{"id":"https://openalex.org/W3028508209","doi":"https://doi.org/10.1109/radioelektronika49387.2020.9092431","title":"Optimization of SiON/SiOx structures fabrication process for optical waveguides","display_name":"Optimization of SiON/SiOx structures fabrication process for optical waveguides","publication_year":2020,"publication_date":"2020-04-01","ids":{"openalex":"https://openalex.org/W3028508209","doi":"https://doi.org/10.1109/radioelektronika49387.2020.9092431","mag":"3028508209"},"language":"en","primary_location":{"id":"doi:10.1109/radioelektronika49387.2020.9092431","is_oa":false,"landing_page_url":"https://doi.org/10.1109/radioelektronika49387.2020.9092431","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2020 30th International Conference Radioelektronika (RADIOELEKTRONIKA)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5077445300","display_name":"\u013dubo\u0161 Podluck\u00fd","orcid":null},"institutions":[{"id":"https://openalex.org/I110757952","display_name":"Slovak University of Technology in Bratislava","ror":"https://ror.org/0561ghm58","country_code":"SK","type":"education","lineage":["https://openalex.org/I110757952"]}],"countries":["SK"],"is_corresponding":false,"raw_author_name":"Lubos Podlucky","raw_affiliation_strings":["Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Bratislava, Slovakia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Bratislava, Slovakia","institution_ids":["https://openalex.org/I110757952"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055987516","display_name":"Mari\u00e1n Vojs","orcid":"https://orcid.org/0000-0001-9929-152X"},"institutions":[{"id":"https://openalex.org/I110757952","display_name":"Slovak University of Technology in Bratislava","ror":"https://ror.org/0561ghm58","country_code":"SK","type":"education","lineage":["https://openalex.org/I110757952"]}],"countries":["SK"],"is_corresponding":false,"raw_author_name":"Marian Vojs","raw_affiliation_strings":["Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Bratislava, Slovakia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Bratislava, Slovakia","institution_ids":["https://openalex.org/I110757952"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026526816","display_name":"Jozef Chovan","orcid":"https://orcid.org/0000-0003-3445-7538"},"institutions":[{"id":"https://openalex.org/I4210113375","display_name":"International Laser Center","ror":"https://ror.org/030n38z97","country_code":"SK","type":"facility","lineage":["https://openalex.org/I4210113375"]}],"countries":["SK"],"is_corresponding":false,"raw_author_name":"Jozef Chovan","raw_affiliation_strings":["International Laser Centre, Bratislava, Slovakia"],"raw_orcid":"https://orcid.org/0000-0003-3445-7538","affiliations":[{"raw_affiliation_string":"International Laser Centre, Bratislava, Slovakia","institution_ids":["https://openalex.org/I4210113375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090666111","display_name":"V. \u0158eh\u00e1\u010dek","orcid":"https://orcid.org/0000-0003-0618-4747"},"institutions":[{"id":"https://openalex.org/I110757952","display_name":"Slovak University of Technology in Bratislava","ror":"https://ror.org/0561ghm58","country_code":"SK","type":"education","lineage":["https://openalex.org/I110757952"]}],"countries":["SK"],"is_corresponding":false,"raw_author_name":"Vlastimil Rehacek","raw_affiliation_strings":["Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Bratislava, Slovakia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Bratislava, Slovakia","institution_ids":["https://openalex.org/I110757952"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5091826232","display_name":"Jaroslav Kov\u00e1\u010d","orcid":"https://orcid.org/0000-0002-4751-4178"},"institutions":[{"id":"https://openalex.org/I110757952","display_name":"Slovak University of Technology in Bratislava","ror":"https://ror.org/0561ghm58","country_code":"SK","type":"education","lineage":["https://openalex.org/I110757952"]}],"countries":["SK"],"is_corresponding":false,"raw_author_name":"Jaroslav Kovac","raw_affiliation_strings":["Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Bratislava, Slovakia"],"raw_orcid":"https://orcid.org/0000-0002-4751-4178","affiliations":[{"raw_affiliation_string":"Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Bratislava, Slovakia","institution_ids":["https://openalex.org/I110757952"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5108033107","display_name":"F. Uherek","orcid":"https://orcid.org/0000-0002-6437-4947"},"institutions":[{"id":"https://openalex.org/I4210113375","display_name":"International Laser Center","ror":"https://ror.org/030n38z97","country_code":"SK","type":"facility","lineage":["https://openalex.org/I4210113375"]}],"countries":["SK"],"is_corresponding":false,"raw_author_name":"Frantisek Uherek","raw_affiliation_strings":["International Laser Centre, Bratislava, Slovakia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"International Laser