yield (engineering)","level":2,"score":0.4859012961387634},{"id":"https://openalex.org/C29074008","wikidata":"https://www.wikidata.org/wiki/Q174925","display_name":"Analogue electronics","level":3,"score":0.41715019941329956},{"id":"https://openalex.org/C81843906","wikidata":"https://www.wikidata.org/wiki/Q173156","display_name":"Digital electronics","level":3,"score":0.41514843702316284},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3628281056880951},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.22164225578308105},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.12524035573005676},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.1231309175491333},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/socc.2012.6398383","is_oa":false,"landing_page_url":"https://doi.org/10.1109/socc.2012.6398383","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2012 IEEE International SOC Conference","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W2093317068","https://openalex.org/W2128343916","https://openalex.org/W2538196624"],"related_works":["https://openalex.org/W2796521923","https://openalex.org/W1603142061","https://openalex.org/W2296682797","https://openalex.org/W1917800633","https://openalex.org/W95651076","https://openalex.org/W2770163697","https://openalex.org/W2373371022","https://openalex.org/W2375192119","https://openalex.org/W2110521006","https://openalex.org/W1862020018"],"abstract_inverted_index":{"Mismatch":[0],"and":[1,9,22,32],"noise":[2],"cause":[3],"significant":[4],"yield":[5],"loss":[6],"in":[7,18],"28nm":[8],"smaller":[10],"process":[11],"nodes.":[12],"This":[13],"paper":[14],"examines":[15],"these":[16],"effects":[17],"analog,":[19],"digital,":[20],"RF":[21],"memory":[23],"circuits,":[24],"along":[25],"with":[26,36],"methods":[27],"to":[28],"quantify,":[29],"account":[30],"for":[31],"counteract":[33],"problems":[34],"associated":[35],"them.":[37]},"counts_by_year":[{"year":2021,"cited_by_count":1},{"year":2014,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}