{"id":"https://openalex.org/W2944000383","doi":"https://doi.org/10.1109/sas.2019.8705974","title":"Two-Dimensional Irradiance Measurement System for Aligner Lithography","display_name":"Two-Dimensional Irradiance Measurement System for Aligner Lithography","publication_year":2019,"publication_date":"2019-03-01","ids":{"openalex":"https://openalex.org/W2944000383","doi":"https://doi.org/10.1109/sas.2019.8705974","mag":"2944000383"},"language":"en","primary_location":{"id":"doi:10.1109/sas.2019.8705974","is_oa":false,"landing_page_url":"https://doi.org/10.1109/sas.2019.8705974","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2019 IEEE Sensors Applications Symposium (SAS)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5016694398","display_name":"Chen-Ju Lee","orcid":null},"institutions":[{"id":"https://openalex.org/I4210166867","display_name":"National Institutes of Applied Research","ror":"https://ror.org/05wcstg80","country_code":"TW","type":"government","lineage":["https://openalex.org/I4210128167","https://openalex.org/I4210166867"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Chen-Ju Lee","raw_affiliation_strings":["Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan","institution_ids":["https://openalex.org/I4210166867"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053558043","display_name":"Liang-Chieh Chao","orcid":null},"institutions":[{"id":"https://openalex.org/I4210166867","display_name":"National Institutes of Applied Research","ror":"https://ror.org/05wcstg80","country_code":"TW","type":"government","lineage":["https://openalex.org/I4210128167","https://openalex.org/I4210166867"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Liang-Chieh Chao","raw_affiliation_strings":["Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan","institution_ids":["https://openalex.org/I4210166867"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101750297","display_name":"Kuo\u2010Cheng Huang","orcid":"https://orcid.org/0000-0001-9971-8343"},"institutions":[{"id":"https://openalex.org/I4210166867","display_name":"National Institutes of Applied Research","ror":"https://ror.org/05wcstg80","country_code":"TW","type":"government","lineage":["https://openalex.org/I4210128167","https://openalex.org/I4210166867"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Kuo-Cheng Huang","raw_affiliation_strings":["Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan","institution_ids":["https://openalex.org/I4210166867"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110696559","display_name":"Yu\u2013Hsuan Lin","orcid":"https://orcid.org/0000-0002-1981-0359"},"institutions":[{"id":"https://openalex.org/I4210166867","display_name":"National Institutes of Applied Research","ror":"https://ror.org/05wcstg80","country_code":"TW","type":"government","lineage":["https://openalex.org/I4210128167","https://openalex.org/I4210166867"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Yu-Hsuan Lin","raw_affiliation_strings":["Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan","institution_ids":["https://openalex.org/I4210166867"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054806740","display_name":"Min-Wei Hung","orcid":"https://orcid.org/0000-0001-7525-2921"},"institutions":[{"id":"https://openalex.org/I4210166867","display_name":"National Institutes of Applied Research","ror":"https://ror.org/05wcstg80","country_code":"TW","type":"government","lineage":["https://openalex.org/I4210128167","https://openalex.org/I4210166867"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Min-Wei Hung","raw_affiliation_strings":["Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan","institution_ids":["https://openalex.org/I4210166867"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113776310","display_name":"Chun-Han Chou","orcid":null},"institutions":[{"id":"https://openalex.org/I4210166867","display_name":"National Institutes of Applied Research","ror":"https://ror.org/05wcstg80","country_code":"TW","type":"government","lineage":["https://openalex.org/I4210128167","https://openalex.org/I4210166867"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Chun-Han Chou","raw_affiliation_strings":["Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan","institution_ids":["https://openalex.org/I4210166867"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.1502,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.51991781,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"19","issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11666","display_name":"Color Science and Applications","score":0.9855999946594238,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11666","display_name":"Color Science and Applications","score":0.9855999946594238,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.9819999933242798,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14156","display_name":"Engineering Applied Research","score":0.980400025844574,"subfield":{"id":"https://openalex.org/subfields/2205","display_name":"Civil and