Centre, Bratislava, Slovakia","institution_ids":["https://openalex.org/I4210113375"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.7157,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.59506867,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":95},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"5"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10767","display_name":"Advanced Photonic Communication Systems","score":0.9993000030517578,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10988","display_name":"Advanced Fiber Laser Technologies","score":0.9991000294685364,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.8132659196853638},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5877231359481812},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5179361701011658},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.45372274518013},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.4390360116958618},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.3308895528316498},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.14212453365325928}],"concepts":[{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.8132659196853638},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5877231359481812},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5179361701011658},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.45372274518013},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4390360116958618},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3308895528316498},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.14212453365325928},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/radioelektronika49387.2020.9092431","is_oa":false,"landing_page_url":"https://doi.org/10.1109/radioelektronika49387.2020.9092431","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2020 30th International Conference Radioelektronika (RADIOELEKTRONIKA)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":10,"referenced_works":["https://openalex.org/W2004245260","https://openalex.org/W2006517529","https://openalex.org/W2019748790","https://openalex.org/W2057778288","https://openalex.org/W2141966677","https://openalex.org/W2152197498","https://openalex.org/W2463516351","https://openalex.org/W2584201205","https://openalex.org/W2771830259","https://openalex.org/W2774841036"],"related_works":["https://openalex.org/W2082914599","https://openalex.org/W4246450666","https://openalex.org/W4388998267","https://openalex.org/W2898370298","https://openalex.org/W2137437058","https://openalex.org/W2756570351","https://openalex.org/W4390401159","https://openalex.org/W2744391499","https://openalex.org/W3120461830","https://openalex.org/W4230250635"],"abstract_inverted_index":{"We":[0,128],"have":[1],"investigated":[2,129],"the":[3,103,130,141,151,170,197],"deposition":[4,27],"and":[5,32,41,81,87,138,146,160,173,191],"etching":[6,51,69],"process":[7],"of":[8,76,89,107,113,132,148,150,167,182,188,202],"silicon":[9,17],"oxynitride":[10],"(SiON)":[11],"films":[12,20,57],"for":[13,50],"optical":[14,109],"waveguides":[15],"on":[16,84,140],"wafer.":[18],"SiON":[19,56,90,108],"were":[21,58],"deposited":[22,124,152,179],"using":[23,53,72,125],"plasma-enhanced":[24],"chemical":[25],"vapor":[26],"(PECVD)":[28],"system.":[29,127],"Thickness,":[30],"uniformity":[31,147],"refractive":[33,142,203],"index":[34],"was":[35,48,92,117,123,163],"measured":[36],"by":[37,43,165],"micro-spot":[38],"spectroscopic":[39],"reflectometry":[40],"confirmed":[42],"ellipsometry.":[44],"Aluminum":[45],"(Al)":[46],"mask":[47],"fabricated":[49],"purpose":[52],"lift-off":[54],"process.":[55],"etched":[59],"in":[60,157,169,200],"low":[61],"pressure":[62],"inductively":[63],"coupled":[64],"plasma":[65,171],"-":[66],"reactive":[67],"ion":[68],"(ICP-RIE)":[70],"chamber":[71],"CF4gas.":[73],"The":[74,176],"effect":[75],"oxygen":[77],"(O2)":[78],"flow":[79,135,186],"rate":[80,86,187],"source":[82],"power":[83,139,192],"etch":[85],"profile":[88,174],"waveguide":[91,110],"investigated.":[93,119],"Scanning":[94],"electron":[95],"microscope":[96],"(SEM)":[97],"has":[98],"been":[99],"used":[100],"to":[101],"study":[102],"overall":[104],"structure":[105],"quality":[106],"core.":[111],"Deposition":[112],"SiOx":[114,120,153],"cladding":[115,121],"layer":[116,122,178],"also":[118],"PECVD":[126],"impact":[131],"total":[133,184],"gas":[134,185],"rate,":[136,145],"N2O/SiH4ratio":[137,181],"index,":[143],"growth":[144],"thickness":[149],"layer.":[154],"Micro-trenching":[155],"occurred":[156],"all":[158],"cases,":[159],"their":[161],"variation":[162],"explained":[164],"combination":[166],"variations":[168],"density":[172],"angles.":[175],"SiO2cladding":[177],"with":[180],"8,353,":[183],"1000":[189],"sccm":[190],"P":[193],"=":[194],"100W":[195],"yielded":[196],"best":[198],"results":[199],"terms":[201],"index.":[204]},"counts_by_year":[{"year":2021,"cited_by_count":2}],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}