{"id":"https://openalex.org/W4252787324","doi":"https://doi.org/10.1109/sbcci.2016.7724072","title":"Successful prototyping of complex integrated circuits with focused ion beam","display_name":"Successful prototyping of complex integrated circuits with focused ion beam","publication_year":2016,"publication_date":"2016-08-01","ids":{"openalex":"https://openalex.org/W4252787324","doi":"https://doi.org/10.1109/sbcci.2016.7724072"},"language":"en","primary_location":{"id":"doi:10.1109/sbcci.2016.7724072","is_oa":false,"landing_page_url":"https://doi.org/10.1109/sbcci.2016.7724072","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2016 29th Symposium on Integrated Circuits and Systems Design (SBCCI)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5053747851","display_name":"E. Petitprez","orcid":null},"institutions":[],"countries":[],"is_corresponding":true,"raw_author_name":"E. Petitprez","raw_affiliation_strings":["CEITEC S.A., Porto Alegre, RS, Brazil"],"affiliations":[{"raw_affiliation_string":"CEITEC S.A., Porto Alegre, RS, Brazil","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007221100","display_name":"Dalton Martini Colombo","orcid":"https://orcid.org/0000-0002-6781-9673"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"D. M. Colombo","raw_affiliation_strings":["CEITEC S.A., Porto Alegre, RS, Brazil"],"affiliations":[{"raw_affiliation_string":"CEITEC S.A., Porto Alegre, RS, Brazil","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5077766905","display_name":"F. M. Henes","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"F. M. Henes","raw_affiliation_strings":["CEITEC S.A., Porto Alegre, RS, Brazil"],"affiliations":[{"raw_affiliation_string":"CEITEC S.A., Porto Alegre, RS, Brazil","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018682034","display_name":"L. Courcelle","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"L. Courcelle","raw_affiliation_strings":["CEITEC S.A., Porto Alegre, RS, Brazil"],"affiliations":[{"raw_affiliation_string":"CEITEC S.A., Porto Alegre, RS, Brazil","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046369453","display_name":"R. Tararam","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"R. Tararam","raw_affiliation_strings":["CEITEC S.A., Porto Alegre, RS, Brazil"],"affiliations":[{"raw_affiliation_string":"CEITEC S.A., Porto Alegre, RS, Brazil","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080754313","display_name":"S. Jacobsen","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"S. Jacobsen","raw_affiliation_strings":["CEITEC S.A., Porto Alegre, RS, Brazil"],"affiliations":[{"raw_affiliation_string":"CEITEC S.A., Porto Alegre, RS, Brazil","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5068720186","display_name":"R. Soares","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"R. Soares","raw_affiliation_strings":["CEITEC S.A., Porto Alegre, RS, Brazil"],"affiliations":[{"raw_affiliation_string":"CEITEC S.A., Porto Alegre, RS, Brazil","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046929852","display_name":"C. Krug","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"C. Krug","raw_affiliation_strings":["CEITEC S.A., Porto Alegre, RS, Brazil"],"affiliations":[{"raw_affiliation_string":"CEITEC S.A., Porto Alegre, RS, Brazil","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5039315772","display_name":"M. Lubaszewski","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"M. Lubaszewski","raw_affiliation_strings":["CEITEC S.A., Porto Alegre, RS, Brazil"],"affiliations":[{"raw_affiliation_string":"CEITEC S.A., Porto Alegre, RS, Brazil","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":9,"corresponding_author_ids":["https://openalex.org/A5053747851"],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.2754369,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"24","issue":null,"first_page":"1","last_page":"5"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.9983999729156494,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.9976999759674072,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.6141592264175415},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.6034747958183289},{"id":"https://openalex.org/keywords/interconnection","display_name":"Interconnection","score":0.5947353839874268},{"id":"https://openalex.org/keywords/electronic-circuit","display_name":"Electronic