Structural Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/irradiance","display_name":"Irradiance","score":0.9232736825942993},{"id":"https://openalex.org/keywords/measure","display_name":"Measure (data warehouse)","score":0.7228631973266602},{"id":"https://openalex.org/keywords/divergence","display_name":"Divergence (linguistics)","score":0.7067694664001465},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.6345545649528503},{"id":"https://openalex.org/keywords/luminance","display_name":"Luminance","score":0.6083602905273438},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.537363588809967},{"id":"https://openalex.org/keywords/system-of-measurement","display_name":"System of measurement","score":0.5196667909622192},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.35310858488082886},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.32630103826522827}],"concepts":[{"id":"https://openalex.org/C46423501","wikidata":"https://www.wikidata.org/wiki/Q830654","display_name":"Irradiance","level":2,"score":0.9232736825942993},{"id":"https://openalex.org/C2780009758","wikidata":"https://www.wikidata.org/wiki/Q6804172","display_name":"Measure (data warehouse)","level":2,"score":0.7228631973266602},{"id":"https://openalex.org/C207390915","wikidata":"https://www.wikidata.org/wiki/Q1230525","display_name":"Divergence (linguistics)","level":2,"score":0.7067694664001465},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6345545649528503},{"id":"https://openalex.org/C73313986","wikidata":"https://www.wikidata.org/wiki/Q355386","display_name":"Luminance","level":2,"score":0.6083602905273438},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.537363588809967},{"id":"https://openalex.org/C37649242","wikidata":"https://www.wikidata.org/wiki/Q932268","display_name":"System of measurement","level":2,"score":0.5196667909622192},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.35310858488082886},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.32630103826522827},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C77088390","wikidata":"https://www.wikidata.org/wiki/Q8513","display_name":"Database","level":1,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0},{"id":"https://openalex.org/C1276947","wikidata":"https://www.wikidata.org/wiki/Q333","display_name":"Astronomy","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/sas.2019.8705974","is_oa":false,"landing_page_url":"https://doi.org/10.1109/sas.2019.8705974","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2019 IEEE Sensors Applications Symposium (SAS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":8,"referenced_works":["https://openalex.org/W73403350","https://openalex.org/W1975823237","https://openalex.org/W2004908797","https://openalex.org/W2082501574","https://openalex.org/W2093798260","https://openalex.org/W2747542949","https://openalex.org/W2791231037","https://openalex.org/W6602958710"],"related_works":["https://openalex.org/W2147777774","https://openalex.org/W1990245967","https://openalex.org/W2054177013","https://openalex.org/W2072442315","https://openalex.org/W2175090515","https://openalex.org/W4383506493","https://openalex.org/W1986953717","https://openalex.org/W1994772959","https://openalex.org/W2427340667","https://openalex.org/W2136398500"],"abstract_inverted_index":{"In":[0,88,125],"the":[1,17,29,43,47,60,64,69,89,93,102,126,140,145,154],"studying,":[2,90],"we":[3,67,91,128],"presented":[4,68],"a":[5,54,131,136],"two-dimensional":[6],"irradiance":[7,44,70,94,120,141],"map":[8],"measurement":[9,71,79,95],"system.":[10],"There":[11],"are":[12],"two":[13,30,103],"important":[14],"factors":[15],"in":[16],"lithography":[18],"which":[19],"is":[20,39,84],"uniformity":[21,113],"deviation":[22],"and":[23,35,51,80,97,115,134,149],"diverge":[24],"angle.":[25,157],"People":[26],"usually":[27],"measure":[28,59,101],"data":[31],"by":[32,49,63],"handle":[33,98],"illuminometer":[34,99],"luminometer.":[36],"However,":[37],"it":[38,52],"difficult":[40],"to":[41,58,100,152],"observe":[42],"distribution":[45],"of":[46,56],"detail":[48],"illuminometer,":[50],"takes":[53],"lot":[55],"space":[57,77],"divergence":[61,117,156],"angle":[62],"illuminometer.":[65],"Therefore,":[66],"system":[72,96,108,146],"that":[73],"doesn\u2019t":[74],"need":[75],"large":[76],"for":[78],"minimum":[81],"detect":[82],"pitch":[83],"less":[85],"than":[86],"1mm.":[87],"used":[92],"commercial":[104],"aligner":[105],"lithography.":[106],"Our":[107],"accurately":[109],"exhibits":[110],"lithographic":[111],"output":[112,155],"deviations":[114],"calculates":[116],"angles":[118],"from":[119],"distributions":[121],"at":[122],"different":[123],"heights.":[124],"future,":[127],"could":[129],"create":[130],"human":[132],"interface":[133],"install":[135],"luminance":[137],"sensor":[138],"near":[139],"sensor.":[142],"It":[143],"made":[144],"control":[147],"simply":[148],"more":[150],"precise":[151],"analysis":[153]},"counts_by_year":[{"year":2020,"cited_by_count":1}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}