circuit","score":0.5366484522819519},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.4920491874217987},{"id":"https://openalex.org/keywords/computer-architecture","display_name":"Computer architecture","score":0.4350832998752594},{"id":"https://openalex.org/keywords/ion-beam","display_name":"Ion beam","score":0.4248400330543518},{"id":"https://openalex.org/keywords/beam","display_name":"Beam (structure)","score":0.408214807510376},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.403438538312912},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.3050336241722107},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.2937166094779968},{"id":"https://openalex.org/keywords/telecommunications","display_name":"Telecommunications","score":0.1144738495349884}],"concepts":[{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.6141592264175415},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.6034747958183289},{"id":"https://openalex.org/C123745756","wikidata":"https://www.wikidata.org/wiki/Q1665949","display_name":"Interconnection","level":2,"score":0.5947353839874268},{"id":"https://openalex.org/C134146338","wikidata":"https://www.wikidata.org/wiki/Q1815901","display_name":"Electronic circuit","level":2,"score":0.5366484522819519},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4920491874217987},{"id":"https://openalex.org/C118524514","wikidata":"https://www.wikidata.org/wiki/Q173212","display_name":"Computer architecture","level":1,"score":0.4350832998752594},{"id":"https://openalex.org/C50774322","wikidata":"https://www.wikidata.org/wiki/Q644248","display_name":"Ion beam","level":3,"score":0.4248400330543518},{"id":"https://openalex.org/C168834538","wikidata":"https://www.wikidata.org/wiki/Q3705329","display_name":"Beam (structure)","level":2,"score":0.408214807510376},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.403438538312912},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3050336241722107},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2937166094779968},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.1144738495349884},{"id":"https://openalex.org/C147176958","wikidata":"https://www.wikidata.org/wiki/Q77590","display_name":"Civil engineering","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/sbcci.2016.7724072","is_oa":false,"landing_page_url":"https://doi.org/10.1109/sbcci.2016.7724072","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2016 29th Symposium on Integrated Circuits and Systems Design (SBCCI)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","score":0.6899999976158142,"display_name":"Affordable and clean energy"}],"awards":[],"funders":[{"id":"https://openalex.org/F4320322025","display_name":"Conselho Nacional de Desenvolvimento Cient\u00edfico e Tecnol\u00f3gico","ror":"https://ror.org/03swz6y49"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W2002807870","https://openalex.org/W2028441260","https://openalex.org/W2098845319","https://openalex.org/W2124678361","https://openalex.org/W2127393159"],"related_works":["https://openalex.org/W3014521742","https://openalex.org/W2155019192","https://openalex.org/W2014709025","https://openalex.org/W2389800961","https://openalex.org/W1995389502","https://openalex.org/W2501578203","https://openalex.org/W2113108952","https://openalex.org/W3215142653","https://openalex.org/W1487051936","https://openalex.org/W194748710"],"abstract_inverted_index":{"Focused":[0],"ion":[1,58],"beam":[2,59],"is":[3,68,74],"a":[4,28],"tool":[5],"that":[6],"allows":[7],"to":[8,21,40],"perform":[9],"microsurgery":[10],"of":[11,15,27,37],"the":[12,35,56,69],"interconnect":[13],"network":[14],"an":[16],"integrated":[17,43],"circuit":[18,60],"in":[19,49,76],"order":[20],"change":[22],"its":[23],"functionality,":[24],"without":[25],"need":[26],"metal":[29],"tweak.":[30],"This":[31],"paper":[32],"reports":[33],"on":[34],"application":[36],"this":[38,67],"technique":[39],"complex":[41],"CMOS":[42],"circuits.":[44],"Two":[45],"case":[46],"studies,":[47],"conducted":[48],"Brazil,":[50],"are":[51],"presented.":[52],"Electrical":[53],"results":[54],"show":[55],"focused":[57],"prototyping":[61],"were":[62],"successful.":[63],"To":[64],"our":[65],"knowledge,":[66],"first":[70],"time":[71],"such":[72],"result":[73],"reported":[75],"Latin":[77],"America.":[78]},"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}